• Title/Summary/Keyword: oxygen ratio

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A Study on the Combustion Characteristics of Diesel Engine by the Change of the Intake Air Composition (흡기조성 변화에 따른 디젤 기관의 연소 특성 변화)

  • 김세원;임재문
    • Journal of Advanced Marine Engineering and Technology
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    • v.18 no.2
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    • pp.91-96
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    • 1994
  • Intake gases other than air, which is composed of oxygen, nitrogen, carbon dioxide, and argon, are used to study their effects on the performance of the diesel engine experimentally. The engine is operated at constant speed and fixed fuel injection timing, and cylinder pressure and heat release rate are measured at various intake gas compositions. The results show that increase of oxygen concentration improves the performance of the engine generally. The adverse effect is observed when the oxygen concentration is increased over the critical oxygen concentration of this test, mainly because of the over-shortened ignition delay. Increase of carbon dioxide concentration degardes the performance of the engine, mainly due to the lower specific heat ratio of carbon dioxide. Adding argon gas to the intake gas improves the overall performance. Finally, it is found that two most influencing factors affecting the performance of the diesel engine in this study are ignition delay and speific heat ratio of the intake gas.

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Mixed Flow and Oxygen Transfer Characteristics of Vertical Orifice Ejector (수직 오리피스 이젝터의 혼합유동 및 산소전달 특성)

  • Kim, Dong Jun;Park, Sang Kyoo;Yang, Hei Cheon
    • Transactions of the Korean Society of Mechanical Engineers B
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    • v.39 no.1
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    • pp.61-69
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    • 2015
  • The objective of this study is to experimentally investigate the mixed flow behaviors and oxygen transfer characteristics of a vertical orifice ejector. The experimental apparatus consisted of an electric motor-pump, an orifice ejector, a circulation water tank, an air compressor, a high speed camera unit and control or measurement accessories. The mass ratio was calculated using the measured primary flow rate and suction air flow rate with experimental parameters. The visualization images of vertically injected mixed jet issuing from the orifice ejector were qualitatively analyzed. The volumetric oxygen transfer coefficient was calculated using the measured dissolved oxygen concentration. At a constant primary flow rate, the mass ratio and oxygen transfer coefficient increase with the air pressure of compressor. At a constant air pressure of the compressor, the mass ratio decreases and the oxygen transfer coefficient increases as the primary flow rate increases. The residence time and dispersion of fine air bubbles and the penetration of mixed flow were found to be important parameters for the oxygen transfer rate owing to the contact area and time of two phases.

Effect of broccoli sprouts germination by soaking water condition (침지조건이 브로콜리 발아에 미치는 영향)

  • Park, Ju-Young;Yoo, Chang-Hoon;Lee, In-Hwa;Hong, Seung-Ho;Cha, Jin-Myeong
    • KSBB Journal
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    • v.23 no.6
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    • pp.551-553
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    • 2008
  • In order to optimization germination condition of broccoli, we carried out germination ratio experiment under soaking time, soaking temperature, oxygen concentration. The germination ratio results 98.5% following as soaking water having 10 ppm DO(demanded oxygen) during 4 hr at $20{\sim}30^{\circ}C$. The result of provide the dissolved oxygen water, when the concentration of oxygen water were 7, 12 ppm, germination ratio were observed about 76%, 92%. Also, we showed the growth rate of 2 times in 12 ppm compared with 7 ppm. Consequently, germination ratio of broccoli increased cultivation condition at soaking water having high concentration oxygen more than supply to oxygen water of high concentration.

