• Title/Summary/Keyword: micro column

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KOH 습식식각을 통한 GaN 기반 Micro-column LED 제작

  • Gong, Deuk-Jo;Gang, Chang-Mo;Choe, Sang-Bae;Seo, Dong-Ju;Sim, Jae-Pil;Nam, Seung-Yong;Lee, Dong-Seon
    • Proceedings of the Korean Vacuum Society Conference
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    • 2014.02a
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    • pp.321-321
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    • 2014
  • GaN는 LED, 태양전지, 그리고 전자소자 등에 쓰이는 물질로, 관련 연구가 활발히 진행되고 있으며, 이와 더불어 top-down방식을 활용한 소자제작 방법 또한 발달되고 있다. 하지만, top-down공정 시 발생 되는 건식 식각에 의한 소자의 손상이 발생되고, 이로 인하여 누설전류가 발생하는 등 여러 가지 문제점이 발생하고 있다. 특히, top-down에서 널리 사용하는 건식식각을 통한 GaN 식각의 경우, nonpolar 면이 아닌, semipolar 면이 드러나게 되며, 이 면은 건식 식각시 발생하는 손상을 포함하고 있다. 본 연구에서는 이러한 문제를 해결하기 위해서, 약 $2{\mu}m$ 크기의 diameter를 갖는 micro-sized column LED를 제작하고, 건식 식각 이후, KOH surface treatment를 통해 손상된 면을 제거함과 동시에 nonpolar면을 드러내는 실험을 실시하였으며, 더불어 column의 diameter를 줄이는 방법을 논하고자 한다.

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Optical Assembly and Fabrication of a Micro-electron Column (마이크로 전자렌즈의 광학적 정렬과 조립)

  • Park, Jong-Seon;Jang, Won-Kweon;Kim, Ho-Seob
    • Korean Journal of Optics and Photonics
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    • v.17 no.4
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    • pp.354-358
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    • 2006
  • A silicon lens and an insulator of pyrex, components of a micro-electron column, should be assembled by aligning and stacking simultaneously. An optical alignment of a diffraction beam and a laser welding were employed for the assembly of a source lens and an Einzel lens with precision within $\pm$4% for the maximum aperture size. The experimental condition for optical alignment and laser welding are explained. Anodic bonding was used to assist in stacking lenses. A micro-electron column of smaller apertures assembled with precise alignment and fabrication was tested with a current image of a Cu grid of 9$\mu$m in linewidth, and showed a higher resolution in acceleration mode.

Study on The Electron-Beam Optics in The Micro-Column for The Multi-Beam Lithography (다중빔 리소그래피를 위한 초소형 컬럼의 전자빔 광학 해석에 관한 연구)

  • Lee, Eung-Ki
    • Journal of the Semiconductor & Display Technology
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    • v.8 no.4
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    • pp.43-48
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    • 2009
  • The aim of this paper is to describe the development of the electron-beam optic analysis algorithm for simulating the e-beam behavior concerned with electrostatic lenses and their focal properties in the micro-column of the multi-beam lithography system. The electrostatic lens consists of an array of electrodes held at different potentials. The electrostatic lens, the so-called einzel lens, which is composed of three electrodes, is used to focus the electron beam by adjusting the voltages of the electrodes. The optics of an electron beam penetrating a region of an electric field is similar to the situation in light optics. The electron is accelerated or decelerated, and the trajectory depends on the angle of incidence with respect to the equi-potential surfaces of the field. The performance parameters, such as the working distances and the beam diameters are obtained by the computational simulations as a function of the focusing voltages of the einzel lens electrodes. Based on the developed simulation algorithm, the high performance of the micro-column can be achieved through optimized control of the einzel lens.

