• 한국자기학회:학술대회 개요집
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• 한국자기학회 2008년도 Asian Magnetics Conference
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• pp.177.1-177.1
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• 2008

• 한국자기학회:학술대회 개요집
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• 한국자기학회 2008년도 Asian Magnetics Conference
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• pp.68.2-68.2
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• 2008

• 한국진공학회지
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• 제15권4호
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• pp.427-433
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• 2006

자발적인 미세상 분리에 의해 실린더형의 규칙적인 배열을 형성하는 고분자 공중합체와 알루미늄의 양극산화에 의해 실린더형 기공 배열이 형성되는 알루미나 템플레이트를 이용하여 다양한 물질의 나노점 배열을 형성하였다. 펄스형 레이저 기상 증착법을 이용하여 은, 니켈, 산화아연, 실리콘, 코발트 / 백금 나노점 배열을 얻었는데, 나노점의 크기와 배열은 템플레이트의 기공 크기와 배열을 보여주었다. 이러한 템플레이트 기법을 이용하면 나노점의 밀도는 고 분자 공중합체와 알루미나의 경우 각각 $6{\times}10^{11}/cm^2$ 와 $1{\times}10^{10}/cm^2$ 이다. 이중 에르븀이 도핑된 실리콘 나노점과 ZnO 나노점 배열은 PL 측정을 통하여 물질의 광학성질에 관해 알아보았다. 에르븀이 도핑된 실리콘 나노점 배열은 $1.54{\mu}m$에서 강한 빛을 내며 ZnO 나노점 배열은 380 nm 에서 강한 PL 세기를 나타낸다.

• 한국자기학회:학술대회 개요집
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• 한국자기학회 2007년도 The 1st International Symposium on Advanced Magnetic Materials
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• pp.98.2-98.2
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• 2007

• 한국진공학회:학술대회논문집
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• 한국진공학회 2013년도 제44회 동계 정기학술대회 초록집
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• pp.600-600
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• 2013

We have fabricated Cr nanodot Schottky diodes utilizing AAO templates formed on n-Si substrates. Three different sizes of Cr nanodots (about 75.0, 57.6, and 35.8 nm) were obtained by controlling the height of the AAO template. Cr nanodot Schottky diodes showed a rectifying behavior with low SBHs of 0.17~0.20 eV and high ideality factors of 5.6~9.2 compared to those for the bulk diode. Also, Cr nanodot Schottky diodes with smaller diameters yield higher current densities than those with larger diameters. These electrical behaviors can be explained by both Schottky barrier height (SBH) lowering effects and enhanced tunneling current due to the nanoscale size of the Schottky contact. Also, we have fabricated Cr-Si nanorod Schottky diodes with three different lengths (130, 220, and 330 nm) by dry etching of n-Si substrate. Cr-Si nanorod Schottky diodes with longer nanorods yield higher reverse current than those with shorter nanorods due to the enhanced electric field, which is attributed to a high aspect ratio of Si nanorod.

• 한국자기학회:학술대회 개요집
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• 한국자기학회 2010년도 임시총회 및 하계학술연구발표회
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• pp.112-113
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• 2010

• 한국자기학회:학술대회 개요집
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• 한국자기학회 2002년도 동계연구발표회 논문개요집
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• pp.34-35
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• 2002

CoCrPt alloy films are attracting wide attention for applications to high-density magnetic recording media and hard magnetic layer in spin valve structure due to their high coercivity and strong magnetocrystalline anisotropy. Diblock copolymer templates are one of the most promising candidates for nanoscale patterning otherwise inaccessible by lithographic procedures [1]. In this study, we have investigated magnetic properties of Co$\sub$68/Cr$\sub$18/Pt$\sub$14/ nanodot arrays made by self-assembling polystyrene-block-methyl methacrylate ((PS-b-PMMA), (Mn = 82.5 Kg/mol, with a 1.12 polydispersity)) diblock copolymer. (omitted)

• Applied Microscopy
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• 제36권spc1호
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• pp.25-33
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• 2006

Nanofabrication with finely focused ion and electron beams is reviewed, and position and size controlled fabrication of nano-metals and -semiconductors is demonstrated. A focused ion beam (FIB) interface attached to a column of 200keV transmission electron microscope (TEM) was developed. Parallel lines and dots arrays were patterned on GaAs, Si and $SiO_2$ substrates with a 25keV $Ga^+-FIB$ of 200nm beam diameter at room temperature. FIB nanofabrication to semiconductor specimens caused amorphization and Ga injection. For the electron beam induced chemical vapor deposition (EBI-CVD), we have discovered that nano-metal dots are formed depending upon the beam diameter and the exposure time when decomposable gases such as $W(CO)_6$ were introduced at the beam irradiated areas. The diameter of the dots was reduced to less than 2.0nm with the UHV-FE-TEM, while those were limited to about 15nm in diameter with the FE-SEM. Self-standing 3D nanostructures were also successfully fabricated.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2009년도 제38회 동계학술대회 초록집
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• pp.33-33
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• 2010

Recently, a self-organizing process that occurs during the anodization of aluminum in acidic electrolytes has attracted a vast amount of research attentions, coupled with the ever-increasing demand for the development of effective, inexpensive and technologically simple methods for the synthesis of low-dimensional nanostructures over a macroscopic area overcoming many of the drawbacks of conventional lithographic techniques. In this presentation, recent progress in the fabrication of ordered nanoporous anodic aluminum oxide (AAO), including conventional anodization techniques, newly developed pulse anodization, hard anodization processes, and generic approaches to three-dimensional pore structures with periodically modulated diameters. Discussion will also cover the applications of AAO for the development of structurally well-defined extended arrays of low-dimensional nanostructures, such as nanodots, nanotubes, and nanowires, which could be model systems in investigating a diverse range of research problems in chemistry and physics and also be starting materials in realizing advanced electronic devices.

• Applied Science and Convergence Technology
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• 제25권5호
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• pp.98-102
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• 2016

The level set method has recently become popular in the simulation of semiconductor processes such as etching, deposition and photolithography, as it is a highly robust and accurate computational technique for tracking moving interfaces. In this research, full three-dimensional level set simulation has been developed for the investigation of focused ion beam processing. Especially, focused ion beam induced nanodot formation was investigated with the consideration of three-dimensional distribution of redeposition particles which were obtained by Monte-Carlo simulation. Experimental validations were carried out with the nanodots that were fabricated using focused $Ga^+$ beams on Silicon substrate. Detailed description of level set simulation and characteristics of nanodot formation will be discussed in detail as well as surface propagation under focused ion beam bombardment.