• Biotechnology and Bioprocess Engineering:BBE
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• v.9 no.3
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• pp.151-155
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• 2004

The bioremediation of water system contaminated with phenolic compounds having endocrine-disrupting activity, i.e. 2,4-dichlorophenol, 2,4-dichlorophenoxy acetic acid (2,4-D), and 2,4,5-trichlorophenoxy acetic acid (2,4,5-T), was investigated by using ozone oxidation and activated sludge treatment. Ozone oxidation (ozonation time: 30 min) followed by activated sludge treatment (incubation time: 5 days) was an efficient treatment method for the conversion of phenolic compounds in water into carbon dioxide and decreased the value of total organic carbon (TOC) up to about 10% of initial value. Furthermore, 2,4-D was dissolved in water containing salt, i.e. artificial seawater (ASW), and this water was used as model coastal water contaminated with phenolic compounds. The activated sludge treatment (incubation time: 5 days) could consume significantly organic acids produced from 2,4-D in the model costal water by the ozone oxidation (ozonation time: 30min) and decrease the value of TOC up to about 35% of initial value.

• Journal of Environmental Science International
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• v.18 no.11
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• pp.1225-1234
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• 2009

The aim of this research was to apply experimental design methodology in the optimization condition of electrochemical oxidation of Rhodamine B(RhB). The reactions of electrochemical oxidation were mathematically described as a function of parameters amounts of current, NaCl dosage, pH and time being modeled by the use of the central composite design, which was used for fitting quadratic response surface model. The application of response surface methodology using central composite design(CCD) technique yielded the following regression equation, which is an empirical relationship between the removal efficiency of RhB and test variable in actual variables: RhB removal (%) = 3.977 + 23.279$\cdot$Current + 49.124$\cdot$NaCI - 5.539$\cdot$pH - 8.863$\cdot$time - 22.710$\cdot$Current$\cdot$NaCl + 5.409$\cdot$Current$\cdot$time + 2.390$\cdot$NaCl$\cdot$time + 1.061$\cdot$pH$\cdot$time - $0.570{\cdot}time^2$. The model predicted also agree with the experimentally observed result($R^2$ = 91.9%).

• Journal of the Korean Society for Heat Treatment
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• v.22 no.5
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• pp.298-306
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• 2009

Gas nitriding and post oxidation were performed on stainless steels and SACM 645 steel. With increasing gas nitriding time, the increasing rate of nitrided layer was most rapid on SACM 645 steel and the nitriding depth of nitrided layer was most narrow on STS 304 steel among three steels. Corrosion resistance was increased with post oxidation on stainless steels and with increasing time the effect of corrosion resistance was decreased to compare with relatively short gas nitriding time. An improvement effect of corrosion resistance was consisted of predominantly on austenitic stainless steel by post oxidation after gas nitriding among three steels and it was relatively less influenced on martensitic stainless steel.

• Journal of the Korean Ceramic Society
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• v.26 no.3
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• pp.341-346
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• 1989

In order to evaluate the oxidation behavior of $\beta$-Sialon, $\beta$-Sialon ceramics was prepared from Si3N4, Al2O3, AlN and Y2O3 system. The specimens were oxidized in an oxygen atmosphere at 1, 20$0^{\circ}C$ for 9days. Oxidation behavior was evaluated by weight gain oxidation process, surface roughness. Microscopy, EDX and X-ray diffraction analysis were also used for the evaluation. The weight and surface roughness ofoxidized specimens were increased with increasing the oxidation time. Oxidized products were mullite, $\alpha$-cristobalite, yttrium aluminum oxide and yttrium silicate oxide.

• Korean Journal of Materials Research
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• v.11 no.10
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• pp.900-906
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• 2001

We prepared tunnel magnetoresistance(TMR) devices of Ta($50\AA$)/NiFe($50\AA$)/IrMn(150$\AA$)/CoFe($50\AA$)/Al ($13\AA$)-O/CoFe($40\AA$)/NiFe($400\AA$)/Ta(50$\AA$) structure which has 100$\times$100 $\mu\textrm{m}^2$ junction area on $2.5\Times2.5 cm^{2}$ $Si/SiO_2$ ($1000\AA$) substrates by a inductively coupled plasma(ICP) magnetron sputter. We fabricated the insulating layer using a ICP plasma oxidation method by varying oxidation time from 80 sec to 360 sec, and measured resistances and magnetoresistance(MR) ratios of TMR devices. We used a high resolution transmission electron microscope(HRTEM) to investigate microstructural evolution of insulating layer. The average resistance of devices increased from 16.38 $\Omega$ to 1018 $\Omega$ while MR ratio decreased from 30.31 %(25.18 %) to 15.01 %(14.97 %) as oxidation time increased from 80 sec to 360 sec. The values in brackets are calculated values considering geometry effect. By comparing cross-sectional TEM images of 220 sec and 360 sec-oxidation time, we found that insulating layer of 360 sec-oxidized was 30 % and 40% greater than that of 150 sec-oxidized in thickness and thickness variation, respectively. Therefore, we assumed that increase of thickness variation with oxidation time is major reason of MR decrease. The resistance of 80 sec-oxidized specimen was 160 k$\Omega$$\mu\textrm{m}^2$ which is appropriate for industrial needs of magnetic random access memory(MRAM) application.

