• 제목/요약/키워드: microwave vacuum

검색결과 210건 처리시간 0.024초

마이크로웨이브 공진 공동을 이용한 플라즈마 원의 설계 및 특성 (Design and Characterization of a Microwave Plasma Source Using a Rectangular Resonant Cavity)

  • 김현태;박용신;성충기;이재령;황용석
    • 한국진공학회지
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    • 제17권5호
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    • pp.408-418
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    • 2008
  • 본 논문에서는 집속이온빔의 플라즈마원을 위한 간단한 직육면체형태의 공진 공동을 설계하고 특성연구를 수행하였다. 공진에 최적인 공동 구조는 HFSS(High Frequency Structure Simulator)를 이용한 전기장 분포를 통해 구체적으로 계산하였다. 공진 공동은 내부 석영관 및 플라즈마 등의 유전체의 영향을 받기 때문에 공동의 한축 길이를 변화시킬 수 있는 구조로 설계되었다. 실험적으로 관찰되는 마이크로웨이브 방전시작전압을 통해 방전에 최적인 공동 길이를 측정하여 HFSS 계산된 값과 비교하였다. 공동은 석영관으로 인한 내부 유효유전율의 변화에 의해 석영관을 고려하지 않았던 길이에 비해 10cm가 감소된 길이에서 최적화됨을 공통적으로 확인할 수 있었다. 또한 압력변화에 따른 방전시작전압은 Paschen Curve와 유사한 결과를 나타내었다. 방전이 발생한 후에는 입력전력에 따라 플라즈마 밀도가 증가하였고 플라즈마의 영향으로 감소한 유효유전율에 의해 10cm가 증가한 길이에서 최적화가 되었다. 하지만 300W이상의 높은 입력 전력에서는 마이크로웨이브가 투과할 수 없는 고밀도 플라즈마 경계층(cut off layer)이 확장하여 더 이상 공동길이 조절을 통한 공동 최적화가 불가능함을 확인하였다. 따라서 고밀도 플라즈마를 만들기 위한 마이크로웨이브 공동의 정확한 설계를 위해 마이크로웨이브가 통과할 수 없는 고밀도 플라즈마 영역을 도체로 가정하고 그 외의 저밀도 플라즈마 영역을 밀도에 고유한 특정 유전율을 가지는 유전체로 설정하여 공동 내부의 전기장 분포를 해석하는 과정이 꼭 필요하다.

마이크로파 플라즈마 CVD법에 의해 작성된 DLC 박막 진공속에서의 거동과 증착조건의 영향

  • 일본명
    • 한국윤활학회:학술대회논문집
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    • 한국윤활학회 2001년도 제33회 춘계학술대회 개최
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    • pp.327-333
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    • 2001
  • DLC films due to their extreme properties have attracted a lot of attention. In this study, the films were prepared on High Speed Steel (SKH2) by microwave plasma assisted CVD method using CH4. Every friction test under the normal load 2,5N and sliding velocity of 20,25mm/s in high vacuum (5${\times}$10$\^$-5/ Torr). The films were analyzed with Raman spectroscopy. The films failed immediately in vacuum due to high friction. Wear volume of DLC coated disks decreased more than that of non-DLC coated disks. Also, hardness of the films is about 600HV.

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The $Al_2O_3$ Passivation Mechanism for c-Si Surface Deposited by ALD Using $O_3$ Oxidant

  • 조영준;장효식
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2013년도 제45회 하계 정기학술대회 초록집
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    • pp.320.1-320.1
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    • 2013
  • We have investigated the effect of surface passivation for crystalline silicon solar cell using ozone-based atomic layer deposited (ALD) $Al_2O_3$. We examined passivation properties such as uniformity, carrier lifetime, thickness, negative fixed charge density at AlOx/Si interface, and reflectance. The influences of process temperature and heat treatment were investigated using microwave photoconductance decay (PCD). Ozone-based ALD $Al_2O_3$ film shows the best carrier lifetime at lower deposition temperature than $H_2O$-based ALD.

