• 제목/요약/키워드: plasma pretreatment

검색결과 229건 처리시간 0.026초

Morphine과 Pentazocine의 혈장 Corticosterone 증가작용에 미치는 Naloxone 및 Diazepam의 영향 (Influences of Diazepam and Naloxine on the increase of Plasma Corticosterone Level induced by Morphine and Pentazocine)

  • 전보권;박정율;조근행;김수경
    • 대한약리학회지
    • /
    • 제19권1호
    • /
    • pp.115-122
    • /
    • 1983
  • The influences of diazepam and naloxone on the increase of plasma corticosterone level induced by morphine, pentazocine, ACTH, or picrotoxin were investigated in male mice. The results obtained were summarized as follows: 1) The increase induced by morphine or pentazocine of plasma corticosterone level was not affected by naloxone pretreatment but markedly suppressed by diazepam pretreatment. 2) The increase induced by ACTH of plasma corticosterone level was not affected by diazepam or naloxone pretreatment. 3) The picrotoxin markedly increased plasma corticosterone level, and the inceease was not affected by diazepam or naloxone pretreatment. This above results suggest that the increase induced by opioids of plasma corticosterone level seems to be rather related with other than opiate- or GABArerecptor.

  • PDF

ZnO ALE를 위한 Si, sapphire기판의 ECR 플라즈마 전처리 (ECR Plasma Pretreatment on Sapphire and Silicon Substrates for ZnO ALE)

  • 임종민;신경철;이종무
    • 한국재료학회지
    • /
    • 제14권5호
    • /
    • pp.363-367
    • /
    • 2004
  • Recently ZnO epitaxial layers have been widely studied as a semiconductor material for optoelectronic devices. Sapphire and silicon are commonly selected as substrate materials for ZnO epitaxial growth. In this communication, we report the effect of the ECR plasma pretreatment of sapphire and silicon substrates on the nucleation in the ZnO ALE (atomic layer epitaxy). It was found that ECR plasma pretreatment reduces the incubation period of the ZnO nucleation. Oxygen ECR plasma enhances ZnO nucleation most effectively since it increases the hydroxyl group density at the substrate surface. The nucleation enhancing effect of the oxygen ECR plasma treatment is stronger on the sapphire substrate than on the silicon substrate since the saturation density of the hydroxyl group is lower at the sapphire surface than that at the silicon surface.

저온플라즈마 및 효소처리한 면의 물성 및 염색성 (Physical Properties and Dyeing Behaviors of Cotton Fabric Treated with Low Temperature Plasma and/or Cellulase)

  • Yoon, Nam Sik;Lim, Yong Jin
    • 한국염색가공학회지
    • /
    • 제8권3호
    • /
    • pp.59-65
    • /
    • 1996
  • Cotton fabrics were treated by low temperature plasma and/or cellulase, and its physical and dyeing properties were investigated. All the pretreatments of the cotton with low temperature plasma of oxygen, nitrogen and argon slowed down the rate of weight loss of cotton in cellulase solution. Plasma pretreatment did not show any strength retention effect on cotton fiber in the subsequent cellulase treatment. Pretreatment of cotton with low temperature oxygen plasma decreased the rate of dyeing in direct dye bath, while cellulase or plasma/cellulase pretreatment increased the rate. Equilibrium dye uptake of cotton was not changed greatly by the pretreatments except the normal untreated cotton showed more or less high uptake. The pretreatment of cellulase with a water-soluble carbodiimide reduced the enzymatic activity, and did not show any strength retention of cotton in enzymatic weight loss.

  • PDF

Effects of Hydrogen Plasma Treatment of the Underlying TaSiN Film Surface on the Copper Nucleation in Copper MOCVD

  • Park, Hyun-Ah;Lim, Jong-Min;Lee, Chong-Mu
    • 한국세라믹학회지
    • /
    • 제41권6호
    • /
    • pp.435-438
    • /
    • 2004
  • MOCVD is one of the major deposition techniques for Cu thin films and Ta-Si-N is one of promising barrier metal candidates for Cu with high thermal stability. Effects of hydrogen plasma pretreatment of the underlying Ta-Si-N film surface on the Cu nucleation in Cu MOCVD were investigated using scanning electron microscopy, X-ray photoelectron spectroscopy and Auger electron emission spectrometry analyses. Cu nucleation in MOCVD is enhanced as the rf-power and the plasma exposure time are increased in the hydrogen plasma pretreatment. The optimal plasma treatment process condition is the rf-power of 40 Wand the plasma exposure time of 2 min. The hydrogen gas flow rate in the hydrogen plasma pretreatment process does not affect Cu nucleation much. The mechanism through which Cu nucleation is enhanced by the hydrogen plasma pretreatment of the Ta-Si-N film surface is that the nitrogen and oxygen atoms at the Ta-Si-N film surface are effectively removed by the plasma treatment. Consequently the chemical composition was changed from Ta-Si-N(O) into Ta-Si at the Ta-Si-N film surface, which is favorable for Cu nucleation.

