• 제목/요약/키워드: mask

검색결과 2,744건 처리시간 0.023초

EUV Lithography Blank Mask Repair using a FIB

  • 채교석;김석구;김신득;안정훈;박재근
    • 한국반도체및디스플레이장비학회:학술대회논문집
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    • 한국반도체및디스플레이장비학회 2004년도 춘계학술대회 발표 논문집
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    • pp.129-131
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    • 2004
  • 극자외선 리소그래피(EUV lithography) 기술은 50nm 이하의 선폭을 가지는 차세대 소자 제작에 있어서 선도적인 기술 중 하나이다. EUVL 에서 필수적인 요소중의 하나가 mirror 로 사용되는 blank mask 이다. Blank mask 에 있어서 가장 중요한 요소는 반사도이다. 이 blank mask 는 Si substrate 위에 반사를 위한 Mo/Si pair 가 40pair 이상 적층되어있다. Blank mask 는 매우 청결해야한다. 만약 결함이 있다면 blank mask 에는 치명적이다 결함은 blank mask 에 있어서 반사도를 떨어뜨리는 주 요소이기 때문이다. 그 결함에는 amplitude defect 과 phase defect 이 있다. FIB 에서는 amplitude defect 을 수정하는 것이 가능하다. 우리는 FIB 를 이용하여 mage mode, spot mode, bar rotation mode 를 사용하여 amplitude defect을 수정하였다. 그리고, 그 결과 효과적으로 amplitude defect을 수정하였다.

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세도우 마스크 장력에 열공정이 미치는 영향 (Effect of Heat Treatment Process on the Shadow Mask Tension)

  • 현도익;문영훈;조종래
    • 소성∙가공
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    • 제12권5호
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    • pp.487-492
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    • 2003
  • Tension variations with heat treatment in shadow mask for flat braun tubes are investigated in this study. In CRT, landing shift of the electron beam due to thermal deformation of the tension mask made the color purity of screen worse. In order to get the final results of thermal deformation, the tensile force within the mask and the welding processes between the rail and the extended mask have to be analysed sequentially. In this study, the effect of heat treatment is studied in terms of tension variations of shadow mask during its manufacturing process.

AFM 기반 액중 Tribo nanolithography 에서의 마스크 층 내식각성에 관한 연구 (Etch Resistance of Mask Layer modified by AFM-based Tribo-Nanolithography in Aqueous Solution)

  • 박정우;이득우
    • 한국정밀공학회:학술대회논문집
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    • 한국정밀공학회 2005년도 추계학술대회 논문집
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    • pp.268-271
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    • 2005
  • Etch resistance of mask layer on silicon substrate modified by AFM-based Tribo-Nanolithography (TNL) in Aqueous Solution in an aqueous solution was demonstrated. n consists or sequential processes, nano-scratching and wet chemical etching. The simple scratching can form a mask layer on the silicon substrate, which acting as an etching mask. For TNL, a specially designed cantilever with diamond tip, allowing the formation of mask layer on silicon substrate easily by a simple scratching process, has been applied instead of conventional silicon cantilever fur scanning. This study demonstrates how the TNL parameters can affect the etch resistance of mask layer, hence introducing a new process of AFM-based maskless nanolithography in aqueous solution.

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광택기 제조를 목적으로 한 스퍼터링을 이용한 Mo 증착과 불산 습식 식각 특성 연구 (A Study on the Mo Sputtering and HF Wet Etching for the Fabrication of Polisher)

  • 김도형;이호덕;권상직;조의식
    • 반도체디스플레이기술학회지
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    • 제16권4호
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    • pp.16-19
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    • 2017
  • For the economical and environmental-friendly fabrication of polisher, Mo mask layer were sputtered on glass substrate instead of Cr mask material. Mo mask layers were sputtered by pulsed-DC sputtering and Photoresist patterns were formed on Mo mask layer for different develop times and optimized. After Mo mask layer were patterned and exposed glass was wet etched by HF solution for different etching times, the remaining Mo mask was stripped by using Al etchant. Develop time of 30 sec and HF wet etching time of 3 min were selected as optimized process condition and applied to the fabrication of polisher.

