• Title/Summary/Keyword: optical aberrations

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Paraboloidal 2-mirror Holosymmetric System with Unit Maginification for Soft X-ray Projection Lithography (연X-선 투사 리소그라피를 위한 등배율 포물면 2-반사경 Holosymmetric System)

  • 조영민;이상수
    • Korean Journal of Optics and Photonics
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    • v.6 no.3
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    • pp.188-200
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    • 1995
  • A design of unit magnification 2-mirror system with high resolution is presented. It is for soft X-ray(wavelength of 13 nm) projection imaging and suitable for preparation of high density semiconductor chip. In general, a holosymmetric system with unit magnification has the advantage that both coma and distortion are completely eliminated. In our holosymmetric 2-mirror system, spherical aberration is addtionally removed by using two identical paraboloidal mirror surfaces and field curvature aberration is also corrected by balancing Petzval sum and astigmatism which depends on the distance between two mirrors, so that the system is a aplanatic flat-field paraboloidal 2-mirror holosymmetric system. This 2-mirror system is small in size, and has a simple configuration with rotational symmetry about optical axis, and has also small central obscuration. Residual finite aberrations, spot diagrams, and diffraction-based MTF's are analyzed for the check of performances as soft X-ray lithography projection system. As a result, the image sizes for the resolutions of$0.25\mum$and $0.18\mum$are 4.0 mm, 2.5 mm respectively, and depths of focus for those are $2.5\mum$, $2.4\mum$respectively. This system should be useful in the fabrication of 256 Mega DRAM or 1 Giga DRAM. DRAM.

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A Study on the Improvement of Wavefront Sensing Accuracy for Shack-Hartmann Sensors (Shack-Hartmann 센서를 이용한 파면측정의 정확도 향상에 관한 연구)

  • Roh, Kyung-Wan;Uhm, Tae-Kyoung;Kim, Ji-Yeon;Park, Sang-Hoon;Youn, Sung-Kie;Lee, Jun-Ho
    • Korean Journal of Optics and Photonics
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    • v.17 no.5
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    • pp.383-390
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    • 2006
  • The SharkHartmann wavefront sensors are the most popular devices to measure wavefront in the field of adaptive optics. The Shack-Hartmann sensors measure the centroids of spot irradiance distribution formed by each corresponding micro-lens. The centroids are linearly proportional to the local mean slopes of the wavefront defined within the corresponding sub-aperture. The wavefront is then reconstructed from the evaluated local mean slopes. The uncertainty of the Shack-Hartmann sensor is caused by various factors including the detector noise, the limited size of the detector, the magnitude and profile of spot irradiance distribution, etc. This paper investigates the noise propagation in two major centroid evaluation algorithms through computer simulation; 1st order moments of the irradiance algorithms i.e. center of gravity algorithm, and correlation algorithm. First, the center of gravity algorithm is shown to have relatively large dependence on the magnitudes of noises and the shape & size of irradiance sidelobes, whose effects are also shown to be minimized by optimal thresholding. Second, the correlation algorithm is shown to be robust over those effects, while its measurement accuracy is vulnerable to the size variation of the reference spot. The investigation is finally confirmed by experimental measurements of defocus wavefront aberrations using a Shack-Hartmann sensor using those two algorithms.

Ultra-Compact Zoom Lens Design for Phone Camera Using Hybrid Lens System (복합렌즈계를 이용한 폰 카메라용 초소형 줌렌즈 설계)

  • Park, Sung-Chan;You, Byoung-Taek
    • Korean Journal of Optics and Photonics
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    • v.19 no.5
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    • pp.349-359
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    • 2008
  • For an inner-focusing 3-groups zoom lens system, this study suggests a new initial design method which applies the process that changes thin lenses into thick ones effectively and quickly, using the hybrid lens system(thin lens+thick lens). In other words, the hybrid lens system is the semi-automatic design process that makes the thin lens of one group change into a thick one while the other groups are composed of thin lenses. Keeping the total power of the system fixed, the power of each group and the distance between principal planes can be fixed. Of course, the other groups composed of thin lenses could be changed into thick lenses sequentially by this process. This design conception results in the 1/4" 5 M inner-focusing 3-groups 2x zoom lens system satisfying the specifications and performances of zoom lens for phone cameras. Also aspherization on lens elements of glass and plastic material enhanced the resolution and reduced the lens size. As a result, we have an ultra-compact inner-focusing 3-groups 2x zoom lens system for a phone camera, with a slim size with TTL of 9.8 mm.

Study on the Scan Field of Modified Octupole and Quadrupole Deflector in a Microcolumn (마이크로칼럼에서 변형된 4중극 디플렉터와 8중극 디플렉터의 스캔 영역 비교)

  • Kim, Young Chul;Kim, Ho-Seob;Ahn, Seong Joon;Oh, Tae-Sik;Kim, Dae-Wook
    • Journal of the Korea Academia-Industrial cooperation Society
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    • v.19 no.11
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    • pp.1-7
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    • 2018
  • In a microcolumn, a miniaturized electrostatic deflector is often adopted to scan an electron beam. Usually, a double octupole deflector is used because it can avoid excessive spherical aberrations by controlling the electron beam path close to the optical axis of the objective lens and has a wide scan field. Studies on microcolumns have been performed to improve the low throughput of an electron column through multiple column applications. On the other hand, as the number of microcolumns increases, the number of wires connected to the components of the microcolumn increases. This will result in practical problems during the process of connecting the wires to electronic controllers outside of the vacuum chamber. To reduce this problem, modified quadrupole and octupole deflectors were examined through simulation analysis by selecting an ultraminiaturized microcolumn with the Einzel lens eliminated. The modified deflectors were designed changing the size of each electrode of the conventional Si octupole deflector. The variations of the scan field and electric field strength were studied by changing the size of active electrodes to which the deflection voltage was to be applied. The scan field increased linearly with increasing deflection voltage. The scan field of the quadrupole deflector and the electric field strength at the center were calculated to be approximately 1.3 ~ 2.0 times larger than those of the octupole deflector depending on the electrode size.