• 제목/요약/키워드: plasma-chemical reactor

검색결과 143건 처리시간 0.024초

Distribution of Ions and Molecules Density in N2/NH3/SiH4 Inductively Coupled Plasma with Pressure and Gas Mixture Ratio) (N2/NH3/SiH4 유도 결합형 플라즈마의 압력과 혼합가스 비율에 따른 이온 및 중성기체 밀도 분포)

  • Seo, Kwon-Sang;Kim, Dong-Hyun;Lee, Ho-Jun
    • The Transactions of The Korean Institute of Electrical Engineers
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    • 제66권2호
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    • pp.370-378
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    • 2017
  • A fluid model of 2D axis-symmetry based on inductively coupled plasma (ICP) reactor using $N_2/NH_3/SiH_4$ gas mixture has been developed for hydrogenated silicon nitride ($SiN_x:H$) deposition. The model was comprised of 62 species (electron, neutral, ions, and excitation species), 218 chemical reactions, and 45 surface reactions. The pressure (10~40 mTorr) and gas mixture ratio ($N_2$ 80~96 %, $NH_3$ 2~10 %, $SiH_4$ 2~10 %) were considered simulation variables and the input power fixed at 1000 W. Different distributions of electron, ions, and molecules density were observed with pressure. Although ionization rate of $SiH_2{^+}$ is higher than $SiH_3{^+}$ by electron direct reaction with $SiH_4$, the number density of $SiH_3{^+}$ is higher than $SiH_2{^+}$ in over 30 mTorr. Also, number density of $NH^+$ and $NH_4{^+}$ dramatically increased by pressure increase because these species are dominantly generated by gas phase reactions. The change of gas mixture ratio not affected electron density and temperature. With $NH_3$ and $SiH_4$ gases ratio increased, $SiH_x$ and $NH_x$ (except $NH^+$ and $NH_4{^+}$) ions and molecules are linearly increased. Number density of amino-silane molecules ($SiH_x(NH_2)_y$) were detected higher in conditions of high $SiH_x$ and $NH_x$ molecules density.

Dimethyl Carbonate Synthesis by Methanol Oxidative Carbonylation (메탄올 산화 카르보닐화에 의한 디메틸카보네이트 합성)

  • Nam, Jeong-Kwang;Cho, Deug-Hee;Suh, Jeong-Kwon;Kim, Seong-Bo
    • Korean Chemical Engineering Research
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    • 제49권5호
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    • pp.530-534
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    • 2011
  • The synthesis of dimethyl carbonate by liquid phase oxidative carbonylation of methanol was studied under batch reaction system. Reaction factors such as effect on various metals, anion containing in copper catalyst, temperature, carbon monoxide and oxygen molar ratio and copper content were investigated. In particular $CuCl_2{\cdot}2H_2O$ showed the excellent of the methanol conversion 65.2%, DMC selectivity 96.6% reaction condition under 1.0 g, $150^{\circ}C$, MeOH/CO/$O_2$=0.2/0.215/0.05 (molar ratio). $CuCl_2$ led to corrosion of the reactor. Thus, a new catalyst system using supports was investigated to resolve these corrosion problem. Influence on various supports were examined and copper catalyst supported on zeolite Y showed the most excellent activity on the formation of dimethyl carbonate. The amount of Fe dissolved during the reaction using ICP-AES (Inductively Coupled Plasma-Atomic Emission Spectrometer) was compared with catalysts, calcined Cu/zeolite Y showed the lower value below 5% than $CuCl_2-2H_2O$.

The surface kinetic properties between $BCl_3/Cl_2$/Ar plasma and $Al_2O_3$ thin film

  • Yang, Xue;Kim, Dong-Pyo;Um, Doo-Seung;Kim, Chang-Il
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 한국전기전자재료학회 2008년도 하계학술대회 논문집 Vol.9
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    • pp.169-169
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    • 2008
  • To keep pace with scaling trends of CMOS technologies, high-k metal oxides are to be introduced. Due to their high permittivity, high-k materials can achieve the required capacitance with stacks of higher physical thickness to reduce the leakage current through the scaled gate oxide, which make it become much more promising materials to instead of $SiO_2$. As further studying on high-k, an understanding of the relation between the etch characteristics of high-k dielectric materials and plasma properties is required for the low damaged removal process to match standard processing procedure. There are some reports on the dry etching of different high-k materials in ICP and ECR plasma with various plasma parameters, such as different gas combinations ($Cl_2$, $Cl_2/BCl_3$, $Cl_2$/Ar, $SF_6$/Ar, and $CH_4/H_2$/Ar etc). Understanding of the complex behavior of particles at surfaces requires detailed knowledge of both macroscopic and microscopic processes that take place; also certain processes depend critically on temperature and gas pressure. The choice of $BCl_3$ as the chemically active gas results from the fact that it is widely used for the etching o the materials covered by the native oxides due to the effective extraction of oxygen in the form of $BCl_xO_y$ compounds. In this study, the surface reactions and the etch rate of $Al_2O_3$ films in $BCl_3/Cl_2$/Ar plasma were investigated in an inductively coupled plasma(ICP) reactor in terms of the gas mixing ratio, RF power, DC bias and chamber pressure. The variations of relative volume densities for the particles were measured with optical emission spectroscopy (OES). The surface imagination was measured by AFM and SEM. The chemical states of film was investigated using X-ray photoelectron spectroscopy (XPS), which confirmed the existence of nonvolatile etch byproducts.

