• 제목/요약/키워드: photosensitive polymer

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Wide-Viewing Liquid Crystal Displays with Periodic Surface Gratings

  • Lee, Sin-Doo;Park, Jae-Hong;Yoon, Tae-Young;Yu, Chang-Jae
    • 한국정보디스플레이학회:학술대회논문집
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    • 2002.08a
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    • pp.947-952
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    • 2002
  • A new concept of forming self-aligned multidomains is used for fabricating wide-viewing liquid crystal displays (LCDs) with periodic surface gratings.An array of the periodic surface gratings is produced on substrates using a photosensitive polymer by the illumination o. the UV light through a patterned photomask. A multidomain structure is naturally formed on the grating surface by the initial director distortions together with continuous variations of an external electric field. The LCD cells with periodic surface gratings are found to show excellent extinction in the off-state and wide-viewing property m the on-state.

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Synthesis and Photocharacteristics of Bismaleimide Containing Ester Linkage (Ester Linkage를 함유한 Bismaleimide의 합성과 감광특성)

  • Kim, Sang-Min;Kim, Tae-Ho
    • Applied Chemistry for Engineering
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    • v.8 no.2
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    • pp.147-153
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    • 1997
  • Bismaleimides(BISMI) containing ester linkages were prepared by the chlorinated N-(p-carboxyphenyl)maleimide and N-(p-hydroxyphenyl)maleimide. The photosensitive properties of BISMI were investigated via changes of the irradiation time. Benzil dimethyl ketal was used as a photoinitiator. The effect of photoinitiator onto BISMI increase in average as increasing photoinitiator concentration and irradiation time. The yield of residual film and image pattern and resolution also measured and discussed.

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Studies on Photosensitive Resins.-Molecular Weight Determination of Isophthalic Acid-Cinnamic Acid-Glycerine Polycondensates (感光性樹脂에 關한 硏究-Isophthalic acid-Cinnamic acid-Glycerine 系 縮重合物의 分子量에 關하여)

  • Shim, Jyong-Sup;Lee, Boo-Sop
    • Journal of the Korean Chemical Society
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    • v.6 no.1
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    • pp.94-98
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    • 1962
  • The polycondensates of isophthalic acid-cinnamic acid-glycerine system were synthesized. The molecular weights of these products were determined by two methods, viscosity method and osmotic pressure methods. In the synthesis of resin, the reaction temperature was kept at 232$^{\circ}C$ and the mole ratio of the reactants was chosen as follows: Glycerine ;1.0 Isophthalic acid ;1.0 Cinnamic acid ;2.8 Excessive cinnamic acid prevented gelation of reaction mixtures. As the solution became very dilute, reduced osmotic pressure P/C (at the concentration of solution below 0.24g/100 ml of acetone) and reduced viscosity ${\eta}_{sp}/C$ (at the concentration of solution below 0.32 g/100 ml of acetone) increased rapidly. The correspondence between molecular weights determined by the two methods made Huggin's equation applicable to the prepared polymer. The values of K and a are $2.77{\times}10^{-5}$ and 1.063, respectively.

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Study on characteristics of liquid crystal alignment on photosensitive polyimide having thermal stability (고내열성을 가진 감광성 폴리이미드의 액정배향 특성에 관한 연구)

  • Lee, Sang-Min;Hwan, Jeoung-Yeon;Nam, Ki-Hyung;Seo, Dae-Shik;Suh, Dong-Hack
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2003.11a
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    • pp.502-505
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    • 2003
  • We synthesized high thermal photoalignment material with hydroxyl aromatic polyimide, and studied the liquid crystal (LC) aligning capabilities on the photopolymer layers. Also, electro-optical (EO) performances for the twisted-nematic (TN)-liquid crystal display (LCD) photoaligned with linearly polarized UV exposure were investigated. A good LC alignment with UV exposure on the photopolymer surface can be obtained. However, the low pretilt angles were obtained below $1^{\circ}$. The Voltage-transmittance (V-T) curve without backflow bounce in the photoaligned TN cell with UV exposure was observed. The response time of photoaligned TN cell was measured about 24 ms.

