• 제목/요약/키워드: nonequilibrium plasma

검색결과 16건 처리시간 0.024초

OpenFOAM을 이용한 비평형 플라즈마 연소 수치해석 (Numerical analysis of nonequilibrium plasma assisted combustion using OpenFOAM)

  • 박영도;허강열
    • 한국연소학회:학술대회논문집
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    • 한국연소학회 2015년도 제51회 KOSCO SYMPOSIUM 초록집
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    • pp.181-182
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    • 2015
  • The nonequilibrium plasmas in which electrons have much higher energy compared to heavy species that cannot be represented with single temperature can enhance combustion reaction significantly. Therefore the nonequilibrium plasmas provide new effective mechanism to control combustion to overcome difficulties advanced combustion devices exploiting extreme operating parameters for high efficiency, lower emission.

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Microwave plasma emission from tunnel-injected nonequilibrium high-Tc superconductors

  • Lee, Kie-Jin
    • 한국초전도학회:학술대회논문집
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    • 한국초전도학회 2000년도 High Temperature Superconductivity Vol.X
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    • pp.9-14
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    • 2000
  • We report on the novel nonequilibrium nlicrowave emission from quasiparticle-injected high-Tc superconductors. The phenomena have been observed for the current-injected YBCO/I/Au or BSCCO/I/Au thin-film tunnel junctions and BSCCO single-crystal intrinsic Josephson mesa junction samples. For the thin-film tunnel junctions, the emitted radiation appears as broadband. For the intrinsic BSCCO mesa samples, the radiation appears as three different modes of emissions depending on the bias point in the hysteretic current-voltage characteristics; Josephson-emission, nonequilibrium broad emission and sharp coherent microwave emission. The results were interpreted by the Josephson plasma excitation model due to quasiparticle injection.

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A Chemical Kinetic Model Including 54 Reactions for Modeling Air Nonequilibrium Inductively Coupled Plasmas

  • Yu, Minghao;Wang, Wei;Yao, Jiafeng;Zheng, Borui
    • Journal of the Korean Physical Society
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    • 제73권10호
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    • pp.1519-1528
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    • 2018
  • The objective of the present study is the development of a comprehensive air chemical kinetic model that includes 11 species and 54 chemical reactions for the numerical investigation of air nonequilibrium inductively coupled plasmas. The two-dimensional, compressible Navier-Stokes equations coupled with the electromagnetic-field equations were employed to describe the fundamental characteristics of an inductive plasma. Dunn-Kangs 32 chemical-reaction model of air was reconstructed and used as a comparative model. The effects of the different chemical kinetic models on the flow field were analyzed and discussed at identical/different working pressures. The results theoretically indicate that no matter the working pressure is low or high, the use of the 54 chemical kinetic model presented in this study is a better choice for the numerical simulation of a nonequilibrium air ICP.

Exhaust Plasma Characteristics of Direct-Current Arcjet Thrusters

  • Tahara, Hirokazu
    • 한국추진공학회:학술대회논문집
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    • 한국추진공학회 2004년도 제22회 춘계학술대회논문집
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    • pp.327-334
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    • 2004
  • Spectroscopic and electrostatic probe measurements were made to examine plasma characteristics with or without a metal plate for a 10-㎾-class direct-current arcjet Heat fluxes into the plate from the plasma were also evaluated with a Nickel slug and thermocouple arrangement. Ammonia and mixtures of nitrogen and hydrogen were used. The NH$_3$ and $N_2$+3H$_2$ plasmas in the nozzle and in the downstream plume without a plate were in thermodynamical nonequilibrium states. As a result, the H-atom electronic excitation temperature and the $N_2$ molecule-rotational excitation temperature intensively decreased downstream in the nozzle although the NH molecule-rotational excitation temperature did not show an axial decrease. Each temperature was kept in a small range in the plume without a plate except for the NH rotational temperature for NH$_3$ gas. On the other hand, as approaching the plate, the thermodynamical nonequilibrium plasma came to be a temperature-equilibrium one because the plasma flow tended to stagnate in front of the plate. The electron temperature had a small radial variation near the plate. Both the electron number density and the heat flux decreased radially outward, and an increase in H$_2$ mole fraction raised them at a constant radial position. In cases with NH$_3$ and $N_2$+3H$_2$ a large number of NH radical with a radially wide distribution was considered to cause a large amount of energy loss, i.e., frozen flow loss, for arcjet thrusters.

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Novel nonequilibrium microwave emission and current-voltage characteristics of $Bi_2$$Sr_2$Ca$Cu_2$$O_{8+d}$ intrinsic Josephson junction mesas

  • Kim, Sun-Mi;Lee, Kie-Jin;Bae, Myung-Ho;Lee, Hu-Jong;Cha, Deok-Joon;Takayuki Ishibashi;Katsuaki Sato;Kim, Jin-Tae
    • Progress in Superconductivity
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    • 제4권2호
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    • pp.104-108
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    • 2003
  • We have measured the transport properties of $Bi_2$$Sr_2$$CaCu_2$$O_{8+d}$ (BSCCO) intrinsic Josephson junction mesa. Transport measurements with current flow along the c-axis, perpendicular to the layer of mesa showed multi-branch structures on the current-voltage characteristics. For single intrinsic junctions, the microwave radiation appears in the form of three different modes of oscillations, which include Josephson emission, nonequilibrium broad emission and sharp coherent microwave emission. Mutual phase interactions between two-mesas structures of BSCCO intrinsic Josephson junctions were studied. The results were explained within the framework of the Josephson plasma excitation model due to quasiparticle injection.n.

