Study the Feasibility of Optical Lithography for critical Lyers of 0.12$\mu\textrm{m}$
(0.12$\mu\textrm{m}$ 설계규칙을 갖는 DRAM 셀 주용 레이어의 OPC 및 PSM)
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- Journal of the Korean Institute of Electrical and Electronic Material Engineers
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- v.14 no.1
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- pp.6-11
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- 2001