• 제목/요약/키워드: metal ion effect

검색결과 513건 처리시간 0.022초

다공성 그물구조 음극을 이용한 구리 전착에 관한 연구 (I) - 전해질 중의 구리 이온 농도의 영향 - (Electrodeposition of Copper on Porous Reticular Cathode(1) - Effect of Cupric Son Concentration -)

  • 이관희;이화영;정원용
    • 전기화학회지
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    • 제3권3호
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    • pp.152-156
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    • 2000
  • 그물구조 다공성 금속을 황산과 황산구리 수용액을 전해질로 사용하여 전기화학적으로 제조하였으며, 이때 균질 전착에 영향을 미치는 구리이온 농도에 대해 살펴보았다. 전해질 중의 황산에 대한 구리이온의 농도비가 감소하면 전해질의 점성이 감소하여 전기전도도의 향상을 가지고 오며, 분극도(polarizability)의 상승을 유발시켜 균일 전류밀도 분포력(throwing power)을 향상시키는 효과를 나타내었다. 그물구조 다공성 금속을 제조하기 위한 최적의 조건은 한계 전류밀도와 균일 전류밀도 분포력을 고려하여 결정되어야 하며, 인가전류가 $10mA/cm^2$일 때 0.2M $CuSO_4\cdot\;5H_2O+0.5\;H_2SO_4$임을 확인하였다.

Fe/BEA 제올라이트 촉매의 N2O/NO 동시 환원 반응에서 금속 담지 방법이 촉매 활성에 미치는 영향 (Effect of Metal Loading Methods on the Catalytic Activity for N2O/NO Simultaneous Reduction over Fe/BEA Zeolite Catalyst)

  • 전민욱;이승재;유인수;문승현;이영우;전상구
    • Korean Chemical Engineering Research
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    • 제55권5호
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    • pp.679-684
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    • 2017
  • Fe/BEA 제올라이트 촉매의 $N_2O/NO$ 동시 환원반응에서 Fe이온을 담지하는 방법이 촉매의 활성에 미치는 영향을 고찰하였다. Fe/BEA 제올라이트 촉매는 함침법과 이온교환법으로 제조되었으며, 제조된 촉매의 성능을 확인하기 위하여 암모니아를 환원제로 사용하는 선택적 촉매 환원 반응을 실시하였다. 그 결과 이온교환 촉매는 함침 촉매보다 높은 NO 및 $N_2O$ 전환율을 나타내었다. 이러한 촉매 활성의 차이를 규명하기 위하여 XRD, $H_2-TPR$, $O_2-TPD$, XPS와 같은 촉매 특성 분석들이 수행되었다. 이온교환 촉매의 활성 증가는 향상된 환원 특성 및 증가된 산소 탈착 속도에 기인한 것으로 판단되며, 이온교환 촉매 제조시 촉매 활성과 관련이 있는 $Fe^{2+}$가 함침 촉매에 비해 약 1.6배 이상 형성되는 것을 XPS 분석을 통하여 확인하였다.

Tetrabenzylalkylenediamine을 이용한 수소이온 선택성 막전극 (Hydrogen ion-selective membrane electrodes based on tetrabenzylalkylenediamine)

  • 김재우;조동희;정성숙;정구춘;박면용
    • 분석과학
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    • 제10권3호
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    • pp.161-167
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    • 1997
  • Tetrabenzylmethylenediamine(TBMDA), tetrabenzylethylenediamine(TBEDA), tetrabenzylpropylenediamine(TBPDA), tetrabenzylhexylenediamine(TBHDA)의 중성운반체를 이용한 수소이온 선택성 막전극을 제조하였다. TBMDA, TBEDA, TBPDA, TBHDA의 아미노기간의 탄소수 변화에 따라 pH 1~pH 9, pH 2~pH 9, pH 3~pH 9, pH 4~pH 9 범위에서 수소이온에 대하여 선택적이고 선형적인 감응을 나타내었으며, 각각에 대한 기울기는 48mV/pH, 52mV/pH, 64mV/pH, 59mV/pH를 나타내었다. 각 전극에 대하여 알칼리금속이온($Li^+$, $Na^+$, $K^+$) 및 알칼리토금속이온($Mg^{2+}$, $Ca^{2+}$, $Sr^{2+}$, $Ba^{2+}$), 전이금속이온($Cu^{2+}$, $Ni^{2+}$, $Co^{2+}$)과 음이온($I^-$, $Br^-$, ${NO_3}^-$, $SCN^-$)에 대한 방해효과를 측정하였다. 선택계수는 분리용액법을 이용하여 측정하였고, 산성 용액에서 선형성을 나타내는 TBMDA가 가장 좋은 결과를 나타내었다.

