• 한국진공학회지
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• 제20권6호
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• pp.456-460
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• 2011

최근 연구 중인 소자들의 크기가 점차 나노 크기를 가짐에 따라서 나노 영역에 대한 물성 분석 연구의 필요성이 대두되고 있다. 특히 나노 크기를 가지는 소자에 대한 기계적 특성은 기존의 마이크로 이상의 소자와는 다른 특성을 보이는 것으로 보고되고 있다. 그러나 이러한 나노 크기에 대한 연구에서 대부분을 차지하는 분광학적, 전기적 방법은 측정 영역 한계와 일정 깊이에 대한 평균적인 정보를 제공하게 된다. 본 연구에서는 나노트라이볼로지 분석의 대표적인 Nano-indenter 분석을 통하여 박막의 수 혹은 수십 나노 미만의 영역과 깊이에 대한 물리적 및 기계적 물성을 연구하였고, Scanning Probe Microscopy를 이용하여 시료 표면 형상을 분석하였으며, 이를 기반으로 수십 나노 이하 두께를 가지는 W-N 확산방지막에 대한 연구를 실시하였다. 연구 결과에 의하면, 박막의 표면 나노강도는 증착 중 질소 유량에 따라서 57.67 GPa에서 9.1 GPa로 급격한 감소가 나타내었고, 또한 탄성계수 역시 575.53 GPa에서 178.1 GPa로 감소되는 것을 확인하였다.

• Journal of Astronomy and Space Sciences
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• 제34권4호
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• pp.343-352
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• 2017

A space plasma facility has been operated with a back-diffusion-type plasma source installed in a mid-sized vacuum chamber with a diameter of ~1.5 m located in Satellite Technology Research Center (SaTReC), Korea Advanced Institute of Science and Technology (KAIST). To generate plasma with a temperature and density similar to the ionospheric plasma, nickel wires coated with carbonate solution were used as filaments that emit thermal electrons, and the accelerated thermal electrons emitted from the heated wires collide with the neutral gas to form plasma inside the chamber. By using a disk-type Langmuir probe installed inside the vacuum chamber, the generation of plasma similar to the space environment was validated. The characteristics of the plasma according to the grid and plate anode voltages were investigated. The grid voltage of the plasma source is realized as a suitable parameter for manipulating the electron density, while the plate voltage is suitable for adjusting the electron temperature. A simple physical model based on the collision cross-section of electron impact on nitrogen molecule was established to explain the plasma generation mechanism.

• 한국토양환경학회지
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• 제1권2호
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• pp.73-81
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• 1996

실험실 내에서 부피비로 약 50%내외의 수분함량을 가진 3개의 서로 다른 깊이의 토양에서 염소와 중수의 확산계수는 4.8$\times$ $10${-7}$ 부터 7.2$\times$ $10${-7}$ $\textrm{cm}^2$/sec와 5.5 $\times$ $10${-5}$ 부터 1.6$\times$ $10${-4}$ $\textrm{cm}^2$//sec였다. 한편, 물과 물질의 이동성에 대한 연구는 중간사로 구성된 토양층 위에 위치하는 점토로부터 미사질 양토에 속하는 약 70cm깊이의 토양에서 실시되었고, 87일간의 실험기간동안 리터당 15.2$m\ell$의 염소와 0.6bq의 중수로 처리된 물을 일정한 유량(2cm/일)으로 관개하였다. 토양의 깊이와 시간에 따른 염소와 중수의 변동위치는 suction probe에 채취된 토양수를 가지고 측정하였는데 실험지 안에서 서로 다른 깊이 또는 동일 위치에서 염소와 중수가 발견되었다. 이러한 실험의 결과로부터 추정컨대 토양수의 유속과 표면확산 계수가 염소와 중수의 분포에 직접적인 영향을 미쳤고 24개의 suction probe에서의 결과는 실질적 물질과 토양의 상호작용의 효과를 나타내는 순수치의 25% 내외에서 평가치를 추정할 수 있었다.

• 한국연소학회지
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• 제4권2호
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• pp.23-33
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• 1999

A turbulent non-premixed ethylene flame, which was set up in a vertical wind tunnel, was examined to understand the effect of turbulent mixing on formations of soot and gaseous species in the flames. Temperature and velocity profiles were measured using uncoated thermocouples and LDV system. Gaseous samples were withdrawn by using a water cooled stainless iso-kinetic gas sampling probe. The samples for inorganic compounds and light hydrocarbons were collected with sampling bottles and were analyzed by a gas chromatography. The samples for aromatic hydrocarbons were collected on a sorbent tube and were analyzed on a GC/MS system. Some of main results were followed. CO and $CO_2$ were measured relatively in early part of flame and the concentration of CO was greater than that of $CO_2$ all over the early flame region due to the scavenging of the oxidizing species OH by soot particles. Aromatic hydrocarbons were measured at x/D=122 along the radial direction and main important species were benzene, xylene, toluene, styrene, indene, naphthalene. The peak points of these compounds occurred at r/D=0.8 apart from the center of flame, around in which the concentration of $C_2H_2$ decayed relatively rapidly from the maximum value.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2001년도 하계학술대회 논문집
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• pp.1010-1013
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• 2001

Zinc oxide(ZnO) films were prepared by ultrasonic spray pyrolysis on indium (In) films deposited by evaporation and subsequently submitted to rapid thermal annealing (RTA). The RTA was processed in air or a vacuum ambient. The crystallographic properties and surface morphologies of the films were characterized before and after the RTA by X-ray diffraction (XRD) and scanning electron microscopy(SEM), respectively. The resistivity variation of the films with RTA temperature and time was measured by the 4-point probe method. Auger electron spectroscopy(AES) was carried out to figure out the distribution of indium atoms in the ZnO films. The resistivity of the ZnO on In(ZnO/In) films decreased to 2${\times}$10$\^$-3/ $\Omega$cm by diffusion of the In. The In diffusion into the ZnO films roughened the surface of the ZnO films. The results of depth profile by AES showed a hump of In atoms around ZnO/In interface after the RTA at 800$^{\circ}C$, which disappeared by the RTA at 1000$^{\circ}C$. The effects of temperature, time and ambient during the RTA on the structural and electrical properties of the ZnO/In films were discussed.

