• International Journal of Korean Welding Society
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• v.1 no.1
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• pp.13-16
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• 2001

High speed seam weldability of tin coated steels was investigated. Welding was performed by the laboratory wire seam welder that was equipped with process monitoring system Test results showed that increase in applied current and pressure reduced the total resistance across the welding electrodes. Lower and upper limits of welding current increased as the sheet thickness increased, while the acceptable welding condition range decreased. However, extremely low electrode pressure produced unstable welding condition range. The results also demonstrated that slower welding speeds widened the optimum welding heat input range.

• 한국정보디스플레이학회:학술대회논문집
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• 2008.10a
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• pp.605-608
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• 2008

The preparation and characteristics of flexible indium tin oxide electrodes grown on polyethylene terephthalate (PET) substrates using a specially designed roll-to-roll sputtering system for use in flexible optoelectronics In spite of low a PET substrate temperature, we can obtain the flexible electrode with a sheet resistance of 47.4 ohm/square and an average optical transmittance of 83.46 % in the green region of 500~550 nm wavelength. Both x-ray diffraction (XRD) and field emission scanning electron microscopy (FESEM) analysis results showed that all flexible ITO electrodes grown on the PET substrate were an amorphous structure with a very smooth and featureless surface, regardless of the Ar/$O_2$ flow ratio due to the low substrate temperature, which is maintained by a cooling drum. In addition, the flexible ITO electrode grown on the Ar ion beam treated PET substrates showed more stable mechanical properties than the flexible ITO electrode grown on the wet cleaned PET substrate, due to an increased adhesion between the flexible ITO and the PET substrates.

• Transactions on Electrical and Electronic Materials
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• v.7 no.5
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• pp.267-270
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• 2006

The Indium tin oxide (ITO) films were deposited on CR39 substrate using DC magnetron sputtering. ITO thin films deposited at room temperature because CR39 substrates its glass-transition temperature of is $130^{\circ}C$. ITO thin films used bottom and top electrode and for organic thin film transparent transistor.(OTFT) ITO thin film electrodes electrical properties and optical transparency properties in the visible wavelength range (300 - 800 nm) strongly dependent on volume of oxygen percent. For the optimum resistivity and transparency of ITO thin film electrode achieved with a 75 W plasma power, 10 % volume of oxygen and a 27 nm/min deposition rate. Above 85 % transparency in the visible wavelength range (300 - 800 nm) measured without post annealing process and $9.83{times}10{-4}{\Omega}cm$ a low resistivity was measured thickness of 300 nm.

• 한국연소학회:학술대회논문집
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• 2014.11a
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• pp.161-164
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• 2014

The feasibility of a molten metal as a bed material of a pyrolysis system was investigated. The molten metal has various advantages such as high thermal conductivity, wide operating range and low viscosity. Tin was selected since its physical characteristics are suitable for the purpose. As a results, it was found that pyrolytic oil yield and reaction rate were significantly enhanced with the molten Tin. In addition, oxygen component of the product oil was decreased due to Tin oxidation.

• Korean Journal of Optics and Photonics
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• v.11 no.3
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• pp.152-157
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• 2000

Post-deposition vacuum annealing effects in electron-bearn-evaporated indium tin oxide (ITO) films have been investigated by the change of transmittance, sheet resistance and crystalline structure with annealing temperature ( $200-335^{\circ}C$) and oxygen partial pressure ($1\times^10^{-5}-1$\times10^{-4} torr$) in air and vacuum. The sarnples were polycrystalline films with a preferred orientation in the (222) plan. High quality films with sheet resistance as low as 62 Q/O and transmittance over 99% (absentee layer at 500 nm) have been obtained by suitably controlling the vacuum annealing pararneters.neters.