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Silver nanowires and nanodendrites synthesized by plasma discharge in solution for the catalytic oxygen reduction in alkaline media

  • Kim, Hoe-Geun;Song, Myeon-Gyu;Kim, Dong-U;Lee, Sang-Yul
    • Proceedings of the Korean Institute of Surface Engineering Conference
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    • 한국표면공학회 2018년도 춘계학술대회 논문집
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    • pp.62-62
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    • 2018
  • Pt is still considered as one of the most active electrocatalysts for ORR in alkaline fuel cells. However, the high cost and scarcity of Pt hamper the widespread commercialization of fuel cells. As a strong candidate for the replacement of Pt catalyst, silver (Ag) has been extensively studied due to its high activity, abundance, and low cost. Ag is more stable than Pt in the pH range of 8~14 as the equilibrium potential of Ag/Ag+ being ${\approx}200mV$ higher than that of Pt/PtO. However, Ag is the overall catalytic activity of Ag for oxygen reduction reaction(ORR) is still not comparable to Pt catalyst since the surface Ag atoms are approximately 10 times less active than Pt atoms. Therefore, further enhancement in the ORR activity of Ag catalysts is necessary to be competitive with current cutting-edge Pt-based catalysts. We demonstrate the architectural design of Ag catalysts, synthesized using plasma discharge in liquid phase, for enhanced ORR kinetics in alkaline media. An attractive feature of this work is that the plasma status controlled via electric-field could form the Ag nanowires or dendrites without any chemical agents. The plasma reactor was made of a Teflon vessel with an inner diameter of 80 mm and a height of 80 mm, where a pair of tungsten(W) electrodes with a diameter of 2 mm was placed horizontally. The stock solutions were made by dissolving the 5-mM AgNO3 in DI water. For the synthesis of Agnanowires, the electricfield of 3.6kVcm-1 in a 200-ml AgNO3 aqueous solution was applied across the electrodes using a bipolar pulsed power supply(Kurita, Seisakusyo Co. Ltd). The repetition rate and pulse width were fixed at 30kHz and 2.0 us, respectively. The plasma discharge was carried out for a fixed reaction time of 60 min. In case of Ag nanodendrites, the electric field of 32kVcm-1 in a 200-ml AgNO3 aqueous solution was applied and other conditions were identical to the plasma discharge in water in terms of electrode configuration, repetition rate and discharge time. Using SEM and STEM, morphology of Ag nanowires and dendrites were investigated. With 3.6 kV/cm, Ag nanowire was obtained, while Ag dendrite was constructed with 32 kV/cm. The average diameter and legth of Ag nanowireses were 50 nm and 3.5 um, and thoes values of Ag dendrites were 40 nm and 3.0 um. As a results of XPS analysis, the surface defects in the Ag nanowires facilitated O2 incorporation into the surface region via the interaction between the oxygen and the electron cloud of the adjacent Ag atoms. The catalytic activity of Ag for oxygen reduction reaction(ORR) showed that the catalytic ORR activity of Ag nanowires are much better than Ag nanodendrites, and electron transfer number of Ag nanowires is similar to that of Pt (${\approx}4$).

