• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2004년도 Asia Display / IMID 04
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• pp.746-748
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• 2004

a-Si TFTs with field-effect mobility of 1.2 $cm^2$/V-s have been fabricated on plastic substrate. Pixel circuits on plastic for AMOLED were made with the same low-temperature fabrication process. The circuits compensate for $V_T$-shift, exhibit high output current, retain functionality and drive current level during long-time continuous operation.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2002년도 International Meeting on Information Display
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• pp.263-267
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• 2002

We are standing at the beginning of the industrialization of flexible thin-film transistor backplanes. An important group of candidates is based on silicon thin films made on metal or plastic foils. The main features of amorphous, nanocrystalline and microcrystalline silicon films for TFTs are summarized, and their compatibility with foil substrate materials is discussed.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2011년도 제40회 동계학술대회 초록집
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• pp.288-289
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• 2011

Indium Tin Oxide (ITO) is a typical highly Transparent Conductive Oxide (TCO) currently used as a transparent electrode material. Most widely used deposition method is the sputtering process for ITO film deposition because it has a high deposition rate, allows accurate control of the film thickness and easy deposition process and high electrical/optical properties. However, to apply high quality ITO thin film in a flexible microelectronic device using a plastic substrate, conventional DC magnetron sputtering (DMS) processed ITO thin film is not suitable because it needs a high temperature thermal annealing process to obtain high optical transmittance and low resistivity, while the generally plastic substrates has low glass transition temperatures. In the room temperature sputtering process, the electrical property degradation of ITO thin film is caused by negative oxygen ions effect. This high energy negative oxygen ions(about over 100eV) can be critical physical bombardment damages against the formation of the ITO thin film, and this damage does not recover in the room temperature process that does not offer thermal annealing. Hence new ITO deposition process that can provide the high electrical/optical properties of the ITO film at room temperature is needed. To solve these limitations we develop the Magnetic Field Shielded Sputtering (MFSS) system. The MFSS is based on DMS and it has the plasma limiter, which compose the permanent magnet array (Fig.1). During the ITO thin film deposition in the MFSS process, the electrons in the plasma are trapped by the magnetic field at the plasma limiters. The plasma limiter, which has a negative potential in the MFSS process, prevents to the damage by negative oxygen ions bombardment, and increases the heat(-) up effect by the Ar ions in the bulk plasma. Fig. 2. shows the electrical properties of the MFSS ITO thin film and DMS ITO thin film at room temperature. With the increase of the sputtering pressure, the resistivity of DMS ITO increases. On the other hand, the resistivity of the MFSS ITO slightly increases and becomes lower than that of the DMS ITO at all sputtering pressures. The lowest resistivity of the DMS ITO is $1.0{\times}10-3{\Omega}{\cdot}cm$ and that of the MFSS ITO is $4.5{\times}10-4{\Omega}{\cdot}cm$. This resistivity difference is caused by the carrier mobility. The carrier mobility of the MFSS ITO is 40 $cm^2/V{\cdot}s$, which is significantly higher than that of the DMS ITO (10 $cm^2/V{\cdot}s$). The low resistivity and high carrier mobility of the MFSS ITO are due to the magnetic field shielded effect. In addition, although not shown in this paper, the roughness of the MFSS ITO thin film is lower than that of the DMS ITO thin film, and TEM, XRD and XPS analysis of the MFSS ITO show the nano-crystalline structure. As a result, the MFSS process can effectively prevent to the high energy negative oxygen ions bombardment and supply activation energies by accelerating Ar ions in the plasma; therefore, high quality ITO can be deposited at room temperature.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2007년도 7th International Meeting on Information Display 제7권1호
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• pp.251-254
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• 2007

Principal challenges to $\underline{direct\;fabrication}$ of high performance a-Si:H transistor arrays on flexible substrates include automated handling through bonding-debonding processes, substrate-compatible low temperature fabrication processes, management of dimensional instability of plastic substrates, and planarization and management of CTE mismatch for stainless steel foils. Viable solutions to address these challenges are described.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2005년도 International Meeting on Information Displayvol.I
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• pp.785-789
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• 2005

Low temperature deposition of silicon and silicon nitride films by catalytic CVD technique was studied for application to thin film transistors on plastic substrates for flexible AMOLEDs. The substrate temperature initially held at room temperature, and was controlled successfully below $150^{\circ}C$ during the entire deposition process. Amorphous silicon films having good adhesion, good surface morphology and sufficiently low content of atomic hydrogen were obtained and could be successfully crystallized using excimer laser without a prior dehydrogenation step. $SiN_x$ films showed a good refractive index, a high deposition rate, a moderate breakdown field and a dielectric constant. The Cat-CVD silicon and silicon nitride films can be good candidates for fabricating thin films transistors on plastic substrates to drive active-matrix organic light emitting display.

