• 한국안전학회지
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• 제16권3호
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• pp.68-75
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• 2001

Photopolymerization, the utilization of electromagnetic radiation(or light) as the energy source for polymerization of functional monomers, oligomers is the basis of important commercial processes with broad applicability, including photoimaging and RV curing of coatings and inks. The objective of this study is to investigate the characteristics of environmental fraternitive photopolymerization of methyl methacrylate(MMA). This work is the first step to continue further research about alkyl methacrylate. The experiment was done in aqueous solution under the influence of photo-initiator concentration(0.05-0.25mol/l), light intensity (5000-9000 ${\mu}J/cm^2$) and monomer concentration(2-6mol/l). Methyl methacrylate was polymerized to high conversion ratio using hydrogen peroxide($H_2O_2$) and the kinetics model we have obtained is as follows. $R_p=k_p[S]^{0.41}[M]^{0.62}[L]^{2.45} exp(53.64/RT$). The differential method of thermogravimetric analysis(Friedman method) was used to obtain value of activation energy on decomposition reaction. The average value of it res 45.4Kca1/mol.

• Macromolecular Research
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• 제10권4호
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• pp.204-208
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• 2002

A linear rod-like molecule, bis[4-(1,3-octadynyl)phenyl] terephthalate (2), consisting of two diacetylenic groups, was prepared. The unsymmetric diacetylene was prepared by the Cadiot-Chodkiewicz coupling reaction of 1-bromohexyne with 4-ethynylphenol and linked to a benzene core by an esterification reaction with terephthaloyl chloride in tetrahydrofuran. The thin film (200 nm thickness) of compound 2 was fabricated by the physical vapor deposition on a glass plate with a thermal evaporator. In the X-ray diffraction (XRD) study, the vapor deposited film on the glass plate showed peaks with d spacings of 19.4, 5.7, and 4.5 $\AA$. This XRD pattern was quite different from that observed for compound 2 isolated by recrystallization from methylene chloride/hexane. The vapor deposited film was polymerized by UV irradiation. Photopolymerization was carried out through a photomask, resulting in a patterned image, where the irradiated part became isotropic.

• 대한화학회지
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• 제46권5호
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• pp.437-471
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• 2002

포토레지스트의 감도 증진은 광산 발생제로부터 발생되는 산에 의해 자동촉매분해가 일어나는 산 증식제를 화학 증폭형 포트레지스트에 첨가함으로써 얻을 수 있다. 본 연구에서는 이소프로필리덴 디시클로헥산올의 p스티렌술폰산 유도체를 산 증식제로 합성되고 그 성능을 평가하였다. 이러한 산 증식제로 합성한 4-hydroxy-4`-p-styrensulfonyloxy isopropylidene dicyclohexane(1), 4,4`-di-styrenesulfonyloxy isopropylidene dicyclohexane(2) 그리고 4-p-styrene-sulfonyloxy-4`-tosyloxy isopropylidene dicyclohexane(3)는 레지스트 공정온도에 대하여 충분한 열적 안정성을 나타내었다. 또한 이러한 산 증식제를 사용한 경우에 광산 발생제만 사용한 poly(tert-butyl methacrylate)film에 비교하여 2배에서 12배 정도의 감도 증진이 일어나 광화상 제조에 실용적으로 응용 할 수 있음을 확인하였다.