• Title/Summary/Keyword: micron size

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Fabrication of Sub-Micron Size $Al-AlO_x-Al$ Tunnel Junction using Electron-Beam Lithography and Double-Angle Shadow Evaporation Technique (전자빔 패터닝과 double-angle 그림자 증착법을 이용한 sub-micron 크기의 $Al-AlO_x-Al$ 터널접합 제작공정개발)

  • Rehmana, M.;Choi, J.W.;Ryu, S.J.;Park, J.H.;Ryu, S.W.;Khim, Z.G.;Song, W.;Chong, Y.
    • Progress in Superconductivity
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    • v.10 no.2
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    • pp.99-102
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    • 2009
  • We report our development of the fabrication process of sub-micron scale $Al-AlO_x-Al$ tunnel junction by using electron-beam lithography and double-angle shadow evaporation technique. We used double-layer resist to construct a suspended bridge structure, and double-angle electron-beam evaporation to form a sub-micron scale overlapped junction. We adopted an e-beam insensitive resist as a bottom sacrificing layer. Tunnel barrier was formed by oxidation of the bottom aluminum layer between the bottom and top electrode deposition, which was done in a separate load-lock chamber. The junction resistance is designed and controlled to be 50 $\Omega$ to match the impedance of the transmission line. The junctions will be used in the broadband shot noise thermometry experiment, which will serve as a link between the electrical unit and the thermodynamic unit.

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Effect of Pulse Plating on Hardness of Brass-Alumina Nanocomposite (펄스전류인가가 황동-알루미나 나노복합도금층의 경도에 미치는 영향)

  • 오영주;안재우;안종관;이만승
    • Journal of the Korean institute of surface engineering
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    • v.35 no.3
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    • pp.158-164
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    • 2002
  • Nanocomposites consisting of a nanocrystalline brass matrix (grain size ; 20-100nm) with sub-micron sized Al2O3 particles (60-200nm) were prepared by pulsed current electrodeposition. The microhardness of the nanocomposite with a grain size of 90-100nm was approximately 1.7 times higher than that of a comparable electrodeposit with no particles. However, significant variations in microhardness were not observed between the nanocomposites with grain sizes of 20 nm and the comparable electrodeposit.

Computer Simulation of Sintering and Grain Growth

  • Matsubara, Hideaki
    • Journal of Powder Materials
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    • v.5 no.4
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    • pp.324-328
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    • 1998
  • This paper is aimed to study the computer simulation of sintering process for ceramics by Monte Carlo and molecular dynamics methods. Plural mechanisms of mass transfer were designed in the MC simulation of sintering process for micron size particles; the transfer of pore lattices for shrinkage and the transfer of solid lattices for grain growth ran in the calculation arrays. The MD simulation was performed in the case of nano size particles of ionic ceramics and showed the characteristic features in sintering process at atomic levels. The MC and MD simulations for sintering process are useful for microstructural design for ceramics.

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A Study on the Wide Reach Nozzle of Sprayer (V) -The Long Range Nozzle- (휴반용 분무기의 Nozzle에 관한 연구(V) -원거리용 Nozzle-)

  • 옹장우;이상우
    • Magazine of the Korean Society of Agricultural Engineers
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    • v.17 no.4
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    • pp.3991-4000
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    • 1975
  • It is the aim of this study to investigate the influence of the factors in the sprayer nozzle for the travelling distance and to get nozzle design data in relation to the nozz1e with and without swirl plate. The factors of sprayer nozzle are composed of the spraying pressure, the helical angle of swirl plate, the helical groove depth of swirl plate, the distance of vortex chamber the slope of nozz1e cap, the curvature of nozzle cap and the hole diameter of nozz1e cap. The travelling distance and the size of sprayed particle are experimeted indoors by the factorial arrange-ment according to the 5 each level of the above factors. The results of this stupy are summarized as follows; 1. In the nozzle with swirl p1ate there were remarkable significance among factors each other, while without swirl plate were no significance. 2. The helical angle and groove depth in the nozzle with swirl plate were the highest effective factors. The effect of helical angle was very remarked in the quadratic curve with minium value. 3. The correlation betweenthe travelling distance and the sprayed particle size was no high and under 250 micron in the case with swirl plate, and there was higher correlation in the case without swirl plate. 4. The new ideal development of the swirl plate using of the most effective helical angle and groove depth will probably show the possiblities to make effective travelling distance over 8 meters and more over and to make average particle diameter under 300 micron.