• Corrosion Science and Technology
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• 제11권4호
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• pp.141-150
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• 2012

Stress corrosion cracks in Alloy 600 compact tension specimens tested at $325^{\circ}C$ in a simulated primary water environment of pressurized water reactor were analyzed by analytical transmission electron microscopy and secondary ion mass spectroscopy (SIMS). From a fine-probe chemical analysis, oxygen was found on the grain boundary just ahead of the crack tip, and chromium oxides were precipitated on the crack tip and the grain boundary attacked by the oxygen diffusion, leaving a Cr/Fe depletion (or Ni enrichment) zone. The oxide layer inside the crack was revealed to consist of a double (inner and outer) layer. Chromium oxides existed in the inner layer, with NiO and (Ni,Cr) spinels in the outer layer. From the nano-SIMS analysis, oxygen was detected at the locations of intergranular chromium carbides ahead of the crack tip, which means that oxygen diffused into the grain boundary and oxidized the surfaces of the chromium carbides. The intergranular chromium carbide blunted the crack tip, thereby suppressing the crack propagation.

• 한국광학회지
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• 제9권2호
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• pp.86-91
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• 1998

소오다 석회유리를 기판으로 하고 전기장에 의한 $Cs^+-Na^+$ 이온교환으로 다중 모우드 평면 광도파로를 제작하였다. 광도파로의 각 모우드들에 대한 실효굴절률을 측정하였으며 변형 Fermi 함수 모양으로 맞춤한 굴절률 분포형태를 전자 현미분석기로 얻은 농도분포형태와 비교분석하여 설명하였다. 정량적인 분석결과 약 90%의 $Na^+$이온이 $Cs^+$이온으로 치환되었다. 주어진 인가전기장, 확산온도 및 확산시간으로부터 광도파로 깊이, 이동도 및 굴절률 변화를 구하는 식을 세웠다. 이 식에서 성립하는 광도파로의 깊이와 확산시간의 제곱근 사이의 선형관계 및 광도파로의 깊이와 인가전기장 사이의 선형관계를 실험으로 확인하였다.

• 열처리공학회지
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• 제6권1호
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• pp.17-25
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• 1993

The Cu - $Nb_3Sn$ composites wire as a superconducting material was prepared by in situ method as follow: Cu - 15wt.% Nb alloys which were melted in a high -frequency induction furnace and casted in bar were cold-worked up to the final diameter of 0.24 mm, electroplated with Sn, pre-treated in two steps and then diffused at $550{\sim}650^{\circ}C$ for 24 ~ 96 hrs. The overall $J_c$ and $T_c$ of the specimens were measured by the four point-probe method at 10 K in the magnetic field of 0 Tesla. The overall $J_c$ of the composites wire which diffused at $550^{\circ}C$ after pre-treating in two steps were generally higher than those of the wire at either $600^{\circ}C$ or $650^{\circ}C$. For the specimens diffused at $550^{\circ}C$, the overall $J_c$ were increased until 72 hrs. of diffusion time and then decreased. However, in case of diffusion at $600^{\circ}C$ and $650^{\circ}C$, the overall $J_c$ were gradually decreased from the beginning. The maximum overall $J_c$ obtained in this experiment was $1.3{\times}10^4\;A/cm^2$, which was measured for the specimen diffused at $550^{\circ}C$ for 72 hrs. When the specimens were diffused at $550^{\circ}C$ for 72 hrs, after pre-treating, the measured critical temperature, $T_c$ was 16.19 K. Similar $T_c$ value were obtained in other specimens regardless of diffusion time and temperature.

• 대한기계학회논문집
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• 제15권6호
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• pp.2062-2072
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• 1991

본 연구에서는 역류의 측정과 원주의 근접 후류의 난류 구조에 미치는 자유흐 름 난류의 영향을 정성적 및 정량적으로 조사하기 위하여, 역류가 존재할 경우나 순간 유입각이 매우 큰 경우에도 난류의 측정이 가능한 split film probe(이하 SFP로 줄여 표기함)를 사용하여 평균 유동장과 난류의 2차 및 3차 모멘트의 변화, 속도 변동 상관 의 변화 및 대규모 와류의 유출 주파수 특성 등을 측정 분석하여, 격자에 의해 형성된 서로 다른 자유흐름 난류특성에 따른 실험 결과들을 비교 검토 해보고자 한다.

• 전자공학회논문지A
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• 제29A권8호
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• pp.49-55
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• 1992

We Have investigated the properties of the titanium nitrite films widely used in VLSI devices as diffusion barrier in Al-based metallization. TiN films were formed by reactive sputtering from Ti target in Ar-N$_2$ mixtures, varying deposition parameters such as N$_2$ partial pressure, substrate temperature, power, and total pressure. All the samples received the heat treatment at 45$0^{\circ}C$ for 30 min. The resulting films are characterized by mechanical stylus($\alpha$-step), x-ray diffraction(XRD), scanning electron microscopy(SEM), and four point probe method. The Tin film properties strongly depend on the deposition condition. The stoichiometry and Ti deposition rate are critically affected by nitrogen partial pressure, and the resistivity, in particular, is dependent on both the substrate temperature and sputtering power.