• Journal of the Korean Chemical Society
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• v.32 no.6
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• pp.567-574
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• 1988

Kinetic studies on the vanadium(IV)-catalyzed oxidation of dimethylsulfoxide by hydrogen peroxide in water and aqueous methanol and ethanol show that the reaction is the first order in the concentration of dimethylsulfoxide and hydrogen peroxide, respectively. Activation parameters are also measured for the oxidation of dimethylsulfoxide. It is suggested that the rate determining step is a process involving oxidation of dimethylsulfoxide as the result of nucleophilic attack by the sulfur on the O-O bond of vanadium(V)-peroxide complex.

• Journal of Welding and Joining
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• v.29 no.5
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• pp.58-62
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• 2011

Stainless steels are alloy steels with a nominal chromium content of at least 11 percent, with other alloy additions. The stainlessness and corrosion resistance of these alloy steels are attributed to the presence of a passive oxide film on the surface. When exposed to conditions like Resistance Spot Welding (RSW) process that remove the passive oxide film, stainless steels are subject to corrosive attack. And exposure to elevated temperatures causes oxidation (discoloration) of areas around indentation in Spot welding. In this paper, deal with the effect of shielding gas (Ar) preventing the corrosion, oxidation of stainless steel. And find the optimal shielding gas flow rate. In addition, suggest effective purging method for direct/indirect spot welding process.

• Journal of the Korean institute of surface engineering
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• v.24 no.4
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• pp.222-229
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• 1991

The oxidation behavior of Ni-6wt.% Cr alloys with various concentration of alumina dispersions(5vol.% 10vol.%) was determined at 1000 and 110$0^{\circ}C$ in oxygen of 1 atm. pressure. Some general observations were ascertained. These include: (a) the addition of alumina dispersoids significantly increased the oxidation resistance of Ni-6wt.% Cr alloy; (b) the rate of oxidation was distinctly decreased as a function of the volume percent of oxide dispersion; and (c) the presence of alumina dispersions promoted the formation of continous, protective Cr2O3 layer at 6 wt.% Cr.

• Tribology and Lubricants
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• v.18 no.4
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• pp.273-278
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• 2002

Grease deterioration of mineral oil type grease was investigated using sealed deep groove ball bearings (6203) and bearing life test rig. The bearing test was performed under 3,000 rpm and 245 N radial load at 120。C. Grease taken ken tested bearings was checked in using certain evaluation methods, for example, oxidation induction time (OIT), FT-IR peak intensity, leakage .ate, bleeding .ate, total acid number. (TAN) and bearing noise increase. Within these test conditions, OIT, TAN, bleeding rate were changed gradually in accordance with bearing operating time and showed useful indices for deterioration of grease.

• Korean Journal of Materials Research
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• v.12 no.6
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• pp.482-487
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• 2002

A $TiO_2$ film for photocatalyst was prepared by anodic oxidation at 180V in acidic electrolyte and film formation mechanism was studied. The major part of anodic $TiO_2$ film consisted of anatase type structure and surface morphology exhibited a porous cell structure. The thickness growth rate of the oxide film with anodization time revealed two-stage slope corresponds to the surface morphology between anodic films. The growth of pores on cell structure and the growth rate of film with two-stage slope are related to the constant formation rate of the $TiO_2$ layer.

• Journal of environmental and Sanitary engineering
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• v.17 no.1
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• pp.69-74
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• 2002

This study explored for treatment processes by investigating the treatment efficiency and reaction mechanism through oxidation reaction using UV and $O_3$ as oxidant in compensate the wastewater containing nitrobenzene that is non biodegradable organic. Also by modeling these reactions, we try to step explanation of optimum reaction rate and reaction mechanism as the development of the computer program predictable the reaction rate by modeling the reaction. By using this model, after kinetic constant for each reaction from an experimental data is made an optimization and for hardly contribute to reaction rate in reaction kinetic equation is made an ignorance and suppose the simplified reaction mechanism, examined the propriety of computer simulation model and simplified reaction mechanism by comparing and inspecting the reaction kinetic constant and masstransfer coefficient. An investigation results for destructional treatment of nitrobenzene in the wastewater as non-biddegradable organic using UV, $O_3{\;}O_2{\;}H_2O_2-UV$ as oxidant.

