• Title/Summary/Keyword: secondary electron emission.

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Sputtering yield and secondary electron emission coefficient ($\gamma$) of the MgO, $MgAl_2O_4$ and $MgAl_2O_4/MgO$ thin film grown on the Cu substrate by using the Focused Ion Beam

  • Jung, Kang-Won;Lee, H.J.;Jeong, W.H.;Oh, H.J.;Choi, E.H.;Seo, Y.H.;Kang, S.O.;Park, C.W.
    • 한국정보디스플레이학회:학술대회논문집
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    • 2006.08a
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    • pp.877-881
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    • 2006
  • We obtained sputtering yields for the MgO, $MgAl_2O_4$ and $MgAl_2O_4/MgO$ films using the FIB system. $MgAl_2O_4/MgO$ protective layers have been found to have less $24^{\sim}^30%$ sputtering yield values from 0.24 atoms/ion up to 0.36 atoms/ion than MgO layers with the values from 0.36 atoms/ion up to 0.45 atoms/ion for irradiated $Ga^+$ ion beam whose energies ranged from 10 keV to 14 keV. And $MgAl_2O_4$ layers have been found to have lowest sputtering yield values from 0.88 up to 0.11. It is also found that $MgAl_2O_4/MgO$ and MgO have secondary electron emission $coefficient({\gamma})$ values from 0.09 up to 0.12 for $Ne^+$ ion whose energies ranged from 50 eV to 200 eV.

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Study of a MgO Protective Layer Deposited with Oxygen Ion Beam Assisted Deposition in an AC PDP (Oxygen Ion Beam Assisted Deposition법에 의해 형성된 AC PDP용 MgO 보호막의 특성 연구)

  • Kwon, Sang-Jik;Li, Zhao-Hui
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.20 no.7
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    • pp.615-619
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    • 2007
  • MgO layer plays an important role for plasma display panels (PDPs). In this experiment, ion beam assisted deposition (IBAD) methode was uesed to deposit a MgO thin film and the assisting oxygen ion beam energy was varied from 100 eV to 500 eV. In order to investigate the relationship between the secondary electron emission and the defect levels of the MgO layer, we measured the cathodoluminescence (CL) spectra of the MgO thin films, and we analyzed the CL peak intensity and peak transition. The results showed that the assisting ion beam energy played an important role in the peak intensity and the peak transition of the CL spectrum. The properties of MgO thin film were also analyzed using XRD and SEM, these results showed the assisting ion beam energy had direct effect on characteristics of MgO thin film.

Effect of Defect Energy levels on the AC PDP Discharging Characteristics (MgO 보호막의 결함 전위 레벨이 AC-PDP 방전 특성에 미치는 효과)

  • Kwon, Sang-Jik;Kim, Yong-Jae;Cho, Eou-Sik
    • Journal of the Institute of Electronics Engineers of Korea SD
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    • v.44 no.12
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    • pp.12-17
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    • 2007
  • The effects of the evaporation rate of MgO films using an electron beam on the MgO properties and the discharge characteristics of a plasma display panel(PDP) were investigated and analyzed. Mgo films were deposited with the various MgO evaporation rates. The MgO properties such as the crystal orientation, the surface roughness, and the film structure, were inspected using XRD(X-ray diffractometry), AFM(atomic force microscopy). From the experiments and Paschen law, the maximum value of the secondary, electron emission coefficient $(\gamma)$ was obtained at the evaporation rate of $5\AA/sec$. The minimum firing voltage and the maximum luminous efficiency were obtained at an evaporation rate of $5\AA/sec$. In the MgO film deposited at $5\AA/sec$, the (200) orientation and $F^+$ center were most intensive. The XRD results and cathode-luminescence(CL) spectra show the $\gamma$ values are correlated with $F/F^+$ centers of the molecular structure of MgO films.

Calculation of Photoelectric Yield by X-ray (X선(線)에 의한 광전수율(光電收率) 계산(計算)에 관(關)한 연구(硏究))

  • Song, Jae-Kwan
    • Journal of radiological science and technology
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    • v.1 no.1
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    • pp.31-35
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    • 1978
  • X-rays contribute to electron emission from material surfaces primarily through photoelectric interaction. A simple model is described for predicting the yield and energy spectrum of photon and Auger electrons emitted from materials exposed to X-ray with low energy. In this paper, We have calculated the yield of primary, Auger, and secondary, electrons. The results of the photoelectric yield model developed here suggests that. I) The angular distribution of emitted electrons(Per unit angle) is proportional to $sin{\theta}\;cos{\theta}$ for all electron energies and all components(Primary, Auger, or Secondary) II) The shape of the energy spectrum of the photoelectric yield is independent of angle. III) For this targets the forward and backward photoelectric yields are indentical.

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Secondary Electron Emission Properties with Lead and Lead-Free Dielectric in AC-PDP

  • Cha, Myung-Lyoung;Lee, Hye-Jung;Choi, Eun-Ha;Kim, Hyung-Sun
    • 한국정보디스플레이학회:학술대회논문집
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    • 2005.07b
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    • pp.1255-1257
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    • 2005
  • The increase of secondary electron-emitting coefficient is effective to reduce the discharge voltage as well as to improve the luminance efficiency of PDP. We investigated the properties of ${\gamma}$ with composition and different dielectric constants, and the microstructure of dielectric after ion collision. As a result the dielectric of PbO system showed higher ${\gamma}$ compared with Pb-free system. However, there was no difference in ${\gamma}$ when the MgO protective layer was covered.