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Synthesis of Photobase Generators and Their Use for Design of Polymeric Photosensitive System

  • Tsunooka, Masahiro;Tachi, Hideki;Asakino, Kaori;Suyama, Kanji
    • Journal of Photoscience
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    • v.6 no.3
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    • pp.145-151
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    • 1999
  • The use of O-carbamoyloximes as photobase generators was investigated. $\alpha$-Meth-ylbenzilydeneamino phenylcarbamate(2a) and $\alpha$-methyl benzilydeneamino cyclohexylcarbamate(2b) were prepared by the reaction of phenyl or cyclohexyl isocyanates with acetophenone oxime , respectively. Aniline, phenylhydrazine and N, N'-diphenylhydrazine were detected in thephotolysis of 2a and cyclohexylamine and cyclohexylhydrazine in the photolysis of 2b. A monomer having pendant carbamoyloxyimino groups (BGM) was prepared by the reaction fo methancryloyloxyethyl iocyanate with acetophenone oxime, and copolymerized with styrene. The BGM copolymer films turned insoluble on UV irradiation, and the degree of insolubilizationwas increased by post-baking. The photocrosslinking was thought to be due to coupling of resulting pendant aminyl radicals, and the thermal crosslinking was due to association of resulting amino and hydrazino groups by hydrogen bonding. The introduction of epoxy groups into polymer increased the degree of thermal crosslinking by post-baking.

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Synthesis and Photocharacteristics of Poly(p-Anol-Formaldehyde) Cinnamate (Poly(p-Anol-Formaldehyde) Cinnamate의 합성과 그 감광특성)

  • Kwon, Soon-Yong;Seo, Kum-Jong;Park, Hong-Soo
    • Journal of the Korean Applied Science and Technology
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    • v.15 no.1
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    • pp.9-15
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    • 1998
  • Poly(p-anol-formaldehyde) cinnamates(AGEFCs) were synthesized to prepare a photo-sensitive polymer which enabled to be photodimerized via 6-center reaction. The photocharacteristics of the mixture of the AGEFCs and a sensitizer after exposure to light was tested. The yield of the residual film, which was closely related to the sensitivity of the film, was affected by the degree of polymerization of the backbone resin, sensitizers and their concentration. AGEFC-3 revealed a good photosensitive effect such as about 73% yield of residual film at 128 min. of exposed time.

Adhesive bonding using thick polymer film of SU-8 photoresist for wafer level package

  • Na, Kyoung-Hwan;Kim, Ill-Hwan;Lee, Eun-Sung;Kim, Hyeon-Cheol;Chun, Kuk-Jin
    • Journal of Sensor Science and Technology
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    • v.16 no.5
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    • pp.325-330
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    • 2007
  • For the application to optic devices, wafer level package including spacer with particular thickness according to optical design could be required. In these cases, the uniformity of spacer thickness is important for bonding strength and optical performance. Packaging process has to be performed at low temperature in order to prevent damage to devices fabricated before packaging. And if photosensitive material is used as spacer layer, size and shape of pattern and thickness of spacer can be easily controlled. This paper presents polymer bonding using thick, uniform and patterned spacing layer of SU-8 2100 photoresist for wafer level package. SU-8, negative photoresist, can be coated uniformly by spin coater and it is cured at $95^{\circ}C$ and bonded well near the temperature. It can be bonded to silicon well, patterned with high aspect ratio and easy to form thick layer due to its high viscosity. It is also mechanically strong, chemically resistive and thermally stable. But adhesion of SU-8 to glass is poor, and in the case of forming thick layer, SU-8 layer leans from the perpendicular due to imbalance to gravity. To solve leaning problem, the wafer rotating system was introduced. Imbalance to gravity of thick layer was cancelled out through rotating wafer during curing time. And depositing additional layer of gold onto glass could improve adhesion strength of SU-8 to glass. Conclusively, we established the coating condition for forming patterned SU-8 layer with $400{\mu}m$ of thickness and 3.25 % of uniformity through single coating. Also we improved tensile strength from hundreds kPa to maximum 9.43 MPa through depositing gold layer onto glass substrate.