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Purification and Characterization of GTP Cyclohydrolase I from Streptomyces tubercidicus, a Producer of Tubercidin

  • Yoo, Jin-Cheol;Han, Ji-Man;Ko, Ok-Hyun;Bang, Hee-Jae
    • Archives of Pharmacal Research
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    • 제21권6호
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    • pp.692-697
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    • 1998
  • GTP cyclohydrolase I catalyzing the first reaction in the biosynthesis of pterin moiety of folic acid in bacteria, was purified from Streptomyces tubercidicus by at least 203-fold with a yield of 32% to apparent homogeneity, using ammonium sulfate fractionation, DEAE-cellulose, Sepharose CL-6B, and hydroxylapatite column chromatography. The molecular weight of the native enzyme was estimated to be 230,000 daltons by gel permeation chromatography. The purified enzyme gave a single band on sodium dodesyl sulfate-polyacrylamide gel electrophoresis and its molecular weight was apparently 58,000 daltons. These results indicate that the enzyme consists of four subunits with the same molecular weight. The $K_m$ and $V_{max}$ values for GTP of the purified enzyme were determined to be 80${\mu}$M and 90nmol/min (mg protein), respectively. The optimum pH and temperature for the enzyme reaction were pH 7.5-8.5 and $40-42^{\circ}C$, respectively. Coenzyme or metal ion was not required for the enzyme activity. The enzyme activity was inhibited by most divalent cations, while it was slightly activated by potassium ion. In case of nucleotides, CTP, GMP, GDP, and UTP inhibited enzyme activity, among which GDP exhibited the strongest inhibitory effect.

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고밀도 $Cl_2/Ar$ 플라즈마를 이용한 $YMnO_3$ 박막의 식각 특성에 관한 연구 (A Study on the Etching Characteristics of $YMnO_3$ Thin Films in High Density $Cl_2/Ar$ Plasma)

  • 민병준;김창일;장의구
    • 한국항해항만학회:학술대회논문집
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    • 한국항해항만학회 2000년도 추계학술대회논문집
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    • pp.21-24
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    • 2000
  • Ferroelectric YMnO$_3$thin films are excellent dielectric materials for high integrated ferroelectric random access memory (FRAM) with metal-ferroelectric-silicon field effect transistor (MFSFET) structure. In this study, YMnO$_3$thin films were etched with Cl$_2$/Ar gas chemistries in inductively coupled plasma (ICP). The maximum etch rate of YMnO$_3$thin films is 285 $\AA$/min under Cl$_2$/Ar of 10/0, 600 W/-200 V and 15 mTorr. The selectivities of YMnO$_3$over CeO$_2$and $Y_2$O$_3$are 2.85, 1.72, respectively. The results of x-ray photoelectron spectroscopy (XPS) reflect that Y is removed dominantly by chemical reaction between Y and Cl, while Mn is removed more effective by Ar ion bombardment than chemical reaction. The results of secondary ion mass spectrometer (SIMS) were equal to these of XPS. The etch profile of the etched YMnO$_3$film is approximately 65$^{\circ}$and free of residues at the sidewall.

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Doping a metal (Ag, Al, Mn, Ni and Zn) on TiO2 nanotubes and its effect on Rhodamine B photocatalytic oxidation

  • Gao, Xinghua;Zhou, Beihai;Yuan, Rongfang
    • Environmental Engineering Research
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    • 제20권4호
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    • pp.329-335
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    • 2015
  • The effects of ion-doping on $TiO_2$ nanotubes were investigated to obtain the optimal catalyst for the effective decomposition of Rhodamine B (RB) through UV photocatalytic oxidation process. Changing the calcination temperature, which changed the weight fractions of the anatase phase, the average crystallite sizes, the BET surface area, and the energy band gap of the catalyst, affected the photocatalytic activity of the catalyst. The ionic radius, valence state, and configuration of the dopant also affected the photocatalytic activity. The photocatalytic activities of the catalysts on RB removal increased when $Ag^+$, $Al^{3+}$ and $Zn^{2+}$ were doped into the $TiO_2$ nanotubes, whereas such activities decreased as a result of $Mn^{2+}$ or $Ni^{2+}$ doping. In the presence of $Zn^{2+}$-doped $TiO_2$ nanotubes calcined at $550^{\circ}C$, the removal efficiency of RB within 50 min was 98.7%.

