• 한국전기전자재료학회논문지
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• 제37권3호
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• pp.292-296
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• 2024

In this study, Iron (III) oxide-hydroxide (δ-FeOOH) was successfully synthesized using hydrogen peroxide (H₂O₂) as an oxidizing agent. The synthesis of δ-FeOOH was carried out by controlling the amount of H₂O₂, and pure δ-FeOOH was successfully synthesized in ranges from 0.2 mL to 0.6 mL of H₂O₂. The size of the synthesized δ-FeOOH particles was compared by controlling the amount of oxidant H₂O₂. The average particle size of the synthesized pure δ-FeOOH particles increased from 875.1 nm to 897.2 nm as the amount of H₂O₂ was increased. The optical properties of δ-FeOOH synthesized under these specific conditions were investigated. All δ-FeOOH showed a similar trend of increasing and decreasing light absorption from 800 nm to 400 nm, although there was a slight difference in the amount of light absorption, with the largest amount of light absorption at 410 nm. The band gap energy of δ-FeOOH through the Tauc plot method was about 2.1~2.2 eV when H₂O₂ was 0.2~1.4mL. With a sufficient small particle size, simple control of that particle size, and a small band gap energy enough to absorb light in the visible spectrum, δ-FeOOH could be useful in a variety of applications, including photoelectrochemistry and battery electrodes.

• Nuclear Engineering and Technology
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• 제56권7호
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• pp.2842-2849
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• 2024

The amorphous glasses containing PbO, ZnO, MgO, and B₂O₃ have been fabricated using the melt quenching technique. The structural properties have been analysed using the Fourier-transform infrared (FTIR) and Raman spectroscopy. Derivative of Absorption Spectra Fitting (DASF) method have been used to estimate the band gap energy from the UV-Vis absorption data which decreases from 3.02 eV to 2.66 eV with increasing the concentration of the PbO.The four glass samples 0.284 and 0.826 MeV showed unique variations in terms of gamma attenuation ability. LZMB4 glass sample proved to be the mist effective in terms of shielding of gamma radiation as it requires little distance compared to LZMB3, LZMB2 and LZMB1 to attenuate. RPE revealed a raise with increase in the thickness of the material and reduces as the energy raises. TF is superior in LZMB1 compared to LZMB2, LZMB3 and LZMB4, confirming that, LZMB4 will attenuate better. The Z_Eff of the materials was seen falling as the energy increases, confirming that the linear attenuation coefficient of the glass materials decreases when the energy is increased. The results confirmed that, glass material LZMB4 is the best option especially for gamma radiation shielding applications compared to LZMB3, followed by LZMB2, then LZMB1.

• 대한전기학회:학술대회논문집
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• 대한전기학회 2000년도 학술대회 논문집 전문대학교육위원
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• pp.35-39
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• 2000

$ZnIn_2S_4$ and $ZnGaInS_4:Er^{3+}$ single crystals crystallized in the rhombohedral (hexagonal) space group $C_{3v}^5(R3m)$, with lattice constants $a=3.852{\AA},\;c=37.215{\AA}$ for $ZnIn_2S_4$, and $a=3.823{\AA}$, and $c=35.975{\AA}$ for $ZnIn_2S_4:Er^{3+}$. The optical absorption measured near the fundamental band edge showed that the optical energy band structure of there compounds had a direct and indirect band gap, the direct and indirect energy gaps are found to be 2.778 and 2.682 eV for $ZnIn_2S_4$, and 2.725 and 2.651eV for $ZnIn_2S_4:Er^{3+}$ at 293 K. The photoluminescence spectra of $ZnIn_2S_4:Er^{3+}$ measured in the wavelength ranges of $500nm{\sim}900nm$ at 10 K. Eight sharp emission peaks due to $Er^{3+}$ ion are observed in the regions of $549.5{\sim}550.0nm,\;661.3{\sim}676.5nm$, and $811.1{\sim}834.1nm$, and $1528.2{\sim}1556.0nm$ in $CdGaInS_4:Er^{3+}$ single crystal. These PL peaks were attributed to the radiative transitions between the split electron energy levels of the $Er^{3+}$ ions occupied at $C_{2v}$, symmetry of the $ZnIn_2S_4$ single crystals host lattice.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2003년도 춘계학술대회 논문집 센서 박막재료 반도체 세라믹
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• pp.154-157
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• 2003

