• Title/Summary/Keyword: plasma polymerization

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A Study on the molecular structure and molecular weight control of styrene films by plasma polymerization (플라즈마 중합법에 의한 스티렌 박막의 분자 구조 및 분자량 제어에 관한 연구)

  • 김종택;최충양;박종관;박응춘;이덕출
    • Journal of the Korean Vacuum Society
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    • v.6 no.3
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    • pp.213-219
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    • 1997
  • The plasma polymerized styrene films were prepared by using an inter-electrode capacitively coupled gas-flow-type reactor, and the effects of plasma polymerization condition on the molecular weight distribution were investigated by Fourier Transform Infrared (FT-IR), Pyrolysis Gas Chromatography(PyGC), Differential Scanning Calorimetry(DSC) and Gel Permeation Chromatography(GPC). From the above results, the very cross-linked films different from chemical characteristics of the starting monomer were taken out, and it is realized that the molecular structure, cross linking density, and molecular weight distribution could be controlled by changing the parameters such as deposition pressure, deposition power and gas flow rate. Accordingly, it is suggested that plasma polymerization method performed by inter-electrode capacitively coupled gas-flow-type reactor has good characteristics for manufacturing the functional organic thin films which can be applied in sensors, opto-electric device, photo-resist by changing the polymerization parameters.

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Emulsion Grafting of Glycidyl Methacrylate onto Plasma-treated Polypropylene Surface (플라즈마 처리된 폴리프로필렌 표면 위에 글리시딜메타크릴레이트의 에멀젼 그래프팅)

  • Ji, Han-Sol;Liu, Xuyan;Choi, Ho-Suk;Kim, Jae-Ha;Park, Han-Oh
    • Polymer(Korea)
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    • v.36 no.1
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    • pp.65-70
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    • 2012
  • Glycidyl methacrylate (GMA) was used to introduce epoxy groups on the surface of polypropylene (PP) plate, used as a substrate, through plasma-induced graft copolymerization. Emulsion polymerization was applied for graft copolymerization of GMA and was compared with conventional solution polymerization to confirm its effect. Plasma treatment conditions under one atmospheric pressure were fixed as follows; the RF power of 200 W, the treatment time of 30 sec, the Ar gas flow rate of 6 LPM, and the exposure time of treated PP samples in air of 5 min. For graft-copolymerization, GMA concentration, reaction temperature, and reaction time was optimized to maximize the grafting degree of GMA. The maximum grafting degree of GMA was obtained at the condition of 12%-GMA concentration, $90^{\circ}C$ reaction temperature, and 5 hr-reaction time. Analysis results supported that the emulsion polymerization was more effective than the solution polymerization for grafting more GMAs on the surface of PP plate under the same reaction conditions.

Poly-$\alpha$-methylstyrene Films by Plasma Polymerization(I) (플라즈마 중합된 Poly-$\alpha$-methylstyrene 박막(I))

  • Park, Sang-Hyun;Lee, Chwi-Cwung;Han, Sang-Ok;Lim, Youg-Hoon;Lee, Deok-Chool
    • Proceedings of the KIEE Conference
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    • 1991.11a
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    • pp.304-306
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    • 1991
  • A new gas-flow type reactor for plasma polymerization was developed to symthesize functional polymer, which enhances the reaction of radicals activated in discharge. $\alpha$-Methylstyrene was used for the polymerization, which are known as starting monomers for the polymer with degradating characteristics. The molecular structure and molecular weight distribution of the polymers were studied.

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The Optical Properties of Tetramethyldisiloxane Plasma Polymerization Thin Films (Tetramethyldisiloxane 플라즈마 중합막의 광학특성)

  • Choi, Chung-Seog;Park, Bok-Kee;Kim, Doo-Seog;Lee, Jin;Lee, Duck-Chool
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 1996.05a
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    • pp.146-149
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    • 1996
  • Polymerization rate, transmittance, refractive index, and extinction coefficient of plasma polymerized tetramethydisiloxane (TMD) have been investigated. The rate of polymerization of TMD films increased nonlinearly with the discharge lower. The refractive indices of thin films varied from 1.40 to 1.43 and they also increased with increasing discharge power. Also, the extinction coefficient was about 0.2 and is independent of photon energy.

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A Study on the Optical Properties of the Organic Thin Films by Plasma Polymerization (플라즈마 중합법에 의한 유기 박막의 광학 특성에 관한 연구(I))

  • Choi, C. S.;Jung, U.;Lee, D. C.;Park, G. B.;Park, S. H.;Park, B. K.
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 1992.05a
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    • pp.26-29
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    • 1992
  • In this study, We made use of interelectrode capacitively coupled type plasma polymerization apparatus in order to make th organic optical thin films. We adopted in Benzen. Styrene, which have optical function in the organic world. It is manufactured polymerization thin films and examined optics properties by it respectively. We have known that the refractive index decreased as discharging power increased. At the middle wave length as 550[nm], the refractive index of Styrene is smaller than one of Benzen. Then, it is known that measured results are valid because the extinction coefficient(K) is about 10$\^$-4/ for variation of refractive index.

