• Title/Summary/Keyword: on-저항

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Evaluation and Selection of Breeding Lines of Pepper Developed by Incorporation of Resistance to Phytophthora capsid into Local Cultivars of Gyeungbuk Province (고추 역병 저항성 도입 경북지역 재래종 육성계통의 평가와 선발)

  • Kim, Byung-Soo;Kim, Jeong-Hoon
    • Current Research on Agriculture and Life Sciences
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    • v.21
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    • pp.11-16
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    • 2003
  • Lines bred for resistance to Phytophthora capsici by incorporation of resistance to P. capsici in PI201234 or CM334 into 'Subi' and 'Chilseong', land races in Youngyang, and 'Punggak', a land race in Cheongdo in Gyeungbuk province, and lines bred for fortification of one of them above with resistance to viral complex, and tolerant selections from another landrace collection from Punggak (KC268) were evaluated for resistance to P. capsici by inoculation at seedling stage. Almost all the breeding lines showed high level of resistance to P. capsid and selections from KC268 showed tolerance or moderate resistance to P. capsid. The selected plants were grown in a net cage in an outdoor nursery for seed production. Utilization of the lines in breeding was discussed.

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A Study on Contact Resistance of the Nano-Scale MOSFET (Nano-Scale MOSFET 소자의 Contact Resistance에 대한 연구)

  • 이준하;이흥주
    • Journal of the Korea Academia-Industrial cooperation Society
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    • v.5 no.1
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    • pp.13-15
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    • 2004
  • The current driven in an MOSFET is limited by the intrinsic channel resistance. All the other parasitic elements in a device structure play a significant role and degrade the device performance. These other resistances need to be less than 15% of the channel resistance. To achieve the requirements, we should investigate the methodology of separation and quantification of those resistances. In this paper, we developed the extraction method of resistances using calibrated TCAD simulation. The resistance of the extension region is also partially determined by the formation of a surface accumulation region that forms under the gate in the tail region of the extension profile. This resistance is strongly affected by the abruptness of the extension profile because the steeper the profile is, the shorter this accumulation region will be.

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Effect of Co/Pd Multilayer on the Magnetoresistance of Perpendicularly Magnetized Magnetic Tunnel Junction (Co/Pd 다층막구조가 수직자기터널접합의 자기저항에 미치는 영향)

  • Kim, Seong-Dong;Lim, Dong-Won;Lee, Seong-Rae
    • Journal of the Korean Magnetics Society
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    • v.16 no.6
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    • pp.271-275
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    • 2006
  • We investigated the magnetoresistance of perpendicularly magnetized magnetic tunnel junction composed of Co/Pd multilayers. The magnetoresistance was maximized with Co electrodes of about 5 nm thickness, which evidenced the important role of the interface in tunneling process. Both the change in perpendicular magnetic anisotropy and improvement of junction resistance were observed with changing Co sublayers, while the spin scattering became dominant with increasing Pd sublayers.

A Study on Composition of Current Stable Negative Resistance Circuitwith LED and CdS. (광전소자를 이용한 전류안정부저항 특성회로의 구성)

  • Park, Ui-Yeol;Do, Si-Hong;Mun, Jae-Deok
    • Journal of the Korean Institute of Telematics and Electronics
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    • v.12 no.5
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    • pp.1-5
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    • 1975
  • 접합형 트린지스터와 발광다이오드(LED) 및 광도전소자(CdS)로서 구성된 광결합 전류안정부저항회로를 진안하였다. 이는 일반적으로 광트랜지스터보다도 더 예민한 것을 이용하여, CdS와 LED를 밀착 시켜서 LED에 흐르는 전류와 CdS의 실효저항변화로써 결합된 광결합방식을 택하였다. 트랜지스터의 콜랙터-에미터간에 인위적인 누변저항을 삽입하는 방법을 도입함으로써 부저항치 및 최대입력단자전압치를 임의로 변화할 수 있게 하였으며, 제안한 회로를 분석하고 또 이를 실험적으로 확인하였다. 누변저항을 1KΩ에서 30KΩ까지 변화시켰을 때 최대입력단자전압은 1.65V에서 4.22V로 변하였고, 부저항치는 -1.0KΩ에서 -10.0KΩ까지 변하였다. 또 실험치에 대한 계산치에의 상대백분최대오차가 11%이었다. A current stable negative resistance circuit has been constucted with combination of coulplementary symmetrical transistors, a light emitting diode and a photoconductive cell. The negative resistance(Rn) and break-over voltage(VBo) can be set at a designed value according to adjustment of the artificial leakage resistance of p-n-p transistor. The RN and VBo calculated in this designed circuit are checked though the experiments, the errors are found less than 11%.

