• 제목/요약/키워드: polymer pattern

검색결과 478건 처리시간 0.023초

무기고분자의 나노임프린트법에 의한 세라믹 선형 패턴의 제조 (Fabrication of Ceramic Line Pattern by UV-Nanoimprint Lithography of Inorganic Polymers)

  • 박준홍;팜안뚜앙;이재종;김동표
    • 폴리머
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    • 제30권5호
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    • pp.407-411
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    • 2006
  • 액상의 고분자 전구체 polyvinylsilazane (PVS) 혹은 allylhydridopolycarbosilane(AHPCS)를 실리콘 기판 위에 스핀 코팅한 다음, DVD 마스터로부터 제조된 polydimethylsiloxane(PDMS) 몰드를 이용한 자외선 나노임프린트법으로 나노 크기의 고분자 패턴을 제조하였다. 나아가 질소 분위기하에서 $800^{\circ}C$ 열처리함으로써 각각 SiCN, SiC 세라믹 패턴도 제조하였다. 가교된 고분자와 세라믹 패턴의 폭과 넓이를 원자힘현미경(AFM)과 주사전자현미경(SEM)으로 관측한 결과 PVS와 AHPCS의 패턴 높이는 각각 38.5%와 24.1%, 패턴 폭은 18.8%와 16.7%의 수축률을 나타내었다. 즉 전구체의 세라믹 수율이 높을수록 세라믹 패턴 수축률은 낮아졌고, 패턴과 기판과의 접착에 의한 수축억제로 이방성 수축현상도 관찰되었다. 본 연구결과는 새로운 세라믹 MEMS 소자제작공정으로서 나노임프린트법의 가능성과 수축률 제어 연구가 필요함을 제시하고 있다.

I-Line과 DUV Resist에서 Poly-Si 플라즈마 식각시 미치는 개스의 영향 (Effects of Gas Chemistries on Poly-Si Plasma Etching with I-Line and DUV Resist)

  • 신기수;김재영
    • 한국진공학회지
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    • 제7권2호
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    • pp.155-160
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    • 1998
  • 256M DRAM급에 해당하는 0.25$\mu\textrm{m}$의 회로선 폭을 가공하기 위해 Arc layer & DUV resist 사용이 필수적이다. Poly-Si 식각시 Arc layer 적용여부 및 resist 종류에 따른 차이 를 TCP-9408 etcher(Lam Research Co.)에서 $Cl_2/O_2, Cl_2/N_2, Cl_2$/HBr 3가지 gas chemistry 를 변화시키면서 조사하였다. 동일한 식각 조건에서 DUV resist사용의 경우에 I-line resist 에 비해 식각 profile이 profile이 positive하고 CD gain도 크게 나왔다. 이것은 resist손실에 의한 polymer생성의 증가가 식각시 측벽 보호막을 강화시키기 때문이다. Arc layer 적용의 경우 Arc layer 식각시 생기는 fluorine계 polymer가 poly-Si 식각시 mask역할을 하므로 CD gain이 증가하는 것으로 나타났다. Gas chemistry에 의한 영향은 $Cl_2/O_2$의 경우가 식각 시 polymer형성을 촉진시켜 positive profile 및 CD gain을 초래하였다. $Cl_2$/HBr의 경우에는 profile이 vertical 하였고 CD gain도 거의 없었다. 또한 dense pattern 과 isolated pattern 사이의 profile 및 CD 차이도 가정 작게 나타났다. HBr gas 사용이 식각시 pattern density 에 따른 측벽 보호막 형성의 불균일성을 최소화 시켜 양호한 특성을 보여주었다.

