• Journal of Korean Ophthalmic Optics Society
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• v.8 no.1
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• pp.23-28
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• 2003

We report a switchable RGB color filters for Lab on a chip. Ink color filter devices are fabricated by PDMS patterning process. The optical transmission in the ultra-violet and visible wavelengths of color filters have been investigated. The ink color filters are characterised by the slope and shape of the spectrum. The transmission of red/yellow filter consists of curves with a sharp cut-off spectrum at 600 and 500 nm. The blue output of the ink filter has 80% peak transmission and weak red-leak, while the green ink filter has 48% peak transmission and red-leak.

• Journal of the Korean Society for Precision Engineering
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• v.23 no.7 s.184
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• pp.138-145
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• 2006

A nanopatterning technique was proposed and demonstrated for low cost and mass productive process using the scanning probe lithography (SPL) and soft lithography. The nanometer scale structure is fabricated by the localized generation of oxide patterning on the H-passivated (100) silicon wafer, and soft lithography was performed to replicate of nanometer scale structures. Both height and width of the silicon oxidation is linear with the applied voltagein SPL, but the growth of width is more sensitive than that of height. The structure below 100 nm was fabricated using HF treatment. To overcome the structure height limitation, aqueous KOH orientation-dependent etching was performed on the H-passivated (100) silicon wafer. Soft lithography is also performed for the master replication process. Elastomeric stamp is fabricated by the replica molding technique with ultrasonic vibration. We showed that the elastomeric stamp with the depth of 60 nm and the width of 428 nm was acquired using the original master by SPL process.

• Journal of the Korean Institute of Telematics and Electronics D
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• v.35D no.3
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• pp.56-62
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• 1998

One of the key components to accomplish WDM all-optical network is an arrayed waveguide grating router. The spectral characterisitc of the ypeical arrayed waveguide grating rouger has parabolic shape, hence the bandwidth is limited. The spectral response of an optical filter should be as flat as possible for the reliable operation of the syste, because the center frequency of the optical source could be deviated in the actual system. In order to acquire these characteristics, we propose and design a new type of the arrayed waveguide grating router with a flat passband using the Fourier optics concept. The BPM simulation results of the new arrayed waveguide grating router with the flat passband show that the bandwideth is 0.8 nm at -1 dB, instertion loss about 6 dB, and the crosstalk less than -23 dB fro each cnannel, which is 1.6 nm(200 GHz) separated from the adjacent channel around 1550 nm wavelength range.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.21 no.9
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• pp.825-828
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• 2008

$Sr_xBa_{(1-x)}TiO_3$ red phosphors doped with Pr(0.13 mol%) and Al(O.23 mol%) were synthesized by solid state reaction method. Orthorhombic perovskite structure with increasing value of x in $Sr_xBa_{(1-x)}TiO_3$:Pr,Al phosphors changed to cubic perovskite structure. Emission bands at 615 nm and 492 nm in $Sr_{0.25}Ba_{0.75}TiO_3$:Pr,Al and $BaTiO_3$:Pr,Al phosphors were observed at room temperature. The main cause of green luminescence at 492 nm was explained by the change of the 4f5d band.

• Journal of the Korean institute of surface engineering
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• v.31 no.5
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• pp.261-265
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• 1998

We investigated compositional separation of Co-23%Cr magnetic alloy thin films with varying film thicknesses. Saturation magnetization and magnetic microstructures were investigated using vibrating sample magnetometer (VSM) and scanning probe microscope (SPM), respectively. Saturation magnetization was as 700 emu/cc for films below 50 nm-thick, and changed to 430 emu/cc for the ones above 2000 nm-thick. This may be due to increment of molar volume of Cr-enriched phase as film thickness increases. The surface grain size in AFM (atomic force microscope) measurement becomes larger as film thickness increases. The MFM (magnetic force microscope) reveals that magnetic microstructure is changed from the fine spherical domains to the maze type domains as film thickness increases. We conclude that employing thickness of Co-22%Cr films below 50 nm is favorable for high density recording in order to enhance perpendicular saturation magnetization and SNR (signal to noise ratio).

• Journal of the Korean Institute of Telematics and Electronics
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• v.23 no.2
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• pp.264-268
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• 1986

A thchnique has been studied for the measurement of the spectral loss and the cut-off wave length, at which the first high-order mode disappears. The near-field patterns of a fiber which is excited by a variable wavelength source are used for the measurement of cut-off wavelength. Because of the absorptive phenomenon of OH- molecular vibration, spectral loss of a single mode optical fiber sample is 5.6dB/km at 1380 nm wavelength and 1dB/km at 1240 nm wavelength. From the near field intensity patterns and the mode field diameter graph for the half power width, the cut-off wavelength of the fiber is measured to be 1120 nm.