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마스크 생산 라인에서 다중 영상 기반 마스크 이어링 검사 방법 (Multi-Vision-based Inspection of Mask Ear Loops Attachment in Mask Production Lines)

  • 우지명;이상현;이헌철
    • 대한임베디드공학회논문지
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    • 제17권6호
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    • pp.337-346
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    • 2022
  • This paper addresses the problem of vision-based ear loops ansd attachment inspection in mask production lines. This paper focuses on connections with ear loops and mask filter by an efficient combined approach. The proposed method used a template matching, shape detection and summation of histogram with preprocessing. We had a parameter for detecting defects heuristically. If the shape vertices are lower than the parameters our proposed method will find defective mask automatically. After finding normal masks in mask ear loops attachment status inspection algorithm our proposed method conducts attachment amount inspection. Our experimental results showed that the precision is 1 and the recall is 0.99 in the mask attachment status inspection and attachment amount inspection.

Globalizing the MEDIHEAL Brand: L&P Cosmetic's Collaboration with BTS

  • Kwon, Ick Hyun
    • Asia Marketing Journal
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    • 제21권2호
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    • pp.51-71
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    • 2019
  • L&P Cosmetic, the leading company selling mask packs on the global market, produces MEDIHEAL, the number-one best-selling mask pack brand in Korea and the best-selling imported mask pack brand in China (2017). The company pioneered the premium market for mask packs through its launch of premium mask packs in 2009, and has subsequently achieved outstanding success in Korea and China. Three key factors have contributed to the success of L&P Cosmetic: product leadership with R&D capability, strategic marketing programs tailored for each market segment, and operational excellence focusing on strategic outsourcing and partnership management. Nonetheless, globalization beyond the Chinese market remains a major challenge for the potential of L&P Cosmetic. The company has embarked upon a collaboration with BTS, the world's top K-pop stars, as an optimally effective way to achieve its goals and a highly efficient strategy to manage the risks of globalization. The global branding collaboration project with BTS has succeeded in generating primary demand for mask packs on the global market, spreading brand awareness of MEDIHEAL, and establishing global channel networks. L&P Cosmetic will continue to grow worldwide on the basis of this outstanding performance.

위상 마스크 간섭계를 이용한 광섬유 격자 제작 (Fiber Brags Grating Fabrication using Interferometer with Phase Mask)

  • 유계준;이호준;김병규;김선관;이원준
    • 한국광학회:학술대회논문집
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    • 한국광학회 2001년도 제12회 정기총회 및 01년도 동계학술발표회
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    • pp.194-195
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    • 2001
  • We fabricated fiber bragg gratings using interferometric method with Phase mask. The interferometer consisted of two plane-parallel mirrors and a phase mask perpendicular to mirrors. The Gratings were written using an Argon-ion laser. The experimental setup could change Bragg wavelength given by the phase mask. (omitted)

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안면부 여과식 방진 마스크의 형태 및 착용 방법 교육이 밀착계수에 미치는 영향 비교 (Comparison of Effects of Mask Style and Donning Training on Fit Factors of Particulate Filtering Facepiece Respirators)

  • 어원석;최영보;신창섭
    • 한국안전학회지
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    • 제31권5호
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    • pp.35-41
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    • 2016
  • Particulate filtering facepiece respirators (PFFR) is one of the most widely used items of personal protective equipments, and a tight fit of the respirators on the wearers is critical for the protection effectiveness. In order to effectively protect the workers through the respirators, it is important to find and evaluate the ways that can be readily applicable at the workplace to improve the fit of the respirators. This study was designed to evaluate effects of mask style (cup or foldable type) and donning training on fit factors (FF) of the respirators, since these are available at various workplace, especially at small business workplace. A total of 40 study subjects, comprised of 30~50s aged male and female workers in metalworking industries, were enrolled in this study. The FF were quantitatively measured before and after training related to the proper donning and use of cup or foldable-type respirators. The pass/fail criterion of FF was set at 100. After the donning training for the cup-type mask, subjects who passed the fit test were increased from 10 to 33. Moreover, the geometric mean (GM) of FF was increased by 340% in subjects who failed the test. In addition, the training effects for the cup-type mask were significant in female and 50s aged subjects. On the other hand, although the GM of FF for the foldable-type mask was also increased after the donning training, the GM of FF for the foldable-type mask and it's increase rate were smaller as compared to the cup-type mask. Furthermore, the differences of the increase rates of the GM of FF in sex and aged of the subjects were not significantly for the foldable-type mask. The multi-distribution of leak points for the foldable-type mask may be one of causes for the less effect of training on the fit of the foldable-type mask. These results imply that the raining on the donning and use of PFFR can enhance the protection effectiveness of cup or foldable-type mask, and that the training effects for the foldable-type mask is less significant than that for the cup-type mask. Therefore, It is recommended that the donning training and fit tests should be conducted before the use of the PFFR, and that efficient tranining programs for the foldable-type mask are required.