• Tribology and Lubricants
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• v.16 no.4
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• pp.241-246
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• 2000

The effect of post-irradiation shelf-aging time on the wear of UHMWPE was investigated, and wear results were correlated with the time-dependent microstructural changes of polyethylene after gamma irradiation sterilization. The levels of oxidation and crosslinking in the shelf-aged acetabular liners were examined by FTIR and hot xylene extraction, respectively, and uni-directional repeat pass sliding wear tests were conducted by using a pin-on-disc wear tester. Gamma irradiation sterilization in the air environment caused an increase of oxidation, crosslinking, and wear resistance. With aging, however, oxidation progressed and decreased the level of crosslinking. This resulted in a decrease of wear resistance of UHMWPE that was accompanied with white bands and brittle cracking.

• Proceedings of the Korean Society of Tribologists and Lubrication Engineers Conference
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• 1999.11a
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• pp.296-302
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• 1999

The effect of post-irradiation shelf-aging time on the wear of orthopaedic grade UHMWPE was investigated, and wear results were correlated with the time-dependent microstructural changes of polyethylene after gamma irradiation sterilization. The levels of oxidation and crosslinking in the shelf-aged acetabular liners were examined by FTIR and hot xylene extraction, respectively, and uni-directional repeat pass sliding wear tests were conducted by using a pin-on-disc wear tester. Gamma irradiation sterilization in the air environment caused an increase of oxidation, crosslinking, and wear resistance. With aging, however, oxidation progressed and decreased the level of crosslinking. This resulted in a decrease of wear resistance of UHMWPE that was accompanied with the existence of white bands and brittle cracking.

• Journal of the Korean institute of surface engineering
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• v.20 no.2
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• pp.60-73
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• 1987

For the purpose of improving the cyclic oxidation resistance of Ni-base superalloy, Inconel 600, aluminide coating methods are studied. The formation rate of aluminide coating layers is measured as a function of time and pack composition to find out the optimum coating condition. The evaluation of cyclic oxidation is established by the change in weight, the microphotography and EPMA of cross sectional area during $200^{\circ}C\;{\leftrightarrow}\;950^{\circ}C\;and\;200^{\circ}C\;{\leftrightarrow}\;1100^{\circ}C$, respectively. The thickness of coating layer and weight gains are parabolic behavior in propotion to time and Al contents. In pack of low aluminum contents, 2 wt%, however, weight gain is decreased when activator, $NH_4Cl$ is higher than 2 wt%. The cyclic oxidation resistance of the coating carried out at 1100$^{\circ}C$ are superior to those of the coating diffusion-treated after pack cementation at 800$^{\circ}C$. Aluminide oxide, which is formed in external scale, is barrier to the cyclic oxidation.

• Nuclear Engineering and Technology
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• v.52 no.4
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• pp.742-754
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• 2020

Zircaloy cladding oxidation is an important phenomenon for both design basis accident and severe accidents, because it results in cladding embrittlement and rapid fuel temperature escalation. For this reason during the last decade, many experts have been conducting experiments to identify the oxidation phenomena that occur under design basis accidents and to develop mathematical analysis models. However, since the study of design extension conditions (DEC) is relatively insufficient, it is essential to develop and validate a physical and mathematical model simulating the oxidation of the cladding material at high temperatures. In this study, the QUENCH-05 and -06 experiments were utilized to develop the best-fitted oxidation model and to validate the SPACE code modified with it under the design extension condition. It is found out that the cladding temperature and oxidation thickness predicted by the Cathcart-Pawel oxidation model at low temperature (T < 1853 K) and Urbanic-Heidrick at high temperature (T > 1853 K) were in excellent agreement with the data of the QUENCH experiments. For 'LOCA without SI' (Safety Injection) accidents, which should be considered in design extension conditions, it has been performed the evaluation of the operator action time to prevent core melting for the APR1400 plant using the modified SPACE. For the 'LBLOCA without SI' and 'SBLOCA without SI' accidents, it has been performed that sensitivity analysis for the operator action time in terms of the number of SIT (Safety Injection Tank), the recovery number of the SIP (Safety Injection Pump), and the break sizes for the SBLOCA. Also, with the extended acceptance criteria, it has been evaluated the available operator action time margin and the power margin. It is confirmed that the power can be enabled to uprate about 12% through best-estimate calculations.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.11 no.1
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• pp.33-40
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• 1998

The composite SiO$_2$/Si$_3$N$_4$/SiO$_2$(ONO) film formed by oxidation on nitride film has been widely studied as DRAM stacked capacitor multi-dielectric films. Load lock(L/L) LPCVD system by HF cleaning is used to improve electrical capacitance and to scale down of effective thickness for memory device, but is brings a new problem. Nitride film deposited using HF cleaning shows selective deposition on poly silicon and oxide regions of capacitor. This problem is avoidable by carpeting chemical oxide using $H_2O$$_2$cleaning before nitride deposition. In this paper, we study the limit of nitride thickness for abnormal oxidation and the initial deposition time for nitride deposition dependent on underlayer materials. We proposed an advanced fabrication process for stacked capacitor in order to avoid selective deposition problem and show the usefulness of nitride deposition using L/L LPCVD system by $H_2O$$_2$cleaning. The natural oxide thickness on polysilicon monitor after HF and $H_2O$$_2$cleaning are measured 3~4$\AA$, respectively. Two substrate materials have the different initial nitride deposition times. The initial deposition time for polysilicon is nearly zero, but initial deposition time for oxide is about 60seconds. However the deposition rate is constant after initial deposition time. The limit of nitride thickness for abnormal oxidation under the HF and $H_2O$$_2$cleaning method are 60$\AA$, 48$\AA$, respectively. The results obtained in this study are useful for developing ultra thin nitride fabrication of ONO scaling and for avoiding abnormal oxidation in stacked capacitor application.