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Amine functionalized plasma polymerized PEG film: Elimination of non-specific binding for biosensing

  • Park, Jisoo;Kim, Youngmi;Jung, Donggeun;Kim, Young-Pil;Lee, Tae Geol
    • Proceedings of the Korean Vacuum Society Conference
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    • 2016.02a
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    • pp.378.2-378.2
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    • 2016
  • Biosensors currently suffer from severe non-specific adsorption of proteins, which causes false positive errors in detection through overestimation of the affinity value. Overcoming this technical issue motivates our research. Polyethylene glycol (PEG) is well known for its ability to reduce the adsorption of biomolecules; hence, it is widely used in various areas of medicine and other biological fields. Likewise, amine functionalized surfaces are widely used for biochemical analysis, drug delivery, medical diagnostics and high throughput screening such as biochips. As a result, many coating techniques have been introduced, one of which is plasma polymerization - a powerful coating method due to its uniformity, homogeneity, mechanical and chemical stability, and excellent adhesion to any substrate. In our previous works, we successfully fabricated plasmapolymerized PEG (PP-PEG) films [1] and amine functionalized films [2] using the plasma enhanced chemical vapor deposition (PECVD) technique. In this research, an amine functionalized PP-PEG film was fabricated by using the plasma co-polymerization technique with PEG 200 and ethylenediamine (EDA) as co-precursors. A biocompatible amine functionalized film was surface characterized by X-ray photoelectron spectroscopy (XPS) and Fourier-transform infrared spectroscopy (FT-IR). The density of the surface amine functional groups was carried out by quantitative analysis using UV-visible spectroscopy. We found through surface plasmon resonance (SPR) analysis that non-specific protein adsorption was drastically reduced on amine functionalized PP-PEG films. Our functionalized PP-PEG films show considerable potential for biotechnological applications such as biosensors.

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Enhanced Properties of Epoxy Molding Compound by Plasma Polymerization Coating of Silica (실리카의 플라즈마 중합 코팅에 의한 에폭시 봉지재의 물성 향상 연구)

  • Roh, J.H.;Lee, J.H.;Yoon, T.H.
    • Journal of Adhesion and Interface
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    • v.2 no.2
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    • pp.1-10
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    • 2001
  • Silica for Epoxy Molding Compound (EMC) was coated via plasma-polymerization with RF plasma (13.56 MHz) as a function of treatment time, power and pressure. 1,3-diaminopropane, allylamine, pyrrole, 1,2-epoxy-5-hexene, allylmercaptan or allylalcohol were utilized for plasma polymerization coating and adhesion of coated silica was evaluated by measuring flexural strength. CTE and water absorption of EMC were also measured, and fracture surface of flexural specimen was analyzed by SEM in order to elucidate the failure mode. The plasma polymer coated silica was analyzed by FT-IR and reactivity of plasma polymer coating with epoxy resin was evaluated with DSC in order to investigate the adhesion mechanism. The EMC prepared from the silica coated with 1,3-diaminopropane or allylamine exhibited high flexural strength, low CTE, and low water absorption compared with the control sample, and also exhibited 100% cohesive failure mode. These results can be attributed to the chemical reaction between the functional groups in the plasma polymer coating and epoxy resin, and also consistent with the results from FT-IR and DSC analysis.

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Electrical Characteristic of PMMA Thin Film by Plasma Polymerization Method with Process Pressure and RF Substrate Bias Power (공정압력 및 기판바이어스 인가유무에 따른 PMMA 플라즈마중합박막의 전기적 특성)

  • Lee, Boong-Joo
    • The Journal of the Korea institute of electronic communication sciences
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    • v.6 no.5
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    • pp.697-702
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    • 2011
  • In this paper, We have fabricated PMMA thin films by plasma polymerization method for organic thin film transistor's insulator layer. In the electrical characteristic results with deposition pressures and substrate RF bias power in thin film deposition process, we have got dielectric constant of 3.4, high deposition rate of 8.6 [nm/min] and high insulation characteristics in condition of RF100 [W], Ar20 [sccm], 5 [mtorr], RF bias 20 [W]. Therefore, the fabricated thin films are possible as insulation layer of OTFT and organic memory.

Polymer thin film organic transistor characteristics with plasma treatment of interlayers (플라즈마 표면처리에 따른 유기트랜지스터 특성)

  • Lee, Boong-Joo
    • The Journal of the Korea institute of electronic communication sciences
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    • v.8 no.6
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    • pp.797-803
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    • 2013
  • In this paper, we fabricated insulator thin films by plasma polymerization method for organic thin film transistor's insulator layer. For improving the electrical characteristics of organic transistor, we treated the semiconductor thin film with $O_2$ plasma. As results, the surface energy of organic transistor was increased from $38mJ/m^2$ to $72mJ/m^2$ and the mobility of organic transistor was increased $0.057cm^2V^{-1}s^{-1}$, that is increased 29% average ratio. Therefore, we have known that oragnic transistor's mobility can improve with plasma treatment of semiconductor thin film's surface.