• Korean Journal of Materials Research
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• v.17 no.4
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• pp.232-235
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• 2007

Indium tin oxide (ITO) films were deposited on polycarbonate CR39 substrate using DC magnetron sputtering. ITO thin films were deposited at room temperature because glass-transition temperature of CR39 substrate is $130^{circ}C$ ITO thin films are used as bottom and top electrodes and for organic thin film transparent transistor (OTFT). The electrodes electrical properties of ITO thin films and their optical transparency properties in the visible wavelength range (300-800 nm) strongly depend on the volume of oxygen percent. The optimum resistivity and transparency of ITO thin film electrode was achieved with a 75 W plasma power, 10 % volume of oxygen and a 27 nm/min deposition rate. Above 85% transparency in the visible wavelength range (300-800 nm) was measured without post annealing process, and resistivity as low as $9.83{\times}^{TM}10^{-4}{\Omega}$ cm was measured at thickness of 300 nm.

• Journal of the Korean institute of surface engineering
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• v.31 no.2
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• pp.109-116
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• 1998

Highly transparent conductive pure and fluorine-doped tin oxide(FT0, $SnO_2$ : F) films have been prepared by low pressure metal organic chemical vapor deposition (LP-MOCVD) from various mixtures of tetramethyitin(TMT) with oxygen or oxygen containing ozone. The properties of TO films have been changed with the variation of gases, flow rate, and substrate temperature. The nsing of oxygen containing ozone instead of pure oxygen, reduced substrate temperature by 100-$150^{\circ}C$ while maintaining same thickness. The films prepared by using ozone showed the resistivity in the range from $10^~2$ to $10^{~3}\Omega$cm, and the mobiiity from 10 to $14\textrm{cm}^2$/Vs. Fluorine-doped tin oxide films had properties such as the resistivity about $10^{-4}\Omega$cm, and the mobility from 14 to $19\textrm{cm}^2$/Vs.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 1997.11a
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• pp.510-514
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• 1997

The thin film that is electrically conductive and optically transparent is called conductive transparent thin film. ITO(Indium-Tin Oxide) which is a kind of conductive transparent thin film has been widely used in solar cell, transparent electrical heater, selective optical filter, FDP(Flat Display Panel) such as LCD(Liquid Crystal Display), PDP(Plasma Display Panel) and so on. Especially in PDP, ITO films is used as a transparent electrode in order to maintain discharge and decrease consumption power through the improvement of cell structure. In this study, we prepared ITO by reactive r.f. sputtering with indium-tin(Sn 10wt%) alloy target instead of indium-tin oxide target. The ITO films deposited at low temperature 15$0^{\circ}C$ and 8% $O_2$. Partial pressure showed about 3.6 Ω/$\square$. At the end of firing, the resistance of ITO was decreased, the optical transparence was improved above 90%.

• Proceedings of the Korean Powder Metallurgy Institute Conference
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• 2006.09a
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• pp.122-123
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• 2006

Tin oxide nanoparticles (n-SnO and $n-SnO_2$) were synthesized by the inert gas condensation (IGC) method under dynamic gas flow of oxygen and argon at various conditions. Transmission electron microscopy (TEM) and X-ray diffraction (XRD) method were used to analysis the size, shape and crystal structure of the produced powders. The synthesized particles were mostly amorphous and their size increased with increasing the partial pressure of oxygen in the processing chamber. The particles also became broader in size when higher oxygen pressures were applied. Low temperature annealing at $320^{\circ}C$ in air resulted to crystallization of the amorphous n-SnO particles to $SnO_2$.

• 보존과학연구
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• s.32
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• pp.155-170
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• 2011

This study intended to identify the ratio of alloy, metallographic examination and hardness on the bronze mirrors excavated in Korea and made the distribution chart of the main components according to each artifact and then tried to compare the ratio of artifacts with that of 鑑燧之齊of Zhouli Kaogongji(周禮, 考工記). Through this research, the components distribution of bronze covered a wide rage but it can be divided into 2~3 groups. When it is categorized into 3 groups, one is the bronze mirror with 70-80% of copper, 15-20% of tin and less than 5% of lead. Another is the bronze mirror with 20%-30% of tin which gives the white luster on metal and the high hardness. The other is the bronze mirror with 60-70% of copper and 15-20% of tin but it has more than 10-15% of lead which causes less luster and the low hardness. It contains less tin than 33%(50%) of tin from 鑑燧之齊 according to the old record Zhouli Kaogongji(周禮, 考工記) of Zhou Dynasty. In Korea the bronze mirror with tin of 鑑燧之齊was never found yet except the case of artifacts analyzed by non-destructive analysis.