Journal of the Korean Institute of Electrical and Electronic Material Engineers (한국전기전자재료학회논문지)

The Korean Institute of Electrical and Electronic Material Engineers (한국전기전자재료학회)
권호 표지
DOI QR코드

DOI QR Code

Effect of Hydrazine as a Complex Agent on the Growth of ZnS Thin Film by Using Chemical Bath Deposition (CBD)

CBD법에 의한 ZnS 박막 성장의 하이드라진 효과

  • Lee, Cha Ran (Department of Energy Convergence Engineering, Cheongju University) ;
  • Kim, Jeha (Department of Energy Convergence Engineering, Cheongju University)
  • 이차란 (청주대학교 에너지융합학과) ;
  • 김제하 (청주대학교 에너지융합학과)
  • Received : 2017.12.04
  • Accepted : 2017.12.28
  • Published : 2018.03.01
Download PDF
⟨ Previous Next ⟩

Abstract

We prepared ZnS thin films via chemical bath deposition (CBD) in an aqueous solution of ammonia ($NH_3$) and hydrazine ($N_2H_4$). The composition ratio of hydrazine used was 0%, 17%, 22%, 29%, or 50%. We investigated the effects of hydrazine and ammonia on the growth, and the structural and optical properties of ZnS in terms of surface uniformity, voids, and grain size. We found that during the growth of ZnS films, hydrazine was very effective for improving the surface morphology and layer uniformity with fast layer formation, while it had no effect on the bandgap energy, $E_g$.

Keywords

References

  1. J. M. Hwang, M. O. Oh, I. Kim, J. K. Lee, and C. S. Ha, Curr. Appl. Phys., 5, 31 (2005). [DOI: https://doi.org/10.1016/ j.cap.2003.11.075]
  2. S. H. Deulkar, C. H. Bhosale, and M. Sharon, J. Phys. Chem. Solids, 65, 1879 (2004). [DOI: https://doi.org/10.1016/j.jpcs.2004. 06.012]
  3. L. X. Shao, K. H. Chang, and H. L. Hwang, Appl. Surf. Sci., 212, 305 (2003). [DOI: https://doi.org/10.1016/S0169-4332(03)00085-0]
  4. J. R. Bakke, J. S. King, H. J. Jung, R. Sinclair, and S. F. Bent, Thin Solid Films, 518, 5400 (2010). [DOI: https:// doi.org/10.1016/j.tsf.2010.03.074]
  5. B. Elidrissi, M. Addou, M. Regragui, A. Bougrine, A. Kachouane, and J. C. Bernede, Mater. Chem. Phys., 68, 175 (2001). [DOI: https://doi.org/10.1016/S0254-0584(00)00351-5]
  6. T. B. Nasr, N. Kamoun, M. Kanzari, and R. Bennaceur, Thin Solid Films, 500, 4 (2006). [DOI: https://doi.org/10.1016/j.tsf. 2005.11.030]
  7. H. Ke, S. Duo, T. Liu, Q. Sun, C. Ruan, X. Fei, J. Tan, and S. Zhan, Mater. Sci. Semicond. Process., 18, 28 (2014). [DOI: https://doi.org/10.1016/j.mssp.2013.10.022]
  8. T. M. Hsieh, S. J. Lue, J. Ao, Y. Sun, W. S. Feng, and L. B. Chang, J. Power Sources, 246, 443 (2014). [DOI: https://doi.org/10.1016/j.jpowsour.2013.07.090]
  9. J. Hong, D. Lim, Y. J. Eo, and C. Choi, Appl. Surf. Sci., 432, 250 (2018). [DOI: https://doi.org/10.1016/j.apsusc.2017.09.133]
  10. A. Wei, J. Liu, M. Zhuang, and Y. Zhao, Mater. Sci. Semicond. Process., 16, 1478 (2013). [DOI: https://doi.org/10.1016/j.mssp.2013.03.016]