Cu-MOCVD를 위한 TiN기판의 플라즈마 전처리 (Plasma pretreatment of the titanium nitride substrate fur metal organic chemical vapor deposition of copper)

  • 이종무;임종민;박웅
    • 한국재료학회지
    • /
    • 제11권5호
    • /
    • pp.361-366
    • /
    • 2001
  • TiN barrier 막 위에 metal organic chemical vapor deposition (MOCVD)법으로 Cu막을 증착함에 있어 TiN막 표면을 먼저 세정처리하지 않고 바로 Cu막을 증착하려하면 Cu의 핵생성이 어렵고, 그 결과 연속된 Cu막이 형성되지 못한다. 본 연구에서는 SEM, AES, AFM 등의 분석방법을 사용하여 TiN 막 표면에 대한 플라즈마 전처리 세정이 Cu막의 핵생성에 미치는 효과에 관하여 조사하였다. Gu의 전처리 세정방법으로는 direct플라즈마 방식이 원거리 플라즈마 방식보다 훨씬 더 효과적이다. 또한 수소플라즈마 전처리 시 rf-power와 플라즈마 조사시간이 증가함에 따라 세정효과는 더 증대된다. 플라즈마 전처리가 Cu의 핵생성을 고양시키는 원리는 다음과 같다. 플라즈마 내의 수소이온이 TiN과 반응하여 $NH_3$가 됨으로서 질소 성분이 제거되어 TiN이 Ti로 환원된다. Cu는 TiN기판보다는 Ti기판상에서 핵생성이 더 잘 되므로 플라즈마 전처리는 Cu의 핵생성을 돕는 효과를 가져온다.

  • PDF

The effect of plamsa treatment on superconformal copper gap-fill

  • 문학기;김선일;박영록;이내응
    • 한국진공학회:학술대회논문집
    • /
    • 한국진공학회 2009년도 제38회 동계학술대회 초록집
    • /
    • pp.249-249
    • /
    • 2010
  • The effect of forming a passivation layer was investigated in superconformal Cu gap-filling of the nano-scale trench with atomic-layer deposited (ALD)-Ru glue layer. It was discovered that the nucleation and growth of Cu during metal-organic chemical vapor deposition (MOCVD) were affected by hydrogen plasma treatments. Specifically, as the plasma pretreatment time increased, Cu nucleation was suppressed proportionally. XPS and Thermal Desorption Spectroscopy indicated that hydrogen atoms passivate the Ru surface, which leads to suppression of Cu nucleation owing to prevention of adsorption of Cu precursor molecules. For gap-fill property, sub 60-nm ALD Ru trenches without the plasma pretreatment was blocked by overgrown Cu after the Cu deposition. With the plasma pretreatment, superconformal gap filling of the nano-scale trenches was achieved due to the suppression of Cu nucleation near the entrances of the trenches. Even the plasma pretreatment with bottom bias leads to the superconformal gap-filling.

  • PDF

ACTH와 Picrotoxin에 의(依)한 혈당(血糖)과 혈장(血漿) Corticosterone 치(値)의 변동(變動)에 미치는 Chlordiazepoxide의 영향(影響) (Influence of Chlordiazepoxide on the Changes of Blood Sugar and Plasma Corticosterone Level Induced by ACTH and Picrotoxin in Mice)

  • 김영규;신만연
    • 대한약리학회지
    • /
    • 제16권2호
    • /
    • pp.39-44
    • /
    • 1980
  • Marc et al. reported that diazepam increased plasma corticosterone level and Dasgupta et al. suggested that chlordiazepoxide(CDP) supressed the adrenal response to ACTH. In this paper, the influence of CDP on the changes of blood sugar and plasma corticosterone level induced by ACTH and picrotoxin were investigated in male mice. The results obtained were summarized as follows; 1) The blood sugar and plasma corticosterone level were increased by CDP, ACTH, and picrotoxin, respectively. 2) The hyperglycemia induced by ACTH and picrotoxin were not affected by the CDP pretreatment. 3) The increase of plasma corticosterone level induced by ACTH was inhibited by the CDP pretreatment. 4) The increase of plasma corticosterone level appeared 30 minutes after picrotoxin injection was slightly enhanced, but the level of 120 minutes after picrotoxin injection was significantly inhibited by the CDP pretreatment.

