• 제목/요약/키워드: nitrogen plasma

검색결과 638건 처리시간 0.027초

상압 플라즈마 매개변수들이 산업용 전자부품의 세척공정(cleansing)에 미치는 효과 (The Effect of Atmospheric Plasma Parameters on Cleansing the Electronic-Industrial Parts)

  • 리의재
    • 한국표면공학회지
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    • 제42권5호
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    • pp.208-215
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    • 2009
  • We employed atmospheric plasma to reactively remove the lubricant sprayed onto such industrial electronic parts as LCD chassis during sheet-metal forming processes and investigated basically the effect of plasma parameters on cleansing the surfaces of zinc-electroplated steel plates (EGI). Specimen prepared with some controlled amount of lubricant sprayed on their surfaces beforehand were subjected to two different kinds of atmospheric plasma, one being generated by using air and the other generated by using nitrogen (99.9% purity). Locating the plasma beams at the height range between 3.5 and 13.5 mm from the surface of each specimen and radiating for 5 to 30 seconds resulted out that the cases with a position of 3.5 mm and a duration of 5 seconds or longer showed the surfaces completely cleansed without a trace of lubricant. Furthermore we found out that the plasma generated by using simple air depicted higher cleansing ability than the other one generated by using expensive nitrogen, interestingly useful very much for industrial purposes. On another aspect, we confirmed that the drilled or cut surfaces of Zn-plated steel substrate would not be oxidized even under the influence of plasma during its cleansing process. Therefore, we could probably conclude from this fore-survey that a dry process adopting atmospheric plasma for cleansing industrial parts might be determined to become successful in terms of commercialization, cautiously.

저밀도 폴리에틸렌의 친수성 표면개질에 미치는 플라즈마의 영향 (The Effect of Plasma on Hydrophilic Surface Modification of LDPE)

  • 황승노;전법주;정일현
    • 공업화학
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    • 제9권3호
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    • pp.383-387
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    • 1998
  • 플라즈마 기체 종류($O_2$, $N_2$, and $O_2/N_2$)에 따른 저밀도 폴리에틸렌의 친수성 표면개질에 미치는 영향이 표면에 생성된 기능성 그룹과 물의 접촉각과의 관계로부터 조사되었다. XPS와 FT-IR ATR 분석을 통하여 플라즈마 처리된 LDPE 표면은 카보닐, 카복실 등의 산소 기능기들이 생성되었고, 질소 플라즈마 처리와 산소와 질소 혼합 기체 플라즈마 처리에 의해 표면에 질소 기능기가 생성됨이 확인되었다. rf-출력과 처리시간에 대한 접촉각 변화에서 질소 플라즈마 처리가 가장 작은 값을 나타내었고, 플라즈마 기체 종류에 관계없이 복합매개 변수 [(W/FM)t]가 520~550GJs/kg 부근에서 가장 효과적인 친수성 개질 반응이 이루어지는 최적조건임을 알 수 있었다.

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Role of oxygen in plasma induced chemical reactions in solution

  • Ki, Se Hoon;Uhm, Han Sup;Kim, Minsu;Baik, Ku Youn;Choi, Eun Ha
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2016년도 제50회 동계 정기학술대회 초록집
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    • pp.208.2-208.2
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    • 2016
  • Many researchers have paid attention to the studies on the interaction between non-thermal plasma and aqueous solutions for biomedical applications. The gas composition in the plasma is very important. Oxygen and nitrogen are the main gases of interest in biological applications. Especially, we focus on the oxygen concentration. In this experiment, we studied the role of oxygen concentration in plasma induced chemical reactions in solution. At first, the amount of ions are measured according to changing the oxygen concentration. And we checked the relationship between these ions and pH value. Secondly, when the oxygen concentration is changed, it identified the type and amount of radical generated by the plasma. In order to confirm the effect of these chemical property change to biological material, hemoglobin and RBCs are chosen. RBCs are one of the common basic biological cells. Thirdly, when plasma treated according to oxygen concentration in nitrogen feeding gas, oxidation of hemoglobin and RBC is checked. Finally, membrane oxidation of RBC is measured to examine the relation between hemoglobin oxidation and membrane damage through relative hemolysis and Young's modulus. Our results suggest that reactive species generated by the plasma differsdepending on the oxygen concentration changes. The pH values are decreased when oxygen concentration increased. OH decrease and NO increase are also observed. These reactive species makes change of chemical properties of solution. We also able to confirm that the difference in these reactive species to affect the oxidation of the Hb and RBCs. The Hb and RBCs are more oxidized with the high oxygen concentration conditions. But membrane is damaged more by plasma treatment with only nitrogen gas. It is shown that red blood cells membrane damage and oxidation of hemoglobin are not directly related.

