• 한국표면공학회지
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• 제19권2호
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• pp.31-43
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• 1986

The properties of the electroless nickel deposit mainly depends on the pH of the bath, the plating temperature, and the molar ratio of nickel to hypophosphite but they are also affected by its formulation and concentration of complexing and buffering agents. According to changeing the concentration of triethanolamine and boric acid, phosphorous contents, microsturcture, crystalline, hardness and wear resistance of deposits obtained from ammoniacal alkaline bath were investigated by EPMA, differential thermal analyser, X-ray diffractometer and wear tester. The results are as follows; (1) Increasing concentration of triethanolamine in the bath, the deposits is slightly inclined to increase its phosphorous content(3.7% P). (2) In the as-plated state, the deposits are not crystallized state but they are thermally unstable phase, and they are crystallized with precipitating $Ni_3P$ at 400$^{\circ}C$. (3) The deposit containing 2.3% P has higher hardness value in the as plated and heat treated state at below 300$^{\circ}C$ than those of 3.7% phosphorous deposit (1090Hk). But in the case of heat treating at 400$^{\circ}C$, the former has lower hardness value (1000Hk) than the latter and has remarkably Ni(III) orientation by heat treatment. (4) The 3.7% phosphorous deposit heat treated at 400$^{\circ}C$ has better wear resistance than hard chromium plating.

• 한국표면공학회지
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• 제40권3호
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• pp.131-137
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• 2007

The typical MCFC (molten carbonate fuel cell) anode is made of Ni-10%Cr alloy. The work of this paper is focused concerning long life of anode because Ni-10% Cr anode is suffering from sintering and creep behavior during cell operation. Therefore, Ni-coated Alumina powder($20{\mu}m$) was developed by electroless nickel plating. Optimum condition of electroless nickel coation on $20{\mu}m$ alumina is as follows: pH 11.7, temperature $65{\sim}80^{\circ}C$, powder amount $100cm^2/l$. The deposition rate for Ni-electroless plating was as a function of temperature and activation energy was evaluated by Arrhenius Equation thereby activation energy calculated slope of experimental data as 117.6 kJ/mol, frequency factor(A) was $6.28{\times}10^{18}hr^{-1}$, respectively.

• 마이크로전자및패키징학회지
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• 제14권3호
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• pp.21-27
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• 2007

이방성 전도필름(ACF) 접합에 사용되는 니켈 범프를 무전해 및 전해 도금법으로 제작한 다음, 이 범프들의 기계적 특성과 충격안전성을 압축시험, 범프전단시험, 낙하충격시험을 통하여 연구하였다. Nano indenter를 이용한 압축시험에서 얻은 하중-변형량 데이터를 변환시켜 니켈범프의 응력-변형량 곡선을 구하였다. 전해 니켈 범프는 무전해 니켈 범프에 비해 매우 작은 탄성한계응력과 탄성계수를 나타냈었다. 무전해 니켈 범프의 탄성한계응력과 탄성계수가 각각 600-800MPa, $9.7{\times}10^{-3}MPa/nm$인 반면 전해 니켈 범프의 경우에는 각각 70MPa, $7.8{\times}10^4MPa/nm$이었다. 범프전단 시험에서 무전해 니켈 범프는 소성변형이 거의 일어나지 않고 낮은 전단하중에서 범프가 패드 층에서 튕기듯이 떨어져 나간 반면 전해 니켈 범프는 큰 소성변형을 일으키며 범프가 잘려나갔으며 높은 전단하중을 보여주었다. 낙하충격시험 결과 ACF 플립칩 방법으로 본딩한 무전해 및 전해 범프 모두 높은 충격 신뢰성을 보였다.

• 한국표면공학회지
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• 제15권2호
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• pp.57-67
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• 1982

Electroless Ni-plating is often utilized in industries due to its physical and mechanical characteristics in contrast to conventional electroplatings. Thus, electroless Ni-plating will be broadly applicated in many fields. However, The physial and mechanical properties of this depositss depend largely on the structure and P content of film and heat treatment. And here discused about the important results of those past research.

• 대한기계학회논문집A
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• 제33권7호
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• pp.621-628
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• 2009

Nickel-phosphorus alloys are attractive materials for diamond turning applications such as fabrication of large optics and other high precision parts. It is also well-known that the higher phosphorus content of the alloys minimizes the diamond tool wear. Due to the weakness of electoless nickel plating that the phosphorus contents is limited to 13-14% (wgt), increased attention has been paid at electro-nickel plating which enables the alloys with 15-16% phosphorus. In this study, experiments were carried out to observe the wear characteristic of single crystal diamond tools in micro-grooving of electro-nickel plated drums. The experiments shows that long distance (50km) machining of micro-grooving on electro-nickel plated drum is possible with a single crystal diamond tool without any significant tool wear and defective machined surface.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 1999년도 추계학술대회 논문집
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• pp.621-624
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• 1999

Metalization technology of the fine patterns by electroless plating is required in place of electrodeposition as high-density printed boards(PCR) become indispensable with the miniaturization of electronic components. Electroless nickel plating is a suitable diffusion barrier between conductor meta1s, such as Al and Cu and solder is essetional in electronic packaging in order to sustain a long period of service. Moreover, Electroless nickel has particular characteristics including non-magnetic property, amorphous structure. wear resistance, corrosion protection and thermal stability In this study fundamental aspects of electroless nickel deposition were studied with effort of complexeing agents of different kinds. Then the property of electroless deposit are controlled by the composition of the deposition solution the deposition condition such as temperature and pH value and so on. the characteristics of the deposits has been carried out.