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철근보강 폴리마 콘크리트보의 변형특성 (Deformation Characteristics of Reinforced Polymer Concrete Beams)

  • 연규석
    • 한국농공학회지
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    • 제30권1호
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    • pp.63-72
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    • 1988
  • The primary objective of the study was to find the deformation characteristics of reinforced polymer concrete beams. A test program was carried out to compare the behavior in deformation of polyester and MMA concrete beams with cement concrete beams but with varying ratios of tensile reinforcement. From the results the following conclusions can be made. 1.The various strengths of polymer concrete ware very high compared to the strengths for cement concrete. Also, compared to conventional concrete beams, flexural strength of reinforced polymer concrete beams was distinctly higher for the same section and steel ratios. 2.The polymer concrete beams exhibit large deflections accompanied by relatively high strengths as compared to cement concrete beams. 3.The average ultimate strain at the extreme compression fiber of polymer concrete beams was 0.01 1 cm / cm, and this value was about three to four times as large as that of cement concrete beams, 4.The polymer concrete beams developed more cracks which were more wide crack distribution spacing than the cement concrete beams, and the beams failed in a more ductile manner. 5.The reinforcing steel ratio has a significant effect on the beam strength, load-deflection response, stress-strain curve, and crack pattern of polymer concrete beams.

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Development of Roll-to- Flat Thermal Imprinting Equipment and Experimental Study of Large Area Pattern Replication on Polymer Substrate

  • 이문구;란 슈하이;이수훈;이혜진;;성연욱
    • 한국생산제조학회지
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    • 제18권3호
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    • pp.307-314
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    • 2009
  • Large area micro pattern replication has promising application potential in many areas. Rolling imprint process has been demonstrated as one of the most competitive processes for such micro pattern replication, because it has advantages in low cost, high throughput and high efficiency. In this paper, we developed a prototype of roll-to-flat(R2F) thermal imprint system for large area micro pattern replication process, which is one of the key processes in the fabrication of flexible displays. Experimental tests were conducted to evaluate the feasibility of system and the parameters' effect on the process, such as flat mold temperature, loading pressure and rolling speed. 100mm $\times$ 100mm stainless steel flat mold and commercially available polycarbonate sheets were used for the tests. The experimental results showed that the developed R2F system is suitable for fabrication of various micro devices with micro pattern over large area.

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전기방사된 나노섬유의 Pattern 연구 (Pattern of polymer nanofibers produced by electrospinning)

  • Kim, Kwan-Woo;Lee, Keun-Hyung;Lee, Douk-Rae;Kim, Hak-Yong;Kim, Sung-Ryong
    • 한국섬유공학회:학술대회논문집
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    • 한국섬유공학회 2003년도 봄 학술발표회 논문집
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    • pp.171-172
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    • 2003
  • In recent years, interest in electrospinning has been quickly increased, because electrospinning is a process capable of making polymer fibers in the range of nano to a few microns diameters[1,2]. The electrospinning was patented by Formhals in 1934[2] and most of studies reported on the subject of electrospinning have been focused on its phenomena[3] and on processing parameters [4-5]. (omitted)

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고분자 전해질 연료전지의 매니폴드 및 분리판 유동분배 특성 분석 (Numerical Study on the Flow Characteristics of Manifold and Bipolar Plate in Polymer Electrolyte Fuel Cells)

  • 조중원;유상필;김민진;이원용;김창수
    • 한국신재생에너지학회:학술대회논문집
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    • 한국신재생에너지학회 2006년도 추계학술대회
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    • pp.320-323
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    • 2006
  • A numerical study is made of a manifold and bipolar plate in polymer electrolyte fuel cells, the aim of the present study is to describe the characteristics of flow pattern In manifold and bipolar plate. The present work shows that the flow pattern in the bipolar plate is affected by the penetration flow through GDL characterized by clamping pressure and GDL intrusion in to a channel area. Manifold geometry also affects the flow distribution. The recirculation flow by bent duct destroy even distribution In manifold, the present work shows that corner rounding can improve the manifold performance.