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NO and $SO_2$ Removal by Dielectric Barrier Discharge-Photocatalysts Hybrid Process (유전체 장벽 방전-광촉매 복합공정에 의한 NO와 $SO_2$ 제거)

  • Kim, Dong-Joo;Nasonova, Anna;Kim, Kyo-Seon
    • Clean Technology
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    • 제13권2호
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    • pp.115-121
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    • 2007
  • In this study, we analyzed experimently the NO and $SO_2$ removal by the dielectric barrier discharge-photocatalysts hybrid process. The glass spheres were used as a dielectric material for dielectric barrier discharge and the $TiO_2$ photocatalysts were coated onto those spheres by the dip-coating method. The $TiO_2$ particles were coated in the sponge-shape, which has the larger surface area. As the voltage applied to the plasma reactor, the pulse frequency of applied voltage, or the residence time increases, the NO and $SO_2$ removal efficiencies increase. The increase in the supplied concentrations of NO and $SO_2$ leads to the higher energy for NO and $SO_2$ removal and the NO and $SO_2$ removal efficiencies decrease. These experimental results can be used as a basis to design the dielectric barrier discharge-photocatalysts hybrid process to remove NO and $SO_2$.

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Water Repellent Finishes of Polyester Fiber Using Glow Discharge (글로우방전을 이용한 폴리에스테르섬유의 발수가공)

  • Mo, Sang Young;Kim, Gi Lyong;Kim, Tae Nyun;Chun, Tae Il
    • Textile Coloration and Finishing
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    • 제5권4호
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    • pp.29-41
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    • 1993
  • In order to surface Hydrophobilization of Poly(ethylene terephthalate) (PET) fiber samples were treated in the atmosphere of CF$_{4}$ or $C_{2}$F$_{6}$glow discharge. The sample used in this study was PET film which is 75$\mu$m thick made by Teijin, O-Type(Japan). The cleaned samples were placed in plasma reactor made of pyrex glass cylinder, and plasma processing was carried out by glow discharge of CF$_{4}$ or $C_{2}$F$_{6}$ gas, being continuously fed by gas flow and continuously pumped out by a vacuum system. Electric power source for generate plasma state was sustained alternating current(60Hz) and voltage was sustained 600 volt. The duration of plasma treatment varied from 15 to 120 seconds except special case, the monomer gase pressure varied from 0.02 to 0.3 Torr and power range was 10 to 90 watts. The hydrophobic features of changed PET surface were evaluated by contact angle measurement and surface chemical characteristics were analyzed by ESCA. Results can be summerized as follows. 1. The most favorable setting position of substrate was the center area between the two electrodes. 2. $C_{2}$F$_{6}$ discharge current was lower than that of CF$_{4}$ when same voltage was sustained. Treated efficiency between CF$_{4}$ and $C_{2}$F$_{6}$ did not revealed significant differences under same electric power(wattage). 3. When monomer pressure is very low below 0.02 torr, as though substrate is exposed to CF$_{4}$ or $C_{2}$F$_{6}$ plasma, it tend to be hydrophilic through a little of fluorine bond and a great deal of oxidizing reaction. 4. There brought good hydrophobilization when monomer pressure was more 0.1 torr and duration of glow discharge treatment was over 45 seconds. When monomer pressure was too high, discharge current became low. Although prolong the duration, there was no more high hydrophobilization. 5. According to ESCA analysis, there were a little CF bond and a prevailing CF$_{2}$ bond in CF$_{4}$-treated substrate. There were CF$_{3}$, a little CF and a prevailing CF$_{2}$ bond in $C_{2}$F$_{6}$-treated substrate.d substrate.

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Decomposition Characteristics of PFCs for Various Plasma Discharge Methods in Dielectric Barrier Discharge (DBD 반응기에서 플라즈마 방전형태에 따른 PFCs 가스의 분해 특성)

  • Kim, Kwan-Tae;Kim, Yong-Ho;Cha, Min-Suk;Song, Young-Hoon;Kim, Seock-Joon;Ryu, Jeong-In
    • Journal of Korean Society for Atmospheric Environment
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    • 제20권5호
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    • pp.625-632
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    • 2004
  • Perfluorocompounds ($PFC_s$), such as tetrafluoromethane ($CF_4$) and hexafluoroethane ($C_2F_6$), have been widely used as plasma etching and chemical vapor deposition (CVD) gases for semiconductor manufacturing processes. Since these $PFC_s$ are known to cause a greenhouse effect intensively, there has been a growing interest in reducing $PFC_s$ emissions. Among various $CF_4$ decomposing techniques, a dielectric barrier discharge (DBD) is considered as one of a promising candidate because it has been successfully used for generating ozone ($O_3$) and decomposing nitrogen oxide (NO). Firstly, optimal concentration of oxygen for $CF_4$ decomposition was found to figure out how many primary and secondary reactions are associated with DBD process. Secondary, to find effective discharge method for $CF_4$ decomposition, a streamer and a glow mode in DBD are experimentally compared, which includes (i) coaxialcylinder DBD, (ii) DBD reactor packed with glass beads. and (iii) a glow mode operation with a helium gas. The test results showed that optimal concentration of oxygen was ranged 500 ppm~1% for treating 500 ppm of $CF_4$ and helium glow discharge was the most efficient one to decompose $CF_4$.

