• 한국소성가공학회:학술대회논문집
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• 한국소성가공학회 2004년도 추계학술대회논문집
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• pp.305-310
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• 2004

The Hot Embossing Lithography(HEL) as a method for the fabrication of nanostructure with polymer is becoming increasingly important because of its simple process, low cost, high replication fidelity and relatively high throughput. In this study, we investigated the characteristics of hot embossing lithography as a nanoreplication technique. To grasp characteristics of nano patterning rheology by process parameters(embossing temperature, pressure and time), we have carried out various experiments by using the DVD(400nm pattern width) and Blu-ray nickel stamps(150nm pattern width). During the hot embossing process, we have observed the characteristics of the size effect. The quality of products made by hot embossing is affected by its cooling shrinkage. The demolding process at the glass transition temperature results in low quality because of the shrinkage of the polymer. Therefore, the quantification of the temperature condition is essential for the replication of high quality.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2013년도 제44회 동계 정기학술대회 초록집
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• pp.632-632
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• 2013

We generated single-crystal organic nanowire arrays using a direct printing method (liquidbridge- mediated nanotransfer molding) that enables the simultaneous synthesis, alignment and patterning of nanowires from molecular ink solutions. Using this method, single-crystal organic nanowires can easily be synthesized by self-assembly and crystallization of organic molecules within the nanoscale channels of molds, and these nanowires can then be directly transferred to specific positions on substrates to generate nanowire arrays by a direct printing process. The position of the nanowires on complex structures is easy to adjust, because the mold is movable on the substrates before the polar liquid layer, which acts as an adhesive lubricant, is dried. Repeated application of the direct printing process can be used to produce organic nanowire-integrated electronics with twoor three-dimensional complex structures on large-area flexible substrates. This efficient manufacturing method is used to fabricate all-organic nanowire field-effect transistors that are integrated into device arrays and inverters on flexible plastic substrates.

• 한국정밀공학회지
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• 제29권1호
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• pp.19-24
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• 2012

We demonstrate the desert beetle back mimicking hybrid superhydrophilic/superhydrophobic patterned surface by using the combination method of colloidal lithography and gravure offset printing for nano and micro patterning, respectively. The two methods are cost-effective and industrially available techniques compared to the other nano/micro patterning methods. To verify the water collecting function of the hybrid surface, the water condensation behavior is investigated on the chilled surface in ambient temperature and high humidity. Due to the synergetic effect of drop and film wise condensation, the hybrid superhydrophobic/superhydrophilic surface shows the higher efficiency than one of single wettability surfaces. The work is underway to get the good patterns of hybrid surfaces for water collecting from the dew or fog.

• 한국진공학회지
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• 제21권1호
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• pp.55-61
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• 2012

본 연구에서는 주기적인 3차원 패턴이 형성된 유리기판을 사용하여 비정질 실리콘 박막 태양전지를 제작하였다. 주기적인 패턴은 일반적인 전도성 투명 산화막(TCO: Trasparent Conductive Oxide) 표면의 불규칙 패턴과 비교하여 더 효율적인 광포획을 가능하게 한다. 태양전지 제작 전 광특성 전산모사를 통하여 주기적인 패턴 유리 기판의 광학적 특성을 알아보았다. 비정질 실리콘 박막 태양전지의 제작은 PECVD를 이용하여 구면 패턴이 형성된 유리기판을 이용하여 제작되었으며, 인공 태양광 조사장치를 이용하여 제작된 태양전지의 성능 평가를 진행하였다. 태양전지 전산모사 결과와 실험 결과들을 비교 분석하여 주기적인 패턴 유리 기판을 이용한 비정질 실리콘 박막 태양전지의 효율향상 가능성을 확인하였다.

• 한국융합학회논문지
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• 제11권7호
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• pp.157-162
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• 2020

최근 레이저를 이용하여 환원된 친환경 그래핀 패턴 기술(Laser Induced Graphene, LIG)은 간단하고 효율적으로 원하는 형태로 다양한 기판 위에 패터닝하는 것이 가능하여 신축 유연 전자 소자, 박막 형태의 에너지 저장 소자 등과 같이 새로운 친환경 전자 소자 제작에 많이 활용되고 있다. 이러한 그래핀 패턴 구조를 이용한 전자 소자의 성능과 효용성을 높이기 위해서는 그래핀 고유의 2차원 특성을 유지하면서 가능한 최소한의 선폭을 구현할 수 있는 최적화된 레이저 패터닝 조건에 대한 연구가 필수적이다. 본 논문에서는 최근 레이저 그래핀 패턴 연구에서 많이 사용되는 Ti:sapphire 펨토초 레이저를 이용해서 그래핀 광-열 산화반응을 분석하여 최적화된 그래핀의 최소선폭을 구현하였다. 레이저 에너지의 확산 효과를 최소화하기 위하여 레이저 광강도와 레이저 스캔 속도를 조절하여 최적의 그래핀 특성을 나타내는 패턴을 연구하였으며 18 ㎛의 집속된 빔을 이용하여 최소 30 ㎛의 이차원 그래핀 선폭을 구현하였다.

