• International Journal of Air-Conditioning and Refrigeration
• /
• 제10권4호
• /
• pp.177-183
• /
• 2002

A pulsed tracer gas technique is applied to measure the distributions of local mean age and local mean residual-life-time of air in a half-scale experimental chamber, The airflow patterns in the chamber are visualized by a Helium bubble generator for three different exhaust locations. A supply slot is located at the top of a right wall, and an exhaust slot is at either bottom-left (Case 1), bottom-right (Case 2), or top-left (Case 3) location. Results show that the distributions of local mean age and local mean residual-life-time are different from each other, but both of them are closely related to the airflow pattern in the space. Included are discussions on explaining the variations of overall room ventilation effectiveness depending upon airflow rates for three different supply-exhaust configurations.

• 대한전기학회:학술대회논문집
• /
• 대한전기학회 2006년도 제37회 하계학술대회 논문집 C
• /
• pp.1554-1555
• /
• 2006

We have studied the backward wave oscillator, a power pulsed generator oscillator at 20 GHz has higher frequency then current one. An absolute instability linear analysis was used for the purpose of designing the slow wave structure. A large diameter of the slow wave structure was adopted to prevent the breakdown brought about by the increase of power density.

• 한국전기전자재료학회논문지
• /
• 제22권10호
• /
• pp.897-903
• /
• 2009

We have designed the backward wave oscillator. A power-pulsed generator oscillated at 24 GHz has higher frequency than current one. It is very inportant to prevent microwave from going into the beam diode, since intence microwave will harmfully affect beam generation. Due to the axial mode operation, there exist a critial value of beam energy for the oscillation. By changing the condition at the SWS end, an enhanced performance of the K-band oversized BWO is observed in a low magnetic field region about 0.8T.

• 한국진공학회:학술대회논문집
• /
• 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
• /
• pp.96-97
• /
• 2012

In nitride and oxide film deposition, sputtered metals react with nitrogen or oxygen gas in a vacuum chamber to form metal nitride or oxide films on a substrate. The physical properties of sputtered films (metals, oxides, and nitrides) are strongly influenced by magnetron plasma density during the deposition process. Typical target power densities on the magnetron during the deposition process are ~ (5-30) W/cm2, which gives a relatively low plasma density. The main challenge in reactive sputtering is the ability to generate a stable, arc free discharge at high plasma densities. Arcs occur due to formation of an insulating layer on the target surface caused by the re-deposition effect. One current method of generating an arc free discharge is to use the commercially available Pinnacle Plus+ Pulsed DC plasma generator manufactured by Advanced Energy Inc. This plasma generator uses a positive voltage pulse between negative pulses to attract electrons and discharge the target surface, thus preventing arc formation. However, this method can only generate low density plasma and therefore cannot allow full control of film properties. Also, after long runs ~ (1-3) hours, depends on duty cycle the stability of the reactive process is reduced due to increased probability of arc formation. Between 1995 and 1999, a new way of magnetron sputtering called HIPIMS (highly ionized pulse impulse magnetron sputtering) was developed. The main idea of this approach is to apply short ${\sim}(50-100){\mu}s$ high power pulses with a target power densities during the pulse between ~ (1-3) kW/cm2. These high power pulses generate high-density magnetron plasma that can significantly improve and control film properties. From the beginning, HIPIMS method has been applied to reactive sputtering processes for deposition of conductive and nonconductive films. However, commercially available HIPIMS plasma generators have not been able to create a stable, arc-free discharge in most reactive magnetron sputtering processes. HIPIMS plasma generators have been successfully used in reactive sputtering of nitrides for hard coating applications and for Al2O3 films. But until now there has been no HIPIMS data presented on reactive sputtering in cluster tools for semiconductors and MEMs applications. In this presentation, a new method of generating an arc free discharge for reactive HIPIMS using the new Cyprium plasma generator from Zpulser LLC will be introduced. Data (or evidence) will be presented showing that arc formation in reactive HIPIMS can be controlled without applying a positive voltage pulse between high power pulses. Arc-free reactive HIPIMS processes for sputtering AlN, TiO2, TiN and Si3N4 on the Applied Materials ENDURA 200 mm cluster tool will be presented. A direct comparison of the properties of films sputtered with the Advanced Energy Pinnacle Plus + plasma generator and the Zpulser Cyprium plasma generator will be presented.

• 한국진공학회:학술대회논문집
• /
• 한국진공학회 2011년도 제40회 동계학술대회 초록집
• /
• pp.185-185
• /
• 2011

ZnTe semiconductor is very attractive materials for optoelectronic devices in the visible green spectral region because of it has direct bandgap of 2.26 eV. The prototypes of ZnTe light emitting diodes (LEDs) have been reported [1], showing that their green emission peak closely matches the most sensitive region of the human eye. Another application to photovoltaics proved that ZnTe is useful for the production of high-efficiency multi-junction solar cells [2,3]. By using the pulse laser deposition system, ZnTe thin films were deposited on ZnO thin layer, which is grown on (0001) Al2O3substrates. To produce the plasma plume from an ablated ZnO and ZnTe target, a pulsed (10 Hz) YGA:Nd laser with energy density of 95 mJ/$cm^2$ and wavelength of 266 nm by a nonlinear fourth harmonic generator was used. The laser spot focused on the surface of the ZnO and ZnTe target by using an optical lens was approximately 1 mm2. The base pressure of the chamber was kept at a pressure around $10^{-6}$ Torr by using a turbo molecular pump. The oxygen gas flow was controlled around 3 sccm by using a mass flow controller system. During the ZnTe deposition, the substrate temperature was $400^{\circ}C$ and the ambient gas pressure was $10^{-2}$ Torr. The structural properties of the samples were analyzed by XRD measurement. The optical properties were investigated by using the photoluminescence spectra obtained with a 325 nm wavelength He-Cd laser. The film surface and carrier concentration were analyzed by an atomic force microscope and Hall measurement system.

