• Title/Summary/Keyword: quartz crystal mass balance

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The Tarnish Process of Silver in H2S Environments

  • Kim, H.;Payer, J.H.
    • Corrosion Science and Technology
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    • v.5 no.6
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    • pp.206-212
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    • 2006
  • The effects of sub-ppm levels of $H_2S$ and the adsorbed water on the atmospheric corrosion of silver were studied with In situ weight balance to study the effect of the adsorbed water on the kinetic behavior and to determine the rate-controlling step, with XPS to analyze the tarnish film, and with calculation of phase equilibrium to predict the stable solid phase, the concentrations of dissolved species ($Ag^-$, $H^+$, $S^{2-}$, $HS^-$) and the equilibrium potentials ($E_{Ag^+/Ag}$, $E_{H^+/H_2}$, $E_{O_2/O^{2-}$). The results of weight measurements showed that oxygen was required for the sulfidation of silver in 100 ppb $H_2S$ and humidified environments enhanced the tarnished rate and oxidizing power. In addition, the rate determining step for tarnishing silver was shown to be changed to transport though the tarnish film.

QMF Ion Beam System Development for Oxide Etching Mechanism Study (산화막 식각 기구 연구를 위한 QMF Ion Beam 장치의 제작)

  • 주정훈
    • Journal of the Korean institute of surface engineering
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    • v.37 no.4
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    • pp.220-225
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    • 2004
  • A new ion beam extraction system is designed using a simple ion mass filter and a micro mass balance and a QMS based detecting system. A quadrupole Mass Filter is used for selective ion beam formation from inductively coupled high density plasma sources with appropriate electrostatic lens and final analyzing QMS. Also a quartz crystal microbalance is set between a QMF and a QMS to measure the etching and polymerization rate of the mass selected ion beam. An inductively coupled plasma was used as a ion/radical source which had an electron temperature of 4-8 eV and electron density of $4${\times}$10^{11}$#/㎤. A computer interfaced system through 12bit AD-DA board can control the pass ion mass of the qmf by setting RF/DC voltage ratio applied to the quadrupoles so that time modulation of pass ion's mass is possible. So the direct measurements of ion - surface chemistry can be possible in a resolution of $1\AA$/sec based on the qcm's sensitivity. A full set of driving software and hardware setting is successfully carried out to get fundamental plasma information of the ICP source and analysed $Ar^{+}$ beam was detected at the $2^{nd}$ QMS.