• Title/Summary/Keyword: polymer stamp

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Study and Fabrication of Transparent Electrode Film by using Thermal-Roll Imprinted Ag Mesh Pattern and Coated Conductive Polymer (열형-롤 각인으로 형성한 Ag 격자 패턴과 전도성 고분자 코팅을 이용한 투명전극 필름 제작에 관한 연구)

  • Yu, Jong-Su;Jo, Jeong-Dai;Yoon, Seong-Man;Kim, Do-Jin
    • Journal of the Korean Society for Precision Engineering
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    • v.27 no.9
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    • pp.11-15
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    • 2010
  • In this study, to fabricate a low-resistance and high optical transparency electrode film, the following steps were performed: the design and manufacture of electroforming stamp, the fabrication of a thermal roll-imprinted polycarbonate (PC) patterned films, the filled low-resistance Ag paste using doctor blade process on patterned PC films and spin coating by conductive polymers. As a result of PC films imprinted line width of $26.69{\pm}2\;{\mu}m$, channel length of $247.57{\pm}2\;{\mu}m$, and pattern depth of $7.54{\pm}0.2\;{\mu}m$. Ag paste to fill part of the patterned film with conductive polymer coating and then the following parameters were obtained: a sheet resistance of $11.1\;{\Omega}/sq$ optical transparency values at a wavelength of 550 nm was 80.31 %.

Forming Simulation of EV Motor Hairpin by Implementing Mechanical Properties of Polymer Coated Copper Wire (고분자 필름 및 구리선 이종 물성을 고려한 EV모터용 헤어핀 성형 공정 해석)

  • D. C. Kim;Y. J. Lim;M. Baek;M. G. Lee;I. S. Oh
    • Transactions of Materials Processing
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    • v.32 no.3
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    • pp.122-128
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    • 2023
  • As electric vehicles (EV) have increasingly replaced the conventional vehicles with internal combustion engines (ICE), most of automotive makers are actively devoting to the technology development of EV parts. Accordingly, the manufacturing process for power source has been also shifting from engine/transmission to EV motor/reducer system. However, lack of experience in developing the EV motor still remains as a technical challenge. In this paper, we employed the forming simulation based on finite element modeling to solve this problem. In particular, in order to increase the accuracy of the forming simulation, we introduced the elastic-plastic constitutive model parameters for polymer-copper hybrid wire by investigating the individual strain-stress curves, and elastic modulus of polymer and copper. Then, the reliability of modeling procedure was confirmed by comparing the simulated results with experiments. Finally, the identified mechanical properties and finite element modeling were applied to a hairpin forming process, which involves multiple deformation paths such as bending, pressing, widening, and twisting. The proposed numerical approach can replace common experience or experiment based trials by reducing production time and cost in the future.

Polymer Optical Microring Resonator Using Nanoimprint Technique (나노 임프린트 기술을 이용한 폴리머 링 광공진기)

  • Kim, Do-Hwan;Im, Jung-Gyu;Lee, Sang-Shin;Ahn, Seh-Won;Lee, Ki-Dong
    • Korean Journal of Optics and Photonics
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    • v.16 no.4
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    • pp.384-391
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    • 2005
  • A polymer optical microring resonator, which is laterally coupled to a straight bus waveguide, has been proposed and demonstrated using a nanoimprint technique. The propagation loss of the ring waveguide and the optical power coupling between the ring and bus waveguides was calculated by using a beam propagation method, then the dependence of the device performance on them was investigated using a transfer matrix method. We have especially introduced an imprint stamp incorporating a smoothing buffer layer made of a silicon nitride thin film. This layer played an efficient role in improving the sidewall roughness of the waveguide pattern engraved on the stamp and thus reducing the scattering loss. As a result the overall Q factor of the resonator was greatly increased. Also it reduced the gap between the ring and bus waveguides effectively to enhance the coupling between them, without relying on the direct writing method based on an e-beam writer. As for the achieved device performance at the wavelength of 1550 nm, the quality factor, the extinction ratio, and the free spectral range were ~103800, ~11 dB, and 1.16 m, respectively.