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A study on the Precision Measurement of Metal Electrical Resistivity (금속 전기비저항의 정밀측정에 관한 연구)

  • Kang, Jeon-Hong;Yu, Kwang-Min;Kim, Han-Jun;Han, Sang-Ok;Park, Kang-Sic;Lee, Sae-Hun
    • Proceedings of the KIEE Conference
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    • 2007.04b
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    • pp.37-39
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    • 2007
  • 금속의 전기 비저항 측정방법은 일반적으로 4단자, van der Pauw, Four-Point Probe(FPP), eddy current 방법 등이 있다. 이들의 측정방법들은 각각 다르지만 동일한 시료에 대한 전기 비저항 측정값은 거의 같은 결과를 나타내어 야 한다. 금속 전기 비저항의 정밀측정에 대한 연구를 위하여 비자성 금속인 STS 316 시료를 선정하여 측정한 결과 4단자와 van der Pauw 방법으로 측정된 비저항은 각각 $75.86{\mu}g\Omega{\cdot}cm$(2.273 %IACS), $75.80{\mu}g\Omega{\cdot}cm$(2.275 %IACS)이며, 측정 불확도는 0.25 %로서 거의 동등한 결과를 나타냈고, Four Point Probe(FPP) 방법으로 측정된 비저항은 $75.36{\mu}g\Omega{\cdot}cm$(2.288 %IACS), 측정 불확도는 0.45 %, eddy current 방법으로 측정된 비저항은 $76.63{\mu}g\Omega{\cdot}cm$(2.25 %IACS), 측정 불확도는 0.64 %로 나타났다.

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A.C.impedance properties on $RuO_2$-based thick film resistors ($RuO_2$계 후막저항체의 교류 임피던스 특성)

  • 구본급;김호기
    • Electrical & Electronic Materials
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    • v.3 no.4
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    • pp.315-324
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    • 1990
  • 저저항(DuPont 1721, 100.OMEGA./sq.)과 고저항(1741, 10K.OMEGA./sq.)의 두 Ru계 후막저항체를 여러 조건에서 소결하여 소결막의 복소임피던스 특성과 임피던스의 주파수의존성을 1KHz-13MHz의 주파수 범위에서 조사하였다. 저저항 1721계의 경우 600.deg.C이상에서 소결한 모든 시편이 거의 저항성분(R)만으로 구성된 등가회로에 해당되는 복소임피던스 거동을 보였으며 임피던스에 미치는 주파수 의존성은 크게 나타나지 않았는데 5KHz까지는 주파수에 따라 변화가 없다가 그 이상의 주파수에서 주파수 증가에 따라 약간씩 증가하였다. 고저항 1741 후막저항체의 경우는 소결조건에 따라 복소임피던스 거동과 임피던스에 미치는 주파수 의존성이 달리 나타났다. 600.deg.C에서는 용량(C) 성분만으로 구성된 등가회로에 해당하는 복소임피던스 거동을 얻었고 주파수 증가에 따라 임피던스가 직선적으로 감소하였으며 700.deg.C이상 900.deg.C까지는 저항(R)과 용량(C)이 병렬로 연결되는 형태의 등가회로에 해당하는 복소임피던스 거동을 얻었고 이때의 임피던스의 주파수 의존성은 저주파수 영역에서는 임피던스가 주파수에 변함없이 일정하다가 5KHz이상의 주파수에서는 주파수 증가에 따라 임피던스가 직선적으로 감소하였다. 1000.deg.C반응에서의 복소임피던스 거동은 RCL성분이 병렬로 연결된 형태의 등가회로에 해당되는 결과를 얻었으며 임피던스도 작아지고 주차수 의존성도 현저하지 않았다.

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Hull Form Generation of Minimum Wave Resistance by a Nonlinear Optimization Method (비선형 최적화 기법에 의한 최소 조파저항 선형 생성)

  • Hee-Jung Kim;Ho-Hwan Chun
    • Journal of the Society of Naval Architects of Korea
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    • v.37 no.4
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    • pp.11-18
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    • 2000
  • This paper is concerned with the generation of an optimal forward hull form by a nonlinear programming method. A Rankine source panel method based on the inviscid and potential flow approximation is employed to calculate the wave-making resistance and SQP method is also used for the optimization. The hull form is represented by a spline function. The forward hull form of a minimum wave resistance with the given design constraints is generated. In addition, the forward hull form of a minimum total resistance by considering the frictional resistance together with an empirical form factor is produced and compared with the former result.