• Transactions of the Korean Society of Automotive Engineers
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• v.14 no.1
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• pp.183-190
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• 2006

For continuously regenerative PM collecting system which adopted thermally stable SiC DPF and electrical heater which was placed upstream of the filter and driven by well constructed control logic, PM oxidation characteristics were investigated varying air flow rate, amounts of PM accumulated on the DPF and filter inlet temperature in order to get optimized PM regeneration performance. This study showed that the operating condition of air flow rate 70 lpm, high PM loading around 30g and filter inlet temperature $700^{\circ}C$ with heat insulation was effective in achieving high regeneration efficiency. Also, in this condition, we could decrease the electric energy consumption by reducing the regeneration time.

• Bulletin of the Korean Chemical Society
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• v.27 no.2
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• pp.255-265
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• 2006

The oxidation of hydrazobenzene by molecular oxygen in the polar solvent methanol is catalysed by a Schiff's base complex Co(3MeOsalen) which is a synthetic oxygen carrier. The products are trans-azobenzene and water. The rate of the reaction has been studied spectrophotometrically and the rate law established. A mechanism involving a ternary complex of catalyst, hydrazobenzene and molecular oxygen has been proposed. The kinetic studies show that a ternary complex $CoL{\cdot}H_2AB{\cdot}O_2$ is involved in the rate determining step. The reactions are summarised in a catalytic cycle. The kinetic data suggest that a ternary complex involving Co(3MeOsalen), triphenyl-phosphine and molecular oxygen is catalytically acive species but at higher triphenylphosphine concentrations the catalyst becomes inactive. The destruction of the catalytic activity could be due to the catalyst becoming coordinated with triphenyl phosphine at both z axis sites of the complex e.g. Co (3MeOsalen)$(PPh_3)_2$.

• Environmental Analysis Health and Toxicology
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• v.12 no.3_4
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• pp.1-13
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• 1997

First- and second-order kinetic oxidation rates of trichlorobenzenes (TCBs) were obtained and compared by a chemical activation system (CAS) which mimics mixed functional oxidase activity. The system consists of EDTA, ferrous sulfate, ascorbic acid, and $H_2O_2$ in potassium phosphdte buffer (monobasic at pH 7.4). The rate of transformation in CAS was enhanced in the presence and absence of catalase in the sequence 1, 2, 3-TCB < 1, 2, 4-TCB < 1, 3, 5-TCB. In general, the rates of degradation were greater in the test media with catalase. The effect of photolysis on the degradation of the TCBs with the CAS were examined. Sensitized photolysis with nitrite, Fenton's reagent, TiO$_2$ and triethylamine (TEA) studied in concert with the CAS demonstrated significant enhancement of the degradation rate of TCBs. Disappearance rates of TCBs in CAS with prior photolysis or prior photosensitization were at least 10-fold higher than the sum of the rate for each single experiment. This study proves that the combination of the CAS and photolysis can be used as a suitable technique for enhancing degradation of TCBs in aqueous systems.

• Journal of information and communication convergence engineering
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• v.1 no.2
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• pp.67-69
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• 2003

The experimental studies for the etch properties of the oxide grown on silicon substrate, which is in diluted hydrogen fluoride (HF) solution, are presented. Using different ion implantation dosages, dopants and energies, silicon substrate was implanted. The wet etching in diluted HF solution is used as a mean of wafer cleaning at various steps of VLSI processing. It is shown that the wet etch rate of oxide grown on various implanted silicon substrates is a strong function of ion implantation dopants, dosages and energies. This phenomenon has never been reported before. This paper shows that the difference of wet etch rate of oxide by ion implantation conditions is attributed to the kinds and volumes of dopants which was diffused out into $SiO_2$ from implanted silicon during thermal oxidation.