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상온대기압 질소 및 공기 플라즈마가 의치상용 레진의 표면 특성과 살균효과에 미치는 영향 (Effect of non-thermal atmospheric pressure nitrogen and air plasma on the surface properties and the disinfection of denture base resin)

  • 서혜연;유은미;최유리;김수화;김광만;김경남
    • 한국치위생학회지
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    • 제14권5호
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    • pp.783-788
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    • 2014
  • Objectives : The purpose of this study was to investigate the effect of non-thermal atmospheric pressure plasma jet(NTAPPJ) on surface properties and Streptococcus mutans disinfection of denture base resin. Methods : Self-cured denture base resin (Jet denture repair resin, Lang dental Mfg, co., USA) was used to make specimen($12mm{\times}2mm$). To observe surface change before and after plasma process, surface roughness and contact angle were measured. For sterilization experiments, the surfaces of specimens were treated with nitrogen and air NTAPPJ for 1 minute after S. mutans was inoculated on the material surfaces. Results : Before plasma process, surface roughness of denture base resin was $0.21{\mu}m{\pm}0.02{\mu}m$. After air and nitrogen NTAPPJ process, surface roughness was $0.19{\mu}m{\pm}0.03{\mu}m$ and $0.18{\mu}m{\pm}0.01{\mu}m$ respectively. There was no significant difference(p>0.05). Contact angle of control group without plasma process was $83.81^{\circ}{\pm}3.14^{\circ}$, while after plasma treatment, contact angles of air NTAPPJ and nitrogen NTAPPJ groups were $63.29^{\circ}{\pm}2.27^{\circ}$ and $46.68^{\circ}{\pm}5.82^{\circ}$ respectively. The result showed a significant decrease in contact angle after plasma process(p<0.05). Compared to the control group 6020.33(CFU/mL) without plasma process, CFU decreased significantly after air NTAPPJ 90.75(CFU/mL) and nitrogen NTAPPJ 80.25(CFU/mL) treatment(p<0.05). Conclusions : It was considered that NTAPPJ can be used for denture disinfection without changing surface properties of materials.

Hybrid MBE Growth of Crack-Free GaN Layers on Si (110) Substrates

  • 박철현;오재응;노영균;이상태;김문덕
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2013년도 제44회 동계 정기학술대회 초록집
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    • pp.183-184
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    • 2013
  • Two main MBE growth techniques have been used: plasma-assisted MBE (PA-MBE), which utilizes a rf plasma to supply active nitrogen, and ammonia MBE, in which nitrogen is supplied by pyrolysis of NH3 on the sample surface during growth. PA-MBE is typically performed under metal-rich growth conditions, which results in the formation of gallium droplets on the sample surface and a narrow range of conditions for optimal growth. In contrast, high-quality GaN films can be grown by ammonia MBE under an excess nitrogen flux, which in principle should result in improved device uniformity due to the elimination of droplets and wider range of stable growth conditions. A drawback of ammonia MBE, on the other hand, is a serious memory effect of NH3 condensed on the cryo-panels and the vicinity of heaters, which ruins the control of critical growth stages, i.e. the native oxide desorption and the surface reconstruction, and the accurate control of V/III ratio, especially in the initial stage of seed layer growth. In this paper, we demonstrate that the reliable and reproducible growth of GaN on Si (110) substrates is successfully achieved by combining two MBE growth technologies using rf plasma and ammonia and setting a proper growth protocol. Samples were grown in a MBE system equipped with both a nitrogen rf plasma source (SVT) and an ammonia source. The ammonia gas purity was >99.9999% and further purified by using a getter filter. The custom-made injector designed to focus the ammonia flux onto the substrate was used for the gas delivery, while aluminum and gallium were provided via conventional effusion cells. The growth sequence to minimize the residual ammonia and subsequent memory effects is the following: (1) Native oxides are desorbed at $750^{\circ}C$ (Fig. (a) for [$1^-10$] and [001] azimuth) (2) 40 nm thick AlN is first grown using nitrogen rf plasma source at $900^{\circ}C$ nder the optimized condition to maintain the layer by layer growth of AlN buffer layer and slightly Al-rich condition. (Fig. (b)) (3) After switching to ammonia source, GaN growth is initiated with different V/III ratio and temperature conditions. A streaky RHEED pattern with an appearance of a weak ($2{\times}2$) reconstruction characteristic of Ga-polarity is observed all along the growth of subsequent GaN layer under optimized conditions. (Fig. (c)) The structural properties as well as dislocation densities as a function of growth conditions have been investigated using symmetrical and asymmetrical x-ray rocking curves. The electrical characteristics as a function of buffer and GaN layer growth conditions as well as the growth sequence will be also discussed. Figure: (a) RHEED pattern after oxide desorption (b) after 40 nm thick AlN growth using nitrogen rf plasma source and (c) after 600 nm thick GaN growth using ammonia source for (upper) [110] and (lower) [001] azimuth.

