• 제목/요약/키워드: polishing pad

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NOVA System을 이용한 CMP Automation에 관한 연구 (The Study for the CMP Automation wish Nova Measurement system)

  • 김상용;정헌상;박민우;김창일;장의구
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2001년도 추계학술대회 논문집
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    • pp.176-180
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    • 2001
  • There are several factors causing re-work in CMP process such as improper polish time calculation by operator, removal rate decline of the polisher, unstable in-suit pad conditioning, slurry supply module problem and wafer carrier rotation inconsistency. And conclusively those fundimental reason for the re-work rate increasement is mainly from the cycle time delay between wafer polish and post measurement. Therefore, Wafer thickness measurement in wet condition could be able to remove those improper process conditions which may happen during the process in comparison with the conventional dried wafer measurement system and it can be able to reduce the CMP process cycle time. CMP scrap reduction by overpolish, re-work rate reduction, thickness control efficiency also can be easily achieved. CMP Equipment manufacturer also trying to develop integrated system which has multi-head & platen, cleaner, pre & post thickness measure and even control the polish time from the calculated removal rate of each polishing head by software. CMP re-work problem such as over & under polish by target thickness may result in the cycle time delay. By reducing those inefficient factors during the process and establish of the automatic process control, CLC system need to be adopted to maximize the process performance. Wafer to Wafer Polish Time Feed Back Control by measuring the wafer right after the polish shorten the polish time calculation for the next wafer and it lead to the perfect Post CMP target thickness control capability. By Monitoring all of the processed the wafer, CMP process will also be stabilize itself.

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Progress of Composite Fabrication Technologies with the Use of Machinery

  • Choi, Byung-Keun;Kim, Yun-Hae;Ha, Jin-Cheol;Lee, Jin-Woo;Park, Jun-Mu;Park, Soo-Jeong;Moon, Kyung-Man;Chung, Won-Jee;Kim, Man-Soo
    • International Journal of Ocean System Engineering
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    • 제2권3호
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    • pp.185-194
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    • 2012
  • A Macroscopic combination of two or more distinct materials is commonly referred to as a "Composite Material", having been designed mechanically and chemically superior in function and characteristic than its individual constituent materials. Composite materials are used not only for aerospace and military, but also heavily used in boat/ship building and general composite industries which we are seeing increasingly more. Regardless of the various applications for composite materials, the industry is still limited and requires better fabrication technology and methodology in order to expand and grow. An example of this is that the majority of fabrication facilities nearby still use an antiquated wet lay-up process where fabrication still requires manual hand labor in a 3D environment impeding productivity of composite product design advancement. As an expert in the advanced composites field, I have developed fabrication skills with the use of machinery based on my past composite experience. In autumn 2011, the Korea government confirmed to fund my project. It is the development of a composite sanding machine. I began development of this semi-robotic prototype beginning in 2009. It has possibilities of replacing or augmenting the exhaustive and difficult jobs performed by human hands, such as sanding, grinding, blasting, and polishing in most often, very awkward conditions, and is also will boost productivity, improve surface quality, cut abrasive costs, eliminate vibration injuries, and protect workers from exposure to dust and airborne contamination. Ease of control and operation of the equipment in or outside of the sanding room is a key benefit to end-users. It will prove to be much more economical than normal robotics and minimize errors that commonly occur in factories. The key components and their technologies are a 360 degree rotational shoulder and a wrist that is controlled under PLC controller and joystick manual mode. Development on both of the key modules is complete and are now operational. The Korean government fund boosted my development and I expect to complete full scale development no later than 3rd quarter 2012. Even with the advantages of composite materials, there is still the need to repair or to maintain composite products with a higher level of technology. I have learned many composite repair skills on composite airframe since many composite fabrication skills including repair, requires training for non aerospace applications. The wind energy market is now requiring much larger blades in order to generate more electrical energy for wind farms. One single blade is commonly 50 meters or longer now. When a wind blade becomes damaged from external forces, on-site repair is required on the columns even under strong wind and freezing temperature conditions. In order to correctly obtain polymerization, the repair must be performed on the damaged area within a very limited time. The use of pre-impregnated glass fabric and heating silicone pad and a hot bonder acting precise heating control are surely required.