$TiO_2$ thin films were fabricated by RF magnetron sputtering system at by controlling deposition times, ratios of $Ar:O_2$ partial presser ratio and substrate conditions. And the surface, cross-section morphology, microstructure, and composition ratio of the films were analyzed by FE-SEM, TEM and XPS. Besides, the optical absorption and transmittance of the $TiO_2$ films were measured by a UV-VIS-NIR Spectrophotometer, and photocatalytic properties were studied by G${\cdot}$C Analyzer & Data Analysis system. As the result, when $TiO_2$ thin film was made at deposition time of 120[min] and $Ar:O_2$ ratio of 60:40, the best structural and optical properties among many thin films could be accepted. The best results of properties were as follows: thickness; 360~370[nm), grain size; 40[nm], gap between two peak binding energy; $5.8{\pm}0.05[eV]$ ($2_{p3/2}$ peak and $2_{p1/2}$ peak of Ti was show at $458.3{\pm}0.05[eV]$ and $464.1{\pm}0.05[eV]$ respectively), binding energy; $530{\pm}0.05[eV]$, optical energy band gap; 3.4[eV].

• Current Photovoltaic Research
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• 제4권1호
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• pp.25-29
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• 2016

$Eu^{3+}$-activated $MgMoO_4$ phosphor thin films were grown at $400^{\circ}C$ on quartz substrates by radio-frequency magnetron sputter deposition from a 15 mol% Eu-doped $MgMoO_4$ target. After the deposition, the phosphor thin films were annealed at several temperatures for 30 min in air. The influence of thermal annealing temperature on the structural and optical properties of $MgMoO_4:Eu^{3+}$ phosphor thin films was investigated by using X-ray diffraction (XRD), photoluminescence (PL), and ultraviolet-visible spectrophotometry. The transmittance, optical band gap, and intensities of the luminescence and excitation spectra of the thin films were found to depend on the thermal annealing temperature. The XRD patterns indicated that all the thin films had a monoclinic structure with a main (220) diffraction peak. The highest average transmittance of 91.3% in the wavelength range of 320~1100 nm was obtained for the phosphor thin film annealed at $800^{\circ}C$. At this annealing temperature the optical band gap energy was estimated as 4.83 eV. The emission and excitation spectra exhibited that the $MgMoO_4:Eu^{3+}$ phosphor thin films could be effectively excited by near ultraviolet (281 nm) light, and emitted the dominant 614 nm red light. The results show that increasing RTA temperature can enhance $Eu^{3+}$ emission and excitation intensity.

• Transactions on Electrical and Electronic Materials
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• 제4권1호
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• pp.7-10
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• 2003

Single phase CuInS$_2$ thin film with the strongest diffraction peak (112) at diffraction angle (2$\theta$) of 27.7$^{\circ}$ and the second strongest diffraction peak (220) at diffraction angle (2$\theta$) of 46.25$^{\circ}$was well made with chalcopyrite structure at substrate temperature of 70$^{\circ}C$. annealing temperature of 250$^{\circ}C$, annealing time of 60 min. The CuInS$_2$ thin film had the greatest grain size of 1.2 Um when the Cu/In composition ratio of 1.03, where the lattice constant of a and c were 5.60${\AA}$ and 11.12${\AA}$, respectively. The Cu/In stoichiometry of the single-phase CuInS$_2$thin films was from 0.84 to 1.3. The film was p-type when tile Cu/In ratio was above 0.99 and was n-type when the Cu/In was below 0.95. The fundamental absorption wavelength, absorption coefficient and optical band gap of p-type CuInS$_2$ thin film with Cu/In=1.3 were 837nm, 3.OH 104 cm-1 and 1.48 eV, respectively. The fundamental absorption wavelength absorption coefficient and optical energy band gap of n-type CuInS$_2$ thin film with Cu/In=0.84 were 821 nm, 6.0${\times}$10$^4$cm$\^$-1/ and 1.51 eV, respectively.

• 한국표면공학회지
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• 제34권5호
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• pp.503-509
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• 2001

Thin films of hydrogenated amorphous silicon (a-Si : H) and hydrogenated amorphous silicon carbide (a-SiC:H) of different compositions were deposited on Si(100) wafer and glass by RF plasma-enhanced chemical vapor deposition (RF-PECVD). In the present work, we have investigated the effects of the RF power on the properties, such as optical band gap, transmittance and crystallinity. The Raman data show that the a-Si:H material consists of an amorphous and crystalline phase for the co-presence of two peaks centered at 480 and $520 cm^{-1}$ . The UV-VIS data suggested that the optical energy band gap ($E_{g}$ ) is not changed effectively with RF power and the obtained $E_{g}$(1.80eV) of the $\mu$c-Si:H thin film has almost the same value of a-Si:H thin film (1.75eV), indicating that the crystallity of hydrogenated amorphous silicon thin film can mainly not affected to their optical properties. However, the experimental results have shown that$ E_{g}$ of the a-SiC:H thin films changed little on the annealing temperature while $E_{g}$ increased with the RF power. The Raman spectrum of the a-SiC:H thin films annealed at high temperatures showed that graphitization of carbon clusters and microcrystalline silicon occurs.