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대기압 아르곤 플라즈마 토치의 진동 및 회전온도 측정 연구 (A Study on the Measurement of Vibrational and Rotational Temperature Using the Atmospheric Ar Plasma Torch)

  • 최광주;장문국;한상보;박재윤
    • 전기학회논문지
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    • 제60권10호
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    • pp.1895-1902
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    • 2011
  • This work was carried out for the measurement of vibration and rotation temperature using the optical emission spectroscopy of nitrogen second positive system in the small plasma torch. Among emissions $N_2$ SP systems, the emission of $N_2$ SP(0-0) was so strong. Emission peaks of SP system increased until the position of 12.5[mm] from the end of plasma torch, after that it decreased. However, vibration temperature decreased from 1540[K] to 1000[K] at the position of 12.5[mm]. In addition, rotational temperature was about 400[K] at the position of 10[mm] and it increased a little as much of 420[K] at 12.5[mm]. Consequently, the plasma torch discussed in this work is possible to apply in the surface treatment process under the low temperature.

플라즈마 질탄화처리된 SCM435강의 미세조직에 미치는 가스 조성의 영향 (Influence of Ambient Gas Composition on the Microstructure of Plasma Nitrocarburised SCM435 steel)

  • 이인섭
    • 한국재료학회지
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    • 제12권6호
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    • pp.427-430
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    • 2002
  • Plasma nitrocarburizing treatment was performed for SCM 435 steel by using a plasma ion nitriding system. The effects of the variation of nitrogen and methan contents upon the hardened layer was investigated. Both the thickness of the compound layer and the amount of $\varepsilon$ phase in the compound layer increased with increasing nitrogen content. However, the thickness of the compound layer decreased due to unstable plasma for an atmosphere containing 90% $N_2$ gas content in the gas mixture. The amount of $\varepsilon$phase in the compound layer increased with increasing $CH_4$ gas content. For $CH_4$ gas content more than 2% in the gas mixture, the thickness of the compound layer decreased due to the formation of $\theta$ phase.

CHARACTERIXATION OF PLASMA ION IMPLANTED SURFACES USING TIME-OF-FLIGHT SECONDARY ION MASS SPECTROMATRY

  • Lee, Yeon-Hee;Han, Seung-Hee;Lee, Jung-Hye;Yoon, Jung-Hyeon
    • 한국표면공학회지
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    • 제29권6호
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    • pp.880-883
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    • 1996
  • Plasma Source Ion Implantation (PSII) technique was used for the hydrophilization or hydrophobization of polymer surfaces. Polymers were modified with different plasma gases such as oxygen, nitrogen, argon, and tetrafluoromethane, and for varying lengths of treatment time. Plasma ion treatment of oxygen, nitrogen, argon and their mixtures increased significantly the hydrophilic properties of polymer surfaces. More hydrophobic surfaces of polymers were formed after the treatment with tetrafluoromethane. A study of plasma source ion implanted polymers was performed using contact angle measurements and Time-of-Flight Secondary Ion Mass Spectrometry (TOF-SIMS). The TOF-SIMS spectra and depth profile were used to obtain the information about the treated surfaces of polymers. The permanence of this technique could be evaluated with respect to ageing time. The surfaces treated with PSII gave better stability than other surface modification methods.

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Assay of Midazolam in Human Plasma by Gas-Liquid Chromatography with Nitrogen-Phosphorus Detection

  • 신호상;홍춘표;Yun-Suk Oh-Shin;강보경;이경옥;이규범
    • Bulletin of the Korean Chemical Society
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    • 제19권5호
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    • pp.524-526
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    • 1998
  • A sensitive and specific method is described for the determination of midazolam in human plasma. The drug was extracted from 1 mL of carbonate buffered plasma (pH 9.6) with 8 mL of diethyl ether. Famprofazone was used as internal standard. The organic phase was evaporated to dryness. The residue was dissolved in methanol for the direct analysis by gas chromatograph-nitrogen phosphorus detector system. In the concentration range of 1-5000 ng/mL, the calibration curve was linear. The coefficients of variation from the precision test were <6% at the range of the concentration of 0.10-2.00 μg/mL and the detection limit for midazolam in 1 mL of plasma was o.5 ng. This assay is more sensitive, selective, simple and rapid than earlier methods. Plasma midazolam concentrations were determined by this method after administration of midazolam.

젖소의 수태율과 혈장 요소태 질소의 관계 (Relation of Conception Rate and Plasma Urea Nitrogen in Dairy Cattle)

  • 박수봉;김현섭;김창근;정영채;이종완;김천호
    • 한국가축번식학회지
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    • 제21권2호
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    • pp.185-189
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    • 1997
  • The objectives of this study were to relate concentrations of plasma urea nitrogen(PUN) to conception rate in dairy cows. the relationship between PUN concentration and time postcalving was examined for 11 individual cows. Mean concentration of PUN rose for serveral weeks after calving and then was stable from 7 week. As PUN increased, the rate of conception decreased. Cows with PUN<15 and 15∼19.9mg/dl had the likelihood ratios of conception of 1.33 and 1.67. As PUN increased 20∼22.9 and 23mg/dl, the likelihood ratios decreased to 1.00 and 0.90. Thus, low PUN had a favorable association with conception, whereas high PUN had a negative association with conception.

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