Deposition of Epitaxial Silicon by Hot-Wall Chemical Vapor Deposition (CVD) Technique and its Thermodynamic Analysis
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- 한국결정성장학회:학술대회논문집
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- 한국결정성장학회 1998년도 PROCEEDINGS OF THE 14TH KACG TECHNICAL MEETING AND THE 5TH KOREA-JAPAN EMGS (ELECTRONIC MATERIALS GROWTH SYMPOSIUM)
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- pp.173-176
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- 1998