보건용 마스크 초미세먼지 제거 성능 평가 및 재사용 연구 (Performance and reusability of certified and uncertified face masks)

  • 이해범;김서정;주흥수;조희주;박기홍
    • 한국입자에어로졸학회지
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    • 제15권4호
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    • pp.191-202
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    • 2019
  • In this study, performance (particle removal efficiency and breathing resistance) of several commercially available face masks (electrostatic filter masks (KF80 certified), a nanofiber filter mask (KF80 certified), and an uncertified mask) with their filter structure and composition were evaluated. Also, effects of relative humidity (RH) of incoming air, water and alcohol exposure, and reusability on performance of face masks were examined. Monodisperse and polydisperse sodium chloride particles were used as test aerosols. Except the uncertified mask filter, PM2.5 removal efficiency was found to be higher than 90%, and the nanofiber filter mask had the highest quality factor due to the low pressure drop and high removal efficiency (nanofibers were arranged in a densely packed pore structure and contained a significant amount of fluorine in addition to carbon and oxygen). In the case of the KF80 certified mask, the removal efficiency was little affected when the RH of incoming air increased. When the mask filters were soaked in water, the removal efficiency of mask filters was degraded. In particular, the uncertified mask filter showed the highest removal efficiency degradation (26%). When the mask was soaked in alcohol, the removal efficiency also decreased with the greater degree than the water soaking case. The nanofiber mask filter showed the strongest resistance to alcohol exposure among tested mask filters. During evaluation of reusability of masks in real life, the removal efficiency of certified mask filter was less than 4% for 5 consecutive days (2 hours per day), while the removal efficiency of uncertified mask filter significantly decreased by 30% after 5 days.

마스크 선택에 따른 직장인의 구취 관련 특성 연구 (A Study on the Characteristics of Bad Breath in Office Workers According to Mask Selection)

  • 서정철;고결;배상덕;문상호;권병안
    • 디지털융복합연구
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    • 제19권2호
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    • pp.439-446
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    • 2021
  • 본 연구는 천연광물질로 나염 처리된 스포츠마스크가 방역마스크와 면마스크와 비교하여 주관적인 구취관련특성과 심리적 특성에서 차이가 있는 지 조사하는 것이다. 연구대상자는 스포츠마스크 군(Sports Mask Group) 30명, 방역마스크 군(KF Mask Group, KMG) 30명과 면 마스크 군(cotton mask group, CMG) 30명으로 나누어 총 90명의 대상자가 연구에 참가하였으며, 하루 1개, 3일 간 3개의 마스크를 사용하게 하였다. 또한 연구 기간은 2020년 10월 15일부터 2020년 10월 30일까지 실시하였다. 연구결과 구취건강과 구강건조 항목에서는 3군 간 차이가 없는 것으로 나타났지만 구강호흡과 구취자각도에서는 스포츠 마스크가 다른 마스크에 비하여 우수하게 나타났다. 심리적 요인을 분석한 결과 우울증은 3군 간 차이가 없는 것으로 나타났지만, 스트레스 요인에서는 스포츠마스크가 다른 마스크보다 스트레스지수가 감소된 것으로 나타났다. 연구의 결과는 기능성 마스크의 활용 방향성을 제시한 것으로써 가치가 있으며, 향후 연구될 기능성 마스크 연구의 기초 자료로 활용되길 바라는 바이다.