• 한국광학회지
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• 제20권6호
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• pp.334-338
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• 2009

최근 디스플레이 기기의 수요가 증대되면서 대면적 노광에 대한 요구가 증대되고 있는데, 내부전반사(total internal reflection: TIR)홀로그래픽 리소그라피는 대면적 노광을 위한 효과적인 방법으로 연구가 진행되고 있다. TIR 홀로그래피에서는 일반적으로 레이저를 이용하여 영상을 기록하고 재생한다. 그러나 자외선 램프와 같은 비가간섭광을 이용하여 재생한다면, 가간섭성에 의해 나타나는 영상잡음을 줄일 수 있고, 대면적 노광에도 보다 용이할 것이다. TIR 홀로그램의 재생을 위하여 자외선 램프를 이용할 때, 램프의 유한한 선폭과 확산각이 재생 영상에 미치는 영향을 분석하고, 재생패턴에 나타나는 선폭 확대 결과를 실험을 통하여 검증하였다. ${\mu}m$ 규모의 선폭을 갖는 대면적 패턴을 TIR 홀로그램으로부터 얻기 위한 재생 광원으로, 가간섭성 광원인 레이저 대신 저잡음성과 경제성을 갖춘 일반적인 자외선 램프의 사용이 가능할 것으로 기대된다.

• Macromolecular Research
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• 제17권3호
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• pp.197-202
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• 2009

Solution-based, direct-write patterning by an automated, computer-controlled, inkjet technique is of particular interest in a wide variety of industrial fields. We report the construction of three-dimensional (3D), micro-patterned structures by polymer inkjet printing. A piezoelectric, drop-on-demand (DOD) inkjet printing system and a common polymer, PVA (poly(vinyl alcohol)), were explored for 3D construction. After a systematic preliminary study with different solvent systems, a mixture of water and DMSO was chosen as an appropriate solvent for PVA inks. The use of water as a single solvent resulted in frequent PVA clogging when the nozzles were undisturbed. Among the tested polymer ink compositions, the PVA inks in a water/DMSO mixture (4/1 v/v) with concentrations of 3 to 5 g/dL proved to be appropriate for piezoelectric DOD inkjet printing because they were well within the proper viscosity and surface tension range. When a dot was printed, the so-called 'coffee-ring effect' was significant, but its appearance was not prominent in line printing. The optimal polymer inkjet printing process was repeated slice after slice up to 200 times, which produced a well-defined, 3 D micro-patterned surface. The overall results implied that piezoelectric DOD polymer inkjet printing could be a powerful, solid-freeform, fabrication technology to create a controlled 3D architecture.

• 대한전기학회:학술대회논문집
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• 대한전기학회 2009년도 제40회 하계학술대회
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• pp.1523_1524
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• 2009

Inkjet technology has various merits as a direct patterning process in plenty of industrial applications, but critical issue such as coffee ring effect should be overcome for the application to an industrial manufacturing process. In this paper, we introduced the morphological analysis of inkjet printed pattrerns on the characristics of inks and substrates. In case of Triethlene Glycol Monoethly Ether based ink, the coffee ring effect was observed. However, an ethanol based ink showed the round shaped morphology under the same printing conditions and surface conditions. An ink consisted of the solvent with high boiling point results in coffee ring effect. This experimental results showed that the morphological change of the printed droplet is caused by the main solvent of ink, rather than the metal content, viscosity and surface tension.

• Bulletin of the Korean Chemical Society
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• 제33권4호
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• pp.1128-1134
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• 2012

We investigated a new method for patterning organic field-effect transistors (OFETs) using a photopatternable conducting polymer nanocomposite, consisting of poly(3-hexylthiophene) (P3HT)-coated gold nanoparticles (AuNPs) that had been modified with a photoreactive cinnamate group, to form P3HT-AuNP-CI. We found that the addition of the cinnamate group to the nanoparticle surface assisted the preparation of a solvent-resistive semiconducting film and preserved the P3HT ordering, which was interrupted by Au-P3HT interactions, as well as provided UV-controllable electrical properties. The P3HT-AuNPs-CI films could be microscale-patterned via a UV crosslinking photoreaction, represented as a promising photopatternable semiconductor material for use in advanced applications, with tunable electrical properties for fabrication of sub-micron and microscale electronic devices.

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2005년도 추계학술대회 논문집
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• pp.322-325
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• 2005

The shrinking critical dimensions of modern technology place a heavy requirement on optimizing feature shapes at the micro- and nano scale. In addition, the use of ion beams in the nano-scale world is greatly increased by technology development. Especially, Focused ion Beam (FIB) has a great potential to fabricate the device in nano-scale. Nevertheless, FIB has several limitations, surface swelling in low ion dose regime, precipitation of incident ions, and the re-deposition effect due to the sputtered atoms. In recent years, many approaches and research results show that the re-deposition effect is the most outstanding effect to overcome or reduce in fabrication of micro and nano devices. A 2D string based simulation software AMADEUS-2D $(\underline{A}dvanced\;\underline{M}odeling\;and\;\underline{D}esign\;\underline{E}nvironment\;for\;\underline{S}putter\;Processes)$ for ion milling and FIB direct fabrication has been developed. It is capable of simulating ion beam sputtering and re-deposition. In this paper, the 2D FIB simulation is demonstrated and the characteristics of ion beam induced direct fabrication is analyzed according to various parameters. Several examples, single pixel, multi scan box region, and re-deposited sidewall formation, are given.