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Characteristics of Electron Beam Extraction in Cold Cathode Type Large Cross-Sectional Pulsed Electron Beam Generator (냉음극형 대면적 펄스 전자빔 가속기의 빔인출 특성)

  • Woo, S.H.;Lee, K.S.;Lee, D.I.;Lee, H.S.
    • Proceedings of the KIEE Conference
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    • 2001.07c
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    • pp.1609-1611
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    • 2001
  • A large cross-section pulsed electron beam generator of cold cathode type has been developed for industrial applications, for example, waste water cleaning, flue gas cleaning, and pasteurization etc. The operational principle is based on the emission of secondary electrons from cold cathode when ions in the plasma hit the cathode, which are accelerated toward exit window by the gradient of an electric potential. The conventional electron beam generators need an electron scanning beam because the small cross section thermal electron emitter is used. The electron beam of large cross-section pulsed electron beam generator do not need to be scanned over target material because the beam cross section is large by 300$cm^2$. We have fabricated the large cross-sectional pulsed electron beam generator with the peak energy of 200keV and beam diameter of 200mm and obtained the large area electron beam in the air. The electron beam current has been investigated as a function of accelerating voltage, glow discharge current, helium pressure, distance from the exit window and radial distribution in front of the exit window.

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Characteristics of spatial distribution of cold cathode type large aperture electron beam (냉음극형 대면적 전자빔의 공간적 분포 특성)

  • Woo, S.H.;Abroyan, M.;Cho, C.H.;Kim, G.H.;Lee, H.S.;Rim, G.H.;Lee, K.S.
    • Proceedings of the KIEE Conference
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    • 1999.07e
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    • pp.2170-2172
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    • 1999
  • A low energy large aperture(LELA) pulsed electron beam generator of a cold cathode type has been developed for environmental applications, for example, waste water cleaning, flue gas cleaning, and pasteurization etc. The operational principle is based on the emission of secondary electrons from cold cathode when ions in the plasma hit the cathode, which are accelerated toward exit window by the gradient of an electric potential. We have fabricated the LELA electron beam generator with the peak energy of 200keV and beam diameter of 200mm and obtained the large aperture electron beam in air. The electron beam current density has been investigated as a function of glow discharge current, accelerating voltage and radial distribution in front of the exit window foil. The plasma density and electron temperature have been measured in order to confirm the relation with the electron beam current density. We are going to upgrade the LELA electron beam generator in the electron energy, electron beam current and stability of operation for various applications.

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A study for development of a dielectric protection layer in PDP (I) (The annealing characteristics of thickness-optimized $Al_2O_3/MgO$) (PDP용 유전체 보호막 재료 개발을 위한 연구 (I) (두께 최적화된 $Al_2O_3/MgO$의 열처리 특성 ))

  • Jeoung, Jin-Man;Yim, Ki-Ju;Shin, Kyung;Lee, Hyun-Yong;Chung, Hong-Bay
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 1998.06a
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    • pp.117-120
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    • 1998
  • In this study, $Al_2O_3/MgO$ bilayer was prepared with Electron-beam evaporation and the properties of the film was investigated in order to improve the property of MgO film, which is used for the protection layer in PDP(P1asma Display Panel). The thickness of $Al_2O_3/MgO$ bilayer was optimized by the Matrix Theory for the fabrication of antireflection structure for 5350A wavelength. The secondary electron emission yields of as-deposited film and annealed film were measured and compared, the bilayer was considered for the applicability as PDP. XRD showed the strong (200) primary peak of MgO. The intensity of (200) peak in the film annealed at 300C was decreased. As the result of SEM analysis for MgO films and Alz03 films, it is considered that the morphology of the films were improved of roughness and it were condensed by annealing.

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Numerical Simulation of the Characteristics of Electrons in Bar-plate DC Negative Corona Discharge Based on a Plasma Chemical Model

  • Liu, Kang-Lin;Liao, Rui-Jin;Zhao, Xue-Tong
    • Journal of Electrical Engineering and Technology
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    • v.10 no.4
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    • pp.1804-1814
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    • 2015
  • In order to explore the characteristics of electrons in DC negative corona discharge, an improved plasma chemical model is presented for the simulation of bar-plate DC corona discharge in dry air. The model is based on plasma hydrodynamics and chemical models in which 12 species are considered. In addition, the photoionization and secondary electron emission effect are also incorporated within the model as well. Based on this model, electron mean energy distribution (EMED), electron density distribution (EDD), generation and dissipation rates of electron at 6 typical time points during a pulse are discussed emphatically. The obtained results show that, the maximum of electron mean energy (EME) appears in field ionization layer which moves towards the anode as time progresses, and its value decreases gradually. Within a pulse process, the electron density (ED) in cathode sheath almost keeps 0, and the maximum of ED appears in the outer layer of the cathode sheath. Among all reactions, R1 and R2 are regarded as the main process of electron proliferation, and R22 plays a dominant role in the dissipation process of electron. The obtained results will provide valuable insights to the physical mechanism of negative corona discharge in air.