• The Journal of Advanced Prosthodontics
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• v.8 no.6
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• pp.472-478
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• 2016

PURPOSE. The aim of this study was to analyze the shapes of lingual polished surfaces in lower complete dentures formed by polished surface impressions and to provide reference data for use when manufacturing edentulous trays and lower complete dentures. MATERIALS AND METHODS. Twenty-six patients with mandibular edentulism were studied. After lower wax dentures were fabricated, wax was removed from the lingual side of the wax denture and a lingual polished surface impression was obtained with tissue conditioner. The definitive denture was scanned with a three-dimensional scanner, and scanned images were obtained. At the cross-sections of the lingual frenum, lateral incisors, first premolars, first molars, and anterior border of the retromolar pads, three points were marked and eight measurements were taken. The Kruskal-Wallis test and a post hoc analysis with the Mann-Whitney test were performed. RESULTS. Each patient showed similar values for the same areas on the left and right sides without a statistically significant difference. The height of the contour of the lingual polished surface at the lingual frenum was halfway between the occlusal plane and lingual border, it moved gradually in a downward direction. The angle from the occlusal plane to the height of the contour of the lingual polished surface was increased as it progressed from the lingual frenum towards the retromolar pads. CONCLUSION. The shape of the mandibular lingual polished surface was convex at the lingual frenum, lateral incisors and gradually flattened towards the first molars and retromolar pads.

• Journal of the Semiconductor & Display Technology
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• v.13 no.1
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• pp.13-17
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• 2014

Since the semiconductor manufacturing requires the silicon wafers with extraordinary degree of surface flatness, the surface polishing of wafers from ingot cutting is an important process for deciding surface quality of wafers. The present study introduces the development of wafer polishing equipment and, especially, the wafer polishing head that employs the forced self-driving of installed silicon wafer as well as the wax wafer mounting technique. A series of wafer polishing tests have been carried out to investigate the effects of self-driving function in wafer polishing head. The test results for wafer planarization showed that the LLS counts and SBIR of polished wafer surfaces were generally improved by adopting the self-driven polishing head in wafer polishing stations.

• Restorative Dentistry and Endodontics
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• v.16 no.2
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• pp.1-17
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• 1991

The purpose of this study was to analyze the in vivo amalgam corrosion products qualitatively. 30 molars with large, intact amalgam restorations were selected. All the restorations were more than 5 years old. Twenty of the removed amalgams were embedded in acrylic resin block. The exposed surfaces of fifteen embedded amalgams were polished by amalgam polishing kit, and the rest were observed without polishing. The remaining 10 amalgams were fractured centrally and perpendiculary to the occlusal surface with a wire-cutter. After all specimens were cleaned ultrasonically in distilled water, each surface was examined under S.E.M. and E.D.A.X. (Energy Dispersive Micro X-ray Analyzer) to determine the morphology and chemical nature of the corrosion products. The following results were obtained: 1. The surfaces of the unpolished amalgam restorations were covered with thin amorphous layer of Sn-Ca-P-S complex with numerous cracks. 2. In the conventional amalgams, the major corrosion products were Sn-Cl phases however, tin oxide phases were also observed. 3. Only tin oxide phase was identified in the high copper amalgam, but it was less frequently observed than in the conventional amalgam. 4. It was easier to observe the corrosion product morphology in the fractured surfaces than in the polished ones. The morphologies of the corrosion product crystals looked like a stack of slightly bended plates in the Sn-Cl phases and polyhedra or polygonal prisms in the tin oxide phases.

• Journal of Welding and Joining
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• v.19 no.2
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• pp.191-199
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• 2001

The oxidation and recrystallization behaviors of Ni-base single crystal superalloy, CMSX-2 were investigated to determine the condition of the preparation for transient liquid phase (TLP) bonding operations. The faying surfaces of CMSX-2 were worked by the shot peening, fine cutting and mechanical polishing treatments and the degree of working of treated surfaces was evaluated by the hardness test and X-ray diffraction method CMSX-2 was heat-treated at 1,173∼1.589k for 3.6ks in vacuum of 4mPa. The mechanically polished surface was slightly oxidized after heat treatment even in the vacuum atmosphere of 4mPa. The thickness of an oxide film increased with increasing the heating temperature and the surface roughness of the faying surface. Recrystallization occurred at the surface after heat treatment at above 1,423K when the hardness was increased more than Hv600 by the shot peening treatment while the mechanically polished or fine cut surfaces didn't recrystallized. Based on these results, it was clearfied that the mechanically polishing with fine abrasive grit could be used for the preparation of faying surface of CMSX-2 before bonding operation.

• Proceedings of the Korean Society of Tribologists and Lubrication Engineers Conference
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• 2002.10b
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• pp.433-434
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• 2002

Chemical mechanical polishing refers to a process by which silicon and partially-processed integrated circuits (IC's) built on silicon substrates are polished to produce planar surfaces for the continued manufacturing of IC's. Chemical mechanical polishing is done by pressing the silicon wafer, face down, onto a rotating platen that is covered by a rough polyurethane pad. During rotation, the pad is flooded with a slurry that contains nanoscale particles. The pad deforms and the roughness of the surface entrains the slurry into the interface. The asperities contact the wafer and the surface is polished in a three-body abrasion process. The contact of the wafer with the 'soft' pad produces a unique elastohydrodynamic situation in which a suction force is imposed at the interface. This added force is non-uniform and can be on the order of the applied pressure on the wafer. We have measured the magnitude and spatial distribution of this suction force. This force will be described within the context of a model of the sliding of hard surfaces on soft substrates.