Changes in Facilitated Transport Behavior of Silver Polymer Electrolytes by UV Irradiation

  • Jongok Won;Yosang Yoon;Kang, Yong-Soo
    • Macromolecular Research
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    • 제10권2호
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    • pp.80-84
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    • 2002
  • Silver species other than the silver ion were formed by UV irradiation on polymer electrolyte membranes containing silver salts and their effect on complexation behavior between the silver and olefin was investigated through the separation performance of olefin/paraffin mixtures. The ideal propylene/propane separation factor reached 350 and the separation coefficient was ca.15 due to the high loading amount of silver ions into poly(2-ethyl-2-oxazoline) (POZ) without UV irradiation. On UV irradiation either in air or under nitrogen, the silver-POZ membranes became yellow-brown initially due to the formation of colloidal silver particles, and finally black and metal-like luster. Even when Ag$^{+}$ was converted, to some extent, to Ag$^{\circ}$ by UV irradiation in air at the early stage, the separation coefficient of olefin/paraffin mixtures was maintained. This suggests that silver species other than the silver ion is active for olefin carrier for facilitated transport. Meanwhile the steady decrease of the separation coefficient was observed in the silver/POZ membranes irradiated under $N_2$. It is suggested that the reduction of silver ions in POZ goes through a different photoreduction mechanism with UV irradiation depending on the environment.t.

The effect of 3-mercapto-5-nitro-benzimidazole (MNB) and poly (methyl methacrylate) (PMMA) treatment sequence organic thin film transistor

  • Park, Jin-Seong;Suh, Min-Chul;Jeong, Jong-Han;Kim, Su-Young;Mo, Yeon-Gon
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2006년도 6th International Meeting on Information Display
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    • pp.1174-1177
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    • 2006
  • A bottom contact organic thin film transistor (OTFT) is fabricated with an organic double-layered gate insulator (GI) and pentacene. The PMMA and MNB layers are treated on gate insulator and source/drain (S/D, Au) before depositing pentacene to investigate device properties and pentacene growth. The sequence of surface treatment affects a device performance seriously. The ultra-thin PMMA (below 50A) was deposited on organic gate insulator and S/D metal by spin coating method, which showed no deterioration of on-state current (Ion) although bottom contact structure was exploited. We proposed that the reason of no contact resistance (Rc) increase may be due to a wettability difference in between PMMA / Au and PMMA / organic GI. As a result, the device treated by $PMMA\;{\rightarrow}\;MNB$ showed much better Ion behavior than those fabricated by $MNB\;{\rightarrow}\;PMMA$. We will report the important physical and electrical performance difference associated with surface treatment sequence.

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나노 구체 리소그라피법에 Ashing과 Annealing 효과를 적용하여 크기조절 가능한 나노패턴의 제조 (Size Tunable Nano Patterns Using Nanosphere Lithography with Ashing and Annealing Effect)

  • 이유림;마흐붑 알람;김진열;정우광;김승대
    • 한국재료학회지
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    • 제20권10호
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    • pp.550-554
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    • 2010
  • This work presents a fabrication procedure to make large-area, size-tunable, periodically different shape metal arrays using nanosphere lithography (NSL) combined with ashing and annealing. A polystyrene (PS, 580 ${\mu}m$) monolayer, which was used as a mask, was obtained with a mixed solution of PS in methanol by multi-step spin coating. The mask morphology was changed by oxygen RIE (Reactive Ion Etching) ashing and temperature processing by microwave heating. The Au or Pt deposition resulted in size tunable nano patterns with different morphologies such as hole and dots. These processes allow outstanding control of the size and morphology of the particles. Various sizes of hole patterns were obtained by reducing the size of the PS sphere through the ashing process, and by increasing the size of the PS sphere through annealing treatment, which resulted in tcontrolling the size of the metallic nanoparticles from 30 nm to 230 nm.

이온 플레이팅법으로 제조한 (Ti$_{1-x}$Cr$_{x}$)N 박막의 마모특성에 관한 연구 (Wear properties of (Ti$_{1-x}$Cr$_{x}$)N coatings deposited by ion-plating method)

  • 이광희;박찬홍;이정중
    • 한국표면공학회지
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    • 제34권2호
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    • pp.125-134
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    • 2001
  • ($Ti_{1-x}$ $Cr_{x}$ )N coatings were deposited by an ion-plating method in a reactor with two separate metal sources, Ti and Cr. Ti was evaporated using an electron beam, while Cr evaporation was carried out by resistant heating. The Ti and Cr concentrations in the coatings were controlled by the Ti and Cr evaporation ratio. The coating hardness increased with increasing the Cr content(x) and showed a maximum value of 6,000 HK at around x=0.8. The critical load of the coatings, measured by the scratch test, was around 30 N. The wear resistance properties of the ($Ti_{1-x}$$Cr_{ x}$)N coatings were evaluated using a CSEM pin-on-disk type tribometer. A Cr-steel ball as well as a SiC ball, which had hardness values of 590 HK and 2,600 HK respectively, were used as the pin. After the wear test, the surface morphology, roughness and the concentration of the coatings were investigated, with the main focus being on the effect of wear debris and the transferred layer on the wear behavior.

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