• Title/Summary/Keyword: nitrogen implantation

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Behavior of Oxygen pprecippitates during SIMOX SOI Fabrication and Their Influences to the Electrical ppropperty (SIMOX SOI 제조시 산소석출물의 거동과 전기적 특성에 미치는 영향)

  • 배영호;정욱진;김광일;권영규;조찬섭;이종현
    • Proceedings of the Korean Vacuum Society Conference
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    • 1992.02a
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    • pp.93-94
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    • 1992
  • 2X1018 ions/cmz at 180 keV and post-implantation annealing at 12500C for 6 hours in nitrogen ambient. The oxygen redistribution process during post-implantation annealing was examined by AES and TEM. The electrical property of the structure was investigated by SRP method. We could find oxygen precipitates in SOl layer after high temperature annealing. The influence of the precipitates to the electrical property of the SOl layer was discussed. And the Iimiting factor to the decrease of the precipi tates during post-implantation anneal ing was discussed also.

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Effect of ion implantation on the tribological properties of TiN-coated SKD 11 and SKD 61 (TiN 코팅된 SKD11과 SKD61의 내마모 성질레 미치는 이온주입 효과)

  • 장태석;이수완;문대원;방건웅
    • Journal of the Korean institute of surface engineering
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    • v.30 no.6
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    • pp.391-399
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    • 1997
  • To figure out wheher the tribological properties of a hras-coating layer can be imporved by ion implantatio, TiN-coated SKD 11 61 were implanted with nitrogen ion and their wear peoperties were examined systematically. The amount of nitrgen ione implanted on the coating layer was $2 \times 10^{15},\;10^{16},\;10^{17},\;and\;10^{18}\;ions/\textrm{cm}^2$, respectively. X-ray diffraction revealed theintensity of the peaks belong TiN tended to increase as the ion dose increased, which implied that the implantation promoted the formation of TiN in the coated later. Howeverthe hardensity of the specimens increased then decreased again as the ion dose increased, resulting in a obvious drop of the hardness for the ion does of $2 \times 10^{18}\;ions/\textrm{cm}^2$<\TEX>. While the adhesion of the coated layer of SKD 61 was excllent regrdless of the implatation, the adhesion of the later of SKD 11 was apparently improved by the implantation. The overall wear properties of SKD 11 was better than that of SKD 61, and the best result was yielded at the ion dose of $2 \times 10^{15}\;ions/\textrm{cm}^2$<\TEX>.

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Optical Reactivity Modification of Titanium Oxide coatings on Ceramic filters by Nitrogen ion Implantation

  • Kim, Hyeong-Jin;Park, Jae-Won
    • Proceedings of the Korean Vacuum Society Conference
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    • 2010.08a
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    • pp.90-90
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    • 2010
  • We investigated the modification of optical response properties of titanium dioxide (TiO2) coatings on the ceramic water-purification filters by using ultraviolet-visible absorption spectroscopy and X-ray diffraction. The TiO2 coatings were prepared on ceramic substrate by e-beam evaporation method. These amorphous TiO2 were turned into anatase phase by heat treatment at $700^{\circ}C$ for 2 hours. The doping of N atoms into the TiO2 coatings was done by using 70KeV of N+ ion implantation with the dose of $1.0{\times}1017$ ions/cm2, followed by post-irradiation heat treatment at $550^{\circ}C$ for 2 hours. Methylene blue test of TiO2 coatings to solar irradiation showed that the post-evaporation heated TiO2 was photocatalytic and N-doped TiO2 reacted to the visible part of solar irradiation.

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Investigation on the Electrical Properties of Ion Implanted ZnO Thin Film (이온 주입된 ZnO 박막의 전기적 특성 연구)

  • Kang, Hong-Seong;Lim, Sung-Hoon;Chang, Hyun-Woo;Kim, Gun-Hee;Kim, Jong-Hoon;Lee, Sang-Yeol;Lee, Jung-Kun;Nastasi, Michael
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2005.11a
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    • pp.49-50
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    • 2005
  • Nitrogen and phosphorus ions were implanted into ZnO thin film fabricated by pulsed laser deposition. ion implanted ZnO thin films were annealed from $700^{\circ}C$ to $1000^{\circ}C$ using rapid thermal annealing process. The electron concentration was changed form $10^{20}$ to $10^{18}/cm^3$. Effect of nitrogen and phosphorus in ZnO thin films was certified and the structural and optical properties of nitrogen and phosphorus doped ZnO thin films depending on concentration of nitrogen and phosphorus were investigated.