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전자 오븐의 누설 고주파 자동 검사 시스템 설계와 제작 (Design and manufacture of atomatic microwave leakage inspection system)

  • 이만형;송지복;이석희;정영철;안희태
    • 제어로봇시스템학회:학술대회논문집
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    • 제어로봇시스템학회 1987년도 한국자동제어학술회의논문집; 한국과학기술대학, 충남; 16-17 Oct. 1987
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    • pp.492-496
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    • 1987
  • The testing philosophy and control schemes are investigated and applied to construct the Automatic Microwave Leakage Inspection System (AMLIS) . AMLIS is consists of three major parts such as Material Handling Mechanism, Fine Positioning Mechanism and Scanning Mechanism. The material Handling unit is designed to perform loading and unloading microwave oven onto the testing point by pneumatic cylinder and vacuum pump. The Fine positioning part includes X-Y-.THETA. table and distance sensing equipment. The scanning part is composed of five SCARA robots, which traverse X-Y-Z catesian coordinates respectively. The leakage testing probes are placed at the end of this each robot then the path and speed are both controlled via microprocessors. A performance test of this system combined with electric parts and software is done and the basic major function of system are accomplished.

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ECR-PECVD 장치의 제작과 특성 (Manufacturing and characterization of ECR-PECVD system)

  • 손영호;정우철;정재인;박노길;황도원;김인수;배인호
    • 한국진공학회지
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    • 제9권1호
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    • pp.7-15
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    • 2000
  • An ECR-PECVD system with the characteristics of high ionization rat다 ability of plasma processing in a wide pressure range and deposition at low temperature was manufactured and characterized for the deposition of thin films. The system consists of a vacuum chamber, sample stage, vacuum gauge, vacuum pump, gas injection part, vacuum sealing valve, ECR source and a control part. The control of system is carried out by the microprocessor and the ROM program. We have investigated the vacuum characteristics of ECR-PECVD system, and also have diagnosed the characteristics of ECR microwave plasma by using the Langmuir probe. From the data of system and plasma characterization, we could confirmed the stability of pressure in the vacuum chamber according to the variation of gas flow rate and the effect of ion bombardment by the negative DC self bias voltage. The plasma density was increased with the increase of gas flow rate and ECR power. On the other hand, it was decreased with the increase of horizontal radius and distance between ECR source and probe. The calculated plasma densities were in the range of 49.7\times10^{11}\sim3.7\times10^{12}\textrm{cm}^{-3}$. It is also expected that we can estimate the thickness uniformity of film fabricated by the ECR-PECVD system from the distribution of the plasma density.

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Hydrophobic and Mechanical Characteristics of Hydrogenated Amorphous Carbon Films Synthesized by Linear Ar/CH4 Microwave Plasma

  • Han, Moon-Ki;Kim, Taehwan;Cha, Ju-Hong;Kim, Dong-Hyun;Lee, Hae June;Lee, Ho-Jun
    • Applied Science and Convergence Technology
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    • 제26권2호
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    • pp.34-41
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    • 2017
  • A 2.45 GHz microwave plasma with linear antenna has been prepared for hydrophobic and wear-resistible surface coating of carbon steel. Wear-resistible properties are required for the surface protection of cutting tools and achieved by depositing a hydrogenated amorphous carbon film on steel surface through linear microwave plasma source that has $TE_{10}-TEM$ waveguide. Compared to the existing RF plasma source driven by 13.56 MHz, linear microwave plasma source can easily generate high density plasma and provide faster deposition rate and wider process windows. In this study, $Ar/CH_4$ gas mixtures are used for hydrogenated amorphous carbon film deposition. When microwave power of 1000 W is applied, 40 cm long uniform $Ar/CH_4$ plasma could be obtained in gas pressure of 200~400 mTorr. The Vickers hardness measurement of hydrogenated amorphous carbon film on steel surface was evaluated. It was found the optimized deposition condition at $Ar:CH_4=25:25$ sccm, 300 mTorr with microwave power of 1000W and RF bias power of 100W. By deposition of hydrogenated amorphous carbon film, contact angle on steel surfaces increases from $43.9^{\circ}$ to $93.2^{\circ}$.