• 한국표면공학회지
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• 제22권1호
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• pp.43-51
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• 1989

The characteristion of composite electroless Nikel palting on the condition of adding 3kinds ceramic dispersives, Al2O3, Si3O4 and artificial diamond powder were studied. Decreasing solution temperature for composite plating was required to depress the spontaneous decomposition caused by dispersive including enlargement of reaction surface. The rate of composite plating was faster than that of general electroless-Nickel plating without dispersive. this increasing tendency of plating rate was remarkable for the active catalysis, like diamond powder.

• 대한환경공학회지
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• 제37권4호
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• pp.204-209
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• 2015

2014년을 기준으로 도금폐수에 함유한 중금속중 니켈은 5 mg/L에서 3 mg/L로 방류수 기준이 강화되었다. 그러나 현재 적용되고 있는 도금폐수 중의 니켈 처리방법으로는 방류수 기준치 이하로 처리하기 어려워 대부분의 처리 업체에서 다른 폐수와 혼합하여 단순한 희석에 의해 농도를 낮추고 있는 실정이다. 이는 환경에 지대한 영향을 미칠 수 있으며 이에 따라 본 연구에서는 희생전극을 사용한 전기분해 방법을 적용하여 실질적이며 효율적인 니켈의 처리방법을 제시하였다. 실험은 인공폐수 및 실폐수로 수행하였으며 인공폐수 실험에서는 전기분해과정에서 니켈 제거 효율에 영향을 줄 수 있는 전류밀도와 pH를 변화시키며 최적의 효율을 나타내는 조건을 도출하였다. 실험결과 니켈 제거 효율은 94%를 상회하며 잔류니켈농도는 방류수 기준치 이하로 낮추고 철 슬러지 처리로 인한 경제성까지 고려한 조건으로 전류밀도 $1{\sim}2mA/cm^2$와 pH 9가 도출되었다. 이 처리 조건을 실폐수에 적용시켰을 때 니켈 제거 효율은 60~70%로 인공폐수 실험결과보다 제거효율이 낮게 조사되었다. 이는 실폐수에는 다른 중금속 및 음이온이 다량 함유되어 있어 처리 효율에 영향을 미친 것으로 판단된다. 실폐수의 경우 pH 9에서 전류밀도 $6{\sim}7mA/cm^2$ 조건으로 5분 동안 전기분해 처리를 하였을 때 니켈 제거효율 88% 이상, 처리수의 잔류 니켈 농도 3.0 mg/L 이하로 방류수 기준을 만족시킬 수 있었다.

• 한국태양에너지학회:학술대회논문집
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• 한국태양에너지학회 2009년도 춘계학술발표대회 논문집
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• pp.214-219
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• 2009

In high-efficiency crystalline silicon solar cells, If high-efficiency solar cells are to be commercialized. It is need to develop superior contact formation method and material that can be inexpensive and simple without degradation of the solar cells ability. For reason of plated metallic contact is not only high metallic purity but also inexpensive manufacture. It is available to apply mass production. Especially, Nickel, Copper and Silver are applied widely in various electronic manufactures as easily formation is available by plating. The metallic contact system of silicon solar cell must have several properties, such as low contact resistance, easy application and good adhesion. Ni is shown to be a suitable barrier to Cu diffusion as well as desirable contact metal to silicon. Nickel monosilicide(NiSi) has been suggested as a suitable silicide due to its lower resistivity, lower sintering temperature and lower layer stress than $TiSi_2$. Copper and Silver can be plated by electro & light-induced plating method. Light-induced plating makes use the photovoltaic effect of solar cell to deposite the metal on the front contact. The cell is immersed into the electrolytic plating bath and irradiated at the front side by light source, which leads to a current density in the front side grid. Electroless plated Ni/ Electro&light-induced plated Cu/ Light-induced plated Ag contact solar cells result in an energy conversion efficiency of 14.68 % on $0.2{\sim}0.6{\Omega}{\cdot}cm,\;20{\times}20mm^2$, CZ(Czochralski) wafer.

• 한국전기전자재료학회논문지
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• 제23권7호
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• pp.575-579
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• 2010

The technologies of Ni/Cu plating contact is attributed to the reduced series resistance caused by a better contact conductivity of Ni with Si and the subsequent electroplating of Cu on Ni. The ability to pattern narrower grid lines for reduced light shading was combined with the lower resistance of a metal silicide contact and an improved conductivity of the plated deposit. This improves the FF (fill factor) as the series resistance is reduced. This is very much requried in the case of low concentrator solar cells in which the series resistance is one of the important and dominant parameter that affect the cell performance. A Selective emitter structure with highly dopeds regions underneath the metal contacts, is widely known to be one of the most promising high-efficiency solution in solar cell processing In this paper the formation of a selective emitter, and the nickel silicide seed layer at the front side metallization of silicon cells is considered. After generating the nickel seed layer the contacts were thickened by Cu LIP (light induced plating) and by the formation of a plated Ni/Cu two step metallization on front contacts. In fabricating a Ni/Cu plating metallization cell with a selective emitter structure it has been shown that the cell efficiency can be increased by at least 0.2%.