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http://dx.doi.org/10.5012/jkcs.2002.46.5.437

Preparation and Characterization of p-Styrenesulfonates of Isopropylidene Dicyclohexanol as Acid Amplifiers to Enhance the Photosensitivity of Positive-Working Photoresists  

Lee, Eun-Ju (Division of Image and Information Engineering, Pukyong National University)
Hong, Kyong-Il (Division of Image and Information Engineering, Pukyong National University)
Lim, Kwon-Taek (Division of Image and Information Engineering, Pukyong National University)
Jeong, Yong-Seok (Division of Image and Information Engineering, Pukyong National University)
Hong, Sung-Su (School of Chemical Engineering, Pukyong National University)
Jeong, Yeon-Tae (Division of Image and Information Engineering, Pukyong National University)
Publication Information
Journal of the Korean Chemical Society / v.46, no.5, 2002 , pp. 437-471 More about this Journal
Abstract
The photosensitivity enhancement of photoresist achieved by the addition of acid amplifiers stems from the autocatalytic decomposition of the acid amplifiers triggered by acidic species generated from a photoacid gen-erator. In this research we synthesized and evaluated 4-hydroxy-4'-p-styrenesulfonyloxy isopropylidene dicyclohex-ane(1), 4,4'-di-p-styrenesulfonyloxy isopropylidene dicyclohexane(2) and 4-p-styrenesulfonyloxy-4'-tosyloxy isopropylidene dicyclohexane(3) as novel acid amplifiers. These acid amplifiers(1-3) showed reasonable thermal stability for resist pro-cessing temperature. As estimated by the sensitivity curve, 1-3 were 2X-12X sensitive than poly(tert-butyl meth-acrylate) film in the presence of a photoacid generator and, therefore, provides practical applicability for photoimaging.
Keywords
Acid Amplifier; Photoacid Generator; Chemically Amplified Photoresist;
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