Effects of Oxygen Flow Ratio on the Structural and Optical Properties of Al-doped ZnO Thin Films (산소 유량비 변화에 따른 Al 도핑된 ZnO 박막의 구조 및 광학적 특성)

  • Son, Young-Gook;Hwang, Dong-Hyun;Cho, Shin-Ho
    • Journal of the Korean Vacuum Society
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    • v.16 no.4
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    • pp.267-272
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    • 2007
  • Al-doped ZnO (AZO) thin films were grown on glass substrates by radio-frequency magnetron sputtering. The effects of oxygen flow ratio, which was used for a sputtering gas, on the AZO thin films were investigated by using the X-ray diffraction (XRD), atomic force microscopy (AFM), and Hall effects measurement. The AZO thin film, deposited with oxygen flow ratio of 0% at the growth temperature of $400^{\circ}C$, showed a strongly c-axis preferred orientation and the lowest resistivity of $6.9{\times}10^{-4}{\Omega}cm$. The ZnO (002) diffraction peak indicated a tendency to decrease substantially with increasing the oxygen flow ratio. Furthermore, as the oxygen flow ratio was decreased, the carrier concentration and the hall mobility were increased, but the electrical resistivity was decreased.

Effect of thickness on properties of ZnO film prepared by direct current reactive magnetron sputtering method

  • Baek, C.S.;Kim, D.H.;Kim, H.H.;Lim, K.J.
    • Journal of Ceramic Processing Research
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    • v.13 no.spc2
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    • pp.403-406
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    • 2012
  • Effect of thickness on ZnO properties including the compositional ratio and crystallinity has been systematically investigated using a variety of characterization tools of x-ray diffraction, field emission scanning electron microscopy, x-ray fluorescence and x-ray photoelectron spectroscopy. Interestingly, it was observed that ZnO films below 80 nm in thickness were in oxygen deficiency, while the oxygen ratio was increased in the films above the thickness, although the compositional ratio of ZnO film was not linearly varied with increasing film thickness. Also, ZnO crystallinity, which is characterized by (002) diffraction pattern, was clearly improved with increasing film thickness. The properties of ZnO film with different sputtering time and the nature of direct current reactive sputtering process were discussed in terms of compositional ratio, especially oxygen ratio in ZnO film.

RF-Sputted Vanadium Oxide Thin Films:Effect of Oxygen Partial Pressure on Structural and Electrochemical Properties

  • Park, Yong Jun;Park, Nam Gyu;Ryu, Gwang Seon;Jang, Sun Ho;Park, Sin Jong;Yun, Seon Mi;Kim, Dong Guk
    • Bulletin of the Korean Chemical Society
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    • v.22 no.9
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    • pp.1015-1018
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    • 2001
  • Vanadium oxide thin films with thickness of about 2000 $\AA$ have been prepared by radio frequency sputter deposition using a V2O5 target in a mixed argon and oxygen atmosphere with different Ar/O2 ratio ranging from 99/1 to 90/10. X-ray diffraction and X-ray absorption near edge structure spectroscopic studies show that the oxygen content higher than 5% crystallizes a stoichiometric V2O5 phase, while oxygen deficient phase is formed in the lower oxygen content. The oxygen content in the mixed Ar + O2 has a significant influence on electrochemical lithium insertion/deinsertion property. The discharge-charge capacity of vanadium oxide film increases with increasing the reactive oxygen content. The V2O5 film deposited at the Ar/O2 ratio of 90/10 exhibits high discharge capacity of 100 ${\mu}Ah/cm2-{\mu}m$ along with good cycle performance.

A Study About the Effect of EGR Ratio on DME HCCI Combustion Process (EGR 율이 DME HCCI 엔진연소과정에 미치는 영향에 관한 연구)

  • Lim, Ocktaeck
    • Transactions of the Korean Society of Mechanical Engineers B
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    • v.37 no.10
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    • pp.879-886
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    • 2013
  • This study aims to provide helpful suggestions for understanding the effect of high EGR on DME HCCI combustion. This study determined which between oxygen partial pressure and oxygen concentration was the main factor affecting the LTHR heating ratio. Furthermore, EGR and the supercharging effect were investigated. To define the parameters for the EGR ratio and supercharging pressure, a numerical analysis of the chemical reaction was conducted under the following conditions: (1) variation of EGR ratio, oxygen concentration, and oxygen content; (2) variation of oxygen partial pressure while the oxygen concentration was almost constant; and (3) variation of oxygen concentration while oxygen partial pressure was constant with EGR and supercharging. The results show that an increase in EGR reduces the combustion duration. On the other hand, an increase in boost pressure increases the combustion duration. Finally, the EGR and boost pressure affect the amount of increase in LTHR.

