• Journal of Magnetics
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• v.17 no.2
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• pp.78-82
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• 2012

CoNiFe(CNF)/$BaTiO_3(BTO)$/CoNiFe(CNF) multilayered thin films were deposited on Pt/Ti/$SiO_2$/Si substrates by using pulsed laser deposition (PLD) system. We fabricated three different thin films of BTO, BTO/CNF and CNF/BTO/CNF for magneto-capacitor and studied their crystalline structure, surface and interface morphology, and magnetic and electrical properties. When three different structures of multilayered thin film were compared, magnetization of CNF/BTO/CNF thin films was decreased by magnetic and dielectric interaction. Also we confirmed that capacitance of CNF/BTO/CNF multilayered thin film was enhanced as being near tetragonal structure with increasing of c/a ratio because of atomic bonding at interface between BTO dielectric and CNF magnetic materials. Finally, we studied the change of the capacitance of CNF/BTO/CNF multilayered thin film with magnetic field for emergence of magnetocapacitance and suggested a possibility of enhanced capacitance.

• Proceedings of the Korean Vacuum Society Conference
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• 2010.02a
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• pp.233-233
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• 2010

Magnetic random access memory (MRAM), based on magnetic tunnel junction (MTJ) and CMOS, is a prominent candidate among prospective semiconductor memories because it can provide nonvolatility, fast access time, unlimited read/write endurance, low operating voltage and high storage density. The etching of MTJ stack with good properties is one of a key process for the realization of high density MRAM. In order to achieve high quality MTJ stack, the use of CoFeB and IrMn magnetic films as free layers was proposed. In this study, inductively coupled plasma reactive ion etching of CoFeB and IrMn thin films masked with Ti hard mask was investigated in a $Cl_2$/Ar gas mix. The etch rate of CoFeB and IrMn films were examined on varying $Cl_2$ gas concentration. As the $Cl_2$ gas increased, the etch rate monotonously decreased. The effective of etch parameters including coil rf power, dc-bais voltage, and gas pressure on the etch profile of CoFeB and IrMn thin film was explored, At high coil rf power, high dc-bais voltage, low gas pressure, the etching of CoFeB and IrMn displayed better etch profiles. Finally, the clean and vertical etch sidewall of CoFeB and IrMn free layers can be achieved by means of thin Ti hard mask in a $Cl_2$/Ar plasma at the optimized condition.

• Proceedings of the Korean Magnestics Society Conference
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• 2002.12a
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• pp.24-25
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• 2002

Tthe structure and magnetic properties of Sm-Co/co films treated at various annealing temperatures and times are reported, The effects of an externally applied magnetic field during annealing, were also investigated. These result is discussed in terms of magnetization reversal of nano grains which seems to compete with the exchange interaction occurring between the nano grains. (omitted)

• Proceedings of the Korean Magnestics Society Conference
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• 2002.12a
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• pp.220-221
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• 2002

There has been a demand for higher frequency operation of magnetic devices. Consideration of the materials that could be applicable to such high frequency applications is the first step when designing magnetic thin films for high-frequency use. Materials suitable for high frequency application should have a larger $M_{S}$ and an appropriate anisotropy field ( $H_{K}$), which increase a resonance frequency, and also a larger $\rho$, which reduces eddy current loss. (omitted)ted)

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2000.11a
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• pp.303-305
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• 2000

The effect of anisotropy field on the high frequency magnetic characteristics of FeTaN films was investigated. Those films show good magnetic properties : 4$\pi$Ms of 13KG, Hc of 0.6 Oe, effective permeability(${\mu}$') of 800 with a stable frequency response up to 800MHz. The films also show a large anisotropy field(Hk) over 21Oe. It result from the increased anisotropy of patterned FeTaN films. The combination of high saturation magnetization and relatively high Hk in these films is believed to the partly responsible for FeTaN for the excellent high-frequency behavior.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.14 no.5
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• pp.193-198
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• 2004

Using the $PbO-B_2O_3-Bi_2O_3$ flux system, $(TbBi)_3(FeAIGa)_5O_{12}(TbIG)$, $(EuBi)_3(FeAIGa)_5O_{12}(EuIG)$ and $(EuTbBi)_3(FeAIGa)_5O_{12}(EuTbIG)$ films were grown on $(GdCa)_3(GaMgZr)_5O_{12}(SGGG)$ substrates by the liquid phase epitaxy (LPE). The saturation magnetization of the grown TbIG, EuIG and EuTbIG films was about 150, 950 and 125 Oe, respectively. The TbIG films resulted in the single magnetic domain while the EuIG and EuTbIG films were observed to be the multi magnetic domains by magnetic force microscope (MFM).

