• Journal of the Korean Society of Safety
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• v.16 no.3
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• pp.68-75
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• 2001

Photopolymerization, the utilization of electromagnetic radiation(or light) as the energy source for polymerization of functional monomers, oligomers is the basis of important commercial processes with broad applicability, including photoimaging and RV curing of coatings and inks. The objective of this study is to investigate the characteristics of environmental fraternitive photopolymerization of methyl methacrylate(MMA). This work is the first step to continue further research about alkyl methacrylate. The experiment was done in aqueous solution under the influence of photo-initiator concentration(0.05-0.25mol/l), light intensity (5000-9000 ${\mu}J/cm^2$) and monomer concentration(2-6mol/l). Methyl methacrylate was polymerized to high conversion ratio using hydrogen peroxide($H_2O_2$) and the kinetics model we have obtained is as follows. $R_p=k_p[S]^{0.41}[M]^{0.62}[L]^{2.45} exp(53.64/RT$). The differential method of thermogravimetric analysis(Friedman method) was used to obtain value of activation energy on decomposition reaction. The average value of it res 45.4Kca1/mol.

• Macromolecular Research
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• v.10 no.4
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• pp.204-208
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• 2002

A linear rod-like molecule, bis[4-(1,3-octadynyl)phenyl] terephthalate (2), consisting of two diacetylenic groups, was prepared. The unsymmetric diacetylene was prepared by the Cadiot-Chodkiewicz coupling reaction of 1-bromohexyne with 4-ethynylphenol and linked to a benzene core by an esterification reaction with terephthaloyl chloride in tetrahydrofuran. The thin film (200 nm thickness) of compound 2 was fabricated by the physical vapor deposition on a glass plate with a thermal evaporator. In the X-ray diffraction (XRD) study, the vapor deposited film on the glass plate showed peaks with d spacings of 19.4, 5.7, and 4.5 $\AA$. This XRD pattern was quite different from that observed for compound 2 isolated by recrystallization from methylene chloride/hexane. The vapor deposited film was polymerized by UV irradiation. Photopolymerization was carried out through a photomask, resulting in a patterned image, where the irradiated part became isotropic.

• Journal of the Korean Chemical Society
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• v.46 no.5
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• pp.437-471
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• 2002

The photosensitivity enhancement of photoresist achieved by the addition of acid amplifiers stems from the autocatalytic decomposition of the acid amplifiers triggered by acidic species generated from a photoacid gen-erator. In this research we synthesized and evaluated 4-hydroxy-4'-p-styrenesulfonyloxy isopropylidene dicyclohex-ane(1), 4,4'-di-p-styrenesulfonyloxy isopropylidene dicyclohexane(2) and 4-p-styrenesulfonyloxy-4'-tosyloxy isopropylidene dicyclohexane(3) as novel acid amplifiers. These acid amplifiers(1-3) showed reasonable thermal stability for resist pro-cessing temperature. As estimated by the sensitivity curve, 1-3 were 2X-12X sensitive than poly(tert-butyl meth-acrylate) film in the presence of a photoacid generator and, therefore, provides practical applicability for photoimaging.