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Comparison of HVOF Thermal Spray Coatings of T800 and WC-Co Powders

  • Cho, T.Y.;Yoon, J.H.;Kim, K.S.;Baek, N.K.;Song, K.O.;Youn, S.J.;Hwang, S.Y.;Chun, H.G.
    • Journal of the Korean institute of surface engineering
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    • v.39 no.6
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    • pp.295-301
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    • 2006
  • Hard chrome plating has been used in surface hard coating over 50 years both for applying hard coating and re-building of worn components. Hard chrome plating solution and mist pollute environment with very toxic $Cr^{6+}$(hex-Cr) known as carcinogen which causes lung cancer, High velocity oxy-fuel (HVOF) thermal spray coatings of WC base cermet and Co-alloy powders are the most promising candidates for the replacement of the traditional hard chrome plating. Surface properties, wear, and friction behaviors of micron size Co-alloy (T800) and micron size WC-l2Co (WC-Co) have been studied for the application as hard coatings. The temperature dependence of wear and friction behaviors of T800 and WC-Co have been investigated at the temperature of $25^{\circ}C$ and $538^{\circ}C$ for the application to high speed spindle.

Extracting the Effective Channel Length of MOSFET by Capacitance - Voltage Method. (Capacitance - Voltage 방법을 이용한 MOSFET의 유효 채널 길이 추출)

  • 김용구;지희환;박성형;이희덕
    • Proceedings of the IEEK Conference
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    • 2003.07b
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    • pp.679-682
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    • 2003
  • Improvement in MOS fabrication technology have led to high-density high-performance integrated circuits with MOSFET channel lengths in the sub-micron range. For devices of the size, transistor characteristics become highly sensitive to effective channel length. We propose a new approach to extract the effective channel length of MOSFET by Capacitance-Voltage (C-V) method. Gate-to-Source, Drain capacitance ( $C_{gsd}$) are measured and the effective channel length can be extracted. In addition, compared to l/$\beta$ method and Terada method, which has been point out that it fails to extract the accurate effective channel length of the devices, we prove that our approach still works well for the devices with down to sub-micron regime.e.

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Separation and Extraction of Hot Particulate from contaminated Perfluorocarbon solution

  • Kim Gye-Nam;Narayan Mathuresh;Wou Hui-Jun;Jung Chong-Hun;Oh Won-Zin
    • Proceedings of the Korean Radioactive Waste Society Conference
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    • 2005.06a
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    • pp.70-71
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    • 2005
  • It was an idea to develop a system to remove the contaminated hot particulate to make clean nuclear research facilities to the clear visibility for researcher. In order to clean micron and sub micron size particulates from used PFC solution as a decontamination tool. Since PFC solution is very expensive so it was a high recommendation to develop the some filtration equipment to purify PFC for next decontamination process, in additionally, reduce the secondary waste. However, we developed an easy and economic filter system to purify the PFC solution. The major advantage of the process operates in closed loop under near ambient conditions, thus minimizing the potential for fugitive TRU emissions and reduces the secondary waste. This has very significant safety and cost impacts. Here we proposed the two types PFC filter systems.