Effects of Oxygen Partial Pressure on the Structural Properties of Sputtered Vanadium Oxide Thin Films (스퍼터된 바나듐 산화막의 구조적 특성에 미치는 산소 분압의 효과)

  • 최복길;최용남;최창규;권광호
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2001.07a
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    • pp.435-438
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    • 2001
  • Thin films of vanadium oxide(VO$\sub$x/) have been deposited by r.f. magnetron sputtering from V$_2$O$\sub$5/ target in gas mixture of argon and oxygen. The oxygen/(oxygen+argon) partial pressure ratio is changed from 0% to 8%. Crystal structure, chemical composition and bonding properties of films sputter-deposited under different oxygen gas pressures are characterized through XRO, XPS, RBS and FTIR measurements. All the films prepared below 8% O$_2$ are amorphous, and those prepared without oxygen are gray indicating the presence of V$_2$O$\sub$$_4$/ phase in the films. V$_2$O$\sub$5/ and lower oxides co-exist in sputter-deposited films and as the oxygen partial pressure is increased the films become more stoichiometric V$_2$O$\sub$5/. The increase of O/V ratio with increasing oxygen gas pressure is attributed to the partial filling of oxygen vacancies through diffusion. It is observed that the oxygen atoms. located on the V-O plane of V$_2$O$\sub$5/ layer participate more readily in the oxidation process.

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Effect of Oxygen Partial Pressure on the Structural, Optical and Electrical Properties of Sputter-deposited Vanadium Oxide Thin Films (스퍼터링으로 증착된 바나듐 산화막의 구조적, 광학적, 전기적 특성에 미치는 산소 분압의 효과)

  • 최복길;최창규;권광호;김성진;이규대
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.14 no.12
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    • pp.1008-1015
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    • 2001
  • Thin films of vanadium oxide(VO$\_$x/) have been deposited by r.f. magnetron sputtering from V$_2$O$\_$5/ target in gas mixture of argon and oxygen. The oxygen/(oxygen+argon) partial pressure ratio is changed from 0% to 8%. Crystal structure, chemical composition, bonding, optical and electrical properties of films sputter-deposited under different oxygen gas pressures are characterized through XPS, AES, RBS, FTIR, optical absorption and electrical conductivity measurements. V$_2$O$\_$5/ and lower oxides co-exist in sputter-deposited films and as the oxygen partial pressure is increased the films become more stoichiometric V$_2$O$\_$5/. The increase of O/V ratio with increasing oxygen gas pressure is attributed to the partial filling of oxygen vacancies through diffusion. It is observed that the oxygen atoms located on the V-O plane of V$_2$O$\_$5/ layer participate more readily in the oxidation process. With increasing oxygen gas pressure indirect and direct optical band gaps are increased, but thermal activation energies are decreased.

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The Investigation of CF4 Decomposition in Methane Premixed Flames on Oxygen Enrichment (산소부화된 메탄 예혼합 화염에서 CF4 분해에 대한 연구)

  • Lee, Ki Yong
    • Journal of the Korean Society of Combustion
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    • v.22 no.4
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    • pp.51-56
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    • 2017
  • The decomposition of tetrafluoromethane has been investigated with the reaction mechanism proposed for freely propagating $CH_4/CF_4/O_2/N_2$ premixed flames on the oxygen enrichment. The factors affecting on the removal efficiency of tetrafluoromethane were analyzed. The increase in flame temperature due to oxygen enrichment has a great influence on the removal efficiency of tetrafluoromethane. At the same oxygen enrichment condition, the removal efficiency in the rich flame is higher than one in the lean flame. The increase of the F/H ratio leads to decrease the flame temperature and the removal efficiency of tetrafluoromethan is decreased at the flame temperature of 2600 K or lower, The elementary reactions that dominate the consumption of tetrafluoromethane are (R1) $CF_4+M=CF_3+F+M$ and (R2) $CF_4+H=CF_3+HF$. (R1) has the greatest effect on the consumption of tetrafluoromethane under the oxygen enhanced flames.