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Effects of NiFeCo of NiFe Insertion Layers on the Giant Magnetoresistance Behavior of Ni/Cu Artificial Superlattice (Ni/Cu 인공초격자에서 NiFeCo 및 NiFe 계면 삽입층이 거대자기저항 거동에 미치는 영향)

  • 송용진;주승기
    • Journal of the Korean Magnetics Society
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    • v.5 no.6
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    • pp.963-967
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    • 1995
  • Ultra thin layers of NiFeCo or NiFe were inserted at the interfaces of Ni and Cu to form a multilayer structure. In case of inserting a NiFe layer, the magnetoresistance was about 6%, the saturation magnetic field was 50 Oe and the hysteresis of R-H (resistance-magnetic field) was very small. In case of inserting a NiFeCo layer, the magnetoresistance increased to about 7% but the saturation magnetic field and hysteresis were also increased. The increase of the output under biased magnetic field was much larger in case of inserting a NiFe layer because of relatively smaller hysteresis in R-H behavior.

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A Study on the Design and Implementation of Contact Resistance Measurement System and Andoroid OS App. (접촉저항 측정 시스템 및 안드로이드 운영체제 앱 설계 및 구현에 관한 연구)

  • Boo, Ra-Yun;Choi, Jung-Hun;An, Byung-Ho;Lee, Myung-Eui
    • Proceedings of the Korea Information Processing Society Conference
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    • 2022.11a
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    • pp.188-190
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    • 2022
  • 본 연구에서는 정전류(Constant Current) 방식에 전압강하법을 이용하여 접촉저항 측정 시스템을 구현하고 측정값을 블루투스 통신을 통해 안드로이드 운영체제에서 확인할 수 있도록 앱을 개발한다. 측정가능한 범위로 0 Ω에서 10.24 Ω 사이의 접촉 저항을 MCP3424 18 bit 분해능 ADC를 사용하여 측정할 수 있도록 설계하였다. 기존에는 반고정 저항과 별도의 전류계를 이용하여 정전류를 설정하였으나, 본 연구에서는 측정의 정밀도 및 편리성 개선을 위해 0.1% 고정밀 고정저항을 병렬로 4개 연결하여 구현하였으며, 또한 1:1 Unity Gain Buffer를 구성하고 Ultra High Precision Z-Foil 방식으로 오차 0.01%, 온도 계수 0.05 ppm/℃ 저항을 사용하여 실제로 측정한 샘플 저항 값의 결과를 확인하였다.

Identification of Leaf Blast Resistance Genes Derived from a Korean Weedy Rice, Ganghwaaengmi 11 (잡초성벼인 강화앵미11 유래 잎도열병 저항성 유전자 탐색)

  • Suh, Jung-Pil;Cho, Young-Chan;Kim, Jeong-Ju;Shin, Young-Seop;Yang, Chang-Ihn;Roh, Jae-Hwan;Kim, Yeon-Gyu
    • Korean Journal of Breeding Science
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    • v.42 no.4
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    • pp.390-396
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    • 2010
  • A weedy rice, Ganghwaaengmi 11, shows high level of leaf blast resistance. The chromosomal number and locations of genes conferring the leaf blast resistance were detected by QTL (quantitative trait loci) analysis using SSR markers in the 120 RILs (recombinant inbred lines) derived from the cross between Nagdongbyeo and Ganghwaaengmi 11. Ganghwaaengmi 11 expressed compatibility with 20 of the 45 inoculated blast isolates, in contrast to Nagdongbyeo with 44 compatible isolates. To identify QTLs affecting partial resistance, RILs were assessed in upland blast nursery in three regions and inoculated with selected nine blast isolates. QTLs for resistance to blast isolates were identified on chromosomes 7, 11 and 12. Three QTLs associated with blast resistance in nursery test at three regions were also detected on chromosomes 7, 11 and 12. The QTL commonly detected on chromosome 12 was only increased blast resistance by Ganghwaaengmi 11 allele. This QTL accounted for 60.3~78.6% of the phenotypic variation in the blast nursery test. OSR32 and RM101 markers tightly linked to QTL for blast resistance on chromosome 12 might be useful for marker-assisted selection (MAS) and gene pyramiding to improve the blast resistance of japonica rice.