• 대한전자공학회논문지SD
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• 제44권11호
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• pp.9-14
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• 2007

본 연구에서는 하부전극 구조 펜타센 유기박막트랜지스터를 이용하여 플라스틱 기판에 인버터, 링 발진기, NAND & NOR 논리게이트, 정류기 등 간단한 집적회로를 제작하고 그 특성을 관찰하였다. 제작된 유기박막트랜지스터 소자의 평균 전하이동도는 0.26 $cm^2/V.sec$, 전류점멸비는 $10^5$로 나타났으며 인버터와 NAND, NOR 논리게이트는 입력에 대해 정확한 논리출력값을 출력하였다. 전파 정류기는 1MHz의 AC 입력신호에 대해 정류효과를 나타냈으며 링 발진기는 DC 40V에서 1MHz의 발진특성을 보였다. 이와 같이 유기박막트랜지스터를 이용한 집적회로를 제작하고 특성을 분석함으로써 현재 관심이 되고 있는 초저가 RFID tag, Flexible Display 구동회로 등에 유기박막트랜지스터를 적용할 수 있는 가능성을 확인하였다.

• 폴리머
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• 제29권2호
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• pp.204-210
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• 2005

플라스틱 디스플레이 기판용으로 사용하기 위하여 무색, 투명하면서 유연성, roll-to-roll 공정, 내열성과 저 열팽창계수 특성을 갖출 수 있는 폴리이미드에 대한 연구를 하였다. 3,3',4,4'-oxydiphthalic anhydride(ODPA), 4,4'-(hexafluoroisopropylidene)diphthalic anhydride (6FDA), sulfonyldianiline(3-SDA), aminophenoxybenzene(TPE-p, TPE-q, TPE-r)과 bis[4-(3-aminophenoxy)phenyl]sulfone(m-BAPS) 등을 사용하여 무색 투명한 폴리이미드를 합성하고 광학적 특성을 UV spectrophotometer, colormeter와 hazemeter를 이용하여 측정하였다. 열팽창계수(CTE)를 낮추기 위하여 층상실리케이트로 나노복합화하였다. 무색투명한 폴리이미드 필름은 440 nm에서 $89\%$ 이상의 광투과도와 yellow index(YI) 값이 7 이하의 우수한 광학 특성을 보였다. 나노복합화한 폴리이미드 필름은 층상실리케이트가 효과적으로 박리되어 층상실리케이트의 함유량이 증가함에 따라 열팽창계수가 감소하는 효과를 보였다.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2005년도 International Meeting on Information Displayvol.I
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• pp.700-702
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• 2005

A 5.0-inch transmissive type plastic TFT arrays were successfully fabricated on a plastic substrate at the resolution of $400{\times}3{\times}300$ lines (100ppi). All of the TFT processes were carried out below $150^{\circ}C$ on PES plastic films. After thin film deposition using PECVD, thin film failures such as film delamination and cracking often occurred. For successful growth of thin films (about 1um) without their failures, it is necessary to solve the critical problem related to the internal compressive stress (some GPa) leading to delamination at a threshold thickness value of the films. The Griffith's theory explains the failure process by looking at the excess of elastic energy inside the film, which overcomes the cohesive energy between film and substrate. To increase the above mentioned threshold thickness value there are two possibilities: (i) the improvement of the interface adhesion (for example, through surface micro-roughening and/or surface activation), and (ii) the reduction of the internal stress. In this work, reducing a-Si layer film thickness and optimizing a barrier SiNx layer have produced stable CVD films at 150oC, over PES substrates

• 한국진공학회:학술대회논문집
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• 한국진공학회 2010년도 제39회 하계학술대회 초록집
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• pp.250-250
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• 2010

Flexible display의 발전에 따라 점차 고온 공정에서 plastic 기판에 영향을 주지 않는 저온 공정으로 변화해 가고 있다. 이러한 발전에 따라 공정온도에 따른 SiNx의 특성 분석을 위해 우선 150C~300C에서 SiNx의 박막을 증착하였다. gas ratio (SiH4:NH3=4:60)와 Power (50W), 공정시간(25min)을 고정하고 온도만을 가변하여 박막의 특성을 분석하였다. 이후에 150C로 온도를 고정 후 gas ratio를 가변하고 Power (40W)와 온도(150C)는 고정 후 실험을 진행하여, 150C에서 최적화된 gas ratio를 알아내도록 하였다. 위의 실험은 p-type 실리콘 웨이퍼 위에 SiNx 박막 증착 후 굴절률과 증착률을 측정하였고, Al 전극을 증착하여 MIS구조를 구현하여, gate voltage에 따른 capacitance를 측정하였다. 이번 논문에서는 SiNx의 Substrate temperature와 gas ratio의 변화에 따른 다양한 특성을 확인하고 이를 체계적으로 분석하였다.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2009년도 9th International Meeting on Information Display
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• pp.142-144
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• 2009

We demonstrated narrow and good aspect-ratio inkjet-printed silver lines with multi-time over-printing methods. By using this strategy, narrow silver lines were obtained with 200 nm thickness and their width and gap between printed lines of uniform narrow silver lines were 30 ${\mu}m$ and 17 ${\mu}m$, respectively. It also had good conductivity, sheet resistacne of 0.36 ${\Omega}/{\square}$ and specific resistance of $8{\mu}{\Omega}{\cdot}cm$. In current stress test, narrow silver line with 30 ${\mu}m$ width was able to a current flow up to 50 mA (2.1A/$cm^2$). Using surface treatment on poly-arylate substrate with $UVO_3$, we obtained clean-edge narrow line without any edge waviness.