Fabrication of FET-Type $Ca^{2+}$ Sensor by Photolithographic Method and Its Characteristics (Photolithography에 의한 FET형 $Ca^{2+}$ 센서의 제작 및 특성)

  • Park, Lee-Soon;Hur, Young-Jun;Sohn, Byung-Ki
    • Journal of Sensor Science and Technology
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    • v.5 no.1
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    • pp.15-22
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    • 1996
  • FET type $Ca^{2+}$ sensor(Ca-ISFET) was fabricated by micropool and photolithographic method utilizing photosensitive polymer as membrane materials. When OMR-83 negative photoresist was used as membrane material, it gave good sensitivity by micropool method with dioctyladipate as plasticizer but it could not be used in the photolithographic method. When poly(viny1 butyral), PVB was used as membrane material, it gave relatively high sensitivity ($23{\pm}0.2\;mV/decade$) for $Ca^{2+}$ concentration range of $10^{-4}{\sim}10^{-1}\;mole/{\ell}$ by photolithographic method. PVB also provided good adhesion to the pH-ISFET base device without adhesion promoter pretreatment and any plasticizer.

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Synthesis of Newel Self-Developing Photosensitive Polyimide

  • Ahn, Byung-Hyun;Lee, Dae-Woo;Lee, Jin-Kook;Hong, Seong-Soo;Lee, Gun-Dae
    • Macromolecular Research
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    • v.8 no.1
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    • pp.19-25
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    • 2000
  • Aromatic diamine monomers containing allylic ester linkage, 1,5-bis(4-aminobenzoate)-1,2,3,4-tetrahydronaphthalene (4-DABTN) and 1,5-bis(3-amin obenzoate)-1,2,3,4-tetrahydronaphthalene (3-DABTN) were synthesized through the reaction of 1,5-dihydroxy-1,2,3,4-tetrahydronaphthalene and 4- or 3-nitrobenzoly chloride. By the reaction of these diamines with pyromellitic dianhydride (PMDA) or 4,4-(hexafluoroisopropylidene)diphthalic anhydride (6FDA), poly(amic acid)s were obtained. The inherent viscosities of the poly(amic acid)s were between 0.55 and 1.31 dL/g. The poly(amic acid)s were converted to polyimides by chemical imidization. The thermogravimetric analysis (TGA) thermograms of these polyimides showed temperatures of 5% weight loss between 323 and 389$^{\circ}C$ in nitrogen atmosphere. The model compound ,1,5-bis (4-nitrobenzoate)-1,2,3,4-tetrahydronaphthalene (4-DNBTN), was decomposed to 4-nitrobenzoic acid and 5-(4-nitrobenzoate)-3,4-dihydronaphthalene upon addition of CF$_3$COOH.

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Studies of Liquid Crystal Alignment on the Photosensitive Polyvinylfluorocinnamate (광감성 폴리비닐플루오로신나메이트의 액정 배향에 관한 연구)

  • Kim, Dong-Soo;Ahn, Won-Sool;Ha, Ki-Ryong;Buluy, O.;Reznikov, Yu.
    • Polymer(Korea)
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    • v.31 no.5
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    • pp.393-398
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    • 2007
  • We studied the mechanism of liquid crystal alignment on polyvinylfluorocinnamate (PVCN-F) films which were irradiated by UV using polarized fourier transform infrared (FT-IR) spectroscopy and ultraviolet/visible (UV/Vis) spectroscopy. UV irradiation of PVCN-F films caused decrease of vinylene -C=C- stretching peak area at $1638cm^{-1}$ and shift of conjugated C:0 stretching vibration at $1712cm^{-1}\;to\;1734cm^{-1}$ which is caused by nonconjugated C=O stretching nitration. To study the orientation direction of 5CB liquid crystal (LC) molecules in the liquid crystal cell with PUV irradiation, rubbing treatment or without any treatment on the PVCN-F alignment layer, we used polarized FT-IR dichroism technique. We successfully measured 5CB LC alignment directions, which are perpendicular to the irradiated PUV polarization direction and parallel to the rubbing direction in the liquid crystal cell without using dichroic dyes.