• 한국정보디스플레이학회:학술대회논문집
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• 2002.08a
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• pp.773-776
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• 2002

Efficient organic white light-emitting diodes are fabricated by doping [bis(2-methyl-8-quinolinolato) (tripheny-siloxy)aluminium (III)] (SAlq), a blue-emitting layer, with a red fluorescent dye of 4-dicyanomethylene-2-methyl-6-{2-(2,3,6,7-tetrahydro-1H,5H-benzo[i,j]quinolizin-8-yl)vinyl}-4H-pyran (DCM2). The incomplete energy transfer from blue-emitting SAlq to red-emitting DCM2 enables to obtain a balanced white light-emission. A device with the structure of ITO/TPD (50 nm)/SAlq:DCM2 (30 nm, 0.5 %)/$Alq_3$ (20 nm)/LiF (0.5 nm)/AI shows emission peaks at 456 nm and 482 nm from SAlq and at 570 nm from DCM2. The white light-emitting device shows an external quantum efficiency of about 2.3 %, a luminous efficiency of about 2.4 lm/W, and the CIE chromaticity coordinates of (0.32, 0.37) at 100 cd/m^2. A maximum luminance of about 23,800 cd/m^2. is obtained at 15 V and the current density of 782 mA/cm^2.

• Journal of Korean Society on Water Environment
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• v.23 no.6
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• pp.863-871
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• 2007

Spectroscopic characteristics of river water from four major watersheds in the Ulsan area were measured to examine their potential for estimating water quality parameters. The total 176 river samples were collected from 44 sites of small streams within the watersheds during the year 2006. Spectroscopic characteristics investigated included protein-like fluorescence (FLF) intensity, fulvic-like fluorescence (FLF) intensity, terrestrial humic-like fluorescence (TLF) intensity, UV absorbance at 254 nm, and UV absorbance difference at 220 nm and 254 nm. Protein-like fluorescence intensity showed linear relationships with biochemical oxygen demand (BOD), chemical oxygen demand (COD), total phosphorous (TP) concentrations of the samples with the correlation of 0.784, 0.779, and 0.733, respectively. Due to the UV absorption characteristics of nitrate at 220 nm, UV absorbance difference at 220 nm and 254 nm was selected to represent total nitrogen (TN) concentration. Exclusion of some samples with PLF intensity higher than 5.0 improved the correlation between the UV absorbance difference and TN as demonstrated by the increase of the correlation coefficient from 0.392 to 0.784. Instead, for the samples with PLF intensity lower than 5.0, the highest correlation of TN was achieved with UV absorbance at 254 nm. The results suggest that PLF intensity could be used as the estimation index for BOD, COD, and TP concentration of river water, and as the primary screening index for the prediction of TN using UV absorbance difference. Some BOD-based water quality levels among the river water were statistically discriminated by the PLF intensity. Low p-values were obtained from the t-tests on the samples with the first level and the second level (p=0.0003) and the samples with the second and the third levels (p=0.0413). Our combined results demonstrated that the selected spectroscopic characteristics of river water could be utilized as a tool for on-site real-time monitoring and/or the primary estimation of water quality.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2008.06a
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• pp.413-414
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• 2008

We have studied an organic layer thickness dependent optical properties and microcavity effects for top-emission organic light-emitting diodes. Manufactured top emission device, structure is Al(100nm)ITPD(xnm)/$Alq_3$(ynm)/LiF(0.5nm)/Al(23nm). While a thickness of hole-transport layer of TPD was varied from 35 to 65nm, an emissive layer thickness of $Alq_3$ was varied from 50 to 100nm for two devices. A ratio of those two layers was kept to about 2:3. Variation of the layer thickness changes a traverse time of injected carriers across the organic layer, so that it may affect on the chance of probability of exciton formation. View-angle dependent emission spectra were measured for the optical measurements. Top-emission devices show that the emission peak wavelength shifts to longer wavelength as the organic layer thickness increases. For instance, it shifts from 490 to 555nm in the thickness range that we used. View-angle dependent emission spectra show that the emission intensity decreases as the view-angle increases. The organic layer thickness-dependent emission spectra show that the full width at half maximum decreases as the organic layer thickness increases. Top emission devices show that the full width at half maximum changes from 90 to 35nm as the organic layer thickness increases. In top-emission device, the microcavity effect is more vivid as the organic layer thickness increases.

• Journal of the Semiconductor & Display Technology
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• v.20 no.4
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• pp.29-37
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• 2021

A 7 nm technology node using extreme ultraviolet lithography with a wavelength of 13.5 nm has been recently developed and applied to the semiconductor manufacturing process. Furthermore, the development of sub-3 nm technology nodes continues to be required. In this study, design factors of an electrostatic deflector for an ultra-miniaturized microcolumn system that can realize an electron wavelength of below 1.23 nm with an acceleration voltage of above 1 eV were investigated using a three-dimensional simulator. Particularly, the optimal design of the electrostatic octupole floating deflector was derived by optimizing the design elements and improving the driving method of the 1 keV low energy ultra-miniaturized microcolumn deflector. As a result, the entire wide field of view greater than 330 ㎛ at a working distance of 4 mm was realized with an ultra-high-resolution electron beam spot smaller than 10 nm. The results of this study are expected to be a basis technology for realizing a wafer-scale multi-array microcolumn system, which is expected to innovatively improve the throughput per unit time, which is the biggest drawback of electron beam lithography.