• Proceedings of the KIEE Conference
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• 2006.07c
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• pp.1448-1449
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• 2006

Pb(Zr,Ti)$O_3$ is one of the most attractive ferroelectric materials for realizing the FeRAM due to its higher remanant polarization and the ability to withstand higher coercive fields. Generally, the ferroelectric materials were patterned by a plasma etching process for high-density FeRAM. The applicable possibility of CMP process to pattern Pb(Zr,Ti)$O_3$ instead of plasma etching process was investigated in our previous study for improvement of an angled sidewall which prevents the densification of ferroelectric memory and is apt to receive the plasma damage. Our previous study showed that good removal rate with the excellent surface roughness compared to plasma etching process were obtained by CMP process for the patterning of Pb(Zr,Ti)$O_3$. The suitable selectivity to TEOS without any damage to the structural property of Pb(Zr,Ti)$O_3$ was also guaranteed. In this study, the removal mechanism of $Pb_{1.1}(Zr_{0.52}Ti_{0.48})O_3$ coated by sol-gel method was investigated. Surface analysis of polished specimens at the best and worst conditions was carried out by XPS.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2000.07a
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• pp.90-93
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• 2000

In this study, the rise throughput and the stability in fabrication of device can be obtained by applying of CMP process to STI structure in 0.18um semiconductor device. To employ in STI CMP, the reverse moat process has been added thus the process became complex and the defects were seriously increased. Removal rates of each thin films in STI CMP was not equal hence the devices must to be effected, that is, the damage was occured in the device dimension in the case of excessive CMP process and the nitride film was remained on the device dimension in the case of insufficient CMP process than these defects affect the device characteristics. To resolve these problems, the development of slurry for CMP with high removal rate and high selectivity between each thin films was studied then it can be prevent the reasons of many defects by reasons of many defects by simplification of process that directly apply CMP process to STI structure without the reverse moat pattern process.

• International Journal of Advanced Culture Technology
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• v.10 no.4
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• pp.460-469
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• 2022

Increasing interest in the metaverse world these days, interest in realistic content such as 3D displays is growing. In particular, hologram images seen in movies provide viewers with an immersive display that cannot be seen in conventional 2D images. Since the first discovery of holography by Dennis Gabor in 1948, this technology has developed rapidly. Spatially, this beginning of technology like Optical hologram called analog hologram and Digital hologram such as computer-generated hologram (CGH). In analog and digital holograms, a recording angle and a recording wavelength are having important role when reproducing and display hologram. In the hologram, diffraction of light causes by unexpected formed by the synthesis from interference with object and reference light. When recording, the incident light information and mismatched reproduction light reconstruct the hologram in an undesirable direction. Reproduction light that is out of sync with incident light information with initial condition of recording will cause reconstructed image in an undesirable direction. Therefore, we analyze the holographic interference pattern generated by hologram recording in volume holograms using photopolymer and analyze the characteristics that vary depending on the angle of the reproduced light. This is expected to be used as a basic research on various holographic application that may cause as holograms are applied to industries in the future.

• Korean Journal of Materials Research
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• v.33 no.5
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• pp.195-204
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• 2023

Micro-electronic gas sensor devices were developed for the detection of carbon monoxide (CO), nitrogen oxides (NO_x), ammonia (NH₃), and formaldehyde (HCHO), as well as binary mixed-gas systems. Four gas sensing materials for different target gases, Pd-SnO₂ for CO, In₂O₃ for NO_x, Ru-WO₃ for NH₃, and SnO₂-ZnO for HCHO, were synthesized using a sol-gel method, and sensor devices were then fabricated using a micro sensor platform. The gas sensing behavior and sensor response to the gas mixture were examined for six mixed gas systems using the experimental data in MEMS gas sensor arrays in sole gases and their mixtures. The gas sensing behavior with the mixed gas system suggests that specific adsorption and selective activation of the adsorption sites might occur in gas mixtures, and allow selectivity for the adsorption of a particular gas. The careful pattern recognition of sensing data obtained by the sensor array made it possible to distinguish a gas species from a gas mixture and to measure its concentration.

