• 한국자기학회:학술대회 개요집
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• 한국자기학회 2008년도 Asian Magnetics Conference
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• pp.123.1-123.1
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• 2008

• 한국자기학회:학술대회 개요집
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• 한국자기학회 2015년도 자성 및 자성재료 국제학술대회
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• pp.145-146
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• 2015

• 한국재료학회:학술대회논문집
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• 한국재료학회 1998년도 IUMRS-ICEM ABSTRACT BOOK
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• pp.110.1-110
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• 1998

• 한국자기학회:학술대회 개요집
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• 한국자기학회 2014년도 자성 및 자성재료 국제학술대회
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• pp.53-54
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• 2014

• 한국자기학회:학술대회 개요집
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• 한국자기학회 2007년도 The 1st International Symposium on Advanced Magnetic Materials
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• pp.125.2-125.2
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• 2007

• 한국자기학회지
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• 제5권5호
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• pp.561-566
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• 1995

Additional magnetooptical Kerr effect (AMOKE) was observed in several multilayer structures. For Fe/Pd and Co/Cu Multilayers, AMOKE enhanced the Kerr rotation in short wavelength side, while for Fe/Ag and FeSi/Cu multilayer systems the Kerr rotation enhancement appeared in long wavelength side. A number of ferromagnetic/nonmagnetic/ferromagnetic(FM/NM/FM) sandwiches showed that the AMOKE led to oscillations of Kerr rotation and Kerr ellipticity in certain wavelength range with changing NM layer thickness similar to the oscillatory interlayer coupling. The oscillation of effective optical constants related to the MOKE oscillation was observed for the first time. The mechanisms of the AMOKE were discussed.

• 대한전자공학회:학술대회논문집
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• 대한전자공학회 1999년도 추계종합학술대회 논문집
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• pp.203-207
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• 1999

In this paper we report new integration technology developed for three-dimensional metallic microstructures in an arbitrary shape. We have developed the two fabrication methods: Multi-Exposure and Single-Development (MESD) and Sacrificial Metallic Mold(SMM) techniques. Three-dimensional photoresist mold can be formed by the MESD method while unlimited number of structural levels can be realized by the SMM technique. Using these two techniques we have fabricated solenoid inductors and levitated spiral inductors for RF applications. We have achieved peak Q- factors over 40 in the 2-10㎓ range, the highest number among the inductors reported to date. Finally, we propose "On-Chip Passives" as a post IC process for monolithic integration of inductors, tunable capacitors, microwave switches, transmission lines, and mixers and filters toward future single-chip transceiver integration.

• 한국정밀공학회지
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• 제31권3호
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• pp.269-275
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• 2014

Conventional machining technologies such as a milling process have limitations in accuracy to fabricate microstructures. Deep X-ray lithography using the synchrotron radiation is a promising micromachining process with an excellent accuracy, whereas there are difficulties in the fabrication of multi-layered structures. Therefore, it is mainly used for fabricating simple mono-layered microstructures with a high aspect ratio. In this study, a novel technology for fabricating multi-layered microstructures is proposed by combining two processes. In advance, an X-ray resist material is cut and machined into various shapes and heights by the micro milling process. Subsequent X-ray irradiation process facilitates the fabrication of multi-layered microstructures. The proposed technology can overcome the limitation of the pattern accuracy in conventional milling process and the difficulty of the multi-layered machining in x-ray process. The usefulness of the proposed technology is demonstrated in this study by applying the technique in the realization of various multi-layered microstructures.

• 한국자기학회:학술대회 개요집
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• 한국자기학회 2007년도 The 1st International Symposium on Advanced Magnetic Materials
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• pp.17.1-17.1
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• 2007

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2008년도 International Meeting on Information Display
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• pp.1286-1289
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• 2008

We report on a wide-viewing liquid crystal (LC) display with bi-level microstructures spontaneously formed by selective wetting on a chemically heterogeneous surface. The bi-level microstructures serve as spacers for maintaining uniform cell gap, as well as protrusions for wide-viewing properties. Our LC cell having the bi-level microstructures shows good electro-optic properties.