• 지구물리와물리탐사
• /
• 제18권3호
• /
• pp.154-161
• /
• 2015

본 연구에서는 중성자-감마 스펙트럼검층 존데 설계를 목적으로 Monte Carlo 시물레이션을 이용하여 열중성자 반응의 우세한 영역 파악 및 포획감마 스펙트럼의 에너지피크 값에 기초한 지층 구성 원소 구분을 수행하였다. 14 MeV 에너지준위의 중성자를 방출하는 중성자발생장치를 선원으로 이용하여 선원으로부터 10 cm 간격으로 12개의 중성자 검출기들을 배열함으로써 거리에 따른 열중성자 양을 측정하였다. 시추공 영향 저감을 위해 존데모형에 차폐재를 적용하여 보다 정확한 열중성자 측정을 수행하여 열중성자 반응이 우세한 위치를 분석한 뒤, 이 위치에서 검출된 포획감마 에너지 스펙트럼을 분석하여 지층을 구성하는 주요 원소 및 그 양을 확인하였다. 본 연구 결과는 중성자-감마 스펙트럼검층 존데의 신호대잡음 비 향상과 포획감마 검출기 최적 위치 선정에 도움이 될 것으로 판단된다.

• 한국정보통신학회논문지
• /
• 제14권9호
• /
• pp.2164-2170
• /
• 2010

Digital radio frequency memory (이하 DRFM)은 입력되는 RF신호를 저장 후 필요한 시점에 입력된 RF신호로 복원하여 출력하는 기능을 가진 장치로써 Jammer, EW시뮬레이터, Target Echo Generator[1] 등 사용되는 분야가 광범위하다. 본 논문에서는 고주파 입/출력모듈, 국부 발진모듈로 구성된 고주파부와 디지털 처리부로 이루어진 DRFM의 하드웨어적 구현 방안을 제안한다. 그리고 펄스형태의 RF신호를 양자화하는 ADC(A/D conversion), 이 데이터를 저장하고 재생신호를 생산하는 FPGA와 RF 신호를 생산하는 DAC(D/A conversion)로 구성되는 디지털 처리부에서 복제된 신호 생성방안을 제안한다. 이렇게 제안된 방안을 적용하여 제작한 후 모의 신호를 입력하여 얻은 시험결과를 통하여 이 제안방안의 타당성을 확인한다.

• 한국진공학회:학술대회논문집
• /
• 한국진공학회 2011년도 제41회 하계 정기 학술대회 초록집
• /
• pp.333-333
• /
• 2011

We have investigated the breakdown properties in liquids by high voltage pulse system. High voltage pulse power system is consisted of the Marx-generator with two capacitors (0.5 ${\mu}F$, withstanding voltage is 40 kV), to which the charging voltage can be applied to maximum 30 kV DC, spark gap switch and charging resistor of 20 $M{\Omega}$. We have made use of tungsten pin electrodes of anode-cathode (A-K), which are immersed into the liquids. The breakdown voltage and current signals are measured by high voltage probe (Tektronix P6015A) and current monitor (IPC CM-1.S). Especially the high speed breakdown or plasma propagation characteristics in the pulsed A-K gap have been investigated by using the high speed ICCD camera. We have measured the electron temperature through the Boltzmann plot method from the breakdown spectrums. Here the A-K gap has been changed by 1 mm, 2 mm, and 3 mm. The used liquids are distilled water and solution of salt (0.9 %). The output voltage and current signals at breakdown in distilled water are shown to be bigger than those in saline solution. The breakdown voltage and current characteristics in liquids will be discussed in accordance with A-K gap distances. It is also found that the electron temperatures and plasma densities in liquids are decreased in conformity with A-K gap.

• 대한전기학회논문지:전기물성ㆍ응용부문C
• /
• 제52권4호
• /
• pp.179-184
• /
• 2003

The pulsed power system is widely used for many industries and environments. Generally, we call the "RUST", the reddish brown surface, that was made on iron surface or some other metals, when they are contacted by water and air the main substance of rust is oxide-ionization. In other words, the chemical symbol of rust on iron surface is iron oxide(III) hydrate Fe203.nH2O. In this study, we have designed and fabricated our system which has a compact pulse generator with switching MOSFET. Also we have studied the metal-oxide removing characteristics using in the atmospheric arc discharge. It has been investigated their removing characteristics by the change of charging voltage and pulse repetition rates. From this result, we can find out that the removal area Is increased from 3.80 to 8.04[$\textrm{cm}^2$], when pulse duration is increased from 100[pps] to 400[pps]. 400[pps].

• 조명전기설비학회논문지
• /
• 제13권3호
• /
• pp.40-47
• /
• 1999

본 연구에서는 개발하고자 하는 저에너지 대면적 전자빔 발생장치는 원리로서 발생원인 글로우 발전에 의한 플라즈마로부터 이온을 음극으로 가속, 충돌하게 하여 그때 발생하는 2차전자를 전자빔원으로 하여 전자를 가속·제어하는데 바탕을 두고 있으며, 본 연구에서는 이러한 원리를 기본으로 이론적 해석을 통한 고효율의 저에너지 대면적 전자빔 발생장치개발의 설계 및 제작에 대해서 연구하였으며, 또한 빔 에너지의 안전성과 방전조건을 고려한 최적의 방전 파라메타를 설정하여 대면적의 균일한 빔 인출을 가능케 하였다.