Decomposition of CFC-12($CCl_2F_2$) by Discharge Plasma (방전 플라스마에 의한 CFC-12($CCl_2F_2$)의 분해)

  • 강현춘;우인성;황명환;안형환;이한섭;조정국;강안수
    • Journal of the Korean Society of Safety
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    • 제14권3호
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    • pp.93-100
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    • 1999
  • Decomposition efficiency, power consumption, and applied voltage of CFC(Chlorofluorocatbon) were investigated by SPCP(surface induced discharge plasma chemical processing) reactor to obtain optimum process variables and maximum decomposition efficiencies. Decomposition efficiency of CFC-12 with various electric frequencies(5~50kHz). flow rates (100~1,000mL/min), initial concentrations(100~1,000ppm), electrode materials(W, Cu, Al). electrode thickness(1, 2, 3mm) and reference gases($N_2$, $O_2$, air) were measured and the products were analyzed with FT-IR. Experimental results showed that at the frequency of 10kHz, the highest decomposition efficiency of 92.7% for CFC-12 were observed at the power consumptions of 29.6W. respectively, and that decomposition efficiency decreased with increasing frequency above 20kHz and decomposition efficiency per unit power were 3.13%/W for CFC-12. Decomposition efficiency was increased with increasing residence times and with decreasing initial concentration of pollutants. Decomposition efficiency was increased with increasing thickness of discharge electrode and the highest decomposition efficiency was obtained for the electrode diameter of 3m. As the electrode material, decomposition efficiency was in order that tungsten(W), copper(Cu), aluminum (Al). Decomposition of CFC-12 in the reference gas of $N_2$ showed the highest efficiency among three reference gases, and then the effect of reference gas on the decomposition efficiency decreased in order of air and $O_2$. The optimum power for the maximum decomposition efficiency was 25.3W for CFC.

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Decomposition of Harmful Materials by SPCP Discharge (연변방전에 의한 유해물질의 분해제거)

  • 우인성;황명환
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • 제11권11호
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    • pp.1043-1048
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    • 1998
  • The decomposition performance of the Surface induced Plasma Chemical Processing(SPCP) for benzene, toluene, xylene and $NO_2$ were experimentally examined. Discharge exciting frequency range was 5kHz and 10kHz, and low frequency discharge requires high voltage to inject high electric power in gas and to decompose contaminants. The decomposition rate of dioxide nitrogen for 5kHz power in gas and to decompose contaminants. The decomposition rate of dioxide nitrogen for 5kHz power supply is only 85%, but it’s rate for 10kHz power supply is very high, more than 96% when peak voltage is 12kv. Aromatic hydrocarbon vapor of up to 1000ppm is almost throughly decomposed at the flow rate of 1000$\ell$/min or lower rate under the discharge with electric power of several hundred watts. High decomposition rate is shown in every case, that is, for SPCP reactor is necessary to obtain the decomposition rate of more than 80~98%. The decomposition rate of benzene, toluene and xylene were 90~98% and dioxide nitrogen was 45~96%.

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Electrical and NO Conversion Characteristics of Dielectric Barrier Discharge Process (질소산화물 제거를 위한 무성 방전 공정의 전기 및 NO 전환 특성)

  • Lee, Yong-Hwan;Jeong, Jae-U;Jo, Mu-Hyeon
    • The Transactions of the Korean Institute of Electrical Engineers C
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    • 제51권1호
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    • pp.15-21
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    • 2002
  • We investigated effects of electrical, physical, and chemical parameters on energy transfer, NO conversion, and light emission in the dielectric barrier discharge (DBD) process. As gap distance between electrodes increased, discharge onset voltage increased. However, as gap distance between electrodes increased, electric field which initiates discharge showed approximately the same value, 30kV/cm. The discharge onset voltage of the coarse surface electrode was lower than that of the smooth surface electrode. And, energy transfer was slightly enhanced in the coarse electrode condition. However, NO conversion rate decreased with the coarse surface electrode because more uniform discharge can be obtained on the smooth surface electrode. The NO conversion rate increased with decreasing the initial concentration, so the DBD process is more feasible in the lower concentration condition. The variation of gas residence time tested at the same energy density in the experiment did not affect on the NO conversion. The result shows that the NO conversion rate mainly depends on the energy density. The DBD process is able to adjust on plasma-photocatalyst process because it emits the short wavelength light in the range of ultraviolet. The intensity of light emission increased with the increase of the energy transfer to the reactor and the gas flow rate.