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Effects of Different Infusion Frequency of Liquid Nitrogen on Human Embryo Development and Pregnancy Rates after Freezing and Thawing (인간 배아 동결 해빙시 액체질소의 분사속도가 배아 발달 및 임신에 미치는 영향)

  • Kim, Young-Ah;Seo, Seong-Seog;Kim, Mi-Ran;Hwang, Kyung-Joo;Park, Dong-Wook;Jo, Mi-Yeong;Ryu, Hee-Suk
    • Clinical and Experimental Reproductive Medicine
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    • v.28 no.4
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    • pp.287-293
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    • 2001
  • Objective : To investigate the efficacy of high infusion frequency of liquid nitrogen on pregnancy in human embryo after freezing and thawing. Materials and Methods: 150 infertile patients underwent 162 consecutive thawing-ET cycles. In the high infusion frequency group (Group A), 47 patients (50 cycles) underwent cryopreservation with high infusion frequency of liquid nitrogen. In the low infusion frequency group (Group B), 103 patients (112 cycles) underwent cryopreservation with low infusion frequency of liquid nitrogen. We analyzed the clinical characteristics, fertilization rates, development of embryo, good quality embryo ratio, implantation rates, and pregnancy rates between these two groups. Results: There was no difference between the groups with regard to clinical characteristics (mean age, infertility duration, infertility factors, hormone profile), mean number of oocyte retrieval, fertilization rates, and mean embryo number of transfers. The survival rates in group A was 64.9% (228 of 350 embryos), and among the 228 embryos 190 embryos (83.3%) which progressed to the two- to eight-cell stage. After thawing, the embryo numbers were 65 (34.2%), 29 (15.3%), 35 (18.4%), and 37 (19.5%) of grades 1, 2, 3, and above 4, respectively. The survival rates in group B was 63.8% (482 of 755 embryos), and among the 482 embryos 465 embryos (96.5%) which progressed to the two- to eight-cell stage. After thawing, the embryo numbers were 106 (22.8%), 94 (20.2%), 89 (19.1%), and 112 (24.1%) of grades 1, 2, 3, and above 4, respectively. There was no difference in embryo quality change after the freezing-thawing procedure between the groups. Implantation rates (31.1% vs. 34.3%) were not significant. However hCG positive rates in group A (40%) were higher than group B, but not statistically significant. Clinical pregnancy rate (26% vs. 25.9%), on going pregnancy rates (>20 weeks) were not significant (26% vs. 25%). Conclusion: We compared embryo quality change, survival rates, and pregnancy rates between high infusion frequency group and low infusion frequency group and the results were similar between the two groups. Therefore, high infusion frequency of liquid nitrogen for cryopreservation is a worthy method to preserve in human embryos.

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Simulation of Neutron irradiation Corrosion of Zr-4 Alloy Inside Water Pressure reactors by Ion Bombardment

  • Bai, X.D.;Wang, S.G.;Xu, J.;Chen, H.M.;Fan, Y.D.
    • Journal of the Korean Vacuum Society
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    • v.6 no.S1
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    • pp.96-109
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    • 1997
  • In order to simulate the corrosion behavior of Zr-4 alloy in pressurized water reactors it was implanted (or bombarded) with 190ke V $Zr^+\; and \;Ar^+$ ions at liquid nitrogen temperature and room temperature respectively up to a dose of $5times10^{15} \sim 8\times10^{16} \textrm{ions/cm}^2$ The oxidation behavior and electrochemical vehavior were studied on implanted and unimplanted samples. The oxidation kinetics of the experimental samples were measured in pure oxygen at 923K and 133.3Pa. The corrosion parameters were measured by anodic polarization methods using a princeton Applied Research Model 350 corrosion measurement system. Auger Electron Spectroscopy (AES) and X-ray Photoelectric Spectroscopy (XPS) were employed to investigate the distribution and the ion valence of oxygen and zirconium ions inside the oxide films before and after implantation. it was found tat: 1) the $Zr^+$ ion implantation (or bombardment) enhanced the oxidation of Zircaloy-4 and resulted in that the oxidation weight gain of the samples at a dose of $8times10^{16}\textrm{ions/cm}^2$ was 4 times greater than that of the unimplantation ones;2) the valence of zirconium ion in the oxide films was classified as $Zr^0,Zr^+,Zr^{2+},Zr^{3+}\; and \;Zr^{4+}$ and the higher vlence of zirconium ion increased after the bombardment ; 3) the anodic passivation current density is about 2 ~ 3 times that of the unimplanted samples; 4) the implantation damage function of the effect of ion implantation on corrosion resistance of Zr-4 alloy was established.

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Recrystallization of Al Thin Film and Formation of AlN by Nitrogen Ion Implantation (질소이온 주입에 의한 Al의 재결정화 및 AlN의 형성에 관한 연구)

  • 조성진;최점수
    • Journal of the Korean Vacuum Society
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    • v.1 no.2
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    • pp.298-301
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    • 1992
  • 진공증착된 Al 다결정 박막에 질소이온을 25keV-50keV, 1 $\times$ 1014-2 $\times$ 1017ions/cm2로 주입하여 박막의 결정구조와 nitride의 형성을 TEM으로 측정하였다. N+2이 온을 에너지 25keV, dose 1 $\times$ 1014ions/cm2로 주입하면 fcc 구조의 Al 결정이 관찰되며, 40keV 이상의 에너지로 2 $\times$ 1017ions/cm2이상 주입하면 AlN이 형성됨을 확인하였다.

