• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2000년도 춘계학술대회 논문집
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• pp.854-857
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• 2000

Chemical Mechanical Polishing(CMP) has been accepted as one of the essential processes for VLSI fabrication. However, as the polishing process continues, pad pores get to be glazed by polishing residues, which hinder the supply of new slurry. This defect makes removal rate decrease with a number of polished wafer and the desired within-chip planarity, within wafer and wafer-to-wafer nonuniformity are unable to be achieved. So, pad conditioning is essential to overcome this defect. The eletroplated diamond grit disk is used as the conventional conditioner, And alumina long fiber, the .jet power of high pressure deionized water and vacuum compression are under investigation. But, these methods have the defects like scratches on wafer surface by out of diamond grits, subsidences of pad pores by over-conditioning, and the limits of conditioning effect. To improve these conditioning methods. this paper presents the Characteristics of Ultrasonic conditioning aided by cavitation.

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 1995년도 춘계학술대회 논문집
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• pp.97-101
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• 1995

This paper describes a new surface finishing process which uses magnetic abrasive polishing. This is applied to automatic finishing of die & mold surface. Nowadays, most of die & mold meanufaturing procedures have been automated by the introduction of NC machine tool and CAD/CAM system. But the surface finishing of die & mold must be done by hand work of well-skilled workers. Though many attempts were tried in the past 15 years to eliminate this hand work, the automatic finishing of die & mold surface with 3D curvature has not been achieved yet. New magnetic abrasive finishing process is thought as one of the possible methods for the automation of 3D surface finishing. In order to improve the grindability of the method, ultra-high speed and 5-axis machining was introduce. The magnetic abrasive polishing which has adopted these methods was confirmend to improve the efficiencyof die & mold surface finishing.

• 한국기계가공학회지
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• 제14권3호
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• pp.36-42
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• 2015

The aspherical lens was designed to be able to array a focal point. For this reason, it has very curved surface. The aspherical lens is fabricated by injection molding or diamond turning machine. With the aspherical lens, tool marks and surface roughness affect the optical characteristics, such as transmissivity. However, it is difficult to polish free form surface shapes uniformly with conventional methods. Therefore, in this paper, the ultra-precision polishing method with MR fluid was used to polish an aspherical lens with 4-axis position control systems. A Tool path and polishing mechanism were developed to polish the aspherical lens shape. An MR polishing experiment was performed using a generated tool path with a PMMA aspherical lens after the turning process. As a result, surface roughness was improved from $R_a=40.99nm$, $R_{max}=357.1nm$ to $R_a=4.54nm$, $R_{max}=35.72nm$. Finally, the MR polishing system can be applied to the finishing process of fabrication of the aspherical lens.

• 대한치과교정학회지
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• 제22권1호
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• pp.123-131
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• 1992

This study was done to evaluate the changes of enamel surface by interproximal stripping and recovery of it by polishing. The number of 34 1st premolars which had extracted for orthodontic treatment were selected as samples. Interproximal stripping was performed by hand with metal strip and strip placer (Dentaurum Co., Germany) and low speed handpiece with diamond disk (Superdiaflex, Germany). Polishing was performed by hand with plastic strip (3M Col) and low speed handpiece with whip-mix, DCPA (Dicalcium Phosphate, Anhydrous, $CaHPO_4$) powder and Sof-lex (3M Co. U.S.A.) polishing kit. Each groups were examined under the scanning electron microscope (JEOL Co., JSM-840A, Japan) and the following results were obtained: 1. The stripped group performed by metal strip and diamond disk altogether showed deep furrow on the enamel surface as wide as about $10{{\mu}m}$. 2. There could be seen more irregular scratched line in the group stripped by metal strip than that by diamond disk. 3. The polished group performed by plastic strip and DCPA powder showed slight smoothening of the edge of stripped furrow on the enamel surface without relation to the stripping method. 4. The polished group performed by Sof-lex progressive polishing kit could not avoid the formation of the furrows on the enamel surface according to the particle size without relation to the stripping method. 5. The polished group performed by the superfine polishing wheel, the final stage of Sof-lex polishing method showed shallow scratched line as wide as within about $2{{\mu}m}$ on the enamel surface without relation to the stripping method. 6. The interproximal stripped enamel surface could not recover its original surface texture by any kind of polishing methods.

