• Journal of Information Display
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• v.12 no.4
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• pp.205-208
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• 2011

Herein, the integration of solution-processed polymer thin-film transistors (TFTs) that were fabricated using selective wettability through ultraviolet (UV) exposure into a reflective liquid crystal display is demonstrated. From the experimental results of energy-dispersive spectroscopy, the composition of carbon and fluorine enhancing the hydrophobicity in the polymer chains was found to play a critical role in the wetting selectivity upon UV exposure. The polymer TFTs fabricated through the wettability-patterning process exhibited long-term stability and reliability. This wetting-selectivity-based patterning technique will be useful for constructing different types of solution-processed electronic and optoelectronic devices.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2018.06a
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• pp.121-121
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• 2018

Copper is a promising electronic material due to low cost and high electrical conductivity. However, the oxidation problem in an ambient condition makes a crucial issue in practical applications. In here, we developed a simple and cost-effective Cu patterning method on a flexible PET film by combining a solution processable Cu nanoparticle patterning and a low temperature post-processing using acetic acid treatment, laser sintering process and acid-assisted laser sintering process. Acid-assisted laser sintering processed Cu electrode showed superior characteristics in electrical, mechanical and chemical stability over other post-processing methods. Finally, the Cu electrode was applied to the flexible electronics applications such as flexible and transparent heaters and touch screen panels.

• Proceedings of the Korean Magnestics Society Conference
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• 2007.05a
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• pp.325.2-325.2
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• 2007

• Proceedings of the Korean Society of Dyers and Finishers Conference
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• 2008.04a
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• pp.58-59
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• 2008

• 한국정보디스플레이학회:학술대회논문집
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• 2006.08a
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• pp.1719-1722
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• 2006

We proposed a soft-lithographic method for aligning a liquid crystal (LC) in patterned azimuthal orientations. It is demonstrated that a thermoplastic polystyrene layer is patterned from a thermally stable polyimide layer via pressure-assisted capillary force lithography, which provides multidirectional LC alignment condition simply followed by a unidirectional rubbing process.

• Journal of Electrical Engineering and Technology
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• v.6 no.2
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• pp.233-238
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• 2011

In the present work, a new approach is proposed for via interconnects of semiconductor devices, where multi-wall carbon nanotubes (MWCNTs) are used instead of conventional metals. In order to implement a selective growth of carbon nanotubes (CNTs) for via interconnect, the buried catalyst method is selected which is the most compatible with semiconductor processes. The cobalt catalyst for CNT growth is pre-deposited before via hole patterning, and to achieve the via etch stop on the thin catalyst layer (ca. 3nm), a novel 2-step etch scheme is designed; the first step is a conventional oxide etch while the second step chemically etches the silicon nitride layer to lower the damage of the catalyst layer. The results show that the 2-step etch scheme is a feasible candidate for the realization of CNT interconnects in conventional semiconductor devices.

• Journal of the Korean Society for Precision Engineering
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• v.16 no.2 s.95
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• pp.60-67
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• 1999

Micro-fabrication techniques such as lithography and LIGA processes usually require large investment and are suitable for mass production. Therefore, there is a need for a new micro-fabrication technique that is flexible and more cost effective. In this paper a novel, economical and flexible method of producing micro-pattern on silicon wafer is presented. This method relies on selective removal of mask by mechanical cutting. Then micro-pattern is produced by chemical etching. V-shaped grooved of about 3 ${\mu}m$ wide and 2 ${\mu}m$ deep has been made on ${SiO_2}m$ coated silicon wafer with this method. This method may be utilized for making microstructures in MEMS application at low cost.

• 한국정보디스플레이학회:학술대회논문집
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• 2005.07b
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• pp.907-912
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• 2005

Micro-patterns of $Pb(Zr_{0.53}Ti_{0.47})O_3$, PZT, thin films with a MPB composition were deposited on $Pt/Ti/SiO_2/Si$ substrate from molecular-designed PZT precursor solution by using self-assembledmonolayer(SAM) as a template. This method includes deposition of SAM followed by the optical etching by exposing the SAM to the UV-light, leading to the patterned SAM as a selective deposition template. The pattern of SAM was formed by irradiating UV-light to the SAM on a substrate and/or patterned PZT thin film through a metal mask for the selective deposition of patterned PZT or lanthanum nickel oxide (LNO) precursor films from alkoxide-based precursor solutions. As a result, patterned ferroelectric PZT and PZT/LNO thin film capacitors with good electrical properties in micrometer size could be successfully deposited.

• Journal of Radiation Industry
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• v.5 no.3
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• pp.243-247
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• 2011

In this study, a convenient method for the selective immobilization of single strand DNA (ssDNA) on a polymer surface was described. A positively charged polyelectrolyte, poly(diallyldimethylammonium chloride) (PDDA), was spin-coated on a tissue culture petridish and the micropatterns of the PDDA were formed by selective ion implantation through a pattern mask. The surface property of the implanted PDDA was investigated by using a surface profiler and FT-IR spectrometer. Cy3-labeled ssDNA was selectively immobilized on the PDDA patterns through ionic interaction and thus, well-defined ssDNA patterns were obtained.

• Transactions of the Korean Society of Mechanical Engineers B
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• v.36 no.11
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• pp.1135-1140
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• 2012

Two-step metallization processes have been proposed to achieve high-efficiency silicon solar cells, where the front-side grids are formed by silver plating after the formation of a nickel seed layer with a mask. Because the conventional mask patterning process is performed by an expensive selective printing method using either UV resist or phase change ink, however, the combination of a simple coating and laser-selective ablation processes is proposed in this study as an alternative means. As a masking material, the solar cell wafer was coated with either inexpensive wax having a low melting temperature or a fluorocarbon solution, and then, an electrode image was patterned by selectively removing the masking material using the laser. It was found that the fluorocarbon coating was not only superior to the wax coating in terms of pattern uniformity but it also increased the efficiency of the solar cell by 0.16%, as confirmed by statistical f and t tests.