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CHARACTERIXATION OF PLASMA ION IMPLANTED SURFACES USING TIME-OF-FLIGHT SECONDARY ION MASS SPECTROMATRY

  • Lee, Yeon-Hee;Han, Seung-Hee;Lee, Jung-Hye;Yoon, Jung-Hyeon
    • Journal of the Korean institute of surface engineering
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    • v.29 no.6
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    • pp.880-883
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    • 1996
  • Plasma Source Ion Implantation (PSII) technique was used for the hydrophilization or hydrophobization of polymer surfaces. Polymers were modified with different plasma gases such as oxygen, nitrogen, argon, and tetrafluoromethane, and for varying lengths of treatment time. Plasma ion treatment of oxygen, nitrogen, argon and their mixtures increased significantly the hydrophilic properties of polymer surfaces. More hydrophobic surfaces of polymers were formed after the treatment with tetrafluoromethane. A study of plasma source ion implanted polymers was performed using contact angle measurements and Time-of-Flight Secondary Ion Mass Spectrometry (TOF-SIMS). The TOF-SIMS spectra and depth profile were used to obtain the information about the treated surfaces of polymers. The permanence of this technique could be evaluated with respect to ageing time. The surfaces treated with PSII gave better stability than other surface modification methods.

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EFFECTS OF NITROGEN AND CARBON ION IMPLANTATION INTO AUSTENITIC STAINLESS STEEL ON HYDROGEN ABSORPTION

  • Terashima, K.;Minegishi, T.;Matsusaka, K.
    • Journal of the Korean institute of surface engineering
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    • v.29 no.5
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    • pp.494-497
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    • 1996
  • The effect of implanted nitrogen and carbon ion into SUS 304 on the absorption of hydrogen by cathodic chaging were studied. Implantations of $N^+$, $C^+$ were performed with doses of $3\times10^{17}$ ions $\textrm{cm}^2$ and $5\times10^{17}N^+cm^2$, and $5\times10^{17}C^+cm^2$, at an energy of 90 keV. Nitrides and carbide were investigatedby X-ray diffraction, Auger electron spectroscopy (AES) and scanning electron microscope (SEM). Formation of hydrides during cathodic charging were depressed by a modified surface layer. It is concluded that the both nitrides and carbides act as the barrier of hydrogen migration and the catalyst of desorption of cathodically charged hydrogen.

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Hard TiN Coating by Magnetron-ICP P $I^3$D

  • Nikiforov, S.A.;Kim, G.H.;Rim, G.H.;Urm, K.W.;Lee, S.H.
    • Journal of the Korean institute of surface engineering
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    • v.34 no.5
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    • pp.414-420
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    • 2001
  • A 30-kV plasma immersion ion implantation setup (P $I^3$) has been equipped with a self-developed 6'-magnetron to perform hard coatings with enhanced adhesion by P $I^3$D(P $I^3$ assisted deposition) process. Using ICP source with immersed Ti antenna and reactive magnetron sputtering of Ti target in $N_2$/Ar ambient gas mixture, the TiN films were prepared on Si substrates at different pulse bias and ion-to-atom arrival ratio ( $J_{i}$ $J_{Me}$ ). Prior to TiN film formation the nitrogen implantation was performed followed by deposition of Ti buffer layer under A $r^{+}$ irradiation. Films grown at $J_{i}$ $J_{Me}$ =0.003 and $V_{pulse}$=-20kV showed columnar grain morphology and (200) preferred orientation while those prepared at $J_{i}$ $J_{Me}$ =0.08 and $V_{pulse}$=-5 kV had dense and eqiaxed structure with (111) and (220) main peaks. X-ray diffraction patterns revealed some amount of $Ti_{x}$ $N_{y}$ in the films. The maximum microhardness of $H_{v}$ =35 GN/ $M^2$ was at the pulse bias of -5 kV. The P $I^3$D technique was applied to enhance wear properties of commercial tools of HSS (SKH51) and WC-Co alloy (P30). The specimens were 25-kV PII nitrogen implanted to the dose 4.10$^{17}$ c $m^{-2}$ and then coated with 4-$\mu\textrm{m}$ TiN film on $Ti_{x}$ $N_{y}$ buffer layer. Wear resistance was compared by measuring weight loss under sliding test (6-mm $Al_2$ $O_3$ counter ball, 500-gf applied load). After 30000 cycles at 500 rpm the untreated P30 specimen lost 3.10$^{-4}$ g, and HSS specimens lost 9.10$^{-4}$ g after 40000 cycles while quite zero losses were demonstrated by TiN coated specimens.s.

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