• Journal of the Korean Society for Precision Engineering
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• v.25 no.3
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• pp.7-14
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• 2008

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2009.06a
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• pp.895-896
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• 2009

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2009.10a
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• pp.199-200
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• 2009

• 한국초전도학회:학술대회논문집
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• 2008.08a
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• pp.83-83
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• 2008

• 한국정보디스플레이학회:학술대회논문집
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• 2006.08a
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• pp.953-955
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• 2006

In this work we compared different sources of composition of Ag powders obtained by dry and wet process on the photolithographic patterning of PDP electrode and resistance of sintered Ag electrode. It was found that 90 : 10 wt% ratio of Ag powder made by dry and wet processes gave optimum result both on the PDP electrode pattern and resistance of PDP electrode after sintering.

• 한국정보디스플레이학회:학술대회논문집
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• 2006.08a
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• pp.1154-1157
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• 2006

Organic thin-film transistors (OTFTs) based on a semiconducting polymer have been fabricated using an organic patterning methodology. Laser assisted lift-off (LALO) technique, ablating selectively the hydrophobic layer by an excimer laser, was used for producing a semiconducting polymer channel in the OTFT with high resolution. The selective wettability of a semiconducting polymer, poly (9-9-dioctylfluorene-co-bithiophene) (F8T2), dissolved in a polar solvent was found to define precisely the pattering resolution of the active channel. It is demonstrated that in the F8T2 TFTs fabricated using the LALO technique and is applicable for the larger area display.

• Journal of Information Display
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• v.12 no.4
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• pp.205-208
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• 2011

Herein, the integration of solution-processed polymer thin-film transistors (TFTs) that were fabricated using selective wettability through ultraviolet (UV) exposure into a reflective liquid crystal display is demonstrated. From the experimental results of energy-dispersive spectroscopy, the composition of carbon and fluorine enhancing the hydrophobicity in the polymer chains was found to play a critical role in the wetting selectivity upon UV exposure. The polymer TFTs fabricated through the wettability-patterning process exhibited long-term stability and reliability. This wetting-selectivity-based patterning technique will be useful for constructing different types of solution-processed electronic and optoelectronic devices.

• Journal of Information Display
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• v.9 no.1
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• pp.14-19
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• 2008

We demonstrated the capillary force lithography (CFL) method for controlling the azimuthal anchoring energy of a liquid crystal (LC) alignment layer. When a thermoplastic polymer film is heated to over the glass transition temperature, the melted polymer is filled into the mold structure by the capillary action and the aspect ratio of the pattern is determined by the dewetting time of the CFL process. Here, the proposed method showed that the azimuthal anchoring energy of the LC alignment layer could be simply controlled by the surface relief patterns which were determined by the dewetting times during the CFL patterning.

• 한국정보디스플레이학회:학술대회논문집
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• 2009.10a
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• pp.868-870
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• 2009

Here we report another soft lithography, peel-off method, for patterning conductive polymer anodes in the fabrication of flexible ITO-free organic light-emitting diodes. This method doesn't require any heating process and UV light. We have demonstrated that such a peel-off technique enables the formation of a very sharp edge and the enhancement of edge roughness.

• 한국정보디스플레이학회:학술대회논문집
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• 2007.08a
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• pp.181-185
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• 2007

We report on our material and process research on ZnO:Al films and on our investigations on wet chemical etching using a variety of etching solutions. We achieve resistivity as low as $750{\mu}{\Omega}cm$ for ZnO:Al films with film thickness of 140 nm. Etching with phosphorous acid allows for accurate fine patterning of the ZnO:Al films on glass substrates.