  • PDF

EFFECTS OF XYLAZINE (ALPHA 2-ADRENERGIC AGONIST) ON THE STRESS RESPONSE TO IMMOBILIZATION AND HEAT IN RATS

  • Fayed, A.H.;Zakaria, A.D.;Hedaya, S.A.;El-Ashmawy, I.M.
    • Asian-Australasian Journal of Animal Sciences
    • /
    • 제7권3호
    • /
    • pp.397-400
    • /
    • 1994
  • The effect of xylazine administration on plasma cortisol, prolactin, glucose and packed cell volume (PCV) responses to immobilization and heat stress was investigated. Immobilization of rats for 2 hours by ligation of the fore and hind legs strongly caused approximately two-fold increase in plasma cortisol and prolactin levels. Plasma glucose and PCV were not significantly changed. Pretreatment of immobilized rats with xylazine (20 mg/kg body weight i.m.) resulted in approximately 20% reduction in both plasma cortisol and prolactin concentrations. A marked hyperglycemia and increase in the PCV value was observed. On the other hand, rats exposed to acute heat stress ($40^{\circ}C$, and 60% relative humidity) for 2 hours, also developed two fold increase in both plasma cortisol and prolactin concentrations and the pretreatment with xylazine caused a 20% reduction in the levels of both hormones. Plasma glucose level was not significantly changed in heat stressed rats but it was markedly increased after pretreatment with xylazine. PCV was significantly incrcased under heat stress and pretreatment with xylazine induced a pronounced elevation in this value. It was suggested that stimulation of cortisol and prolactin secretion in response to immobilization or heat stress can be partially reduced by an alpha 2-adrenergic agonist.

The Structure and Electrical Characteristics of CNTs Depending on the Hydrogen Plasma Treatment

  • Uh, Hyung-Soo;Lee, Soo-Myun;Jeon, Pil-Goo;Kwak, Byung-Hwak;Park, Sang-Sik;Cho, Euo-Sik;Lee, Jong-Duk;Kwon, Sang-Jik
    • 한국정보디스플레이학회:학술대회논문집
    • /
    • 한국정보디스플레이학회 2003년도 International Meeting on Information Display
    • /
    • pp.855-858
    • /
    • 2003
  • Carbon nanotubes (CNTs) were grown on Ni-coated TiN/Si substrate by microwave plasma chemical vapor deposition using mixture gas of $H_2/CH_4$ at low temperature of 500 $^{\circ}C$. Average diameter of CNTs could be easily controlled by $H_2$ plasma pretreatment time before CNTs growth. The turn-on voltages of CNT emitters were varied from 3.5 $V/{\mu}m$ to 9 $V/{\mu}m$ according to the hydrogen pretreatment conditions. The close relationship between electron emission characteristics and pretreatment time indicates that pretreatment condition can be a key process parameter in CNTs growth for field emission displays..

  • PDF

Phenytoin과 Phenobarbital이 뇌내(腦內) Catecholamine함량(含量)과 혈장(血漿) Corticosterone치(値) 변동(變動)에 미치는 영향(影響) (Influence of Phenytoin and Phenobarbital on the Changes of Brain Norepinephrine Content and Plasma Corticosterone Level in Mice)

  • 김남헌;천연숙
    • 대한약리학회지
    • /
    • 제18권2호
    • /
    • pp.51-58
    • /
    • 1982
  • In this paper, the influence of phenytoin and phenobarbical on the changes of brain norepinephrine(NE) content, plasma corticosterone and blood sugar level in mice were studied. The results obtained were summarized as follows: 1) Phenytoin(50 mg/kg) increased the brain NE content but phenobarbital(50 mg/kg) did not affect. The increase of the brain NE content induced phenytoin was potentiated by phenobarbital pretreatment. 2) Phenytoin(25 mg/kg, 50 mg/kg) markedly increased the level of plasma corticosterone but phenobarbital did not affect. The increase of the plasma corticosterone induced by phenytoin was inhibited by phenobarbital pretreatment. 3) Phenytoin(50 mg/kg) markedly increased the blood sugar level but phenobarbital did not affect. The increase of the blood sugar induced by phenytoin was not affected by phenobarbital pretreatment.

  • PDF