• Restorative Dentistry and Endodontics
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• v.8 no.1
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• pp.97-106
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• 1982

The purpose of this study was to evaluate the effect of different polishing procedures on the surfaces of composite resins. Two-paste type comosite restorative resin (Hipol) was selected for this study. 70 cavities prepared on the plaster-stone dies, 6mm in diameter and 2mm in depth, was filled with composite resin according to the manufacturer's specifications and by polymerizing against mylar strips. The polymerized composite resin specimens were polished (surface finished) by using 6 polishing devices; white stones, diamond finishing points, 12-fluted carbide finishing burs, green stones, sand paper disks, and Quasite rubber disk after polished with sand paper disks and green stones. A profilometer (Bendix type) was used to record in microinches the surface roughness of each surface finished composite resin specimens. The results were as follows. 1. The best finished surface that can be obtained is a surface formed by the mylar matrix strip 2. The white stones produced the smoothest surface in the experimental group. 3. The green stones produced the roughest surface in the experimental group. 4. It was proved that the gradual use of finishing instruments from a rough one to fine ones reduced the surface roughness.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.9 no.5
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• pp.459-462
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• 1999

Recent advances in NLO Borate Crystals for UV Generation are reviewed with the particular emphasis on the technique to improve the life time of UV optics. The laser-damage resistance of CLBO and fused silica surfaces was successfully improved after removing polishing compound by ion beam etching. The polishing compound embedded in the CLBO and fused silica surfaces were to a depth of less than 100nm. We were able to remove polishing compound without degrading the surface condition when the applied ion beam voltage was less than 200 V. The laser-induced surface damage threshold of CLBO was improved up to 15J/$\textrm{cm}^2$(wavelength: 355 nm, pulse width: 0.85 ns)as compared with that of the as-polished surface (11 J/$\textrm{cm}^2$). The laser-induced surface damage of fused silica also increased from 7.5J/$\textrm{cm}^2$ to 15J/$\textrm{cm}^2$. For the irradiation of a 266 nm high-intensity and high-repetition laser light, the surface lifetime of CLBO and fused silica could be more doubled compared with that of the as-polished surface.

• The Magazine of the Society of Air-Conditioning and Refrigerating Engineers of Korea
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• v.5 no.3
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• pp.169-177
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• 1976

The importance of surface conditions of nucleate boiling is well recognized and it has been known that the heat transfer to boiling liquid is closely related to the bubble population density. The bubble population density should depend on various factors such as heat flux, surface roughness, surface contamination, properties of liquid, etc. In this paper the effect of surface conditions on heat transfer in nucleate boiling is treated. The experiments were carried out with distilled water boiler, on the horizontal heating surfaces, sintered with various bronze particle, under atmospheric pressure. In addition, experimental investigation for the polished bronze surface was performed. By studing a coefficient Xb defined by eq. (9), which represents the bubble foaming ability of heating surface, generalized fomula on the heat transfer in the nucleate toiling were expressed. The coefficient $X_b$, determined empirically, is not constant and indicates a major influence of the sintered metal surfaces on the $\Delta$, necessary to sustain nucleate boiling at any given heat flux. In this study, the main results are obtained as follows; (1) At low temperature difference, the coefficient $X_b$ of sintered metal surface was found to he higher than the polished surface throughout the full range of experiments. (2) The optimum sintered structure showing the maximum coefficient $X_b$ has been confirmed to exist and it is encountered when particle diameter is $256{\mu}$.

• Journal of the Korean Society for Precision Engineering
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• v.16 no.2 s.95
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• pp.145-152
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• 1999

This paper presents the principle and experimental results of a non-contact surface roughness measurement by means of screen projected pattern of lase beam reflected from a polished surface. In the reflected laser beam pattern especially from a fine surface like ground or polished one, light intensity varies from the center fo the image to its boundary as the Gaussian distribution. The standard deviation of a light intensity distribution is assumed to be a good non-contact estimator for measuring the surface roughnes, because the light reflectivity is known to be well related with the surface roughness. This method doesn't need to discriminate between the specularly reflected light and the diffusely reflected one, whereas the scattered laser intensity method must do. Nor it needs to adjust the change of light intensity caused by environmental lights or specimen materials. Reflected laser beam pattern narrowly spreads out in the vertical direction to tiny scratches on the polished surface due to abrasives. The deeper the scratch the more the dispersion, which means the rougher surface. The standard deviation of the pattern is nearly in proportion to the surface roughness. Measurement errors by this method are shown to be below 10 percent compared with those obtained by a common contact method. The inclination of measuring unit from the normal axis causes the measurement errors up to 10 percent for an angle of 4 degree. Therefore the proposed method can be used as an on-the-machine quick roughness estimator within 10 percent measurement error.

• Journal of the Korean Society of Safety
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• v.28 no.6
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• pp.73-78
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• 2013

The purpose of this study was to evaluate three kinds of slipmeters (BOT, BPT, English XL) used on-site floor with ASTM F2508 which is comprised of four different standard surfaces(polished granite, glazed porcelain, vinyl composite tile ;VCT, and ceramic tile). ASTM F2508 has two criteria that decide which slipmeter is appropriate or not. The evaluated slipmeters were dreg sled, articulated sturt, and pendulum strike type. The test results revealed that two kinds of slipmeters(BOT, BPT) successfully ranked all four standard surfaces and differentiated among standard surfaces with varying degrees of slipperiness. Nevertheless, the measured value with BOT on the VCT, which was reported as slippery floor in previous study, was higher than its threshold(0.6). Although some slipmeter satisfy two criteria of ASTM F2508, they can underestimate the slip potential. So, another criteria is needed so as to reduce this problem. English XL couldn't properly measure slipperiness under the two kind of floors(glazed porcelain, VCT). So the slider of English XL was modified in order to meet two criteria of ASTM F2508.