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Sintering Properties of High-pressure Water Atomized SUS 316L Ultra Fine Powder

  • Toyoshima, Hisataka;Kusunoki, Minoru;Otsuka, Isamu
    • Proceedings of the Korean Powder Metallurgy Institute Conference
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    • 2006.09b
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    • pp.769-770
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    • 2006
  • The MIM industry is currently focusing on parts that are used in automobiles and medical instruments. Many of the parts in these categories are very small and often not easy to machine because of its complex geometry. Therefore MIM is well suited for the production of these parts. We tested the sinterability of SUS316L ultra fine powders (3,4, 6, 8micron) produced by ATMIX high-pressure water-atomization, and it showed excellent results. A density of 97% theoretical was obtained by sintering at 1373K when using the ultra fine powder (3micron). Specifically, the finer the powder size, higher was the sintered density. The surface roughness and accuracy are also greatly improved with ATMIX ultra fine powder.

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Characteristics of metal-induced crystallization (MIC) through a micron-sized hole in a glass/Al/$SiO_2$/a-Si structure (Glass/Al/$SiO_2$/a-Si 구조에서 마이크론 크기의 구멍을 통한 금속유도 실리콘 결정화 특성)

  • Oh, Kwang H.;Jeong, Hyejeong;Chi, Eun-Ok;Kim, Ji Chan;Boo, Seongjae
    • 한국신재생에너지학회:학술대회논문집
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    • 2010.06a
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    • pp.59.1-59.1
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    • 2010
  • Aluminum-induced crystallization (AIC) of amorphous silicon (a-Si) is studied with the structure of a glass/Al/$SiO_2$/a-Si, in which the $SiO_2$ layer has micron-sized laser holes in the stack. An oxide layer between aluminum and a-Si thin films plays a significant role in the metal-induced crystallization (MIC) process determining the properties such as grain size and preferential orientation. In our case, the crystallization of a-Si is carried out only through the key hole because the $SiO_2$ layer is substantially thick enough to prevent a-Si from contacting aluminum. The crystal growth is successfully realized toward the only vertical direction, resulting a crystalline silicon grain with a size of $3{\sim}4{\mu}m$ under the hole. Lateral growth seems to be not occurred. For the AIC experiment, the glass/Al/$SiO_2$/a-Si stacks were prepared where an Al layer was deposited on glass substrate by DC sputter, $SiO_2$ and a-Si films by PECVD method, respectively. Prior to the a-Si deposition, a $30{\times}30$ micron-sized hole array with a diameter of $1{\sim}2{\mu}m$ was fabricated utilizing the femtosecond laser pulses to induce the AIC process through the key holes and the prepared workpieces were annealed in a thermal chamber for 2 hours. After heat treatment, the surface morphology, grain size, and crystal orientation of the polycrystalline silicon (pc-Si) film were evaluated by scanning electron microscope, transmission electron microscope, and energy dispersive spectrometer. In conclusion, we observed that the vertical crystal growth was occurred in the case of the crystallization of a-Si with aluminum by the MIC process in a small area. The pc-Si grain grew under the key hole up to a size of $3{\sim}4{\mu}m$ with the workpiece.

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Preparation and Drug Release Profiles of Solid Lipid Nanoparticles(SLN) (의약품의 Solid Lipid Nanoparticle의 제조 및 용출특성)

  • Yoo, Hye-Jong;Kim, Kil-Soo
    • Journal of Pharmaceutical Investigation
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    • v.26 no.2
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    • pp.125-135
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    • 1996
  • Solid lipid nanoparticles(SLN) are particulate systems for parenteral drug administration and suitable for controlled release. SLN were prepared by homogenization process. Dispersion at increased temperature (molten lipid) was performed to yield SLN loaded with lipophilic drugs. Tetracaine base, lidocaine base, prednisolone, methyltestosterone and ethinylestradiol were used as model drugs to access the loading capacity and to study the release behavior. To investigate production parameters(lipids, surfactant concentration, homogenizing rpm) in the formation of SLN, particle size was performed by laser diffraction analysis. The mean particle size of SLN with stearic acid or trilaurin was below 1 micron. By decreasing the particle size and increasing the surfactant concentration, the release rate was increased especially in the case of highly lipophilic drug loaded SLN. Methyltestosterone or ethinylestradiol loaded SLN showed a distinctly prolonged release over a few days.

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