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Development of Micro-Optical Patterned LCD-LGP using UV Inclined-Exposure Process (UV 경사노광에 의한 미세광학패턴 LCD-도광판)

  • Hwang C. J.;Kim J. S.;Ko Y. B.;Heo Y. M.
    • Proceedings of the Korean Society for Technology of Plasticity Conference
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    • 2005.05a
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    • pp.51-54
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    • 2005
  • Light Guide Plate (LGP) of LCD-BLU(Back Light Unit) is manufactured by forming optical pattern with $5\~100um$ in diameter on the LGP by means of sand blasting or etching method. However, in order to improve the luminance of LCD-LGP, the design of optical pattern has introduced UV inclined-exposure process in this study. This micro-optical pattern, which has asymmetric elliptical column shaped pattern, can change low viewing-angle to high viewing-angle, as well as it contribute to diffusion of light. As a result, this type of micro-optical pattern can introduce the highly luminance. The PR structure obtained in the stage of lithography has asymmetric elliptical column shape and it is processed into a micro-optical pattern. Optical design with this kind of micro-optical pattern, mold fabrication by electroplating and LGP molding with injection molding are under way.

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Micro End-milling Technology for Micro Pole Structures (미세 폴 구조물 가공을 위한 마이크로 앤드밀링 기술)

  • Je, Tae-Jin;Choi, Doo-Sun;Lee, Eung-Sug;Hong, Sung-Min;Lee, Jong-Chan;Choi, Han
    • Journal of the Korean Society of Manufacturing Process Engineers
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    • v.4 no.4
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    • pp.7-13
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    • 2005
  • In the case of fabricating micro pole structures such as column, square-pole and gear shaft by the micro end-milling process, it can be useful in the fields of industry, for example, micro parts, electrode for electrical discharge machining and micro mold for injection molding. In this study, machining factors and the process were analyzed. Machining experiments of various micro pole configurations were performed. Analysis of the change and effect of the cutting force according to the machining conditions was carried out. An analytical study of the deformation of the micro pole caused cutting conditions and cutting force through the finite element method and ANSYS program was carried out. As a result, this research presented a method of fabricating the column pole of below $100{\mu}m$ diameter with high aspect ratio by using micro end-milling process, and based on that, a method of fabricating a variety of applicable structures. Also the minimum size of the pole capable of fabricating through theory and experiment were demonstrated.

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The Optimal Condition for Scanning Large Area with a Micro-electron-column (초소형 전자칼럼의 대면적 주사 적정조건)

  • Park, Sung-Soon;Kim, Ho-Seob;Jang, Won-Kweon
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.20 no.6
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    • pp.481-486
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    • 2007
  • In large area scanning with a micro-electron-column, the operating condition for the best resolution was investigated in factors of working distance and field of view. The resolution of a test sample was dependent on electron beam energy and scanning field size. The best resolution with single deflector was obtained at 300 V and 30 mm in the electron emitting tip voltage and a working distance, respectively. The scanning area at that condition was $13.9{\times}13.9mm^2$, linearly increased with the working distance. Double deflector was employed for larger scanning size without increasing working distance, but showed only 1.7 times larger than that of single deflector, and the resolution was inverse proportional to the scanning size.

Analysis of Carbendazim and Carbaryl by Micro-HPLC (Micro-HPLC에 의한 Carbendazim과 Carbaryl의 분석)

  • Choi, Kyoung-Sook;Lee, Hoe-Yeon;Lee, Duck-Hee;Byun, Woon-Ki
    • Analytical Science and Technology
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    • v.7 no.3
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    • pp.421-425
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    • 1994
  • A micro-high performance liquid chromatography(Micro-HPLC) techniquie with solid phase extraction was reported which detected carbendazim and carbaryl at picogram levels. They were separated on microbore packed $C_{18}$ column($1.0mm\;I.\;D{\times}150mm$, $d_f=5{\mu}m$) using a 50% methanol mobile phase and detected at UV 220nm(${\alpha}=2.94$, $R_s=4.71$), while they were not resolved on analtical HPLC system(${\alpha}=1.27$, $R_s=0.76$). The detection thresholds of carbendazim and carbaryl were 0.5ng and 0.1ng on Micro-HPLC, therefore Micro-HPLC system was 20~40 told more sensitive than anayltical HPLC system. Sep-Pak $C_{18}$ catridge was found to be efficient in enriching carbendazim and carbaryl from dilute aqueous solution with 97.0% and 97.8% recoveries of them. The Sep-Pak $C_{18}$ catridge followed by the Micro-HPLC had been applied to the quantitative analysis of carbendazim and carbaryl in spiked juices and a commercial drinking water.

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