• The Journal of Advanced Prosthodontics
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• 제13권4호
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• pp.258-267
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• 2021

PURPOSE. The purpose of this study was to compare the surface roughness, phase transformation, and surface topography of dental zirconia with three different yttrium oxide compositions under same grinding and polishing conditions. MATERIALS AND METHODS. Three zirconia disks (IPS e.max ZirCAD LT, MT, MT multi, Ivoclar Vivadent AG, Schaan, Liechtenstein) were selected for experimental materials. Sixty-nine bar-shaped specimens were fabricated as 12.0 × 6.0 × 4.0 mm using a milling machine and glazing was conducted on 12.0 × 6.0 mm surface by same operator. With a custom polishing device, 12.0 × 6.0 mm surfaces were polished under same condition. Surface roughness (Ra[㎛]) was measured before grinding (C), after grinding (G), and at every 3 steps of polishing (P1, P2, P3). X-ray diffraction and FE-SEM observation was conducted before grinding, after grinding, and after fine polishing (P3). Statistical analysis of surface roughness was performed using Kruskal-Wallis test and Mann-Whitney-U test was used as a post hoc test (α = .05). RESULTS. There were no significant differences of surface roughness between LT, MT, and MM groups. In LT, MT, and MM groups, P3 groups showed significantly lower surface roughness than C groups. X-ray diffraction showed grinding and polishing didn't lead to phase transformation on zirconia surface. In FE-SEM images, growths in grain size of zirconia were observed as yttrium oxide composition increases. CONCLUSION. Polished zirconia surface showed clinically acceptable surface roughness, but difference in yttrium oxide composition had no significant influence on the surface roughness. Therefore, in clinical situation, zirconia polishing burs could be used regardless of yttrium oxide composition.

• The Journal of Advanced Prosthodontics
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• 제11권1호
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• pp.1-6
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• 2019

PURPOSE. The purpose of this in vitro study was to evaluate the effect of surface grinding and polishing procedures using high speed zirconia diamond burs with different grit sizes on the phase transformation and flexural strength of zirconia. MATERIALS AND METHODS. Forty disc shape specimens ($15{\times}1.25mm$) with a cylindrical projection in the center of each disc ($1{\times}3mm$) were fabricated with 3Y-TZP (Prettau, Zirkonzahn, Italy). The specimens were divided into 4 groups (n=10) according to the grinding and polishing procedures: Control group - grinding (coarse-grit diamond bur), Group 1 - grinding (coarse-grit diamond bur) + polishing, Group 2 - grinding (fine-grit diamond bur) + polishing, and Group 3 - grinding (fine grit diamond bur). Each specimen was analyzed by 3D-OM, XRD analysis, and biaxial flexural strength test. RESULTS. Based on the surface morphology by 3D-OM images, polished specimens showed smoother surface and lower roughness value (Ra). In the result of XRD analysis, partial phase transformation from tetragonal to monoclinic zirconia occurred in all groups. Control group, ground with a coarse grit diamond bur, showed more $t{\rightarrow}m$ phase transformation and lower flexural strength than Groups 1 and 2 significantly. CONCLUSION. The flexural strength in all specimens after grinding and polishing showed over 500 MPa, and those were clinically acceptable. However, grinding with a coarse grit diamond bur without polishing induced the phase transformation and low strength. Therefore, surface polishing is required for the occlusal adjustment using a high speed zirconia diamond bur to reduce the phase transformation and to prevent the decrease of flexural strength of zirconia.