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열간나노임프린트공정을 이용한 평판형 폴리머 소재의 선형 패턴 제작에 관한 연구 (A study on Linear Pattern Fabrication of Plate-type Polymer by Using Thermal Nano Imprint Lithography Process)

  • 정유나;이창수;윤성원;강충길
    • 소성∙가공
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    • 제18권8호
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    • pp.616-624
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    • 2009
  • In this work we demonstrate the hot-embossing process under different forming conditions such as forming temperature, load, and holding time in pressing, in order to determine the suitable conditions required for linear patterning on polymer plates (PC). Results showed that the replicated pattern depth increased in proportion to an increase in the forming temperature, load, and time. The reduction of the workpiece thickness increased according to the holding time in the pressing process. In the process of time, the reduction ratio of the workpiece thickness decreased due to the surface area increment of the workpiece, while the pressure on the workpiece declined. In order to reduce the bulging ratio we introduced a temperature difference between the upper and the lower punch.

Polymer Gravure Printing용 열경화형 Ag Paste의 물성과 레올로지 특성 연구 (A Study on Rheology Property and Characteristics of Thermal-curable Ag Paste for Polymer Gravure Printing)

  • 구태희;남수용;김성빈
    • 한국인쇄학회지
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    • 제30권2호
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    • pp.1-12
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    • 2012
  • In this experiment, we have manufactured thermal-curable silver pastes for direct printing. And to enhance conductivity, printability, adhesion and hardness during polymer direct-gravure prints, we have manufactured Ag pastes by adding variety of filter contents. Then we have investigated characteristics of rheology in paste according to the gravure printability and the properties of printed conductive patterns. Depending on a variety of Ag powder, there was a big difference in sharpness of printed pattern. And also by the use of carbon, there was a big difference in amount of solvent used, conductivity and in hardness. We could improve doctoring and the sharpness of a pattern by adding Ag paste in carbon particle, but as we have used nano-sized particle, there was an increase in the amount of solvent used and also we have found out that it gives a bad effect as adhesive and hardness becomes weaker. Even though Ag particle has the same spherical shape, the surface treatments could differ from one another. And by the appropriate choice and with the suitable combination of Ag powder, excellent printability and conductivity could be obtained.

Thickness Dependence of the Glass Transition Temperature in Thin Polymer Films

  • Lee, Jeong-Kyu;Zin, Wang-Cheol
    • 한국고분자학회:학술대회논문집
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    • 한국고분자학회 2006년도 IUPAC International Symposium on Advanced Polymers for Emerging Technologies
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    • pp.201-201
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    • 2006
  • In this study the glass transition temperature in thin polymer films has been studied. Ellipsometry has been used to measure $T_{g}$ of thin film as a function of film thickness. Empirical equation has been proposed to fit the measured $T_{g}$ pattern with thickness. Also, a continuous multilayer model was proposed and derived to describe the effect of surface on the observed $T_{g}$ reduction in thin films, and the depth-dependent $T_{g}$ profile was obtained. These results showed that $T_{g}$ at the top surface was much lower than the bulk $T_{g}$ and gradually approached the bulk $T_{g}$ with increasing distance from the edge of the film. The model and equation were modified to apply for the polymer coated on the strongly favorable substrate and the freely standing film.

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Fabrication of Polymer Laser Device by Two-Photon Induced Photopolymerization Technique

  • Yokoyama, Shiyoshi;Nakahama, Tatsuo;Miki, Hideki
    • 한국고분자학회:학술대회논문집
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    • 한국고분자학회 2006년도 IUPAC International Symposium on Advanced Polymers for Emerging Technologies
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    • pp.231-231
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    • 2006
  • We fabricated a polymer sub-microstructure for optical device application by two-photon-induced laser lithography technique. Polymer pattern could be minimized as small as ${\sim}100\;nm$. The photopolymerization resin contains laser-dye, thus promising a high level of the optical gain. We utilized the lithography technique to the photonic crystal application, where the template of the two-dimensional photonic crystal was modified by polymer gain medium as defect-shape and line-shape orientations. Photonic band gap effect from polymer-doped photonic crystals is expected to exploit the application such as organic solid-state laser device.

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