텅스텐 화학적-기계적 연마 공정에서 부식방지막이 증착된 금속 컨디셔너 표면의 전기화학적 특성평가 (Electrochemical Characterization of Anti-Corrosion Film Coated Metal Conditioner Surfaces for Tungsten CMP Applications)

  • 조병준;권태영;김혁민;;박문석;박진구
    • 마이크로전자및패키징학회지
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    • 제19권1호
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    • pp.61-66
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    • 2012
  • 반도체 산업에서 회로의 고집적화와 다층구조를 형성하기 위해 화학적-기계적 연마(CMP: Chemical-Mechanical Planarization) 공정이 도입되었으며 반도체 패턴의 미세화와 다층화에 따라 화학적-기계적 연마 공정의 중요성은 더욱 강조되고 있다. 화학적-기계적 연마공정이란 화학적 반응과 기계적 힘을 동시에 이용하여 표면을 평탄화하는 공정으로, 화학적-기계적 연마 공정은 압력, 속도 등의 공정조건과, 화학적 반응을 유도하는 슬러리(Slurry), 기계적 힘을 위한 패드 등에 의해 복합적으로 영향을 받는다. 패드 컨디셔닝이란 컨디셔너가 화학적-기계적 연마 공정 중에 지속적으로 패드 표면을 연마하여 패드의 손상된 부분을 제거하고 새로운 표면을 노출시켜 패드의 상태를 일정하게 유지시키는 것을 말한다. 한편, 금속박막의 화학적-기계적 연마 공정에 사용되는 슬러리는 금속박막과 산화반응을 하기 위하여 산화제를 포함하는데, 산화제는 금속 컨디셔너 표면을 산화시켜 부식을 야기한다. 컨디셔너의 표면부식은 반도체 수율에 직접적인 영향을 줄 수 있는 스크래치(Scratch) 등을 발생시킬 뿐만 아니라, 컨디셔너의 수명도 저하시키게 되므로 이를 방지하기 위한 노력이 매우 중요하다. 본 연구에서는 컨디셔너 표면에 슬러리와 컨디셔너 표면 간에 일어나는 표면부식을 방지하기 위하여 유기박막을 표면에 증착하여 부식을 방지하고자 하였다. 컨디셔너 제작에 사용되는 금속인 니켈과 니켈 합금을 기판으로 하고, 증착된 유기박막으로는 자기조립단분자막(SAM: Self-Assembled Monolayer)과 불화탄소(FC: FluoroCarbon) 박막을 증착하였다. 자기조립단분자막은 2가지 전구체(Perfluoroctyltrichloro silane(FOTS), Dodecanethiol(DT))를 사용하여 기상 자기조립 단분자막 증착(Vapor SAM) 방법으로 증착하였고, 불화탄소막은 10 nm, 50 nm, 100 nm 두께로 PE-CVD(Plasma Enhanced-Chemical Vapor Deposition, SRN-504, Sorona, Korea) 방법으로 증착하여 표면의 부식특성을 평가하였다. 표면 부식 특성은 동전위분극법(Potentiodynamic Polarization)과 전기화학적 임피던스 측정법(Electrochemical Impedance Spectroscopy(EIS)) 등의 전기화학 분석법을 사용하여 평가되었다. 또한 측정된 임피던스 데이터를 전기적 등가회로(Electrical Equivalent Circuit) 모델에 적용하여 부식 방지 효율을 계산하였다. 동전위분극법과 EIS의 결과 분석으로부터 유기박막이 증착된 표면의 부식전류밀도가 감소하고, 임피던스가 증가하는 것을 확인하였다.