• Korean Chemical Engineering Research
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• v.45 no.5
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• pp.487-492
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• 2007

Using the selective host-guest inclusion of $G_2$[naphthalene disulfonate], the structural isomers of 1,2-dibromobenzene and 1,3-dibromobenzene were separated. As such, 1,3-dibromobenzene was selectively included as guest into the host framework in mixture isomers over 30% fraction of 1,3- dibromobenzene ($X_{1,3-DBB}=0.3$) whereas 1,2-dibromobenzene as guest was selective to the inclusion below $X_{1,3-DBB}=0.3$. This was due to the selectivity of host framework toward the guest molecules playing a role of template to the host framework. From the powder pattern XRD of inclusion compounds crystallized in pure isomer and mixture solutions, the template roles of guest molecules to the host framework were confirmed. Using the DSC, it was found that the more energy was required to release 1,3-dibromobenzene of guest from the host framework than 1,2-dibromobenzene due to the higher thermal stability. The thermal stability of the $G_2NDS$-1,3-dibromobenzene inclusion compound was consistent with the high selectivity of 1,3- dibromobenzene to the host framework in broad range of fraction in the isomer mixture

• Korean Journal of Weed Science
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• v.30 no.3
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• pp.233-242
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• 2010

This study was conducted to know that if ionic liquids can be applicable as control agents of harmful algae in water-ecosystem and to find out problems caused by ionic liquid application. Firstly, the differential selectivity of various fresh-water algal species to several 1-alkyl-3-methylimidazolium chloride ionic liquids was investigated. There was a distinct differential response between alkyl chain lengths from butyl to dodecyl and towards the algal organisms : Generally algicidal activity was increased with increase of chain length and among the algae used in this study, Stephanodiscus hantzschii f. tenuis, Oscillatoria tenuis and Spirulina pratensis were most sensitive to 1-dodecyl-3-methylimidazolium chloride (MAIC12), next was Microcystis aeruginosa, and the others were relatively less sensitive to the chemical. The selectivity degree was about ten to twenty times based on the $EC_{80}$ (Effective concentration required for 80% growth inhibition). Secondly, an activity persistence of ionic liquids was investigated in natural mimic condition (using water bottle containing soil-sediments under the greenhouse condition). At the application of $1.0{\mu}g\;mL^{-1}$ of 1-octyl-3-methylimidazolium chloride (MAIC8), the algal growth did not occur at all until 6 days after treatment(DAT) and observed a only little growth at 9 DAT. But the algae grew rapidly after 9 DAT. So at 20 DAT, total chlorophylls was $264.4{\mu}g\;L^{-1}$ and the growth was inhibited by 58.2% compared to untreatment. On the other hand, MAIC12 also had a similar persistence pattern to MAIC8, showing nearly 5 times more activity than MAIC8. At 20 days after $0.2{\mu}g\;mL^{-1}$ application of MAIC12, that is, total chlorophylls was $251.2{\mu}g\;L^{-1}$ and the growth was inhibited by 55.2% compared to untreatment. In summary, 1-alkyl-3-methylimidazolium chloride ionic liquids is likely to be applicable for selective control of harmful algae as potent compounds having long lasting activity. However, the difficulty of degradation seems to be a limiting factor in an eco-friendly application of the compounds.

• Proceedings of the Korean Vacuum Society Conference
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• 2012.08a
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• pp.411-411
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• 2012

Over the recent years, surface enhanced Raman spectroscopy (SERS) has dramatically grown as a label-free detecting technique with the high level of selectivity and sensitivity. Conventional SERS-active nanostructured layers have been deposited or patterned on rigid substrates such as silicon wafers and glass slides. Such devices fabricated on a flexible platform may offer additional functionalities and potential applications. For example, flexible SERS-active substrates can be integrated into microfluidic diagnostic devices with round-shaped micro-channel, which has large surface area compared to the area of flat SERS-active substrates so that we may anticipate high sensitivity in a conformable device form. We demonstrate fabrication of flexible SERS-active nanostructured substrates based on soft-lithography for simple, low-cost processing. The SERS-active nanostructured substrates are fabricated using conventional Si fabrication process and inkjet printing methods. A Si mold is patterned by photolithography with an average height of 700 nm and an average pitch of 200 nm. Polydimethylsiloxane (PDMS), a mixture of Sylgard 184 elastomer and curing agnet (wt/wt = 10:1), is poured onto the mold that is coated with trichlorosilane for separating the PDMS easily from the mold. Then, the nano-pattern is transferred to the thin PDMS substrates. The soft lithographic methods enable the SERS-active nanostructured substrates to be repeatedly replicated. Silver layer is physically deposited on the PDMS. Then, gold nanoparticle (AuNP) inks are applied on the nanostructured PDMS using inkjet printer (Dimatix DMP 2831) to deposit AuNPs on the substrates. The characteristics of SERS-active substrates are measured; topology is provided by atomic force microscope (AFM, Park Systems XE-100) and Raman spectra are collected by Raman spectroscopy (Horiba LabRAM ARAMIS Spectrometer). We anticipate that the results may open up various possibilities of applying flexible platform to highly sensitive Raman detection.

