• Proceedings of the Korean Society of Precision Engineering Conference
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• 2009.10a
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• pp.657-658
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• 2009

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2007.06a
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• pp.681-682
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• 2007

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2007.06a
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• pp.175-176
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• 2007

• Journal of the Korean Society for Precision Engineering
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• v.23 no.11 s.188
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• pp.116-125
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• 2006

MEMS and LIGA technologies have been used for fabricating microstructures, but their shape is not 3D because of difficulty for preparation of many masks. To fabricate 3D microstructures, microstereolithography technology based on Digital Micromirror Device($DMD^{TM}$) was introduced. It has no need of masks and is capable of fabricating high aspect ratio microstructures. In this technology, STL file is the standard format as the same of conventional rapid prototyping system, and 3D parts are fabricated by layer-by-layer according to 2D section sliced from STL file. The UV light source is illuminated to DMD which makes bitmap images of 2D section, and they are transferred and focused on resin surface. In this paper, we addressed optical design of microstereolithography system in consideration of light path according to DMD operation and image-forming on the resin surface using optical design program. To verify the performance of implemented microstereolithography system, 3D microstructures with complexity and high aspect ratio were fabricated.

• Journal of the Korean Society for Precision Engineering
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• v.28 no.8
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• pp.1000-1007
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• 2011

For enlarging the applications of microstereolithography, the use of diverse materials is required. In this study, the material switching system (MSS) for projection microstereolithography apparatus is proposed. The MSS consists of three part; resin level control, resin dispensing control, and vat level control. Curing characteristic of materials used in fabrication has been identified. Through repeated fabrication of test models, the critical fabrication error is investigated and a possible solution to this error is suggested. The developed system can be applied to improve the strength of microstructure and extended to fabricate an array of microstructures with multiple materials.

• Journal of the Korean Society for Precision Engineering
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• v.27 no.4
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• pp.102-108
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• 2010

Projection microstereolithography is a process of fabricating a micro-structure by using dynamic mask such as digital micromirror device(DMD). DMD shapes the beam into cross-sectional image of structure. Photocurable resin is cured by the beam and stacked layer on top of layer. It is difficult to deliver the beam from the DMD to the photocurable resin without any distortions. We assume that the beam exposed to the resin by 1 pixel of DMD has Gaussian distribution, so the shaped beam reflected by the DMD affects its neighboring area. Curing pattern corresponding to a cross-sectional images is predicted by superposition of pixels of Gaussian distribution and it is similar to cured shape.

• Journal of the Korean Society for Precision Engineering
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• v.21 no.1
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• pp.46-50
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• 2004

The curing characteristics of a liquid photopolymer during microstereolithography and the shape accuracy of thereby fabricated microstructures were investigated experimentally. A He-Cd laser with a wavelength of 442nm and a photopolymer consisted of a commercial resin from SK chemical and a photoinitiat or were used for the experiment. By varying the laser beam power and scanning speed of the focused laser beam, minimum curing thickness of 50 ${\mu}ㅡ$ was obtained. The distortion of solidified structure due to adhesion force was measured and the optimum fabrication conditions were determined. Also, the feasibility of direct fabrication of three-dimensional microstructures by Super IH process was examined.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2004.10a
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• pp.714-719
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• 2004

Controlling the cure depth of the Fa1260T photopolymer enhances the quality of a microstructure and minimizes its size in microstereolithography. In this work, variation of cure depth of the Fa1260T photopolymer is investigated while the concentration of a photopolymerization inhibitor as a radical quencher was varied. The energy source inducing photopolymerization was a He-Cd laser and a motorized stage controled the laser beam path accurately. The effects of process variables such as laser beam power and scan speed on the cure depth were examined. Optimum conditions for the minimum cure depth were determined as laser power of 230 W and scan speed of 40-50 m/s at the concentration of the radical quencher of 5％. The minimum cure depth at the optimal condition was 14 m. The feasibility of the fabrication of microstructures such as a microcup, microfunnel, and microgrid of 100 m size is demonstrated using Super IH process.

• Laser Solutions
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• v.9 no.1
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• pp.1-7
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• 2006

In order to increase the productivity of conventional microstereolithography (MSL), digital micromirror device($DMD^{TM}$) based MSL is proposed and the feasibility of 3D rnicrocomponents fabrication is demonstrated in two ways; free surface and constrained surface techniques. The clearness of optical images at the exposure plane was confirmed for the fabrication of an accurate 3D structure by controlling the dynamic viscosity of FA1260T and the shape accuracy of a structure fabricated with epoxy-based resin ($Somos^{\circledR}$ 10120) was analyzed to determine the optimum curing conditions. After finding the appropriate process variables, the feasibility of multiple microstructures is then demonstrated. Due to the high productivity, MSL using $DMD^{TM}$ showed the potential to replace the existing focused laser beam MSL.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2009.06a
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• pp.51-52
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• 2009