Characteristics of SiO2 Gas Barrier Films as a Function of Process Conditions in Facing Target Sputtering (FTS) System (대향타겟식 스퍼터링 장치의 공정 조건에 따른 SiO2 가스 차단막의 특성)
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- Journal of the Korean Institute of Electrical and Electronic Material Engineers
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- v.22 no.7
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- pp.595-601
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- 2009