• 한국진공학회지
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• 제6권2호
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• pp.129-135
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• 1997

$ZnIn_2Se_4$ 및 $ZnIn_2Se_4$:Co 단결정을 합성된 ingot를 사용하여 수직 Bridgman 방법으 로 성장시키고, 성장된 단결정의 결정구조와 광학적 특성을 연구하였다. 성장된 단결정은 공 간군이 142m인 사방정계구조를 가지고 있다. 기초 흡수단 영역에서의 광흡수 spectra측정으 로부터 이 단결정들은 간접전이형 에너지띠 구조를 갖고 있으며, 이 화합물 반도체의 직접 전이형 및 간접전이형 에너지 간격은 10K에서 300K로 측정 온도를 변화시킬 때 감소하였 다. 직접전이 energy gap의 온도계수는 $ZnIn_2Se_4$ 단결정의 경우는 $\alpha=3.57\times10^{-4}$eV/K, $\beta$ =519K이고, $ZnIn_2Se_4$:Co 단결정의 경우는 $\alpha=2.79\times10^{-4}$eV/K 및 $\beta$=421K로 각각 주어졌다. 또한 간접전이 energy gap의 온도계수는 ZnIn2Se4 단결정의 경우는 $\alpha=2.31\times10^{-4}$eV/K 및 $\beta$=285K이며, $ZnIn_2Se_4$:Co 단결정의 경우는 $\alpha=3.71\times10^{-4}$eV:K와 $\beta$=609K이였다. $ZnIn_2Se_4$:Co 단결정에서 cobalt 불순물에 기인한 6개의 불순물 광흡수 peak가 나타났다. 이 들 불순물 광흡수 peak들은 불순물로 첨가된 cobalt가 모체별정의 $T_d$ symmetry site에 $CO^{2+}$ion으로 위치하고, $CO^{2+}$ion의 분리된 전자에너지 준위들 사이의 전자전이에 의해 나타난 peak들로 해석된다.

• 대한금속재료학회지
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• 제50권11호
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• pp.847-854
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• 2012

Al-doped ZnO (AZO) thin films were grown on quartz substrates by the sol-gel method. The effects of the Al mole fraction on the structural and optical properties of the AZO thin films were investigated by scanning electron microscopy (SEM), X-ray diffraction (XRD), and UV-VIS spectroscopy. The particle size of the AZO thin films decreased with an increase in Al concentrations. The optical parameters, the optical band gap, absorption coefficient, refractive index, dispersion parameter, and optical conductivity, were studied in order to investigate the effects of Al concentration on the optical properties of AZO thin films. The dispersion energy, single-oscillator energy, average oscillator wavelength, average oscillator strength, and refractive index at an infinite wavelength of the AZO thin films were affected by the Al incorporation. The optical conductivity of the AZO thin films also increased with increasing photon energy.

• Journal of Electrochemical Science and Technology
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• 제13권3호
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• pp.377-389
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• 2022

The current global energy supply depends heavily on fossil fuels. This makes technology such as direct water splitting from harvesting solar energy in photoelectrochemical (PEC) systems potentially attractive due to its a promising route for environmentally benign hydrogen production. In this study, undoped and nickel-doped molybdenum oxide photoanodes (called photoanodes S₁ and S₂ respectively) were synthesized through electrodeposition by applying -1.377 V vs Ag/AgCl (3 M KCl) for 3 hours on an FTO-coated glass substrate immersed in molibdatecitrate aqueous solutions at pH 9. Scanning electron microscopy (SEM), atomic force microscopy (AFM), energy-dispersive X-ray spectroscopy (EDS), and X-ray photoelectron spectroscopy (XPS) were used for microstructural and compositional characterizations of the photoanodes. In addition, the optical and photoelectrochemical characterizations of these photoanodes were performed by UV-Visible spectroscopy, and linear scanning voltammetry (LSV) respectively. The results showed that all the photoanodes produced exhibit conductivity and catalytic properties that make them attractive for water splitting application in a photoelectrochemical cell. In this context, the photoanode S₂ exhibited better photocatalytic activity than the photoanode S₁. In addition, photoanode S₂ had the lowest optical band-gap energy value (2.58 eV), which would allow better utilization of the solar spectrum.