• Proceedings of the IEEK Conference
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• 2002.07a
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• pp.180-183
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• 2002

In this paper, we propose new unsharp masking technique based on the multiscale gradient planes. The unsharp masking technique is implemented as a high-pass filter and improves the sharpness of degraded images. However, the conventional unsharp masking enhances the noise component simultaneously. To reduce the noise influence, we introduce the edge information from the difference of the gradient values between two consecutive scales of the multiscale gradient. The multiscale gradient indicates the presence of image edges as the ratio between the gradients between two different scales by its multiscale nature. The noise reduction of the proposed method does not depend on the variance of images and noises. In experiment, we demonstrate enhancement results for blurred noisy images and compare with the conventional cubic unsharp masking technique.

• Proceedings of the Korean Society for Technology of Plasticity Conference
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• 2001.10a
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• pp.186-189
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• 2001

The main method in micro-etching process, used in manufacturing semiconductors, electronic components, circuits, is Photo Masking method that exposes and develops on the photo-sensitivity solutions or films. This method enables one to process highly precisely, $\pm$0.03 mm in end line location area. But this has limits in a high speed / wide width process, difficulties in endless masking, and the problem of high price. We have developed the direct masking method to make use of Gravure printing, widely used in grocery packing sheet printing. We made cylinder tools to influence the masking quality by laser stream process. We have confirmed that the end line location accuracy in the line width of the product is improved from 0.12 mm to $\pm$0.07 mm level, after etching process.

• The Transactions of The Korean Institute of Electrical Engineers
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• v.56 no.3
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• pp.629-631
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• 2007

In hands-free full-duplex communication systems, acoustic signals picked up by the microphones can be mixed with echo signals as well as noises, which may result in poor performance of the corresponding communication system. Also, the system performance may decrease further if the reverberation occurs since it is harder to estimate the impulse response of the demixing system. For blind source separation (BSS) in such cases, a time-frequency masking approach can be employed to separate undesired echo signals and noises, but, permutation ambiguities also should be solved for the echo cancellation. In this paper, we propose a new acoustic echo cancellation (AEC) approach utilizing the time-frequency masking and higher-order statistics, whereby a desired signal selection, based on coherence and third-order statistics (i.e., kurtosis), is introduced along with output signal normalization. Simulation results demonstrate that the proposed approach yields better echo and noise cancellation performances than the conventional AEC approaches.

• Korean Journal of Remote Sensing
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• v.33 no.4
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• pp.437-444
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• 2017

Since land pixels often generate false alarms in ship detection using Synthetic Aperture Radar (SAR), land masking is a necessary step which can be processed by a land area map or water database. However, due to the continuous coastline changes caused by newport, bridge, etc., an updated data should be considered to mask either the land or the oceanic part of SAR. Furthermore, coastal concrete facilities make noise signals, mainly caused by side lobe effect. In this paper, we propose two methods. One is a semi-automatic water body data generation method that consists of terrain correction, thresholding, and median filter. Another is a dynamic land masking method based on water database. Based on water database, it uses a breadth-first search algorithm to find and mask noise signals from coastal concrete facilities. We verified our methods using Sentinel-1 SAR data. The result shows that proposed methods remove maximum 84.42% of false alarms.

• Journal of Multimedia Information System
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• v.4 no.2
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• pp.65-73
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• 2017

This paper proposes a method to improve the image quality by designing Unsharp Mask Filter (UMF) based on Retinex theory which controls the frequency pass characteristics adaptively. Conventional unsharp masking technique uses blurring image to emphasize sharpness of image. Unsharp Masking(UM) adjusts the original image and sigma to obtain a high frequency component to be emphasized by the difference between the blurred image and the high frequency component to the original image, thereby improving the contrast ratio of the image. In this paper, we design a Unsharp Mask Filter(UMF) that can process the contrast ratio improvement method of Unsharp Masking(UM) technique with one filtering. We adaptively process the contrast ratio improvement using Unsharp Mask Filter(UMF). We propose a method based on Retinex theory for adaptive processing. For adaptive filtering, we control the weights of Unsharp Mask Filter(UMF) based on the human visual system and output more effective results.

• Proceedings of the Korean Information Science Society Conference
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• 1998.10c
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• pp.15-17
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• 1998

설명 기반 학습은 시스템 성능향상에 필요한 탐색 제어 지식을 학습하는 방법으로 많이 이용되고 있다. EBL은 과거의 문제풀이 과정을 일반화하여 학습한 다음 이와 유사한 상황이 발생할 경우, 문제풀이를 거치지 않고 학습된 해답을 신속하게 제시하여 성능을 향상시킨다. 그러나 새로운 문제 해결이 과거 문제 풀이 해답에 의존할 경우, 그에 대한 해답을 신속히 구할 수는 있지만 해답의 질은 학습 결과에 의존하지 않을 때보다 오히려 못할 수 있다. 이러한 현상을masking효과라고 한다. 본 논문에서는 의존성 구조를 학습, 이용하여 이러한 masking 효과를 축소하고자 한다. 의존성 구조는 현 상태에서 선택된 연산자가 이후의 문제 풀이에 끼치는 영향을 포함하는 구조로서, 이후 유사한 상황에 대해 선택될 연산자의 적합성 및 효율성을 평가하는 기준으로 사용될 수 있다는 점에서 masking 효과를 축소할 수 있다.

• ETRI Journal
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• v.32 no.3
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• pp.370-379
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• 2010

In this paper, we propose efficient masking methods for ARIA and AES. In general, a masked S-box (MS) block can be constructed in different ways depending on the implementation platform, such as hardware and software. However, the other components of ARIA and AES have less impact on the implementation cost. We first propose an efficient masking structure by minimizing the number of mask corrections under the assumption that we have an MS block. Second, to make a secure and efficient MS block for ARIA and AES, we propose novel methods to solve the table size problem for the MS block in a software implementation and to reduce the cost of a masked inversion which is the main part of the MS block in the hardware implementation.

• Journal of the Korean Society for Precision Engineering
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• v.21 no.5
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• pp.24-31
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• 2004

Masking effect of the nanoscratched silicon (100) surface was studied and applied to a maskless nanofabrication technique. First, the surface of the silicon (100) was machined by ductile-regime nanomachining process using the scratch option of the Nanoindenter${ \circledR}$ XP. To clarify the possibility of the nanoscratched silicon surfaces for the application to wet etching mask, the etching characteristic with a KOH solution was evaluated at room temperature. After the etching process, the convex nanostructures were made due to the masking effect of the mechanically affected layer. Moreover, the height and the width of convex structures were controlled with varying normal loads during nanoscratch.

• Journal of Information Processing Systems
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• v.19 no.3
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• pp.323-333
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• 2023

Facial expression recognition can aid in the development of fatigue driving detection, teaching quality evaluation, and other fields. In this study, a facial expression recognition method was proposed with a residual masking reconstruction network as its backbone to achieve more efficient expression recognition and classification. The residual layer was used to acquire and capture the information features of the input image, and the masking layer was used for the weight coefficients corresponding to different information features to achieve accurate and effective image analysis for images of different sizes. To further improve the performance of expression analysis, the loss function of the model is optimized from two aspects, feature dimension and data dimension, to enhance the accurate mapping relationship between facial features and emotional labels. The simulation results show that the ROC of the proposed method was maintained above 0.9995, which can accurately distinguish different expressions. The precision was 75.98%, indicating excellent performance of the facial expression recognition model.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2012.05a
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• pp.177-178
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• 2012