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Micro-gap DBD Plasma and Its Applications

  • Zhang, Zhitao;Liu, Cheng;Bai, Mindi;Yang, Bo;Mao, Chengqi
    • 동굴
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    • 제76호
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    • pp.37-42
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    • 2006
  • The Dielectric Barrier Discharge (DBD) is a nonequilibrium gas discharge that is generated in the space between two electrodes, which are separated by an insulating dielectric layer. The dielectric layer can be put on either of the two electrodes or be inserted in the space between two electrodes. If an AC or pulse high voltage is applied to the electrodes that is operated at applied frequency from 50Hz to several MHz and applied voltages from a few to a few tens of kilovolts rms, the breakdown can occur in working gas, resulting in large numbers of micro-discharges across the gap, the gas discharge is the so called DBD. Compared with most other means for nonequilibrium discharges, the main advantage of the DBD is that active species for chemical reaction can be produced at low temperature and atmospheric pressure without the vacuum set up, it also presents many unique physical and chemical process including light, heat, sound and electricity. This has led to a number of important applications such as ozone synthesizing, UV lamp house, CO2 lasers, et al. In recent years, due to its potential applications in plasma chemistry, semiconductor etching, pollution control, nanometer material and large area flat plasma display panels, DBD has received intensive attention from many researchers and is becoming a hot topic in the field of non-thermal plasma.

대기압 비평형 플라스마의 발생 및 규소(Si)식각에의 응용 (Generation of Low Temperature Plasma at Atmospheric Pressure and its Application to Si Etching in Open Air)

  • 이봉주
    • 한국세라믹학회지
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    • 제39권4호
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    • pp.409-412
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    • 2002
  • 대기압 하에서 정상적으로 저온 플라스마가 발생 가능한 장치를 개발했다. 개발한 장치는 접지전극을 유전체로 피복한 용량결합형 전극구조로 되어 있다. rf(13.56 M Hz)을 여기 원으로서 사용한 아르곤(Ar) 또는 헬륨(He)은 플라스마 가스로서 사용했다. 발생한 플라스마는 발광분광법, 플로브 진단법에 의해 특성을 검토했다. 그 결과 전자온도>여기온도>가스온도 관계에 있는 비평형 상태의 플라스마였다. 본 장치를 사용하여 발생한 플라스마에 반응가스(CF4)을 첨가해서 대기 개방 계에서 Si(100)식각($1.5{\mu}m$/min)에 적용하여 높은 처리속도를 실현했다.

Physical properties of TiN thin films deposited by grid-assisted magnetron sputtering

  • Jung, Min J.;Nam, Kyung-H.;Han, Jeon-G.;Shaginyan, Leonid-R.
    • 한국표면공학회:학술대회논문집
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    • 한국표면공학회 2002년도 춘계학술발표회 초록집
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    • pp.46-46
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    • 2002
  • It is well known that thin film growth and surface morphology can be substantially modified by ion-bombardment during the deposition. This is particularly important in case of thin-film deposition at low temperatures where the film growth occurs under highly nonequilibrium conditions. An attractive way to promote crystalline growth and surface morphology is deposition of additional energy in to the surface of the growing film by bombardment with hyperthermal particles. We were deposited crystalline Ti and TiN thin films on Si substrate by magnetron sputtering method with grid. Its thin films were highly smoothed and dense as increasing grid bias. In order explore the benefits of a bombardment of the growing film with high energetic particles. Ti and TiN films were deposited on Si substrates by an unbalanced magnetron sputter source with attached grid assembly for energetic ion extraction. Also, we have studied the variation of the plasma states by Langmuir probe and Optical Emission Spectroscopy (OES). The epitaxial orientation. microstructual characteristics. electrical and surface properties of the films were analyzed by XRD. SEM. Four point probe and AFM.

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듀얼 소스 증착장치를 이용한 Ni-C 박막의 특성에 관한 연구 (A Study on the Characterization of Ni-C Thin Films Utilizing a Dual-Source Deposition System)

  • 한창석;전창환;한승오
    • 열처리공학회지
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    • 제21권5호
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    • pp.235-243
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    • 2008
  • Ni-C composite films were prepared using a combination of microwave plasma CVD and ion beam sputtering deposition working in a codeposition way. The structure of these films was characterized by energy-dispersive X-ray diffraction (EDXRD), transmission electron microscopy (TEM) and Raman spectroscopy. It was found that a nickel carbide phase, $Ni_3C$ (hcp), formed as very fine crystallites over a wide temperature range when Ni-C films were deposited at low $CH_4$ flow rates. The thermal stability of this nonequilibrium carbide $Ni_3C$ was also studied. As a result, the $Ni_3C$ carbide was found to decompose into nickel and graphite at around $400^{\circ}C$. With high $CH_4$ flow rates (> 0.2 sccm), the structure of the Ni-C films became amorphous. The formation behavior of the carbide and amorphous Ni-C phases are discussed in relation to the electrical resistivity of the films.