• Journal of the Korean Magnetics Society
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• v.6 no.5
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• pp.317-322
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• 1996

Thin films of Fe-Zr-N were fabricated by rf magnetron reactive sputtering method. The saturation magnetization and coercivity as functions of annealing temperature and partial pressure of nitrogen gas, effective permeability at high frequencies, and thermal stability were investigated. Magnetic softness was exhibited in the composition range of $Fe_{72-78}Zr_{7-10}N_{15-18}$ which was boundary between polycrystalline and amorphous structure. These films exhibited magnetic softness with saturation magentic flux density of 1.55 T and effective permeability of about 3000 at 1 MHz. These films also exhibited thermal stability by sustaining effective permeability of 2500 or above as the temperature was raised to $550^{\circ}C$. It is asswned that good magnetic softness is obtained because grain growth of $\alpha-Fe$ is prohibited due to the precipitation of ZrN nanocrystals. The grain sizes of $\alpha-Fe$ films were $40~50\AA$ and the grain sizes of ZrN nanocrystals were $10~15\AA$.

• Journal of the Korean Magnetics Society
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• v.9 no.6
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• pp.285-290
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• 1999

The magnetic properties of sputtered amorphous $Fe_{86.7}Zr_{3.3}B_4Ag_6$ thin films, which contains an additional insoluble element Ag, have been investigated as a function of uniaxal field annealing temperature. The amorphous $Fe_{86.7}Zr_{3.3}B_4Ag_6$ thin films produced by relatively low temperature annealing at 40$0^{\circ}C$ for 1 hour was found to have very high permeability of 7800 at 50 MHz, 0.2 mOe, high magnetization of 1.7 T, low coercivity of 1.0 Oe and very low core loss of 1.4 W/cc at 1 MHz, 0.1 T, respectively. It is notable that the permeability and core loss values for various kinds of the soft magnetic thin films reported up to now. The reason for the appearance for the good soft magnetic properties is presumably due to the homogeneous formation of very fine bcc $\alpha$-Fe clusters with the size in the amorphous $Fe_{86.7}Zr_{3.3}B_4Ag_6$ thin films matrix, which can be deduced from the XRD results.

• Progress in Superconductivity
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• v.14 no.1
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• pp.30-33
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• 2012

We have grown $MgB_2$ superconducting thin films on the SiC buffer layers by means of hybrid physical-chemical vapor deposition (HPCVD) technique. Prior to that, SiC was first deposited on $Al_2O_3$ substrates at various temperatures from room temperature to $600^{\circ}C$ by using the pulsed laser deposition (PLD) method in a vacuum atmosphere of ${\sim}10^{-6}$ Torr pressure. All samples showed a high transition temperature of ~40 K. The grain boundaries of $MgB_2$ samples with SiC layer are greater in amount, compare to that of the pure $MgB_2$ samples. $MgB_2$ with SiC buffer layer samples show interesting change in the critical current density ($J_c$) values. Generally, at both 5 K and 20 K measurements, at lower magnetic field, all $MgB_2$ films deposited on SiC buffer layers have low $J_c$ values, but when they reach higher magnetic fields of nearly 3.5 Tesla, $J_c$ values are enhanced. $MgB_2$ film with SiC grown at $600^{\circ}C$ has the highest $J_c$ enhancement at higher magnetic fields, while all SiC buffer layer samples exhibit higher $J_c$ values than that of the pure $MgB_2$ films. A change in the grain boundary morphologies of $MgB_2$ films due to SiC buffer layer seems to be responsible for $J_c$ enhancements at high magnetic fields.

• Journal of Magnetics
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• v.11 no.2
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• pp.77-82
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• 2006

The structure and magnetic properties of Fe-Ni films, deposited by DC magnetron sputtering on Si(111) wafer, have been studied. The spin wave stiffness constant is determined by Brillouin light scattering (BLS) and compared with the value obtained from magnetization measurements. The range of exchange interaction was determined as 0.4 atomic distances in the film deposited in a bias magnetic field, which is 1/2 that in the film grown in no bias magnetic field. The results show that the dimensions of exchange coupling increased by the sputtering in the magnetic field.