• Title/Summary/Keyword: microimprinting

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Ordered Micropatterns by Confined Dewetting of an Imprinted Polymer Thin Film and Their Microlens Application

  • Lee, Geun-Tak;Yoon, Bo-Kyung;Acharya, Himadri;Park, Cheol-Min;Huh, June
    • Macromolecular Research
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    • v.17 no.3
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    • pp.181-186
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    • 2009
  • We fabricated ordered micro/nano patterns induced by controlled dewetting on the topographically patterned PS/P4VP bilayer thin film. The method is based on utilizing microimprinting lithography to induce a topographically heterogeneous bilayer film that allows the controlled dewetting upon subsequent thermal annealing. The dewetting that was initiated strictly at the boundary of the thicker and thinner regions was guided by the presence of the topographic structure. The dewetting front velocity of the microdomains in the confined regions was linearly proportional to the measurement time, which enabled us to control the size of the dewet domain with annealing time. In particular, the submicron sized dot arrays between lines were generated with ease when the dewetting was confined into geometry with a few microns in size. The kinetically driven, non-lithographical pattern structures accompanied the pattern reduction to 400%. The pattern arrays on a transparent glass substrate were especially useful for non-circular microlens arrays where the focal length of the lens was easily tunable by controlling the thermal annealing.

Ordered Polymer Nanostructures Induced by Controlled Dewetting

  • Park, Cheol-Min;Yoon, Bo-Kyung;Kim, Tae-Hee
    • Proceedings of the Polymer Society of Korea Conference
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    • 2006.10a
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    • pp.188-188
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    • 2006
  • We demonstrate two very simple and fast routes to fabricating ordered micro/nanopatterns of polymers over large areas on various substrates using controlled dewetting. The first method is based on utilizing microimprinting to induce the local thickness variation of an initially inverted bilayer which allows the controlled dewetting and partial layer inversion upon subsequent thermal annealing. In the second method, the self assembly of block copolymer was controlled on a chemically micropatterned surface produced by microcontact printing, being combined with its solvent vapor treatment. The kinetically driven, non-lithographical nanopattern structures were easily fabricated over large area by these approaches.

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