• Korean Journal of Optics and Photonics
• /
• v.34 no.5
• /
• pp.202-209
• /
• 2023

A KRISS-type small integrating sphere with a high spatial radiance uniformity was made using pressed polytetrafluoroethylene (PTFE) and a reflective rod to calibrate the spectral radiance responsivity of absolute radiant thermometers. The spatial radiance uniformity of the KRISS-type small integrating sphere was ±0.009%, five times higher than the best value reported by foreign national metrology institutions thus far. In addition, we improved the spatial radiance uniformity of a commercial sintered PTFE integrating sphere by a factor of 10.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
• /
• v.31 no.3
• /
• pp.177-181
• /
• 2018

We prepared ZnS thin films via chemical bath deposition (CBD) in an aqueous solution of ammonia ($NH_3$) and hydrazine ($N_2H_4$). The composition ratio of hydrazine used was 0%, 17%, 22%, 29%, or 50%. We investigated the effects of hydrazine and ammonia on the growth, and the structural and optical properties of ZnS in terms of surface uniformity, voids, and grain size. We found that during the growth of ZnS films, hydrazine was very effective for improving the surface morphology and layer uniformity with fast layer formation, while it had no effect on the bandgap energy, $E_g$.

• Proceedings of the Korean Vacuum Society Conference
• /
• 2016.02a
• /
• pp.213-213
• /
• 2016

현재 반도체 산업에서는 디바이스의 고 집적화, 고 수율을 목적으로 패턴의 미세화 및 웨이퍼의 대면적화와 같은 이슈가 크게 부각되고 있다. 다중 패터닝(multiple patterning) 기술을 통하여 고 집적 패턴을 구현이 가능해졌으며, 이와 같은 상황에서 각 패턴의 임계치수(critical dimension) 변화는 패턴의 위치 및 품질에 큰 영향을 끼치기 때문에 포토마스크의 임계치수 균일도(critical dimension uniformity, CDU)가 제작 공정에서 주요 파라미터로 인식되고 있다. 반도체 광 리소그래피 공정에서 크롬(Cr) 박막은 사용되는 포토 마스크의 재료로 널리 사용되고 있으며, 이러한 포토마스크는 fused silica, chrome, PR의 박막 층으로 이루어져 있다. 포토마스크의 패턴은 플라즈마 식각 장비를 이용하여 형성하게 되므로, 식각 공정의 플라즈마 균일도를 계측하고 관리 하는 것은 공정 결과물 관리에 필수적이며 전체 반도체 공정 수율에도 큰 영향을 미친다. 흔히, 포토마스크 임계치수는 플라즈마 공정에서의 라디칼 농도 및 식각 선택비에 의해 크게 영향을 받는 것으로 알려져 왔다. 본 연구에서는 Cr 포토마스크 에칭 공정에서의 Cl2/O2 공정 플라즈마에 대해 O2 가스 주입량에 따른 식각 선택비(etch selectivity) 변화를 계측하여 선택비 제어를 통한 Cr 포토마스크 임계치수 균일도 향상을 실험적으로 입증하였다. 연구에서 사용한 플라즈마 계측 방법인 발광분광법(OES)과 optical actinometry의 적합성을 확인하기 위해서 Cl2 가스 주입량에 따른 actinometer 기체(Ar)에 대한 atomic Cl 농도비를 계측하였고, actinometry 이론에 근거하여 linear regression error 1.9%을 보였다. 다음으로, O2 가스 주입비에 따른 Cr 및 PR의 식각률(etch rate)을 계측함으로써 식각 선택비(etch selectivity)의 변화율이 적은 O2 가스 농도 범위(8-14%)를 확인하였고, 이 구간에서 임계치수 균일도가 가장 좋을 것으로 예상할 수 있었다. (그림 1) 또한, spatially resolvable optical emission spectrometer(SROES)를 사용하여 플라즈마 챔버 내부의 O atom 및 Cl radical의 공간 농도 분포를 확인하였다. 포토마스크의 임계치수 균일도(CDU)는 챔버 내부의 식각 선택비의 변화율에 강하게 영향을 받을 것으로 예상하였고, 이를 입증하기 위해 각각 다른 O2 농도 환경에서 포토마스크 임계치수 값을 확인하였다. (표1) O2 11%에서 측정된 임계치수 균일도는 1.3nm, 그 외의 O2 가스 주입량에 대해서는 임계치수 균일도 ~1.7nm의 범위를 보이며, 이는 25% 임계치수 균일도 향상을 의미함을 보인다.

• Journal of the Optical Society of Korea
• /
• v.17 no.3
• /
• pp.242-248
• /
• 2013

Full color holographic optical element fabrication using a photopolymer is proposed for a waveguide-type head mounted display. The fabricated full color holographic optical elements can be attached to the waveguide to replace the conventional couple-in and couple-out optics in the head mounted display. To implement the system, this study analyzed the optical characteristics of the photopolymer using three lasers (red, green and blue). Considering the color uniformity, a new laminated structure for a full color holographic optical element was also designed. The proposed system was confirmed experimentally.