Novel Process to Improve Defect Problems for Thermal Nanoimprint Lithography (열 나노임프린트 리소그래피를 위한 패턴의 결함 향상에 관한 실험적 연구)

  • Park, Hyung-Seok;Shin, Ho-Hyun;Seo, Sang-Won;Sung, Man-Young
    • The Transactions of the Korean Institute of Electrical Engineers C
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    • v.55 no.5
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    • pp.223-230
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    • 2006
  • The reliability of imprint patterns molded by stamps for industrial application of nanoimprint lithography (NIL), is an important issue. Usually, defects can be produced by incomplete filling of negative patterns and the shrinkage phenomenon of polymers in conventional NIL. In this paper, the patterns that undergo a varied temperature or varied pressure period during the thermal NIL process have been investigated, with the goal of resolving the shrinkage and defective filling problems of polymers. The effects on the formation of polymer patterns in several profiles of imprint processes are also studied. Consequently, it is observed that more precise patterns are formed by the varied temperature (VT-NIL) or varied pressure (VP-NIL). The NIL (VT-NIL or VP-NIL) process has a free space compensation effect on the polymers in stamp cavities. From the results of the experiments, the polymer's filling capability can be improved. The VT-NIL is merged with the VP-NIL for the better filling property. The patterns that have been imprinted in the merged NIL are compared with the results of conventional NIL. In this study, the improvement in the reliability for results of thermal NIL has been achieved.

Soft Lithography of Graphene Sheets Via Surface Energy Modification

  • Kim, Hansun;Jung, Min Wook;Myung, Sung;Jung, Daesung;Lee, Sun Sook;Kong, Ki-Jeong;Lim, Jongsun;Lee, Jong-Heun;Park, Chong Yun;An, Ki-Seok
    • Proceedings of the Korean Vacuum Society Conference
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    • 2013.08a
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    • pp.144.2-144.2
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    • 2013
  • With the synthesis of graphene sheets as large-scale and high quality, it is essentially important to develop suitable graphene patterning process for future industrial applications. Especially, transfer or patterning method of CVD-grown graphene has been studied. We report simple soft lithographic process to develop easily applicable patterning method of large-scale graphene sheets by using chemically functionalized polymer stamp. Also important applications, the prototype capacitors with graphene electrode and commercial polymer dielectrics for the electrostatic-type touch panel are fabricated using the developed soft lithographic patterning and transfer process.

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Fabrication of Transparent Electrode Film for Organic Photovoltaic using Ag grid and Conductive Polymer (Ag grid와 전도성 고분자를 이용한 인쇄기반 OPV용 투명전극 형성)

  • Yu, Jongsu;Kim, Jungsu;Yoon, Sungman;Kim, Dongsoo;Kim, Dojin;Jo, Jeongdai
    • 한국신재생에너지학회:학술대회논문집
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    • 2011.05a
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    • pp.116.1-116.1
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    • 2011
  • Materials with a combination of high electrical conductivity and optical transparency are important components of many electronic and optoelectronic devices such as liquid crystal displays, solar cells, and light emitting diodes. In this study, to fabricate a low-resistance and high optical transparent electrode film for organic photovoltaic, the following steps were performed: the design and manufacture of an electroforming stamp mold, the fabrication of thermal roll imprinted (TRI) poly-carbonate (PC) patterned films, the manufacture of high-conductivity and low-resistance Ag paste which was filled into patterned PC film using a doctor blade process and then coated with a thin film layer of conductive polymer by a spin coating process. As a result of these imprinting processes the PC films obtained a line width of $10{\pm}0.5{\mu}m$, a channel length of $500{\pm}2{\mu}m$, and a pattern depth of $7.34{\pm}0.5{\mu}m$. After the Ag paste was used to fill part of the patterned film with conductive polymer coating, the following parameters were obtained: a sheet resistance of $9.65{\Omega}$/sq, optical transparency values were 83.69 % at a wavelength of 550 nm.

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Fabrication of Micro Patterned Fibronectin for Studying Adhesion and Alignment Behavior of Human Dermal Fibroblasts