• Proceedings of the Korean Institute of Information and Commucation Sciences Conference
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• 2010.10a
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• pp.597-599
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• 2010

In this paper, by considering the real UWA channel environments, the measured channel data is used to generate the UWA channel model and calculate the relative parameters for underwater OFDM systems. Practical least square (LS) based channel estimation with linear interpolation are adopted to obtain the channel state information (CSI) at receiver side. As multi-input multi-output (MIMO) processing techniques, Alamouti code is implemented and evaluated to perform for space time block coding (STBC) and space frequency block coding (SFBC) for UWA OFDM systems with the MIMO configuration of $2{\times}1$, at the same time, $1{\times}2$ maximum ratio combining (MRC) is performed for the purpose of comparison. The simulation results show that, with perfect channel estimation, SFBC failed to work duo to the serious frequency selectivity of UWA channel environments. When the practical channel estimation is applied, in the case of STBC, the proposed 4-column pilot pattern gives better performance about 7dB than SISO system.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2005.11a
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• pp.68-69
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• 2005

BTO ($BaTiO_3$) thin film is one of the high dielectric materials for high-density dynamic random access memories (DRAMs) due to its relatively high dielectric constant. It is generally known that BTO film is difficult to be etched by plasma etching, but high etch rate with good selectivity to pattern mask was required. The problem of sidewall angle also still remained to be solved in plasma etching of BTO thin film. In this study, we first examined the patterning possibility of BTO film by chemical mechanical polishing (CMP) process instead of plasma etching. The sputtered BTO film on TEOS film as a stopper layer was polished by CMP process with the self-developed $BaTiO_3$- and $TiO_2$-mixed abrasives slurries (MAS), respectively. The removal rate of BTO thin film using the$ BaTiO_3$-mixed abrasive slurry ($BaTiO_3$-MAS) was higher than that using the $TiO_2$-mixed abrasive slurry ($TiO_2$-MAS) in the same concentrations. The maximum removal rate of BTO thin film was 848 nm/min with an addition of $BaTiO_3$ abrasive at the concentration of 3 wt%. The sufficient within-wafer non-uniformity (WIWNU%)below 5% was obtained in each abrasive at all concentrations. The surface morphology of polished BTO thin film was investigated by atomic force microscopy (AFM).

• 한국해양학회지
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• v.21 no.4
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• pp.236-244
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• 1986

This study was carried out for appreciable information on the proper habitats and feeding modes of some dominant polychaetes in the continental shelf of the East Sea during April, 1985. Among 95 polychaete species, we select ed 9 dominant species in terms of their occurring frequency, abundance and population density. These are Terebellides stroemi, Chaetozone setosa, Magelona japonica, Ampharete arctica, Aglaophamus sinensis, Nothria holobranchiata, Lumbrineris japonica, Myriochele gracilis, Notoproctus pacificus. Major food item s of these species are centric diatoms and detritus. The feeding modes of the the m are mainly surtace or subsurface deposit feeding, though two specters, M.holobranchiata and L. japonica, could be assumed to be potential carnivores. To a certain degree, most deposit feeders in the coarse sediments showed selectivity in feeding and tube building. The feeding mode, gut content and the tube structure, and the distribution pattern of dominant polychaetes correspond well with the habitat tharacters, e.g.the bottom topography, the source of food and the sediment composition.