• 한국정보디스플레이학회:학술대회논문집
• /
• 2002.08a
• /
• pp.905-909
• /
• 2002

Characteristics of reflective LCDs, which have gained a lot of notice in recent years, rely largely on optical design of circular polarizers and the quarter-wave plates, as a component. Important design includes wavelength dispersion, viewing angle, uniformity of display and matching of refractive index. Our work has contributed to improving performance of reflective LCDs by enhancing the characteristics of polymer film using stretching and optical lamination technologies. To design that offers higher contrast and wider viewing angle, we have discovered that it is necessary to control viewing angle variation of the polarizing axis in order to compensate for the viewing angle of the polarizing film as well as the optical anisotropic properties of liquid crystal. Applying this technology to circular polarizers used for reflective LCDs enables design of wide viewing angle circular polarizers. In order to realize higher contrast for reflective LCDs, it is also necessary to design other optical materials including polarizing films. For design of hybrid optical film, it is particularly necessary to reduce surface reflection and interface reflection. This paper also reports our findings concerning this topic.

• Journal of the Optical Society of Korea
• /
• v.14 no.3
• /
• pp.266-276
• /
• 2010

In the present study, an optical system is proposed for maskless lithography using a digital micromirror device (DMD). The system consists of an illumination optical system, a DMD, and a projection lens system. The illumination optical system, developed for 95% uniformity, is composed of fly's eye lens plates, a 405 nm narrow band pass filter (NBPF), condensing lenses, a field lens and a 250W halogen lamp. The projection lens system, composed of 8 optical elements, is developed for 4 ${\mu}m$ resolution. The proposed system plays a role of an optical engine for PCB and/or FPD maskless lithography. Furthermore, many problems arising from the presence of masks in a conventional lithography system, such as expense and time in fabricating the masks, contamination by masks, disposal of masks, and the alignment of masks, may be solved by the proposed system. The proposed system is verified by lithography experiments which produce a line pattern with the resolution of 4 ${\mu}m$ line width.

• Journal of the Korean Society of Manufacturing Technology Engineers
• /
• v.24 no.2
• /
• pp.217-223
• /
• 2015

In this paper, the performance of a system was analyzed according to the design parameters of a LED secondary lens that can be applied at a very close range, e.g., for direct lighting or display systems. We designed the secondary lens of the very-close-range LED using an aspheric equation and analyzed its performance-particularly the angle of the beam spread, central luminous intensity, and light uniformity-with respect to the thickness of lens, radius, conic constant, and asphericity (4th). Our analysis shows that four parameters affect the performance. The simulation results indicate an optimal thickness of 1 mm and show that a larger radius yields higher performance. The optimal range for the conic constant was determined as -1.21 to -1.25, the optimal range for the asphericity was determined as 0.0047xx to 0.0049xx (4th).

• Proceedings of the KIEE Conference
• /
• 1998.11c
• /
• pp.776-778
• /
• 1998

Electrical and optical characteristics of Powder type EL display(P-ELD) in this study are described, In experimental results of V-J, current are increased with increasing the frequency and voltage. Luminance was increased with frequency. This is due to the positive space charge formed to cathode region. Lumiance at 150V, 20 kHz has $840\;cd/m^2$. This tendency is due to the decrease of capacitive reactance in insulator layer. Uniformity of P-ELD shows 97%. CIE chromaticity with increasing frequency are shifted toward blue color. It can be explained in tenn of the difference of recombination energy.

• Proceedings of the KSRS Conference
• /
• 2004.10a
• /
• pp.432-435
• /
• 2004

MSC (Multi Spectral Camera) system is a remote sensing payload to obtain high resolution ground image. In this application, uniformity characteristic is important as well as GSD (Ground Resolved Distance) and SNR (Signal to Noise Ratio). MSC image chain is consisted of OM (Optical Module), CCD, Video processor, NUC and DCSU (Data Compression and Storage Unit). Each block makes and corrects MSC's nonuniformity response. This paper shows the cause of nonuniformity error and the correction scheme of MSC system from the electronic point of view.

• Current Optics and Photonics
• /
• v.6 no.3
• /
• pp.332-336
• /
• 2022

Given a cubic space, it is easy to uniformly illuminate the floor with light sources placed on top. However, little has been reported about uniform illumination on walls with the same configuration of light sources. Here we present a luminaire consisting of nine light-emitting diodes (LEDs) with perfect Lambertian distribution, placed on the top as a 3 × 3 rectangular LED array. The distances between LEDs and tilt angles of each individual LED are adjustable and optimized by an annealing algorithm. After optimization, the array produces a rectangular illumination pattern on one wall with a uniformity of about 89%. Analysis shows that the tilt angles of individual LEDs are key parameters for uniform side illumination. In a scenario that is more practical, the tilt angles of all the LEDs are set to be the same, only decreasing the uniformity to 83%.