Influence of Magnetic Field Near the Substrate on Characteristics of ITO Film Deposited by RF Sputtering Method (기판 부근의 자기장이 RF 스퍼터링법으로 증착된 ITO 박막의 특성에 미치는 영향)
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- Journal of the Korean Institute of Electrical and Electronic Material Engineers
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- v.25 no.7
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- pp.563-568
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- 2012