• 한국공작기계학회:학술대회논문집
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• 한국공작기계학회 1998년도 춘계학술대회 논문집
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• pp.59-64
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• 1998

We need to achieve th mass product through methods of higher efficient, higher precise manufacturing process than those of existing precision abrasive machining. Thus, this study is to develop mirror-like surface machining technique of outer diameter of the piston pin by the compound magneto-electrolytic abrasive polishing system. The procedure of machining is followed as first, fulfill the pre-processing by cylindrical grinder, second, complete mirror-like surface by the method of magneto-electrolytic abrasive polishing used CBN non-woven abrasive pads. In this study, it was found that the best suitable conditions of mirror-like surface polishing were that the electrode density was 0.1A/$\textrm{cm}^2$, the applied pressure 1.5kgf/$\textrm{cm}^2$, the feed rate 0.5mm/rev, and the rotoation velocity of workpiece 80rpm, and that the surface roughness was reduced in this conditions.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2005년도 추계학술대회 논문집 Vol.18
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• pp.358-359
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• 2005

Chemical mechanical polishing(CMP) process depends on a variety of variables. Especially, surface roughness of pad plays a key role in material removal in CMP in terms of transportation ability of pores and real contact area. The surface roughness is deteriorated with polishing time by applied pressure and relative velocity. In this reason, diamond conditioner has been used to maintain the roughness on the pad. The authors try to investigate the correlation between pad roughness and frictional behavior by comparing ex-situ conditioning with in-situ conditioning.

• 한국정밀공학회지
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• 제25권9호
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• pp.32-37
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• 2008

Freestanding hydride vapor phase epitaxy grown GaN(Gallium Nitride) substrates subjected to various polishing methods were characterized for their surface and subsurface conditions, Although CMP(Chemical Mechanical Polishing) is one of the best approaches for reducing scratches and subsurface damages, the removal rate of Ga-polar surface in CMP is insignificant($0.1{\sim}0.3{\mu}m$/hr) as compared with that of N-polar surface, Therefore, conventional MP(Mechanical Polishing) is commonly used in the GaN substrate fabrication process, MP of (0001) surface of GaN has been demonstrated using diamond slurries with different abrasive sizes, Diamond abrasives of size ranging from 30nm to 100nm were dispersed in ethylene glycol solutions and mineral oil solutions, respectively. Significant change in the surface roughness ($R_a$ 0.15nm) and scratch-free surface were obtained by diamond slurry of 30nm in mean abrasive size dispersed in mineral oil solutions. However, MP process introduced subsurface damages confirmed by TEM (Transmission Electronic Microscope) and PL(Photo-Luminescence) analysis.

• 대한치과보철학회지
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• 제38권1호
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• pp.108-115
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• 2000

This study was designed to compare the effect of polishing on surface roughness of composite resin. We used Z100(3M) composite resin and placed the composite resin in the hole (4mm thick and 4mm in diameter) of vinyl plate and polymerized it under manufacturer's instructions. Samples were divided into 5 groups by polishing methods. Group 1 was control: resin was polymerized under glass plate, Group 2: resin was polymerized without any polishing procedure, Group 3: resin was polymerized with a polishing procedure of abrasive disc, Group 4: bonding agent was applyed in thin layer and polymerized on the polished polymerized resin surface. Group 5: resin was polymerized under transparent celluloid strip. The surface roughness of each specimen was measured with Sufacoder SEF-30D (Kosaka lab. Ltd) under 0.08mm cut off, 0.05mm/s stylus speed, ${\times}40$ horizontal magnification, ${\times}5000$ vertical magnification. The results were as follows : 1. Group 1 showed the most smooth surface in this study. 2. Group 3 showed more rough surface than Group 2. Considering the surface roughness, it would be better to make the shape completely before polymerize the resin. To finish and polish after the polymerization of resin makes less smooth surface. 3. When we use the transparent celluloid strip, minimum finishing procedures are recommended. Any polishing procedure could not recover the smooth resin surface of celluloid strip. 4. Application and polymerization of the thin layer of bonding agent on the polished surface showed the minimum surface smoothing effect.