  • Lee, Seung-Jae;Son, Young-Sook;Kim, Chun-Ho;Choi, Man-Soo
    • Macromolecular Research
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    • v.15 no.4
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    • pp.348-356
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    • 2007
  • The aim of this study was to fabricate a submicro-and micro-patterned fibronectin coated wafer for a cell culture, which allows the positions and dimensions of the attached cells to be controlled. A replica molding was made into silicon via a photomask in quartz, using E-beam lithography, and then fabricated a polydimethylsiloxane stamp using the designed silicon mold. Hexadecanethiol $[HS(CH_2){_{15}}CH_3]$, adsorbed on the raised plateau of the surface of polydimethylsiloxane stamp, was contact-printed to form self-assembled monolayers (SAMs) of hexadecanethiolate on the surface of an Au-coated glass wafer. In order to form another SAM for control of the surface wafer properties, a hydrophilic hexa (ethylene glycol) terminated alkanethiol $[HS(CH_2){_{11}}(OCH_2CH_2){_6}OH]$ was also synthesized. The structural changes were confirmed using UV and $^1H-NMR$ spectroscopies. A SAM terminated in the hexa(ethylene glycol) groups was subsequently formed on the bare gold remaining on the surface of the Aucoated glass wafer. In order to aid the attachment of cells, fibronectin was adsorbed onto the resulting wafer, with the pattern formed on the gold-coated wafer confirmed using immunofluorescence staining against fibronectin. Fibronectin was adsorbed only onto the SAMs terminated in the methyl groups of the substrate. The hexa (ethylene glycol)-terminated regions resisted the adsorption of protein. Human dermal fibroblasts (P=4), obtained from newborn foreskin, only attached to the fibronectin-coated, methyl-terminated hydrophobic regions of the patterned SAMs. N-HDFs were more actively adhered, and spread in a pattern spacing below $14{\mu}m$, rather than above $17{\mu}m$, could easily migrate on the substrate containing spacing of $10{\mu}m$ or less between the strip lines.

Improved Defect Control Problem using Scaled Down Silicon Oxide Stamps for Nanoimprint Lithography (나노임프린트 리소그래피를 위한 스케일 다운된 산화막 스탬프 제작과 패턴결함 개선에 관한 연구)

  • Park, Hyung-Seok;Choi, Woo-Beom;Sung, Man-Young
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.19 no.2
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    • pp.130-138
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    • 2006
  • We have investigated pattern scaling down of silicon stamps through the oxidation technique, During oxidizing the silicon stamps, silicon dioxide that has 300 nm and 500 nm thickness was grown, and critical deformations were not observed in the patterns. There was positive effect to reduce size of patterns because vertical and horizontal patterns have different orientation. We achieved pattern reduction rate of $26\%$. In addition, the formation of polymer patterns had been investigated with varied temperature and pressure conditions to improve the filling characteristics of polymers during nanoimprint lithography when pattern sizes were few micrometers. In these varied conditions, polymers had been affected by free space compensation and elastic stress relaxation for filling the cavities. Based on the results, defect control which is an important issue in the nanoimprint lithography were facilitated.

Nano Molding Technology for Optical Storage Media with Large-area Nano-pattern (대면적 광 정보저장매체의 나노성형에 대한 기술 개발)

  • Shin Hong-Gue;Ban Jun-Ho;Cho Ki-Chul;Kim Heon-Yong;Kim Byeong-Hee
    • Journal of the Korean Society for Precision Engineering
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    • v.23 no.4 s.181
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    • pp.162-167
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    • 2006
  • Hot embossing lithography(HEL) has the production advantage of comparatively few process step, simple operation, a relatively low cost for embossing tools(Si), and high replication accuracy for small features. In this paper, we considered the nano-molding characteristic according to molding parameters(temperature, pressure, times, etc) and induced a optimal molding condition using HEL. High precision nano-patter master with various shapes were designed and manufactured using the DRIE(Deep Reactive ion Etching), LPCVD(Low Pressure Chemical Vapor Deposition) and thermal oxidation process, and we investigated the molding characteristic of DVD and Blu-ray nickel stamp. We induced flow behaviors of polymer, rheology by shapes and sizes of the pattern through various molding experiments. Finally, with achieving nano-structure molding with high aspect ratio, we will secure a basic technology about the molding of large-area nano-pattern media.

Design and Multi-scale Analysis of Micro Contact Printing (미세접촉인쇄기법의 설계와 다중스케일해석)

  • Kim, Jung-Yup;Kim, Jae-Hyun;Choi, Byung-Ik
    • Proceedings of the KSME Conference
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    • 2003.11a
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    • pp.1927-1931
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    • 2003
  • Nanometer-sized structures are being applied to many fields including micro/nano electronics, optoelectronics, quantum computing, biosensors, etc. Micro contact printing is one of the most promising methods for manufacturing the nanometer-sized structures. The crucial element for the micro contact printing is the nano-resolution printing technique using polymeric stamps. In this study, a multi-scale analysis scheme for simulating the micro contact printing process is proposed and some useful analysis results are presented. Using the slip-link model [1], the dependency of viscoelasticity on molecular weight of polymer stamp is predicted. Deformation behaviors of polymeric stamps are analyzed using finite element method based upon the predicted viscoelastic properties.

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